CN102471047A - 用于制造由增强的硅制成的微机械部件的方法 - Google Patents
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Abstract
本发明涉及用于制备由增强的硅制成的微机械部件的方法,所述方法包括以下步骤:在硅晶片中微加工该部件或一组部件;在一个或多个步骤中在该部件的整个表面上形成二氧化硅层,以便获得为天然二氧化硅的厚度至少五倍的二氧化硅厚度;通过化学侵蚀除去二氧化硅层。
Description
发明领域
本发明涉及用于制备增强的由硅制成的微机械部件(pièces de micromécanique)的方法。它是制造硅制微机械部件的方法,其为所述部件提供提高的机械强度,特别地抗冲击性,和优良的摩擦性质。本发明更具体地涉及这种用作适用于微机械部件(其被布置以与其它部件摩擦接触、该微机械部件相对于这些其它部件运动)的方法。这些微机械部件同样可以是运动部件(如,例如绕轴旋转部件)或固定部件(如,例如轴承)。它例如是,作为非限制实例,用于机械钟表运动的微机械部件。
技术背景
硅是越来越多地用于制造机械部件,特别地微机械部件的材料,无论它们是否是"被固定的"部件,即,其与它们已经在其上被加工的基材保持连接,或"自由"部件,如形成钟表运动的传动链一部分的部件。
与通常用于制造微机械部件(如齿轮、铰接部件或弹簧)的金属或合金相比,硅具有以下优点:它具有低3-4倍的密度并因此具有非常降低的惯性和对磁场不敏感。这些优点在钟表领域内在等时性和运行持续时间方面都是特别有利的。
然而,硅有根据地具有对冲击灵敏的名声,这在装配期间可能是必需的,冲击在运行期间是不可避免的或偶然的,例如当使用者碰撞或掉落该手表时。
专利文献WO2007/000271提出用于改善硅制微机械部件的机械强度的方法。根据这种现有技术文献,一旦该部件已经在硅晶片中进行微加工,其表面用二氧化硅层涂覆。这种层通过在900℃-1200℃的温度下使该部件的表面热氧化形成。测定热氧化过程的持续时间以便获得是天然二氧化硅的厚度至少五倍的二氧化硅的厚度。
刚才描述的方法的一个缺点是二氧化硅明显地提高了获得的部件的摩擦系数。为了克服这个缺点,上述文献提出在无定形二氧化硅上加入其它材料的涂料;必须对该其它材料进行选择(对于它的摩擦学性质)。这种技术方案,其在于在二氧化硅层之上加入附加涂层,具有使涂料层加倍的缺点。而且,某些涂料没有很好地粘附到二氧化硅上。
发明内容
本发明的目的因此是提供硅制微机械部件的制造方法,其为所述部件提供可与根据WO2007/000271的方法制备的部件相当的机械强度,然而还为所述部件提供可与没有用二氧化硅层涂覆的硅制部件相当的摩擦学性质。
本发明因此涉及根据附带权利要求1的由增强的硅制成的部件的制造方法。
令人惊奇地,先验地所述实验显示本发明的除去二氧化硅层的步骤对所述部件的机械性质几乎没影响。换句话说,根据本发明制备的部件的机械强度与根据上述文献WO2007/000271的方法制备的部件几乎相同。而且,根据本发明制备的部件的摩擦学性质是显著地更好的。
在下文提出的假设本质上都不具有限制性特征,但可以试图进行在下面的解释。
首先,当在该部件表面上形成二氧化硅层时,该二氧化物不仅仅满足于涂覆该部件的外部。它填充并且堵塞裂纹、缺口及其它在硅中的微孔。因为,从化学角度来看,硅原子对氧原子比对其它硅原子更具亲合力,硅-二氧化硅接合应该具有更大的粘附性并且二氧化硅构成对硅的缺陷非常有效的焊接。
当除去二氧化硅层时,“剥离”自然地从外部发生。因此,在硅中的微孔内部的二氧化物最后被侵蚀。因此理解的是,当已经除去二氧化硅层时,应该继续存在一定数量二氧化物的脉纹(veines)或插入物,它们填满在硅制部件的表面中的微孔。这些二氧化物"焊料"的存在可以引起该硅的增强,并因此引起所制备部件的更大的机械强度。
根据本发明的方法的有利变型,二氧化硅层通过在900℃-1200℃的温度下热氧化该部件的表面形成。理解的是,根据这种变型,产生二氧化物的反应消耗硅。因此,随着氧化步骤进行,构成与新二氧化物层的界面的硅表面向后移。硅表面的向后移具有使在硅中较浅的表面裂纹和其它微孔消失的优点,因此不需要堵塞它们。
附图说明
本发明的其它特征和优点在以下实施例的描述中通过参考附图更明显地呈现,这些实施例以非限制性说明方式给出,其中:
- 图1a显示硅制微机械部件的初始截面;
- 图2a对应于在形成二氧化硅层之后的图1a;
- 图3a对应于在除去二氧化硅层之后的图2a;
- 图1b是显示在硅表面中的两个微裂缝和一个微孔的图1a的一部分的显著放大;
- 图2b对应于在形成二氧化硅层之后的图1b;
- 图3b对应于在除去二氧化硅层之后的图2b。
发明的详细说明
作为可以使用本发明的方法制造的增强的微机械部件的实例,可以提到齿轮、擒纵轮、地脚螺栓(ancres)或其它被绕轴旋转的部件,如心轴。最后,本发明的方法还可以制造被动部件,如,例如轴承。
图1a完全示意地显示具有硅制芯(ame)1的微机械部件的截面,其中标注号3指示初始外表面。当使硅制部件放置在环境介质中一定时间段时,它天然地由被称为"天然氧化物"二氧化硅(未显示)涂覆,其厚度基本为1-10nm。图1b是在硅的表面3中的两个微裂缝12和一个表面微孔14的图1a的一部分的显著放大。认为这些裂纹或微孔的存在可促进使得硅制部件更易碎的和脆性的是合理的。
图2a显示在通过在900℃-1200℃热氧化该硅制部件的表面而形成二氧化硅层之后的图1a的截面。为此,应用在著作"Semiconductor devices: physics and technology",(Ed. John Wiley & Sons,ISBN0-471-87424-8,01.01 1985,p.341-355)中描述的操作方法。因此,需要在1100℃的温度下大约10小时以获得约1.9μm的SiO2厚度。如图2a显示,以牺牲硅形成二氧化物,其正面3向后移以产生与形成的SiO2的新界面5。相反地,由于SiO2具有更低密度,SiO2的外表面7延伸超过部件的初始表面。这些分界线3、5和7的位置没有按比例尺显示。图2b显示在形成二氧化硅层之后与图1b相同的放大。可以看出,因为在硅和形成的SiO2之间的界面5的向后移,表面的微孔14已经完全消失。还看出,微裂缝12已经完全地由二氧化硅填充。
图3a显示在已经通过用氢氟酸溶液的化学侵蚀来除去二氧化硅层之后的硅制部件的相同截面。一旦通过该处理已经除去SiO2层,可以看到边界5,其在图2中对应于在硅和氧化物之间的界面,现在已经变成外表面。由于氧化已经消耗部分硅,通过本发明的方法提供的微机械部件的尺寸(cotes)稍微小于在微加工期间为其提供的尺寸。然而,很明显的是Si和SiO2的物理性质和热处理的特征的认识可用于计算用于切割部件的初始尺寸以便在处理结束时获得希望的尺寸。图3b显示在已经除去二氧化硅层2之后与图1b和2b相同的放大。可以看到,二氧化硅的"脉纹"继续保留在微裂缝12内部。为了使在微裂缝内部的二氧化物的腐蚀降低至最小,一旦已经除去层2,剥离二氧化硅的步骤优选地应该被间断。对SiO2的化学性质和用于“剥离”的稀释氢氟酸的认识可用于计算最佳的暴露时间以便除去SiO2层同时保留在裂纹12中的二氧化物的脉纹。正如前面提到的那样,硅原子具有与氧原子比与其它硅原子更大亲合力。在这些条件下,用二氧化硅线填充微裂缝可以引起使用通过本发明的方法制备的部件所观测到的优良机械强度。
另一方面,本领域的技术人员将理解,当形成二氧化物层时该热氧化引起该硅表面的退却。通过用另一种方法,例如从硅烷(SiH4)或TEOS (Si(OC2H5)4)形成二氧化物层,理论上将可以实施本发明的方法同时避免刚才描述的部件的缩小。
还将理解的是,可以对形成本说明书的主题的实施方案进行对于本领域的技术人员明显的各种变化和/或改进而不脱离由附带的权利要求所定义的本发明的范围。特别地,氢氟酸溶液不是唯一除去二氧化硅层的方式。本领域的技术人员将可以使用任何显示适合于实施该操作的方式,特别地使用BHF。
另一方面,根据本发明的方法的未显示的变型,可以提供附加步骤,在该附加步骤中由因其摩擦学性质而被选择的材料制成的涂层在已除去SiO2之后在硅表面上形成。为此,本领域的技术人员将可以选择任何其它显示适合于该目的的材料。特别地,可以选择呈金刚石形式的结晶碳(DLC)或碳纳米管。
Claims (7)
1.制造由增强的硅制成的微机械部件的方法,所述方法顺序地包括以下步骤:
-在硅晶片中微细加工该部件或一组部件;
-在一个或多个步骤中在该部件的整个表面上形成二氧化硅层,以便获得是天然二氧化硅的厚度至少五倍的二氧化硅厚度;
-通过化学侵蚀除去二氧化硅层。
2.根据权利要求1的方法,特征在于二氧化硅层的厚度是天然二氧化硅的厚度的至少一百倍。
3.根据权利要求1的方法,特征在于该二氧化硅层通过在900℃-1200℃温度下热氧化该部件的表面而形成。
4.根据权利要求2的方法,特征在于在该方法的第一步骤中,该部件使用比希望的最终尺寸稍微更大的尺寸进行微加工,并且在于该二氧化硅层然后通过在900℃-1200℃的温度下热氧化该部件的表面而形成。
5.根据前述权利要求任一项的方法,特征在于在除去二氧化硅层的步骤之后,它包括在该部件的表面上形成具有比晶体硅更好的摩擦学性质的材料的涂层。
6.用于结合到钟表机械装置中的增强的硅制微机械部件,特征在于它能够通过根据权利要求1-5任一项的方法获得。
7.根据权利要求6的部件,特征在于二氧化硅"脉纹"存在于该部件的表面中。
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EP09166269.2 | 2009-07-23 | ||
EP09166269A EP2277822A1 (fr) | 2009-07-23 | 2009-07-23 | Procede de fabrication d'une piece micromecanique en silicium renforce |
PCT/EP2010/060497 WO2011009869A1 (fr) | 2009-07-23 | 2010-07-20 | Procédé de fabrication d'un pièce micromécanique en silicium renforcé |
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EP (2) | EP2277822A1 (zh) |
JP (2) | JP2012533441A (zh) |
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Also Published As
Publication number | Publication date |
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US8992784B2 (en) | 2015-03-31 |
CN102471047B (zh) | 2015-08-19 |
EP2456714B1 (fr) | 2015-03-18 |
JP2012533441A (ja) | 2012-12-27 |
JP3183864U (ja) | 2013-06-06 |
US20130029157A1 (en) | 2013-01-31 |
EP2456714A1 (fr) | 2012-05-30 |
EP2277822A1 (fr) | 2011-01-26 |
CH701499B1 (fr) | 2016-09-15 |
WO2011009869A1 (fr) | 2011-01-27 |
CH701499A2 (fr) | 2011-01-31 |
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