CN102400110B - 一种气相沉积用导流防尘控气盘及气相沉积炉内洁净生产的方法 - Google Patents
一种气相沉积用导流防尘控气盘及气相沉积炉内洁净生产的方法 Download PDFInfo
- Publication number
- CN102400110B CN102400110B CN 201110400858 CN201110400858A CN102400110B CN 102400110 B CN102400110 B CN 102400110B CN 201110400858 CN201110400858 CN 201110400858 CN 201110400858 A CN201110400858 A CN 201110400858A CN 102400110 B CN102400110 B CN 102400110B
- Authority
- CN
- China
- Prior art keywords
- gas
- control tray
- gas control
- diversion dustproof
- diversion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110400858 CN102400110B (zh) | 2011-12-06 | 2011-12-06 | 一种气相沉积用导流防尘控气盘及气相沉积炉内洁净生产的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201110400858 CN102400110B (zh) | 2011-12-06 | 2011-12-06 | 一种气相沉积用导流防尘控气盘及气相沉积炉内洁净生产的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102400110A CN102400110A (zh) | 2012-04-04 |
CN102400110B true CN102400110B (zh) | 2013-06-05 |
Family
ID=45882741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201110400858 Active CN102400110B (zh) | 2011-12-06 | 2011-12-06 | 一种气相沉积用导流防尘控气盘及气相沉积炉内洁净生产的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN102400110B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105112885B (zh) * | 2015-08-31 | 2018-01-26 | 清远先导材料有限公司 | 一种带有清料装置的化学气相沉积炉 |
CN105925959B (zh) * | 2016-05-13 | 2018-10-16 | 上海纳米技术及应用国家工程研究中心有限公司 | 一种复合型ald导气装置 |
CN111424319B (zh) * | 2020-05-12 | 2020-12-01 | 江苏超芯星半导体有限公司 | 一种大尺寸公斤级碳化硅单晶的制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101265570A (zh) * | 2008-04-30 | 2008-09-17 | 苏州纳晶光电有限公司 | 高温金属有机化学气相淀积反应器 |
CN101373702A (zh) * | 2007-08-24 | 2009-02-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 腔室内衬及反应腔室 |
CN201428008Y (zh) * | 2009-07-10 | 2010-03-24 | 李伟 | 一种多晶硅化学气相沉积装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4974815B2 (ja) * | 2006-10-04 | 2012-07-11 | 東京エレクトロン株式会社 | 薄膜形成装置の洗浄方法、薄膜形成方法及び薄膜形成装置 |
-
2011
- 2011-12-06 CN CN 201110400858 patent/CN102400110B/zh active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101373702A (zh) * | 2007-08-24 | 2009-02-25 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 腔室内衬及反应腔室 |
CN101265570A (zh) * | 2008-04-30 | 2008-09-17 | 苏州纳晶光电有限公司 | 高温金属有机化学气相淀积反应器 |
CN201428008Y (zh) * | 2009-07-10 | 2010-03-24 | 李伟 | 一种多晶硅化学气相沉积装置 |
Also Published As
Publication number | Publication date |
---|---|
CN102400110A (zh) | 2012-04-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN1292092C (zh) | 用于金属有机化学气相沉积设备的双层进气喷头 | |
CN102400110B (zh) | 一种气相沉积用导流防尘控气盘及气相沉积炉内洁净生产的方法 | |
CN106811736B (zh) | 一种化学气相沉积装置 | |
CN103569998B (zh) | 碳纳米管制备装置及方法 | |
CN102312199A (zh) | 一种扫描镀膜装置及扫描镀膜组件 | |
CN107500298A (zh) | 电子级多晶硅还原炉及多晶硅的生产方法 | |
CN205870851U (zh) | 混凝土粉料储存装置 | |
CN205856602U (zh) | 一种高效节能式硒化锌气相沉积炉 | |
CN104086080B (zh) | 沉积装置、提高光纤预制棒疏松体密度的方法 | |
CN101314844B (zh) | 一种水平切向进口、中心垂直出口的mocvd反应室 | |
CN202369640U (zh) | 一种气相沉积用导流防尘控气盘 | |
CN107447205B (zh) | 一种高效沉积cvd装置 | |
CN108545745A (zh) | 一种72对棒多晶硅还原炉 | |
CN103857459A (zh) | 通过流化床反应器清洁废气的方法和装置 | |
CN107604340A (zh) | 化学气相沉积炉 | |
CN102433548B (zh) | 一种用于气相沉积的均匀气流进气口装置及均匀进气的方法 | |
CN104264217B (zh) | 一种制备半导体外延片的mocvd反应装置 | |
CN103633190B (zh) | 晶体硅太阳能电池的硼扩散装置及方法 | |
CN103278008B (zh) | 带气幕保护的反应塔及其进气方法 | |
CN113737270B (zh) | 一种热场的排气装置 | |
CN202786415U (zh) | 排气环 | |
CN102839358A (zh) | 一种金属有机物化学气相沉积设备的热吹扫结构 | |
CN207294881U (zh) | 化学气相沉积炉 | |
CN202380081U (zh) | 一种用于气相沉积的均匀气流进气口装置 | |
CN102758192B (zh) | 一种半导体外延片载片盘及其支撑装置及mocvd反应室 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: SHANDONG GUOJIN NEW MATERIALS CO., LTD. Free format text: FORMER OWNER: LIU RUQIANG Effective date: 20120224 |
|
C41 | Transfer of patent application or patent right or utility model | ||
C53 | Correction of patent for invention or patent application | ||
CB03 | Change of inventor or designer information |
Inventor after: Liu Rucui Inventor after: Liu Ruqiang Inventor before: Liu Ruqiang |
|
COR | Change of bibliographic data |
Free format text: CORRECT: INVENTOR; FROM: LIU RUQIANG TO: LIU RUCUI LIU RUQIANG |
|
TA01 | Transfer of patent application right |
Effective date of registration: 20120224 Address after: 251200 Shandong province Yucheng City South Road No. 88 Applicant after: Shandong Guojing New Materials Co., Ltd. Address before: South East Shandong 251200 city of Dezhou province Yucheng City No. 88 Applicant before: Liu Ruqiang |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant |