CN102400108B - Thin film deposition machine and bearing part thereof - Google Patents
Thin film deposition machine and bearing part thereof Download PDFInfo
- Publication number
- CN102400108B CN102400108B CN201110379032.3A CN201110379032A CN102400108B CN 102400108 B CN102400108 B CN 102400108B CN 201110379032 A CN201110379032 A CN 201110379032A CN 102400108 B CN102400108 B CN 102400108B
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- framework
- bearing part
- substrate
- film deposition
- deposition machine
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- 238000000427 thin-film deposition Methods 0.000 title description 9
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 230000008021 deposition Effects 0.000 claims abstract description 41
- 239000000463 material Substances 0.000 claims description 25
- 238000012423 maintenance Methods 0.000 abstract description 7
- 239000013077 target material Substances 0.000 abstract 1
- 239000010408 film Substances 0.000 description 41
- 238000000151 deposition Methods 0.000 description 29
- 238000000034 method Methods 0.000 description 11
- 238000004140 cleaning Methods 0.000 description 9
- 239000012528 membrane Substances 0.000 description 6
- 239000004693 Polybenzimidazole Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229920002480 polybenzimidazole Polymers 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910001069 Ti alloy Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Secondary Cells (AREA)
- Battery Electrode And Active Subsutance (AREA)
- Sealing Battery Cases Or Jackets (AREA)
- Battery Mounting, Suspending (AREA)
Abstract
A film deposition machine and a bearing part thereof are provided, the film deposition machine is suitable for bombarding a target material to deposit a film on a substrate, and the film deposition machine comprises a first electrode plate, a second electrode plate and a bearing part. The second electrode plate is opposite to the first electrode plate, the target is arranged on the first electrode plate, and the bearing piece is arranged on the second electrode plate. The bearing piece is suitable for bearing the substrate and comprises a body and a frame body which can be separated from each other, wherein the frame body is suitable for surrounding the body. The invention can reduce the maintenance cost of the technological film deposition machine and improve the film quality.
Description
Technical field
The present invention relates to a kind of film and form board, particularly relate to a kind of film deposition machine station and bearing part thereof.
Background technology
In the industrial circles such as semi-conductor now, electronics, machinery, film deposition techniques is widely used.Film deposition techniques can be divided into physical vapor deposition and chemical vapour deposition, and wherein physical vapor deposition utilizes the phase change of material not relate to chemical reaction to carry out thin film deposition.
In physical vapor deposition, common method is sputtering method, and it utilizes ionized gas to bombard target, makes the particle deposition of target on substrate, to form thin film on substrate.
In known technology, substrate is positioned on the bearing part of film deposition machine station.Schematic top plan view when Fig. 1 is the bearing part bearing substrate of known film deposition machine station, and Fig. 2 is that the bearing part of Fig. 1 is in order to diagrammatic cross-section during bearing substrate.Please refer to Fig. 1 and Fig. 2, in order to avoid bearing part 100 oversize causes easily colliding in the process of carrying and impaired, known bearing part 100 is designed to be formed side by side by three rectangular plates 110.So, carry again after three rectangular plates 110 can being separated, to reduce bearing part 100 probability impaired in the process of carrying.
In known technology, substrate 50 is configured on bearing part 100, and target particle is except being deposited on except on substrate 50, also can be deposited on bearing part 100 not by the region 102 that substrate 50 hides, so also can film be formed on region 102.When the thin film deposition on region 102 is to certain thickness, the work cleaned need be carried out, become source of pollution to avoid the film on region 102.
But, when carrying out bearing part 100 cleaning, need first disassemble bearing part 100, then each rectangular plate 110 of bearing part 100 is carried to clean sentencing and clean, so comparatively expend time in.And under long-time use, these rectangular plates 110 are easily impaired in regular disassembly process or handling process, and regular cleaning also can cause the thickness of these rectangular plates 110 to change.
In addition, after these three rectangular plates 110 of bearing part 100 combine, between adjacent rectangular plate 110, originally just easily produce high low head, cause substrate 50 cannot with bearing part 100 flat contact.If the thickness of adding each rectangular plate 110 easily changes after repeatedly clean, then the problems referred to above will be more serious.Because bearing part 100 has thermal conducting function concurrently, if so substrate 50 cannot with bearing part 100 flat contact, by making, being heated of substrate 50 is uneven.And, due to the speed of thin film deposition and the temperature on structure and substrate 50 surface closely bound up, so substrate 50 is heated and unevenly will reduces membrane quality.
Summary of the invention
The invention provides a kind of film deposition machine station, to reduce maintenance cost and to promote membrane quality.
The present invention separately provides a kind of bearing part, to promote cleaning efficiency.
The present invention proposes a kind of film deposition machine station, and it is suitable for bombardment target with deposit film on substrate, and film deposition machine station comprises the first battery lead plate, the second battery lead plate and bearing part.Second battery lead plate is relative with the first battery lead plate, and target is arranged at the first battery lead plate, and bearing part is configured at the second battery lead plate.Bearing part is suitable for bearing substrate, and comprise can be separated from one another body and framework, wherein framework is suitable for around body.
In one embodiment of this invention, above-mentioned body is rectangular, and framework is suitable for each side connecting body.
In one embodiment of this invention, above-mentioned framework comprises multi-disc sheet material.
In one embodiment of this invention, above-mentioned body is identical with the material of framework.
In one embodiment of this invention, above-mentioned body is different from the material of framework.
In one embodiment of this invention, the edge of above-mentioned body is provided with the first clinch, and the edge of framework is provided with the second clinch coordinated with the first clinch, and bearing part is the flat board overlapped by body and framework.
In one embodiment of this invention, above-mentioned body and framework are respectively equipped with multiple locking hole, for securing to the second battery lead plate.
In one embodiment of this invention, above-mentioned film deposition machine station also comprises multiple holder, and wherein framework is provided with multiple first perforation, and the second battery lead plate is provided with multiple second perforations of corresponding first perforation, each holder through the first corresponding perforation and the second perforation, and clamps substrate.
In one embodiment of this invention, above-mentioned bearing part comprises base plate carrying district with bearing substrate, base plate carrying district contain body and with framework local overlapping.
The present invention separately proposes a kind of bearing part, and it is applicable to film deposition machine station, with bearing substrate.Bearing part comprises body and framework that can be separated from one another, and wherein framework is suitable for around body.
In one embodiment of this invention, above-mentioned body is rectangular, and framework is suitable for each side connecting body.
In one embodiment of this invention, above-mentioned framework comprises multi-disc sheet material.
In one embodiment of this invention, the edge of above-mentioned body is provided with the first clinch, and the edge of framework is provided with the second clinch coordinated with the first clinch, and bearing part is the flat board overlapped by body and framework.
In one embodiment of this invention, above-mentioned bearing part comprises base plate carrying district with bearing substrate, base plate carrying district contain body and with framework local overlapping.
When bearing part of the present invention is in order to bearing substrate, substrate can cover whole body, so when carrying out thin film deposition processes, and can not deposit film on body.Therefore, when carrying out the cleaning of bearing part, only need clean framework, so can promote the cleaning efficiency of bearing part, to reduce the maintenance cost of present invention process film deposition machine station.In addition, substrate can the body of flat contact bearing part, so can thermally equivalent, therefore can promote membrane quality.
For present invention process above and other object, feature and advantage can be become apparent, preferred embodiment cited below particularly, and coordinate appended accompanying drawing, be described in detail below.
Accompanying drawing explanation
Schematic top plan view when Fig. 1 is the bearing part bearing substrate of known film deposition machine station.
Fig. 2 is that the bearing part of Fig. 1 is in order to schematic diagram during bearing substrate.
Fig. 3 is the schematic diagram of a kind of film deposition machine station of one embodiment of the invention.
Fig. 4 is the schematic top plan view of bearing part in Fig. 3.
Fig. 5 is the diagrammatic cross-section of the bearing part of another embodiment of the present invention.
Fig. 6 is the diagrammatic cross-section of the film deposition machine station of another embodiment of the present invention.
Wherein, description of reference numerals is as follows:
20: positive ion
50,70: substrate
72: surface
60: target
62: atom
100: bearing part
102: region
110: rectangular plate
200,200b: film deposition machine station
210: the first battery lead plates
220, the 220b: the second battery lead plate
222: the second perforations
230: holder
300,300a, 300b: bearing part
302: base plate carrying district
310,310a, 310b: body
311: side
312: the first clinch
313,327: overlap joint block
314,328: overlap joint groove
315,325: locking hole
316: lug boss
317: loading end
320,320a, 320b: framework
321,322,323,324: sheet material
326: the second clinch
329: the first perforations
Embodiment
Fig. 3 is the schematic diagram of a kind of film deposition machine station of one embodiment of the invention, and Fig. 4 is the schematic top plan view of bearing part in Fig. 3.Please refer to Fig. 3 and Fig. 4, the film deposition machine station 200 of the present embodiment is suitable for bombardment target 60 with deposit film on substrate 70.This film deposition machine station 200 is such as sputtering machine table, and it comprises the first battery lead plate 210, second battery lead plate 220 and bearing part 300.Second battery lead plate 220 is relative with the first battery lead plate 210, and target 60 is arranged at the first battery lead plate 210, and bearing part 300 is configured at the second battery lead plate 220, and bearing part 300 is suitable for bearing substrate 70.In the present embodiment, the first battery lead plate 210 is such as negative plate, and the second battery lead plate 220 is such as positive plate, and the second battery lead plate 220 can be used as hot-plate, to heat bearing part 300.
In above-mentioned film deposition machine station 200, rare gas element (as the argon) ionization passed into therebetween can be made by the electric field between the first battery lead plate 210 and the second battery lead plate 220, and under the effect of electric field, positive ion 20 in gas is subject to the attraction of negative plate (i.e. the first battery lead plate 210) and accelerating impact target 60, so that the atom 62 of target 60 is hit, and atom 62 can be deposited on substrate 70, to form film.
In order to improve the problem that known bearing part causes, the present embodiment is improved for the structure of bearing part 300 especially.Hereafter the structure for bearing part 300 is elaborated.
The bearing part 300 of the present embodiment comprises body 310 and framework 320 that can be separated from one another, and wherein framework 320 is suitable for around body 310.Framework 320 such as can form flat board after being combined with body 310.Body 310 is such as rectangular, and framework 320 is suitable for each side 311 connecting body 310.In addition, bearing part 300 comprises base plate carrying district 302 to carry above-mentioned substrate 70, base plate carrying district 302 be such as in Fig. 4 dotted line around region, its contain body 310 and with framework 320 local overlapping.In more detail, the size of bearing part 300 is size according to substrate 70 and designs, and substrate 70 is such as cover whole base plate carrying district 302, and the district that effectively utilizes of substrate 70 is such as overlapping with body 310.The described district that effectively utilizes is such as display space or induction zone etc., the kind of optic placode 70 and determining.In the present embodiment, when substrate 70 is configured at bearing part 300, the periphery of substrate 70 can exceed the side 311 of body 310, and the periphery of such as substrate 70 can exceed the side 311 about 1 centimeter of body 310, but is not limited thereto, and can adjust according to actual demand.In addition, body 310 and framework 320 can be respectively equipped with multiple locking hole 315,325, so can by through locking hole 315,325 body 310 and framework 320 are fixed on the second battery lead plate by the locking part (not shown) locked in the second battery lead plate 220.220。In addition, body 310 and framework 320 separately can be provided with multiple perforation (not shown), when wanting carrying substrate 70, first thimble (not shown) can be borrowed through these perforations by substrate 70 jack-up, in order to carrying substrate 70 by film deposition machine station 200.
Above-mentioned framework 320 comprises multi-disc sheet material, and as sheet material 321,322,323,324, these sheet materials 321,322,323,324 are such as combined into rectangular box, with around body 310.In addition, body 310 and framework 320 can select the better material that can insulate again of thermal conductivity to make, with the thermal conduction provided by the second battery lead plate 220 to substrate 70.Body 310 can be identical with the material of framework 320, such as, be glass.In another embodiment, body 310 can not be identical with the material of framework 320, for example, the material of body 310 can be glass, and the material of framework 320 can be pottery, aluminium sheet or titanium alloy sheet, wherein surface of aluminum plate can be formed with anonite membrane, and titanium alloy sheet surface can be formed with industrial plastic film, as polybenzimidazole (polybenzimidazole, PBI) film.
In the bearing part 300 of the present embodiment, most substrate 70 is positioned at body 310, thus can with body 310 flat contact, conduct to substrate 70 uniform thermal power provided to make the second battery lead plate 220, and then promote the quality of post-depositional film.And, in base plate carrying district 302, the intersection position of framework 320 and body 310 is at the edge of substrate 70, and the district that effectively utilizes of substrate 70 is overlapping with body 310, even if so framework 320 and the intersection unfairness of body 310, be still unlikely to cause substantial impact to membrane quality.In addition, because substrate 70 can cover whole body 310, so when carrying out thin film deposition processes, film can be deposited in the framework 320 do not covered by substrate 70 of bearing part 300, and can not deposit film on body 310.So, when carrying out the cleaning of bearing part 300, only need clean framework 320, so can promote the cleaning efficiency of bearing part 300, to reduce the maintenance cost of the film deposition machine station 200 of the present embodiment.In addition, only have framework 230 easily because causing thickness to change serious after repeatedly clean and can't bear to use, so the framework 320 that only need more renew, so can save the maintenance cost of film deposition machine station 200 further.
It should be noted that, although the framework 320 of above-mentioned bearing part 300 is that to comprise four sheet materials 321,322,323,324 be example, the present invention does not limit the quantity of the sheet material of framework.In addition, in another embodiment, framework also can be only made up of a sheet material.
Fig. 5 is the diagrammatic cross-section of the bearing part of another embodiment of the present invention.Please refer to Fig. 5, the bearing part 300a of the present embodiment is similar to above-mentioned bearing part 300, and difference is in bearing part 300a.The bearing part 300a of the present embodiment is the flat board overlapped by body 310a and framework 320b, wherein the edge of body 310a is provided with the first clinch 312, the edge of framework 320a is provided with the second clinch 326 coordinated with the first clinch 312, is easier to be overlapped to form flat board to make body 310a and framework 320b.In Figure 5, first clinch 312 such as comprises overlap joint block 313 and overlap joint groove 314, and the second clinch 326 such as comprises overlap joint block 327 and overlap joint groove 328, wherein overlap block 313 and be placed in overlap joint groove 328, and overlap block 327 and be placed in overlap joint groove 314, and overlap joint block 313 overlies one another with overlap joint block 327.
It should be noted that, the present embodiment does not limit the concrete structure of the first clinch and the second clinch, and in other embodiments, the first clinch and the second clinch also can be respectively locating slot and locating dowel.In addition, comprise in the embodiment of multi-disc sheet material in framework, each sheet material also can be provided with the clinch in order to overlap with another sheet material, laps one another to make adjacent two sheet materials can pass through clinch.
Fig. 6 is the diagrammatic cross-section of the film deposition machine station of another embodiment of the present invention.Please refer to Fig. 6, the film deposition machine station 200b of the present embodiment, except the first battery lead plate 210, second battery lead plate 220b and bearing part 300b, also comprises multiple holder 230.And the framework 320b of bearing part 300b is provided with multiple second perforations 222 that multiple first perforation 329, the second battery lead plate 220b is provided with corresponding first perforation 329, each holder 230 through the first corresponding perforation 329 and the second perforation 222, and clamps substrate 70.So, when carrying out thin film deposition processes, the surface 72 of the film to be formed of substrate 70 can be made to be not parallel to ground, such as, perpendicular to ground.In addition, the edge of the body 310b of bearing part 300b can be provided with lug boss 316, and the edge of substrate 70 is bearing on lug boss 316, and being provided with of this lug boss 316 helps holder 230 and clamp substrate 70.
It should be noted that, lug boss 316 is generally less than 2 millimeters from the distance of loading end 317 projection of body 310b, so after substrate 70 produces slight deformation, the substrate 70 of the overwhelming majority still can contact the loading end 317 of body 310b, therefore is unlikely to affect membrane quality.In addition, the film deposition machine station 200 of Fig. 3 also can use this holder 230, but its framework 320 and the second battery lead plate 220 need arrange corresponding perforation in addition.
In sum, the present invention at least has following advantages:
1., when bearing part of the present invention is in order to bearing substrate, substrate can cover whole body and part framework.When carrying out thin film deposition processes, can not deposit film on body, so when carrying out the cleaning of bearing part, only need clean framework, so can promote the cleaning efficiency of bearing part, to reduce the maintenance cost of film deposition machine station of the present invention.
2. only have framework easily because causing thickness to change serious after repeatedly clean to can't bear to use, so the framework that only need more renew, so can save the maintenance cost of film deposition machine station further.
3. the district that effectively utilizes of substrate can the body of flat contact bearing part, so can thermally equivalent, therefore can promote the quality of thin film deposition.
Although the present invention discloses as above with preferred embodiment; so itself and be not used to limit the present invention; any those of ordinary skill in the art; without departing from the spirit and scope of the present invention; when doing a little change and retouching, the scope that therefore protection scope of the present invention ought define depending on appended claim is as the criterion.
Claims (12)
1. a film deposition machine station, be suitable for bombardment one target to deposit a film on a substrate, this film deposition machine station comprises:
One first battery lead plate, this target is arranged at this first battery lead plate;
One second battery lead plate is relative with this first battery lead plate; And
One bearing part, is configured at this second battery lead plate, and this bearing part is suitable for carrying this substrate, and comprise can be separated from one another a body and a framework, wherein this framework is suitable for around this body, this framework be combined with this body after forms one flat board;
Wherein this bearing part comprises a base plate carrying district to carry this substrate, and this body is contained and overlapping with this framework local in this base plate carrying district, and this substrate covering this base plate carrying district whole and the periphery of this substrate exceed the side of this body.
2. film deposition machine station as claimed in claim 1, wherein this body is rectangular, and this framework is suitable for each side connecting this body.
3. film deposition machine station as claimed in claim 1, wherein this framework comprises multi-disc sheet material.
4. film deposition machine station as claimed in claim 1, wherein this body is identical with the material of this framework.
5. film deposition machine station as claimed in claim 1, wherein this body is different from the material of this framework.
6. film deposition machine station as claimed in claim 1, wherein the edge of this body is provided with one first clinch, the edge of this framework is provided with one second clinch coordinated with this first clinch, and this bearing part is the flat board overlapped by this body and this framework.
7. film deposition machine station as claimed in claim 1, wherein this body and this framework are respectively equipped with multiple locking hole, for securing to this second battery lead plate.
8. film deposition machine station as claimed in claim 1, also comprise multiple holder, wherein this framework is provided with multiple first perforation, this second battery lead plate is provided with multiple second perforations of corresponding described multiple first perforation, each holder through this corresponding first perforation and this second perforation, and clamps this substrate.
9. a bearing part, is applicable to a film deposition machine station, and to carry a substrate, this bearing part comprises a body and a framework that can be separated from one another, and wherein this framework is suitable for around this body, forms a flat board after this framework is combined with this body;
Wherein this bearing part comprises a base plate carrying district to carry this substrate, and this body is contained and overlapping with this framework local in this base plate carrying district, and this substrate covering this base plate carrying district whole and the periphery of this substrate exceed the side of this body.
10. bearing part as claimed in claim 9, wherein this body is rectangular, and this framework is suitable for each side connecting this body.
11. bearing parts as claimed in claim 9, wherein this framework comprises multi-disc sheet material.
12. bearing parts as claimed in claim 9, wherein the edge of this body is provided with one first clinch, and the edge of this framework is provided with one second clinch coordinated with this first clinch, and this bearing part is the flat board overlapped by this body and this framework.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100137760 | 2011-10-18 | ||
| TW100137760A TWI477630B (en) | 2011-10-18 | 2011-10-18 | Thin film deposition apparatus and bearing element thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102400108A CN102400108A (en) | 2012-04-04 |
| CN102400108B true CN102400108B (en) | 2015-04-22 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201110379032.3A Active CN102400108B (en) | 2011-10-18 | 2011-11-18 | Thin film deposition machine and bearing part thereof |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102400108B (en) |
| TW (1) | TWI477630B (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI473899B (en) * | 2012-04-06 | 2015-02-21 | Au Optronics Corp | Sputtering device |
| CN107193142A (en) * | 2017-07-19 | 2017-09-22 | 武汉华星光电技术有限公司 | Alignment film cure system |
| CN107365968B (en) * | 2017-08-24 | 2019-09-17 | 武汉华星光电半导体显示技术有限公司 | A kind of sputtering unit and sputter system |
| CN110106481B (en) * | 2019-06-06 | 2021-01-26 | 京东方科技集团股份有限公司 | Coating device and physical vapor deposition equipment |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1661129A (en) * | 2004-02-24 | 2005-08-31 | 台达电子工业股份有限公司 | Filming device and clamps |
| CN101358333A (en) * | 2007-08-02 | 2009-02-04 | 鸿富锦精密工业（深圳）有限公司 | Clamping device of sputtering substrate |
| CN201567369U (en) * | 2009-11-09 | 2010-09-01 | 北儒精密股份有限公司 | Baseplate carrier |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI375295B (en) * | 2005-07-15 | 2012-10-21 | Applied Materials Inc | Reducing electrostatic charge by roughening the susceptor |
| US7981262B2 (en) * | 2007-01-29 | 2011-07-19 | Applied Materials, Inc. | Process kit for substrate processing chamber |
| CN201990721U (en) * | 2011-03-04 | 2011-09-28 | 友威科技股份有限公司 | Uniform temperature glass bearing tool device of vertical vacuum coating machine |
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2011
- 2011-10-18 TW TW100137760A patent/TWI477630B/en active
- 2011-11-18 CN CN201110379032.3A patent/CN102400108B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1661129A (en) * | 2004-02-24 | 2005-08-31 | 台达电子工业股份有限公司 | Filming device and clamps |
| CN101358333A (en) * | 2007-08-02 | 2009-02-04 | 鸿富锦精密工业（深圳）有限公司 | Clamping device of sputtering substrate |
| CN201567369U (en) * | 2009-11-09 | 2010-09-01 | 北儒精密股份有限公司 | Baseplate carrier |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI477630B (en) | 2015-03-21 |
| CN102400108A (en) | 2012-04-04 |
| TW201317375A (en) | 2013-05-01 |
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