CN102380829A - Sand spraying device and pattern forming method - Google Patents
Sand spraying device and pattern forming method Download PDFInfo
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- CN102380829A CN102380829A CN2010102680196A CN201010268019A CN102380829A CN 102380829 A CN102380829 A CN 102380829A CN 2010102680196 A CN2010102680196 A CN 2010102680196A CN 201010268019 A CN201010268019 A CN 201010268019A CN 102380829 A CN102380829 A CN 102380829A
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- nozzle
- blasting unit
- sand blasting
- filtration channel
- main body
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Abstract
The invention provides a sand spraying device which comprises a main body, a nozzle and a filtering channel, wherein the main body is provided with an inner space, the nozzle is connected with the main body and an outlet of the nozzle is aligned with the inner space of the main body, and the filtering channel is contained in the inner space of the main body and has a certain distance with the nozzle. The filtering channel is provided with an inner through hole which is used for being aligned with a workpiece presetting region for spraying the sand. The invention further provides a pattern forming method, which comprises the steps of: offering a base plate which is provided with a film layer for forming a pattern; covering a dry film light resistance layer on the film layer; offering a photomask provided with the pattern to be formed, and exposing the dry film light resistance layer by the photomask; removing light resistance which can be dissolved in a developing way by means of developing to remain the light resistance which can not be dissolved in a developing way so as to form into a light resistance protecting layer; removing the film layer which is not covered by the light resistance protecting layer by sand spraying and etching of the sand spraying device; and removing the light resistance protecting layer, and forming the pattern of the film layer on the base plate.
Description
Technical field
The present invention relates to sand blasting unit, and relate to and utilize sand blasting unit to form method of patterning.
Background technology
The sandblast of sand blasting unit utilizes the method for physical impacts cutting workpiece often to be used to level decontamination, makes surface of the work have certain cleannes and roughness.A kind of sand blasting unit of prior art has a nozzle, and sand grains promptly spreads to surface of the work through this nozzle.This sand grains has the physical etch effect of anisotropic to workpiece.
Along with present workpiece is more and more accurate, its zone to be processed is more and more littler.Yet because sand grains sprays through nozzle, it can spread to a wideer zone, and promptly inlet zone maybe be bigger 2～3 times than jet size.Therefore, be difficult to use sandblast in the Precision Machining field.
Summary of the invention
In view of this, being necessary to provide a kind of can be applicable to the sand blasting unit in Precision Machining field and utilizes this sand blasting unit to form method of patterning.
A kind of sand blasting unit, it comprises that one has the main body of an inner space, a nozzle that is connected and exports this inner space of aligning with this main body, and a filtration channel that is contained in this body interior space and keeps at a certain distance away with this nozzle.This filtration channel has an interior bone and is used to accept the sand grains that sprays from this nozzle and be used to aim at the workpiece presumptive area of treating sandblast.
A kind of formation method of patterning, it comprises the steps: to provide a substrate, and it has the rete of a pattern to be formed; Cover a dry film photoresist layer in this rete; Provide one to have the light shield of pattern to be formed and utilize this light shield to this dry film photoresist layer exposure; The photoresistance of develop removing the photoresistance of the dissolving of can developing and staying the dissolving of can not developing becomes the photoresistance protective layer; Utilize above-mentioned sand blasting unit sandblast etching to remove this rete that not hidden by this photoresistance protective layer; Remove this photoresistance protective layer, on this substrate, form the rete pattern.
With respect to prior art, sand blasting unit provided by the invention is provided with the filtration channel relative with nozzle, the sandblast etching workpiece presumptive area to be processed that falls from filtration channel and make surface of the work form pattern.
Description of drawings
Fig. 1 is the schematic perspective view of the sand blasting unit that provides of first embodiment of the invention.
Fig. 2 is the cut-away view of the sand blasting unit of Fig. 1 along the II-II line, and wherein sand grains makes an addition to show that sand grains flows to.
Fig. 3 is the cut-away view of the sand blasting unit that provides of second embodiment of the invention.
Fig. 4 to Fig. 9 utilizes sand blasting unit to form the sketch map of the step of method of patterning.
The main element symbol description
Sand blasting unit 100,200
Main body 110,210
Pillar 112,212
Baffle plate 140
Nozzle 120,220
Outlet 122,222
Filtration channel 130,230
Accepting groove 238
Circular arc connecting portion 138
Dry film photoresist layer 50
Photoresistance protective layer 60
The specific embodiment
To combine accompanying drawing and a plurality of embodiment below, the sand blasting unit that the present technique scheme is provided with utilize this sand blasting unit to form method of patterning to do further to specify.
See also Fig. 1 and Fig. 2 in the lump, the sand blasting unit 100 that first embodiment of the invention provides comprises 110, one nozzles 120 that are connected with this main body 110 of a main body, and a filtration channel 130.
This main body 110 comprises four pillars 112 and four baffle plates 140.These pillars 112 surround an inner space 142 with these baffle plates 140.These baffle plates 140 are one-body molded with this pillar 112.Highly higher when these baffle plates 140, in the time of can supporting this main body 110, these pillars 112 can omit.This main body 110 is carried sand grains 20, and this sand grains 20 is sprayed from this nozzle 120 with certain speed.The kind of this sand grains 20 and particle diameter are decided with treating etched depth according to the workpiece material of treating sandblast, are advisable not destroy the workpiece ground.For example working as the workpiece ground is a metal; The low sand grains of this metal of hardness ratio can be selected for use,, the low sand grains of hardness ratio bead can be selected for use when the workpiece ground is a glass; When the workpiece ground is PET (Polyethylene terephthalate; PET) substrate, because PET has high molecular toughness, the material of sand grains is more unrestricted.
The size of this nozzle 120 is decided with the injection rate that needs according to area to be sprayed.This inner space 142 is aimed in the outlet 122 of this nozzle 120.
This filtration channel 130 is contained in this inner space 142, and keeps at a certain distance away with this nozzle 120.This filtration channel 130 and these nozzle 120 coaxial settings.This filtration channel 130 has the tubulated ends 134 and the relative tabular end 136 near the workpiece area of treating sandblast near nozzle 120.The interior bone 132 that has this filtration channel 130 runs through this tubulated ends 134 and this tabular end 136, is used to aim at the workpiece area of treating sandblast.The size of this interior bone 132 is decided according to treating the workpiece presumptive area size of sandblast.For example, this workpiece presumptive area size of treating sandblast is less, and then the size of this interior bone 132 is also less so that certainly the sand grains 20 of this interior bone 132 ejections only aim at and etching this treat the workpiece presumptive area of sandblast.This tabular end 136 is used to stop the sand grains 20 of the interior bone 132 that does not fall into this filtration channel 130.This filtration channel 130 further one comprise the circular arc connecting portions 138 that connect tubulated ends 134 and tabular end 136, this circular arc connecting portion 138 has the effect of speed of the sand grains 20 of the interior bone 132 that do not fall into this filtration channel 130 of slowing down.
The inner space 142 of this main body 110 can further stop and accommodate the sand grains 20 of the interior bone 132 that does not fall into this filtration channel 130.These sand grains 20 can reclaim.
Please consult Fig. 2 once more, when sand grains 20 after 120 ejections of this nozzle, this filtration channel 130 of part sand grains 20 spirts arrives the workpiece presumptive area of treating sandblast via the interior bone 132 of this filtration channel 130, thus this workpiece presumptive area of etching.Remainder sand grains 20 is ejected on this circular arc connecting portion 138 and this tabular end 136, is finally stopped by baffle plate 140, can not drop down onto the workpiece that this treats sandblast.
See also Fig. 3, the sand blasting unit 200 that second embodiment of the invention provides comprises 210, one nozzles 220 that are connected with this main body 210 of a main body, and a filtration channel 230.This sand blasting unit 200 is with the difference of above-mentioned sand blasting unit 100: this main body 210 is not established the baffle plate near filtration channel 230; A plurality of pillars 212 of this main body 210 limit an inner space 242, and this inner space 242 is aimed in the outlet 222 of this nozzle 220, and this filtration channel 230 is housed in this inner space 242, and the periphery of this filtration channel 230 cooperates with these pillars 212; The plate dress end 236 of this filtration channel 230 offers an annular accepting groove 238 towards this inner space 242, and this annular accepting groove 238 can be accommodated the sand grains of the interior bone 232 that does not fall into this filtration channel 130, and it can not dropped down onto on the workpiece of treating sandblast.
See also Fig. 4 to Fig. 9, it is as shown in the figure to utilize above-mentioned sand blasting unit 100 to form a method of patterning.
At first, like Fig. 4, provide a substrate 30 as ground.This substrate 30 is according to needing to select metal, and glass or PET are as material.Then, be coated with the surface of a rete 40 in this substrate 30.In the present embodiment, this rete 40 is indium tin oxide (Indium Tin Oxide, ITO) a conductive single layer film.
Next,, cover a dry film photoresist layer 50 on this rete 40, and dry film photoresist layer 50 and the substrate with rete 40 30 are fitted with roller 52 like Fig. 5.This dry film photoresist layer 50 can be positive photoresistance or negative photoresistance, and in the present embodiment, it is positive photoresistance, and promptly these dry film photoresist layer 50 exposed areas can be dissolved in the developer and can be removed.This dry film photoresist layer 50 helps reclaiming the sand grains that is sprayed onto individually on it.
Secondly, like Fig. 6, a light shield 54 is provided and utilizes this dry film photoresist layer 50 of 54 pairs of parts of this light shield to make public.Light is represented with the arrow form in scheming.This light shield 54 has required pattern.There is the positive negativity that only depends on dry film photoresist layer 50 in this required pattern with through-hole form or entity form (non through hole form).In the present embodiment, because dry film photoresist layer 50 is positive photoresistance, this required pattern is present in this light shield 54 with entity form.Can not be dissolved in the developer by the part of the dry film photoresist layer 50 that this light shield 54 covers and be removed.
Next, like Fig. 7, after dissolving is removed through developer (figure does not show), only stay the part dry film photoresist layer 50 that covered by this light shield 54.This part dry film photoresist layer 50 has pattern, and becomes a photoresistance protective layer 60.
Again next,, utilize 100 pairs of above-mentioned sand blasting units not receive the part of the rete 40 that photoresistance protective layer 60 covers to carry out the sandblast etching, thereby remove the part that this does not receive the rete 40 that photoresistance protective layer 60 covers like Fig. 8.
At last,, remove this photoresistance protective layer 60, obtain rete pattern 70 like Fig. 9.This photoresistance protective layer 60 also can be removed through the exposure imaging method.
Utilize above-mentioned sand blasting unit 100 accurately to form pattern in the workpiece presumptive area.
The substrate 30 that has rete pattern 42 can be applied in the electric series products such as circuit board.
It is understandable that, for the person of ordinary skill of the art, can make other various corresponding changes and distortion by technical conceive according to the present invention, and all these change the protection domain that all should belong to claim of the present invention with distortion.
Claims (10)
1. sand blasting unit, it comprises:
One main body, it has an inner space;
A nozzle that is connected with this main body, this body interior space is aimed in the outlet of this nozzle; And
A filtration channel that is contained in this body interior space and keeps at a certain distance away with this nozzle, this filtration channel have an interior bone and are used to accept the sand grains that sprays from this nozzle and be used to aim at the workpiece presumptive area of treating sandblast.
2. sand blasting unit as claimed in claim 1, wherein: this main body comprises a plurality of pillars and a plurality of baffle plate, these a plurality of pillars and this a plurality of baffle plates surround this inner space.
3. sand blasting unit as claimed in claim 1, wherein: this filtration channel and the coaxial setting of this nozzle.
4. sand blasting unit as claimed in claim 1, wherein: this filtration channel comprises a tubulated ends and the tabular end near the workpiece presumptive area of treating sandblast near this nozzle, this interior bone runs through this tubulated ends and this tabular end.
5. sand blasting unit as claimed in claim 4, wherein: this filtration channel comprises that further one connects the circular arc connecting portion of this tubulated ends and this tabular end.
6. sand blasting unit as claimed in claim 4, wherein: this filtration channel comprises that further one is opened in the sand grains accepting groove of this tabular end towards the surface of this inner space.
7. sand blasting unit as claimed in claim 1, wherein: this main body comprises a plurality of pillars, these pillars limit this inner space, this filtration channel periphery and this stanchions.
8. one kind forms method of patterning, and it comprises:
One substrate is provided, and it has the rete of a pattern to be formed;
Cover a dry film photoresist layer in this rete;
Provide one to have the light shield of pattern to be formed and utilize this light shield to this dry film photoresist layer exposure;
The photoresistance of develop removing the photoresistance of the dissolving of can developing and staying the dissolving of can not developing becomes the photoresistance protective layer;
One sand blasting unit is provided; This sand blasting unit comprises that one has the main body of an inner space; A nozzle that is connected and exports this inner space of aligning with this main body; And a filtration channel that is contained in this body interior space and keeps at a certain distance away with this nozzle, this filtration channel has an interior bone and is used to accept the sand grains that sprays from this nozzle and be used to aim at the workpiece presumptive area of treating sandblast;
Utilize this sand blasting unit sandblast etching to remove this rete that not hidden by this photoresistance protective layer; And
Remove this photoresistance protective layer, on this substrate, form the rete pattern.
9. formation method of patterning as claimed in claim 8, wherein: this dry film photoresist layer is positive photoresistance, the non-corresponding area of the pattern of photoresistance that is made public and develop and remove.
10. formation method of patterning as claimed in claim 8, wherein: this filtration channel and the coaxial setting of this nozzle.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010268019.6A CN102380829B (en) | 2010-08-31 | 2010-08-31 | The method of sand blasting unit and formation pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010268019.6A CN102380829B (en) | 2010-08-31 | 2010-08-31 | The method of sand blasting unit and formation pattern |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102380829A true CN102380829A (en) | 2012-03-21 |
| CN102380829B CN102380829B (en) | 2015-11-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010268019.6A Expired - Fee Related CN102380829B (en) | 2010-08-31 | 2010-08-31 | The method of sand blasting unit and formation pattern |
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| CN (1) | CN102380829B (en) |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0383556A1 (en) * | 1989-02-14 | 1990-08-22 | Kiyoshi Horii | Cutting method and apparatus |
| CN2099685U (en) * | 1991-06-06 | 1992-03-25 | 崔文金 | Glass carving tool |
| CN1068062A (en) * | 1992-06-25 | 1993-01-20 | 中国科学院半导体研究所职工技术协会 | Method and equipment thereof at the hard material surface making photographic sand carving pattern |
| JPH0897537A (en) * | 1994-09-26 | 1996-04-12 | Toppan Printing Co Ltd | Method of producing thick film pattern |
| JPH08305017A (en) * | 1995-05-01 | 1996-11-22 | Matsushita Electron Corp | Photosensitive resin composition, photosensitive dry film for sand blasting and etching method using the same |
| CN1236219A (en) * | 1998-02-16 | 1999-11-24 | 株式会社村田制作所 | Method of forming groove in surface of mother substrate |
| EP0985491A2 (en) * | 1998-08-31 | 2000-03-15 | Ingersoll-Rand Company | Method and apparatus for machining a workpiece by piercing |
| US20030104321A1 (en) * | 2001-12-05 | 2003-06-05 | Plasmion Displays, Llc | Method of forming capillary discharge site of plasma display panel using sand blasting |
| TWI225472B (en) * | 1998-06-25 | 2004-12-21 | Heraeus Quarzglas | Process for working a quartz glass component |
| CN101254589A (en) * | 2007-02-28 | 2008-09-03 | 斯奈克玛公司 | Alignment control for a water-jet cutting system |
-
2010
- 2010-08-31 CN CN201010268019.6A patent/CN102380829B/en not_active Expired - Fee Related
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0383556A1 (en) * | 1989-02-14 | 1990-08-22 | Kiyoshi Horii | Cutting method and apparatus |
| CN2099685U (en) * | 1991-06-06 | 1992-03-25 | 崔文金 | Glass carving tool |
| CN1068062A (en) * | 1992-06-25 | 1993-01-20 | 中国科学院半导体研究所职工技术协会 | Method and equipment thereof at the hard material surface making photographic sand carving pattern |
| JPH0897537A (en) * | 1994-09-26 | 1996-04-12 | Toppan Printing Co Ltd | Method of producing thick film pattern |
| JPH08305017A (en) * | 1995-05-01 | 1996-11-22 | Matsushita Electron Corp | Photosensitive resin composition, photosensitive dry film for sand blasting and etching method using the same |
| CN1236219A (en) * | 1998-02-16 | 1999-11-24 | 株式会社村田制作所 | Method of forming groove in surface of mother substrate |
| TWI225472B (en) * | 1998-06-25 | 2004-12-21 | Heraeus Quarzglas | Process for working a quartz glass component |
| EP0985491A2 (en) * | 1998-08-31 | 2000-03-15 | Ingersoll-Rand Company | Method and apparatus for machining a workpiece by piercing |
| US20030104321A1 (en) * | 2001-12-05 | 2003-06-05 | Plasmion Displays, Llc | Method of forming capillary discharge site of plasma display panel using sand blasting |
| CN101254589A (en) * | 2007-02-28 | 2008-09-03 | 斯奈克玛公司 | Alignment control for a water-jet cutting system |
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| CN102380829B (en) | 2015-11-18 |
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