JPH0897537A - Method of producing thick film pattern - Google Patents

Abstract

PURPOSE: To remove abrasives easily by using dry ice as the abrasives at sand blasting of pattern forming material that is applied on a board with a predetermined thickness with a sand blasting mask of a predetermined pattern. CONSTITUTION: Thick film pattern forming material 2 is applied on all surface of a glass board 1 by a screen printing method. A sand blasting mask 3 is applied and patterned using a general method on the thick film pattern forming material 2. Dry ice 4 is blasted to the pattern forming material by a sand blasting device at jet pressure and unnecessary part is shaved away. Then the sand blasting mask 3 is removed by a chemical treatment. The board, on which the pattern is formed, is baked at 850 deg.C for 10 minutes and a thick film pattern 5 is obtained. The mixed dry ice during the initial process is evaporated and only the pattern forming material remains.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of manufacturing a thick film pattern such as a barrier or an electrode in a plasma display.

[0002]

2. Description of the Related Art Conventionally, as a method for forming a thick film pattern, a pattern forming material is made into a paste, which is printed in a pattern by screen printing, and then this is dried and fired to produce a thick film pattern. The method is known.

However, this method is limited in the film thickness obtained by one printing. Especially when a very thick film thickness is required like a barrier in a plasma display, it is not possible to obtain a predetermined film thickness by printing once, so it is necessary to perform repeated printing to obtain a predetermined film thickness. Therefore, its productivity was extremely poor.

Therefore, in recent years, as a method for efficiently manufacturing a thick film pattern, a sand blast method has attracted attention as shown in, for example, the Technical Report EID91-103 of the Institute of Electronics, Information and Communication Engineers.

The sandblast method is a method of physically etching the pattern forming material with the abrasive by spraying the abrasive onto the pattern forming material which has been applied on the substrate in advance with a predetermined film thickness. At this time, a target thick film pattern can be obtained by masking a portion to be left as a pattern.

[0006]

In the conventional sandblasting, a hard and chemically stable substance such as alumina is used as the abrasive to be sprayed on the pattern forming material.

On the other hand, the pattern forming material has lead glass as its main component in a barrier in a plasma display, for example.

By the way, in the pattern formation by the conventional printing method, the pattern forming material is formed only in a necessary portion.

On the other hand, in the sandblasting method, a desired pattern is obtained by scraping off unnecessary portions of the pattern forming material applied in advance.

Therefore, in the sandblasting method, the pattern forming material is wasted, and as described above, some pattern forming materials may contain heavy metals such as lead.

Therefore, ideally, it is desirable that the pattern forming material scraped off is recovered and reused.

However, it is unavoidable that the abrasive used for polishing the pattern-forming material scraped off is mixed. Further, since the mixed abrasive is chemically stable as described above, it is difficult to separate it.

The present invention was devised in order to solve the problems of the prior art, and is a method for producing a thick film pattern which allows the pattern forming material scraped off by the sandblast method to be easily recovered. Is intended to provide.

[0014]

In order to achieve the above object, in the present invention, in the production of a thick film pattern by a sandblast method, a pattern forming material is applied on a substrate in advance to a predetermined film thickness, and the pattern is used for sandblasting. It is characterized in that dry ice is used as an abrasive when performing sandblasting through a mask.

[0015]

According to the method of forming a thick film pattern, dry ice is used as an abrasive, but dry ice is easily vaporized. Therefore, among the mixture of the pattern forming material and the abrasive that has been scraped off, The abrasive can be easily removed. Therefore, the scraped-off pattern forming material can be easily reused.

[0016]

1 to 5 are sectional views showing a method of manufacturing a thick film pattern according to the present invention. The steps will be described below in order.

First, as shown in FIG. 1, the thick film pattern forming material 2 was applied to the entire surface of the glass substrate 1 by the screen printing method.

Next, as shown in FIG. 2, a sandblasting mask 3 (ORDYL B) is formed on the thick film pattern forming material 2.
F-200, manufactured by Tokyo Ohka Co., Ltd.) was applied and patterned according to a standard method.

The thick film pattern has a line width of 100 μm, a pitch of 200 μm, and a thickness of 200 μm. The thickness of the sandblasting mask 3 is 25 μm.
And

Subsequently, as shown in FIG. 3, dry ice 4 was sprayed onto the pattern forming material at a spraying pressure of 3 kg / cm ² by using a sandblasting device (SC-2: manufactured by Fuji Seisakusho), and unnecessary portions were scraped off. It was The dry ice is crushed in advance by using an ultra-low temperature crushing device (goblin: manufactured by Nara Machinery Co., Ltd.).

After removing the unnecessary portion, the sandblast mask 3 was peeled off by chemical treatment as shown in FIG.

The patterned substrate is heated at 580 ° C. for 10 hours.
After baking for a minute, a thick film pattern 5 having a line width of 100 μm, a pitch of 200 μm and a thickness of 170 μm was obtained as shown in FIG. Further, dry ice was mixed in the scraped-off pattern forming material at first, but the dry ice was vaporized when left to stand, so only the pattern forming material remained.

[0023]

The present invention has the following effects.

The sandblast method is 100 μm in one operation.
Since the thick film pattern exceeding m can be obtained, the pattern can be formed more efficiently than the conventional thick film pattern forming method by repeated printing of screen printing. Further, the number of steps is reduced, so that the yield is improved.

However, the pattern forming material scraped off is difficult to separate from the pattern forming material and the abrasive because the abrasive is a chemically stable material such as alumina in the conventional sandblast method. It was difficult to reuse the pattern forming material.

In the present invention, since dry ice which is easily vaporized is used as the abrasive, only the pattern forming material can be separated from the scraped mixture of the pattern forming material and the abrasive and recovered.

Since the recovered material can be reused, the waste of the material can be eliminated by repeatedly using the material, so that the cost can be reduced.

[0028]

[Brief description of drawings]

FIG. 1 is a cross-sectional view of a thick film pattern forming material applying step according to an embodiment of the present invention.

FIG. 2 is a sectional view of a sandblasting mask forming step in the embodiment of FIG.

FIG. 3 is a cross-sectional view of a sandblasting process using dry ice in the embodiment of FIG.

4 is a cross-sectional view of a sandblasting mask peeling process in the embodiment of FIG.

5 is a cross-sectional view of a thick film pattern forming material firing step in the embodiment of FIG.

[Explanation of symbols]

1 ... Glass substrate 2 ... Thick film pattern forming material 3
..Sandblast mask 4 ... dry ice 5 ...
..Thick film patterns

Claims (3)

[Claims] 1. A pattern forming material having a predetermined film thickness is formed on a substrate in advance, and sandblasting is performed through a sandblasting mask having a desired pattern.
A method for manufacturing a thick film pattern, which comprises obtaining a desired thick film pattern. 2. A pattern forming material having a predetermined film thickness is applied onto a substrate in advance, and sandblasting is performed through a sandblasting mask having a desired pattern.
A method for manufacturing a thick film pattern, which comprises obtaining a desired thick film pattern. 3. The method for forming and forming a thick film pattern according to claim 1, wherein dry ice is used as a polishing agent for the sandblast treatment.