CN102374942A - 透射电镜样品制备方法及透射电镜样品 - Google Patents
透射电镜样品制备方法及透射电镜样品 Download PDFInfo
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Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103196728A (zh) * | 2013-04-09 | 2013-07-10 | 上海华力微电子有限公司 | 使用fib技术制备sem或tem样品保护层的方法 |
CN103792114A (zh) * | 2012-11-02 | 2014-05-14 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN103808540A (zh) * | 2012-11-08 | 2014-05-21 | 中芯国际集成电路制造(上海)有限公司 | 透射电子显微镜样品的制作方法 |
CN105334086A (zh) * | 2014-08-13 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法及tem样品 |
CN105510092A (zh) * | 2014-09-22 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN105806679A (zh) * | 2016-05-17 | 2016-07-27 | 上海华力微电子有限公司 | 一种tem样品的制备方法 |
CN106018022A (zh) * | 2016-05-17 | 2016-10-12 | 上海华力微电子有限公司 | 一种平面tem样品的制备方法 |
CN106289890A (zh) * | 2015-05-15 | 2017-01-04 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN106289909A (zh) * | 2016-08-19 | 2017-01-04 | 上海华力微电子有限公司 | 制备透射电子显微镜样品的方法 |
CN107643309A (zh) * | 2017-08-31 | 2018-01-30 | 武汉钢铁有限公司 | 电工钢表面涂层的分析方法 |
CN111397989A (zh) * | 2020-05-08 | 2020-07-10 | 上海华力集成电路制造有限公司 | 一种半导体器件的检验样品的制备方法 |
CN112146953A (zh) * | 2020-09-21 | 2020-12-29 | 长江存储科技有限责任公司 | 测试样品及其制备方法 |
GB2603293A (en) * | 2021-01-08 | 2022-08-03 | Materials Analysis Tech Inc | Physical analysis method, sample for physical analysis and preparing method thereof |
WO2023279442A1 (zh) * | 2021-07-05 | 2023-01-12 | 长鑫存储技术有限公司 | 一种半导体测试样品及其制备方法 |
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CN1083591A (zh) * | 1992-09-03 | 1994-03-09 | 中国科学院金属研究所 | 透射电镜用金属粉体薄膜的制备方法 |
US6303399B1 (en) * | 2000-09-12 | 2001-10-16 | Advanced Micro Devices Inc. | Method of sample preparation for electron microscopy |
JP2007292507A (ja) * | 2006-04-21 | 2007-11-08 | Matsushita Electric Ind Co Ltd | 透過型電子顕微鏡の試料作製方法および集束イオンビーム装置 |
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Patent Citations (3)
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CN1083591A (zh) * | 1992-09-03 | 1994-03-09 | 中国科学院金属研究所 | 透射电镜用金属粉体薄膜的制备方法 |
US6303399B1 (en) * | 2000-09-12 | 2001-10-16 | Advanced Micro Devices Inc. | Method of sample preparation for electron microscopy |
JP2007292507A (ja) * | 2006-04-21 | 2007-11-08 | Matsushita Electric Ind Co Ltd | 透過型電子顕微鏡の試料作製方法および集束イオンビーム装置 |
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103792114A (zh) * | 2012-11-02 | 2014-05-14 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN103792114B (zh) * | 2012-11-02 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN103808540B (zh) * | 2012-11-08 | 2017-02-15 | 中芯国际集成电路制造(上海)有限公司 | 透射电子显微镜样品的制作方法 |
CN103808540A (zh) * | 2012-11-08 | 2014-05-21 | 中芯国际集成电路制造(上海)有限公司 | 透射电子显微镜样品的制作方法 |
CN103196728B (zh) * | 2013-04-09 | 2015-12-02 | 上海华力微电子有限公司 | 使用fib技术制备sem或tem样品保护层的方法 |
CN103196728A (zh) * | 2013-04-09 | 2013-07-10 | 上海华力微电子有限公司 | 使用fib技术制备sem或tem样品保护层的方法 |
CN105334086A (zh) * | 2014-08-13 | 2016-02-17 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法及tem样品 |
CN105510092A (zh) * | 2014-09-22 | 2016-04-20 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN106289890B (zh) * | 2015-05-15 | 2019-04-02 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN106289890A (zh) * | 2015-05-15 | 2017-01-04 | 中芯国际集成电路制造(上海)有限公司 | Tem样品的制备方法 |
CN105806679A (zh) * | 2016-05-17 | 2016-07-27 | 上海华力微电子有限公司 | 一种tem样品的制备方法 |
CN106018022A (zh) * | 2016-05-17 | 2016-10-12 | 上海华力微电子有限公司 | 一种平面tem样品的制备方法 |
CN106018022B (zh) * | 2016-05-17 | 2018-09-18 | 上海华力微电子有限公司 | 一种平面tem样品的制备方法 |
CN106289909A (zh) * | 2016-08-19 | 2017-01-04 | 上海华力微电子有限公司 | 制备透射电子显微镜样品的方法 |
CN106289909B (zh) * | 2016-08-19 | 2019-01-22 | 上海华力微电子有限公司 | 制备透射电子显微镜样品的方法 |
CN107643309A (zh) * | 2017-08-31 | 2018-01-30 | 武汉钢铁有限公司 | 电工钢表面涂层的分析方法 |
CN111397989A (zh) * | 2020-05-08 | 2020-07-10 | 上海华力集成电路制造有限公司 | 一种半导体器件的检验样品的制备方法 |
CN112146953A (zh) * | 2020-09-21 | 2020-12-29 | 长江存储科技有限责任公司 | 测试样品及其制备方法 |
CN112146953B (zh) * | 2020-09-21 | 2024-03-01 | 长江存储科技有限责任公司 | 测试样品及其制备方法 |
GB2603293A (en) * | 2021-01-08 | 2022-08-03 | Materials Analysis Tech Inc | Physical analysis method, sample for physical analysis and preparing method thereof |
GB2603293B (en) * | 2021-01-08 | 2023-09-27 | Materials Analysis Tech Inc | Physical analysis method, sample for physical analysis and preparing method thereof |
US11955312B2 (en) | 2021-01-08 | 2024-04-09 | Materials Analysis Technology Inc. | Physical analysis method, sample for physical analysis and preparing method thereof |
WO2023279442A1 (zh) * | 2021-07-05 | 2023-01-12 | 长鑫存储技术有限公司 | 一种半导体测试样品及其制备方法 |
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