CN102356183A - 涂覆滑动元件的方法以及滑动元件具体为活塞环 - Google Patents

涂覆滑动元件的方法以及滑动元件具体为活塞环 Download PDF

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CN102356183A
CN102356183A CN2009801581540A CN200980158154A CN102356183A CN 102356183 A CN102356183 A CN 102356183A CN 2009801581540 A CN2009801581540 A CN 2009801581540A CN 200980158154 A CN200980158154 A CN 200980158154A CN 102356183 A CN102356183 A CN 102356183A
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马库斯·肯尼迪
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    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C23C16/303—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J9/00—Piston-rings, e.g. non-metallic piston-rings, seats therefor; Ring sealings of similar construction
    • F16J9/26—Piston-rings, e.g. non-metallic piston-rings, seats therefor; Ring sealings of similar construction characterised by the use of particular materials
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    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
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Abstract

本发明涉及一种方法，其中，首先制造纳米颗粒，然后在涂覆过程中通过PVD和/或CVD方法将其注入涂层中。本发明还涉及一种滑动元件，其包括通过PVD和/或CVD方法而形成的涂层，所述涂层包含单独制造的纳米颗粒。

Description

涂覆滑动元件的方法以及滑动元件具体为活塞环
技术领域
本发明涉及一种涂覆滑动元件的方法以及一种滑动元件具体为活塞环。对滑动元件(如活塞环)的要求是，其只会产生较小的摩擦损失。例如，当活塞环在内燃机中用作滑动元件时，摩擦的增加会对燃料消耗产生直接的影响。而且，油料消耗还受到活塞环条件的影响。特别是，基于此，还有待观察必然特别高从而恒定地实现所需摩擦值的所谓的焦痕强度(burn mark strength)和爆燃强度(outbreak strength)。
背景技术
正如先前使用的产品，已知通过PVD方法在硬质材料基底(具体为氮化铬)上对活塞环进行涂覆。而且，与Al2O3或金刚石颗粒(颗粒的尺寸在微米范围内)结合有关的铬层的电化学沉积也是已知的。
WO 2007/079834 A1披露了DLC(类金刚石碳)涂层体系，其可以包括纳米晶形式的碳化钨沉积物，该碳化钨沉积物是在分离过程中制造的，并且尺寸最高达10nm。
最终，DE 199 58 473 A1涉及一种用等离子束源制造复合层的方法，其中可以嵌入纳米晶颗粒，并且可以与已知的、独立可控的CVD或者PVD方法相结合。
发明内容
形成本发明基础的目的是可以提供一种涂覆滑动元件的方法，以及相应的滑动元件，所述滑动元件可以在所需的使用期限内实现所需的摩擦和磨损性能。
该目的可以通过权利要求1所描述的方法来实现。
具体实施方式
因此，本发明提供了一种形成涂层的方法，该涂层包括在滑动元件具体为活塞环的至少一个外表面上形成的至少一层，其中，首先制造纳米颗粒，然后在涂覆过程中将其注入到涂层中。换言之，纳米颗粒不是原位制造的，即不是在涂覆期间制造的，而是一定程度的非原位单独制造的，并且在涂覆过程中加入到涂层中。该原理可以这样使用并且改进机械性能，如疲劳强度、焦痕强度、爆燃强度、断裂强度和断裂伸度，其如公知常识中所述起到如下作用。还值得注意的是，本发明并不限于此。所述颗粒的加入会引起局部晶格变形，从而导致了上述改进的机械性能。而且，实现了由于极高的晶粒极限密度、弹性增加和摩擦减少引起的磨损性能的改进。
所述注入纳米颗粒的优势也可以在要进行的分散或者沉积硬化中得以实现。也就是说，受压产生的或已经存在的位移不能通过颗粒或沉积物而完成或“贯穿”(“cut”through)，但是在颗粒之间有一定程度的凸出。这样，形成了必须通过位移来绕过的位移环。随着这种绕过，需要比当后者通过颗粒或沉积物“贯穿”时更高的能量。负载能力也因此而提高。而且，本发明有利地进一步利用了如下效果：随颗粒间隔降低以及颗粒尺寸减少，用于位移迁移的屈服应力会提高。材料强度因此提高了。该效果可以通过纳米颗粒而更好的得到。而且，在本发明范围内显示出，在其表面高缺陷密度的基础上，涂覆过程中后者可以被实际上独立地注入并结合在要被加强的材料中。这样，有利于形成所需的无粘性、部分粘性或粘性且具有上述机械性能效果的沉积物。非原位制造纳米颗粒进一步有利地确保能够控制纳米颗粒的化学和结晶结构。另外，通过这样的控制，当制造纳米颗粒时，可以确保在涂覆过程中以所需的方式将后者注入到层中因而生长。
这样的涂覆可以通过经过试验和测试的PVD(物理气相沉积)和/或CVD(化学气相沉积)涂覆方法而有利地进行。
根据本发明方法的进一步有益效果在更多权利要求中都有描述。
对于涂层的基底材料或基质，已证明包括氮化物特别是金属(氧)氮化物(具体为Cr(O)N、AlN或TiN)的材料是非常有利的。
初始试验表明纳米颗粒的体积分数为20％以下时会得到良好的性能。
而且，具有1到100nm，优选5到75nm，特别优选5到50nm粒度(直径)的纳米颗粒可以得到良好的性能。
纳米颗粒化合物选自氧化物、碳化物和/或硅化物的组中，优选为MexOy、MexCy或MexSiy。此处金属可以为铬、钛、钽、硅、铟、锡、铝、钨、钒或钼，和/或x可以为1到3，和/或y可以为1到3。
关于层厚度，涂层厚度的最大值为100μm，并且优选在5到50μm范围内时可以得到特别好的性能。
虽然根据已被验证的性能，根据本发明的涂层可以用于多种不同的途径，但是所述基底材料(即根据本发明要被涂覆的滑动元件的材料)通常优选为铸铁或者钢。
而且，可以通过权利要求9所述的滑动元件(具体为活塞环)来实现上述目的。根据本发明的滑动元件的优选实施方式对应于根据本发明的制造所述滑动元件的方法的优选实施方式。以同样的方式应用所述滑动元件，会产生有益效果，特别是永久滑动元件恒定地具有所需的摩擦值和磨损性能。
在活塞环的优选情况下，可以涂覆作为滑动表面的一个或多个表面，即上和/或下面、和/或接触面即活塞环的圆柱体外表面。与至少一个所述表面相比，接触面可以涂覆更厚的涂层，所述涂层是根据本发明的加入有单独制造的纳米颗粒的涂层。接触面和至少一个表面之间的过渡区域(cross-over)可以在涂层上导圆，在活塞环基底材料上的过渡区域也可以相同的方式导圆。两个表面的涂层厚度可以相同。在一些特殊的应用中也可以只涂覆一个接触面。

Claims (16)

1.一种形成涂层的方法，该涂层包括在滑动元件具体为活塞环的至少一个外表面上形成的至少一层，其中，首先制造纳米颗粒，然后在涂覆过程中将所述纳米颗粒注入到涂层中，所述涂覆过程通过PVD和/或CVD方法来进行。
2.根据权利要求1所述的方法，其特征在于，形成的所述涂层包含金属氮化物，具体为CrN、AlN或TiN。
3.根据权利要求1或2所述的方法，其特征在于，形成的所述涂层包含金属氧氮化物，具体为CrON。
4.根据权利要求1到3中任一项所述的方法，其特征在于，所述纳米颗粒占所述涂层最高达20体积％。
5.根据权利要求1到4中任一项所述的方法，其特征在于，形成所述涂层，以使所述纳米颗粒的尺寸为1到100nm，优选为5到75nm，且特别优选为5到50nm。
6.根据权利要求1到5中任一项所述的方法，其特征在于，形成所述涂层，以使所述纳米颗粒选自氧化物、碳化物和/或硅化物的组中，并且所述化合物的一种或多种包括MexOy、MexCy和MexSiy，其中Me为Cr、Ti、Ta、Si、In、Sn、Al、W、V、Mo，和/或x＝1～3，和/或y＝1～3。
7.根据权利要求1到6中任一项所述的方法，其特征在于，形成的所述涂层总厚度最高达约100μm，优选为5到50μm。
8.根据权利要求1到7中任一项所述的方法，其特征在于，在作为滑动元件的基底材料的铸铁或钢上形成所述涂层。
9.一种滑动元件具体为活塞环，其具有包括通过PVD和/或CVD方法在至少一个外表面上形成的至少一层的涂层，所述涂层含有单独制造的纳米颗粒。
10.根据权利要求9所述的滑动元件，其特征在于，所述涂层包含金属氮化物，具体为CrN、AlN或TiN。
11.根据权利要求9或10所述的滑动元件，其特征在于，所述涂层包含金属氧氮化物，具体为CrON。
12.根据权利要求9到11中任一项所述的滑动元件，其特征在于，所述纳米颗粒占所述涂层最高达20体积％。
13.根据权利要求9到12中任一项所述的滑动元件，其特征在于，所述纳米颗粒的尺寸为1到100nm，优选为5到75nm，特别优选为5到50nm。
14.根据权利要求9到13中任一项所述的滑动元件，其特征在于，所述纳米颗粒选自氧化物、碳化物和/或硅化物的组中，并且所述化合物的一种或多种包括MexOy、MexCy和MexSiy，其中Me为Cr、Ti、Ta、Si、In、Sn、Al、W、V、Mo，和/或x＝1～3，和/或y＝1～3。
15.根据权利要求9到14中任一项所述的滑动元件，其特征在于，所述涂层的总厚度最高达约100μm，优选为5到50μm。
16.根据权利要求9到15中任一项所述的滑动元件，其特征在于，所述滑动元件的基底材料包括铸铁或钢。
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CN104854258A (zh) * 2012-10-11 2015-08-19 费德罗-莫格尔公司 在一个涂覆操作中在活塞环的工作面、侧面以及内径上进行耐磨涂层的化学气相沉积

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EP2408949B1 (de) 2013-01-16
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