CN108603278A - 具有保护层的有涂层的活塞环 - Google Patents

具有保护层的有涂层的活塞环 Download PDF

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CN108603278A
CN108603278A CN201780009983.7A CN201780009983A CN108603278A CN 108603278 A CN108603278 A CN 108603278A CN 201780009983 A CN201780009983 A CN 201780009983A CN 108603278 A CN108603278 A CN 108603278A
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piston ring
protective layer
functional coating
layer
dlc
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CN108603278B (zh
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彼得-克劳斯·埃塞尔
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Federal Mogul Burscheid GmbH
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Abstract

本发明涉及一种活塞环，该活塞环具有作为功能层/磨损保护层的DLC(类金刚石)层，其中用保护层覆盖所述DLC层，所述保护层的材料不同于DLC层的材料并且所述保护层的材料具有比DLC层的材料更高的耐热性。此外，本发明涉及一种用于制造具有DLC磨损保护层的活塞环的方法，在所述DLC磨损保护层的表面内以由表面粗糙度产生的凹陷部内的沉积物形式提供保护层。

Description

具有保护层的有涂层的活塞环
技术领域
本发明涉及一种活塞环(特别是垫圈)的涂层，或者涉及所述活塞环的涂层在内燃机的活塞上的用途。
背景技术
在内燃机中，诸如活塞环的滑动元件必须用尽可能少的摩擦和尽可能少的磨损两者而运行尽可能长的使用寿命。为了减少摩擦(该摩擦与内燃机的燃料消耗直接相关)并延长使用寿命，通常已知的是为这种滑动元件提供防止磨损的摩擦减小涂层。为此，例如使用本领域的技术人员通常已知的DLC(类金刚石)涂层或渗氮层。使用多种工艺来施加DLC层。由于其高涂布率和相对低的成本，PA-CVD(等离子辅助化学气相沉积)工艺被经常使用。也已知的是PVD(物理气相沉积)工艺的使用。
在这个背景下，因为垫圈暴露在最大气体压力和最高热负荷之下，因此对关于距离燃烧室最近的活塞环、垫圈的磨损和匹配精确方面的要求特别高，以便满足低漏气和最低油耗的要求。因此，存在提高提供有功能涂层/磨损保护涂层的活塞环的特性的需要。
为了延长环的使用寿命，最优磨合行为也是必需的。为了防止涂层过早地被损坏，活塞环的环轮廓也必须被优化并且必须能够通过具有不同强度的基础材料和涂层之间的内部应力的附加的相互作用来评估该环轮廓。
发明内容
根据本发明，利用这种活塞环来解决问题：该活塞环包括活塞环主体，作为所述活塞环主体的外表面(至少其支承表面)上的功能涂层的DLC涂层被施加到所述活塞环主体上，其中保护层被施加到在活塞环支承表面的至少一个局部表面处的功能涂层上，并且其中所述保护层由这样的材料组成，该材料不同于所述功能涂层的材料并且与所述功能涂层相比抵抗更高的温度。
根据一方面，保护层可以通过PVD工艺来施加。
根据本发明的另一方面，保护层的厚度小于5μm、优选地小于2μm、最优选地小于1μm。
根据另一方面，保护层可以由金属或金属氮化物组成。
根据一方面，保护层被施加到整个活塞环支承表面。
根据本发明的另一方面，保护层可以不被施加到活塞环支承表面的围绕枢轴点的区域，并且保护层可以被施加到活塞环支承表面的其余部分，有可能的话，包括上述区域外的运行边缘。
根据一方面，功能涂层/磨损保护层可以形成为不含氢或卤素的DLC层。
根据一方面，保护层可以以表面沉积物的形式存在于功能涂层的凹陷部内。
根据一方面，当功能涂层具有小于10μm的层厚度时，保护层的表面沉积物构成总表面面积的10％至30％之间的面积百分比，当功能涂层具有大于10μm的层厚度时，表面沉积物构成总表面面积的20％至40％之间的面积百分比。
根据一方面，活塞环支承表面上的Rpk粗糙度值可以在0.03μm至0.1μm的范围内，并且Rk粗糙度值可以在0.15μm至0.3μm的范围内。
根据本发明，还利用用于制造活塞环的方法来解决问题，该方法包括提供活塞环主体；将作为功能涂层的DLC层至少施加到所述活塞环主体的支承表面；将保护层施加到所述功能涂层；以及部分地去除所述保护层，使得仅在所述功能涂层的表面中的凹陷部内留有沉积物。
根据该方法的一方面，在施加功能涂层之前，可以使活塞环主体、特别是那些提供有功能涂层的外表面粗糙化。
根据该方法的一方面，可以通过电弧工艺或溅射工艺来施加功能涂层。
根据该方法的一方面，功能涂层在其被施加后可以具有在0.15μm至0.5μm范围内的Rpk粗糙度值以及在0.3μm至0.7μm范围内的Rk粗糙度值。
根据该方法的一方面，可以在PVD工艺中施加保护层。
根据该方法的一方面，保护层的材料可以包括金属、金属合金或金属氮化物，优选地铬、铝、氮化钛或氮化钒。
根据该方法的一方面，当功能涂层的层厚度大于20μm时，保护层的材料的施加厚度可以在0.05μm至1μm之间、优选地在0.2μm至0.4μm之间；以及当功能涂层的层厚度小于20μm时，保护层的材料的施加厚度优选地在0.05μm至0.4μm之间、更优选地在0.1μm至0.2μm之间。
根据该方法的一方面，去除步骤可以包括研磨、特别是外圆研磨。
根据该方法的另一方面，当功能涂层具有小于10μm的层厚度时，可以继续进行去除步骤直到表面沉积物的面积百分比为总表面面积的10％至30％之间；以及当功能涂层具有大于10μm的层厚度时，可以继续进行去除步骤直到表面沉积物的面积百分比为总表面面积的20％至40％之间。
具体实施方式
在下文中，将参考多种实施方式和不同的特征来描述本发明。
本发明涉及用于活塞环的保护层，该活塞环被提供有功能层/磨损保护层，其中功能涂层由类金刚石DLC组成。DLC涂层包括四面体非晶碳层(也被称为“ta-C”)，其具有sp3杂化键，sp3杂化键为类金刚石结构的形成原因。这种类型的硬的非晶碳基层能够减少摩擦并且展示出在大约450℃至550℃的范围内的耐热性以及2μm直至4μm的涂层厚度。优选地，DLC层为不含氢或卤素的DLC层。
DLC层/功能涂层覆盖活塞环支承表面的至少部分区域，但可选择地也可以覆盖活塞环的其它外表面区域，例如活塞环的侧面。
DLC层还涂有保护层，该保护层由不同于DLC层材料的材料组成，并且保护层的材料具有比DLC层的材料更高的耐热性，例如在550℃至650℃范围内的耐热性。在这个背景下，覆盖物被施加于活塞环支承表面的至少一部分，但是覆盖物也可以延伸到整个支承表面上。
活塞环的支承表面通常具有半球形的或圆锥形的轮廓，也就是说在横截面表示中，外线不平行于活塞轴/气缸壁延伸，而是向外成拱形的并且是倾斜的。在这种情况下，本领域的技术人员理解术语“枢轴点”意味着在活塞环的安装状态中的凸度/锥度(顶点)的径向最外面的点，或者也是支承表面轮廓的最大点，或者还是支承表面轮廓的转折点。也可以说是，在周向产生“枢轴线”。根据一实施方式，围绕枢轴点的区域并不被提供有保护层。因此，在活塞环支承表面的周向上产生未施加保护层的一种带，该带也可以说是位于围绕“枢轴线”的区域中。另一方面，支承表面的包括运行边缘(未位于该围绕枢轴点的区域中)的区域被提供有保护层。
在这个背景下，保护层的厚度有几微米的不同，但不应超过5μm，优选地，保护层的厚度小于2μm，最优选地保护层具有小于1μm的厚度。
根据一实施方式，金属或金属氮化物被用作用于保护层的材料。
本领域技术人员已知用于施加该保护层的多种方法。根据本发明的一可行的实施方式，保护层以物理气相沉积(PVD)方法施加至DLC层。
还可以想到在DLC层和保护层之间施加附加层。
根据优选的实施方式，保护层是在功能涂层的表面中的凹陷部内的沉积物的形式。在这个背景下，术语表面中的凹陷部被理解为意味着由于该表面的粗糙度而存在的凹陷部。因此，于是保护层没有封闭表面的形式，而是遍布整个表面的一系列微小的表面沉积物。
凹陷部和沉积物的尺寸可以通过用于产生功能涂层的工艺来调整。在这里，已经发现对于较薄的功能涂层(即在这种情况下小于10μm)，表面沉积物相对于总表面面积的面积百分比优选为在10％至30％的范围内，然而对于较厚的功能涂层，该面积百分比也应该更大。更准确地，对于大于10μm的层厚度，面积百分比优选为总厚度的20％至40％。因此，表面沉积物的面积百分比还应该随着功能涂层变厚而增加。活塞环支承表面上的Rpk粗糙度值在0.03μm至0.1μm的范围内；活塞环支承表面上的Rk粗糙度值在0.15μm至0.3μm的范围内。
根据本发明，按照以下部分所描述的来制造具有在功能涂层中的表面沉积物形式的保护层的活塞环。首先施加类金刚石(DLC)层作为功能涂层，也就是说作为活塞环主体上的磨损保护层，该活塞环主体例如由灰铸铁或钢材制成。还将保护层施加于该DLC层上，并且该保护层在随后的步骤中又被去除至这种程度：附加层，即保护层仅保留在DLC层中的凹陷部内。因此，沉积物存在于DLC层的表面上的由于DLC层的表面粗糙度而产生的凹陷部内。
优选地为金属沉积物形式的该附加层使得在气缸壁和活塞环表面之间形成油和碳的混合物以及金属保护层。通过保护层的进一步去除来减小摩擦因数，从而改善了磨损行为、特别是磨合行为。在持续100小时的发动机试验中，观察到根据本发明生产的(即，具有磨损保护层中的附加的表面沉积物的)活塞环的磨合行为的改善。特别地，发现涂层磨损大约减少15％并且位于TDC处的衬垫磨损大约减少25％。
为了在DLC功能涂层中的这种表面沉积物，DLC层必须具有一定的粗糙度。根据一实施方式，该粗糙度通过在施加功能涂层之前至少在功能涂层待被施加的位置处对活塞环主体进行粗糙化来调整。然后该粗糙度被“转移”至功能涂层的表面。根据另一实施方式，为了产生一定的基本粗糙度，通过电弧工艺或溅射工艺(两者都为PVD工艺)来施加DLC层。当然，还可以想到将利用电弧工艺/溅射工艺施加DLC层与对活塞环主体进行粗糙化相结合。在施加保护层之前，优选地，功能涂层(DLC层)的表面具有在0.15μm至0.5μm范围内的Rpk粗糙度值，以及在0.3μm至0.7μm范围内的Rk粗糙度值。
粗糙度值通常适于活塞环支承表面的总轴向高度，并且如果随后处理支承表面，那么(金属)保护层可以分布在支承表面上，即分布在环形研磨上方和下方。这些区域可以根据轴向高度而具有从0.05mm至4mm的不同宽度。
优选地，用于保护层的材料为金属、金属合金或金属氮化物，特别优选地为铬、铝、氮化钛或氮化钒。优选地，保护层的材料被施加为直到0.05μm至1μm范围内的厚度。更优选地，在DLC层的厚度大于20μm的情况下，保护层材料的施加厚度优选地在0.2μm至0.4μm之间。在DLC层的厚度小于20μm的情况下，保护层材料的施加厚度优选地在0.05μm至0.4μm之间、最优选地在0.1μm至0.2μm之间。优选地，使用PVD工艺来施加保护层。
在已经施加一层保护层材料之后，在随后的去除步骤中通过适合的工艺再次将其部分地去除。在这个背景下，研磨工艺、特别是外圆研磨工艺是优选的。继续进行去除直到保护层材料的沉积物仅保留在由于DLC层的表面的粗糙度引起的凹陷部中。以这种方式，表面沉积物形成在DLC层上。优选地，对于较薄(即小于10μm)的DLC层，继续进行去除工艺直到表面沉积物的面积占总表面面积的百分比在10％至30％的范围内。在较厚(即大于10μm)的DLC层的情况下，上述面积百分比优选在20％至40％的范围内。在这个背景下，面积百分比可以通过光栅电子显微镜(REM)映射过程来确定。在这里，术语总表面面积被理解为应用根据本发明的方法(包括去除工艺)的总面积，即面积百分比为去除了保护层材料的表面面积的百分比。还可以想到将保护层仅仅施加于DLC层的一部分上，和/或仅仅从局部区域去除保护层材料，而在其它局部区域中，施加的保护层保留其全部的厚度。还可以在不同的局部区域处去除保护层材料的不同厚度，例如可以想到去除在活塞环的应力集中区域内的更多的材料。
在功能涂层上的保护层材料的施加以及随后的去除工艺具有将Rpk粗糙度值减小大约20％，以及将Rk粗糙度值减小大约30％的效果。该改变指具有表面沉积物的功能涂层(即在去除步骤后)相比于不具有表面沉积物的功能涂层(即直接在DLC层/功能涂层的施加之后)。因此，粗糙度值显著地减小，这导致磨损行为的改善。

Claims (19)

1.一种活塞环，包括活塞环主体，
其中，DLC层作为功能涂层被施加于所述活塞环主体的外表面，至少被施加于支承表面，
其中，保护层被施加于至少在活塞环支承表面的局部表面上的所述功能涂层上，
其中，所述保护层由这样的材料组成，该材料不同于所述功能涂层的材料并且具有比所述功能涂层的材料更高的耐热性。
2.根据权利要求1所述的活塞环，其中，在PVD工艺中施加所述保护层。
3.根据前述权利要求中任一项所述的活塞环，其中，所述保护层的厚度小于5μm、优选地小于2μm、最优选地小于1μm。
4.根据前述权利要求中任一项所述的活塞环，其中，所述保护层由金属或金属氮化物组成。
5.根据前述权利要求中任一项所述的活塞环，其中，所述保护层被施加于整个活塞环支承表面。
6.根据前述权利要求中任一项所述的活塞环，其中，保护层不被施加于所述活塞环支承表面的围绕枢轴点的区域，以及其中，保护层被施加于所述活塞环支承表面的其余部分以及所述区域外的运行边缘。
7.根据前述权利要求中任一项所述的活塞环，其中，所述功能涂层形成为不含氢或卤素的DLC层。
8.根据前述权利要求中任一项所述的活塞环，其中，所述保护层具有在所述功能涂层中的凹陷部内的表面沉积物的形式。
9.根据权利要求8所述的活塞环，其中，当所述功能涂层具有小于10μm的层厚度时，所述保护层的表面沉积物占总表面面积的10％至30％之间的面积百分比，以及当所述功能涂层具有大于10μm的层厚度时，所述保护层的表面沉积物占总表面面积的20％至40％之间的面积百分比。
10.根据权利要求8-9中任一项所述的活塞环，其中，所述活塞环支承表面上的Rpk粗糙度值在0.03μm至0.1μm的范围内，以及Rk粗糙度值在0.15μm至0.3μm的范围内。
11.一种用于制造有涂层的活塞环的方法，包括：
提供活塞环主体；
将DLC层作为功能涂层至少施加至所述活塞环主体的支承表面；
将保护层施加于所述功能涂层上；
部分地去除所述保护层，使得仅在所述功能涂层的表面中的凹陷部内留有沉积物。
12.根据权利要求11所述的方法，其中，在施加功能涂层之前，对所述活塞环主体、特别是那些被提供所述功能涂层的表面进行粗糙化。
13.根据权利要求11-12中任一项所述的方法，其中，在电弧工艺或溅射工艺中施加所述功能涂层。
14.根据权利要求11-13中任一项所述的方法，其中，在施加所述功能涂层后，所述功能涂层具有在0.15μm至0.5μm的范围内的Rpk粗糙度值以及在0.3μm至0.7μm的范围内的Rk粗糙度值。
15.根据权利要求11-14中任一项所述的方法，其中，利用PVD工艺施加所述保护层。
16.根据权利要求11-15中任一项所述的方法，其中，所述保护层的材料包括金属、金属合金或金属氮化物，优选地铬、铝、氮化钛或氮化钒。
17.根据权利要求11-16中任一项所述的方法，其中，对于大于20μm的所述功能涂层的层厚度，所述保护层的材料的施加厚度在0.05μm至1μm之间、优选地在0.2μm至0.4μm之间；对于小于20μm的所述功能涂层的层厚度，所述保护层的材料的施加厚度优选地在0.05μm至0.4μm之间、优选地在0.1μm至0.2μm之间。
18.根据权利要求11-17中任一项所述的方法，其中，所述去除步骤包括研磨、特别是外圆研磨。
19.根据权利要求11-18中任一项所述的方法，其中，对于小于10μm的所述功能涂层的层厚度，继续进行所述去除步骤直到所述表面沉积物的面积百分比为总表面面积的10％至30％之间；以及对于大于10μm的所述功能涂层的层厚度，继续进行所述去除步骤直到所述表面沉积物的面积百分比为总表面面积的20％至40％之间。
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RU2727466C2 (ru) 2020-07-21
BR112018015486A2 (pt) 2018-12-18
DE102016108088B4 (de) 2018-05-09
CN108603278B (zh) 2020-04-07
JP2019516914A (ja) 2019-06-20
EP3390683A1 (de) 2018-10-24
KR20180113607A (ko) 2018-10-16
EP3390683B1 (de) 2022-01-26
PT3390683T (pt) 2022-02-17
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RU2018137183A3 (zh) 2020-05-20
RU2018137183A (ru) 2020-05-20

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