CN102323723A - 基于Abbe矢量成像模型的光学邻近效应校正的优化方法 - Google Patents
基于Abbe矢量成像模型的光学邻近效应校正的优化方法 Download PDFInfo
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102636951A (zh) * | 2012-05-11 | 2012-08-15 | 北京理工大学 | 双吸收层交替相移接触孔掩模衍射场的计算方法 |
CN102981355A (zh) * | 2012-12-13 | 2013-03-20 | 北京理工大学 | 一种基于基本模块的掩模辅助图形优化方法 |
CN103631096A (zh) * | 2013-12-06 | 2014-03-12 | 北京理工大学 | 基于Abbe矢量成像模型的光源-掩模-偏振态联合优化方法 |
CN103744265A (zh) * | 2014-01-29 | 2014-04-23 | 上海华力微电子有限公司 | 改善工艺窗口的光学临近修正方法 |
CN109634068A (zh) * | 2019-01-29 | 2019-04-16 | 北京理工大学 | 离焦低敏感度、工艺窗口增强的光源-掩模批量优化方法 |
CN117454831A (zh) * | 2023-12-05 | 2024-01-26 | 武汉宇微光学软件有限公司 | 一种掩模版图形优化方法、系统及电子设备 |
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CN101191996A (zh) * | 2006-11-29 | 2008-06-04 | 联华电子股份有限公司 | 光掩模的制造方法以及光学接近度校正的修补方法 |
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CN101349861A (zh) * | 2007-07-19 | 2009-01-21 | 上海华虹Nec电子有限公司 | 平滑规则式光学临近修正光掩膜图形的方法 |
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CN101995763A (zh) * | 2009-08-17 | 2011-03-30 | 上海宏力半导体制造有限公司 | 光学邻近校正方法 |
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US20030107770A1 (en) * | 2001-07-11 | 2003-06-12 | Applied Materials, Inc. | Algorithm for adjusting edges of grayscale pixel-map images |
CN1629730A (zh) * | 2003-10-27 | 2005-06-22 | 国际商业机器公司 | 执行基于模型的光学邻近校正的方法 |
CN101191996A (zh) * | 2006-11-29 | 2008-06-04 | 联华电子股份有限公司 | 光掩模的制造方法以及光学接近度校正的修补方法 |
CN101311825A (zh) * | 2007-05-21 | 2008-11-26 | 海力士半导体有限公司 | 修正光学邻近效应的方法 |
CN101349861A (zh) * | 2007-07-19 | 2009-01-21 | 上海华虹Nec电子有限公司 | 平滑规则式光学临近修正光掩膜图形的方法 |
CN101726991A (zh) * | 2008-10-24 | 2010-06-09 | 中芯国际集成电路制造(上海)有限公司 | 光学临近修正的测试方法及光掩模版制造方法 |
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Non-Patent Citations (1)
Title |
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蔡懿慈,周强,洪先龙,石蕊,王旸: "光学邻近效应矫正(OPC)技术及其应用", 《中国科学 E辑:信息科学》, vol. 37, no. 12, 31 December 2007 (2007-12-31) * |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102636951A (zh) * | 2012-05-11 | 2012-08-15 | 北京理工大学 | 双吸收层交替相移接触孔掩模衍射场的计算方法 |
CN102636951B (zh) * | 2012-05-11 | 2014-07-30 | 北京理工大学 | 双吸收层交替相移接触孔掩模衍射场的计算方法 |
CN102981355A (zh) * | 2012-12-13 | 2013-03-20 | 北京理工大学 | 一种基于基本模块的掩模辅助图形优化方法 |
CN103631096A (zh) * | 2013-12-06 | 2014-03-12 | 北京理工大学 | 基于Abbe矢量成像模型的光源-掩模-偏振态联合优化方法 |
CN103744265A (zh) * | 2014-01-29 | 2014-04-23 | 上海华力微电子有限公司 | 改善工艺窗口的光学临近修正方法 |
CN103744265B (zh) * | 2014-01-29 | 2016-09-07 | 上海华力微电子有限公司 | 改善工艺窗口的光学临近修正方法 |
CN109634068A (zh) * | 2019-01-29 | 2019-04-16 | 北京理工大学 | 离焦低敏感度、工艺窗口增强的光源-掩模批量优化方法 |
CN117454831A (zh) * | 2023-12-05 | 2024-01-26 | 武汉宇微光学软件有限公司 | 一种掩模版图形优化方法、系统及电子设备 |
CN117454831B (zh) * | 2023-12-05 | 2024-04-02 | 武汉宇微光学软件有限公司 | 一种掩模版图形优化方法、系统及电子设备 |
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