CN102269936A - Method and system for simulating moth compound eye optical antireflection structure pattern - Google Patents
Method and system for simulating moth compound eye optical antireflection structure pattern Download PDFInfo
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- 230000010287 polarization Effects 0.000 claims description 6
- 238000006243 chemical reaction Methods 0.000 claims description 5
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- 238000004556 laser interferometry Methods 0.000 description 5
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- 210000004027 cell Anatomy 0.000 description 3
- 238000002164 ion-beam lithography Methods 0.000 description 3
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- 229910004205 SiNX Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000609 electron-beam lithography Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000000025 interference lithography Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000001127 nanoimprint lithography Methods 0.000 description 2
- 239000002086 nanomaterial Substances 0.000 description 2
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- 238000002310 reflectometry Methods 0.000 description 2
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- 239000002253 acid Substances 0.000 description 1
- 230000003667 anti-reflective effect Effects 0.000 description 1
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- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
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Abstract
The invention relates to a method and a system for generating a moth compound eye periodic antireflection structure pattern by a multi-beam laser interference technology. The system comprises a laser, a beam expanding collimation system, a beam splitting and refraction system, a half wavelength plate, a polarizer, a charged coupled device (CCD) and the like and is characterized in that: a laser interference system is used for combining six or more than six coherent laser beams, performing intensity modulation on light intensity distribution in an interference field and distributing by using the modulated and re-distributed light intensity to obtain the micro or nanoscale moth compound eye periodic structure pattern. By the method, the simulation of a moth compound eye periodic array structure is realized to the greatest extent; by adjusting an incident angle and a space angle of the interference system, the periodic and feature size of the structure pattern is adjusted from nanoscale level to micro level to make the manufacturing of the nanoscale and micro structures more convenient and accurately realize the simulation of the moth compound eye antireflection structure, so the light absorption efficiency is improved.
Description
Technical field
The present invention relates to a kind of employing multi-beam laser interference technique emulation moth compound eye periodicity optical anti-reflection structure method of patterning and system, belong to improvement simulate optical anti-reflection structure pattern.
Technical background
The moth ocular structure is a kind of optics anti-reflection structure.1967, Bernhard found a kind of nocturnal habit moth, and its cornea produces hardly to infrared reflection of light, and its principle is broad research [1] so far.The moth compound eye is by a lot of simple eye compositions, and this structure allows them have extraordinary anti-reflection efficiency.The researchist is inspired by the antireflection characteristic of moth ocular structure, produces the array structure of similar moth ocular structure and periodic distribution in solar cell surface, can reach the higher conversion efficiency of solar cell [2,3].
The making of solar battery antireflective structure often is used method at present has: (1) caustic corrosion, acid corrosion, electrochemical etching method.Though technology is simple, but the result of corrosion rear surface structure has certain randomness, there is the unit size of direct relation the corrosion back all within a bigger variation range with reflectivity, seek out minimum reflectivity, must accurately control reaction process, and the corrosive liquid that uses in the course of reaction can cause very big pollution [3-5] to human and environment.(2) plasma enhanced chemical vapor deposition (PECVD) method.Deposit the making that the SiNx film is used for the antireflecting film of crystalline silicon substrate with this method, but the PECVD deposition is very expensive.In addition, the SiNx film of commercialization is normally antireflecting at the about 600nm of wavelength specially, and in other wavelength coverage that comprises part incident sun power, reflection loss increases fast.In addition, for multilayer film, because the restriction of Coating Materials, chemistry that they are different with matrix material and physical characteristics will cause adhesion effect, heat coupling and membranous layer stability to be affected.
The manufacturing of laser interference nanometer be currently possess fast, low cost and large-area nano structure make one of technology of advantage and potentiality.The laser interference nano-photoetching is when utilizing two bundles or the light beam coherence stack more than two bundles, can produce the light intensity energy distribution of intensity periodic modulation, when the light intensity energy distribution of this periodic modulation and material interact, can produce nanostructured at material surface, substrate can be plane or curved surface.This technology is more suitable in producing [6-7] in batches than ion beam lithography IBL (ion beam lithography), beamwriter lithography EBL (electron beam lithography) and scanning head photoetching SPL (scanning probe lithography) technology.Having pattern form than nano impression NIL (nano imprint lithography) is to be in harmonious proportion advantage such as can finish on curved surface at random.
Therefore, the present invention proposes to utilize laser interferometry to prepare emulation moth compound eye periodicity optical anti-reflection structure method of patterning and system, belongs to the improvement [8] to existing optics anti-reflection structure pattern implementation method and system.
List of references:
1.J.Rao，R.Winfield?and?L.Keeney，″Moth-eye-structured?light-emitting?diodes″，Optics?Communications，Vol.283，pp.2446-2450，2010.
2.C.Ting，C.Chen?and?C.P.Chou，“Subwavelength?structures?for?broadband?antireflection?application”，Optics?Communications，Vol.282，pp.434-438，2009.
3.Y.Li，J.Zhang?and?B.Yang，“Antireflective?surfaces?based?on?biomimetic?nanopillared?arrays”，Nano?Today，Vol.5，pp.117-127，2010.
4.S.Chattopadhyay，Y.F.Huang，Y.J.Jen，A.Ganguly，K.H.Chen?and?L.C.Chen，“Anti-reflecting?and?photonic?nanostructures”，Materials?Science?and?Engineering?R，Vol.69，pp?1-35，2010.
5.B.Liu?and?W.Yeh，“Antireflective?surface?fabricated?from?colloidal?silica?nanoparticles”，Colloids?and?Surfaces?A：Physicochemical?and?Engineering?Aspects，Vol.356，pp?145-149，2010.
6.D.M.Koller，N.Galler，H.Ditlbacher，A.Hohenau，A.Leitner，F.R.Aussenegg，J.R.Kren，″Direct?fabrication?of?micro/nano?fl?uidic?channels?by?electron?beam?lithography″，Microelectronic?Engineering，Vol.86，pp.1314-1316，2009.
7.K.Yamada，M.Umetani，T.Tamura，Y.Tanaka，H.Kasa?and?J.Nishii，“Antireflective?structure?imprinted?on?the?surface?of?optical?glass?by?SiC?mold”，Applied?Surface?Science，Vol.255，pp?4267-4270，2009
8.T.Chang，K.Cheng，T.Chou，C.Su，H.Yang?and?S.Luo，“Hybrid-polymer?nanostructures?forming?an?anti-reflection?film?using?two-beam?interferenceand?ultraviolet?nanoimprint?lithography”，Microelectronic?Engineering，Vol.86，pp.874-877，2009.
Summary of the invention
The present invention is in order better to realize the moth compound eye anti-reflection structure pattern of high emulation, propose a kind of multi-beam laser interference technique emulation moth compound eye antireflection periodic structure method of patterning and system of utilizing, adopt the method emulation moth compound eye structural pattern of six beam interferences.Native system comprises: laser instrument, beam-expanding collimation system, beam splitting and dioptric system, polaroid, half-wave plate, CCD etc.The laser beam of sending by laser instrument, by beam splitting and dioptric system laser beam is divided into six bundle coherent lights, by the half-wave plate of every Lu Guangzhong placement in the system and the mirror group of polaroid, six polarization state and the light intensities of restrainting each light path of coherent lights are controlled respectively, make coherent light beam obtain to interfere, form the moth compound eye periodicity optical anti-reflection structure pattern of high emulation on CCD or imaging surface, the shape of interference figure and quality are more accurate controlled.For the wherein three-beam of six light beams and the method for other three-beam employing quadrature incident, the incident angle of setting the two-beam in three light beams is identical, the incident angle of a branch of light is different from this two-beam in addition, the laser beam ranges of incidence angles that makes each light path is 0 ° to 90 °, and set each Shu Xianggan polarized state of light unanimity, behind beam-expanding collimation system, obtain the moth compound eye periodicity optical anti-reflection structure pattern of high emulation.
By conversion with adjust the beam splitter in the beam splitting and dioptric system and relative putting position and the angle between the enocscope in the light path, change the incident angle of coherent light beam, thereby adjust the parameter of moth compound eye periodicity optical anti-reflection structure pattern, make the characteristic dimension of system's pattern can be adjustable to micron order from nanoscale, service band has controllability.Under existing light path condition, the parameter that can optionally increase and decrease the light beam number and change every Shu Guang obtains expecting wants the figure that obtains.
Laser interference lithography is a kind of with its large tracts of land, high-level efficiency, low-cost production's micro-nano pattern and extensively receive publicity.It can make the periodic patterns that micron order, nanoscale and micro-nano mix, and can wait by incident angle, the Space Angle that changes incident light for the micro-nano periodic patterns and realize.Utilize the method fabrication cycle array pattern of laser interference lithography can directly be produced on solar cell surface, not disturbed by foreign material, durable, lasting, and have low cost, can make the advantage of large tracts of land periodic pattern.
At present mostly moth ocular structure emulation technology has been to realize that the uniform period of moth compound eye median ocellus arranges.The present invention utilizes the method for laser interference to produce the anti-reflection structure pattern of moth compound eye, and the research of having filled up high emulation moth compound eye anti-reflection structure is the blank of research field at home and abroad.The pattern that the present invention produced is for realizing that laser interference photolithography technology is made large tracts of land on host material, high emulation moth compound eye anti-reflection structure provides new approach.
The present invention has compared following advantage with existing method and system:
Owing in each bundle coherent light, be provided with the optical polarization device in the light path, each bundle polarized state of light and light intensity are regulated and control respectively, to improve the contrast of conoscope image, make the more accurate advantage such as controlled of the shape of conoscope image and quality.
Because laser interferometry emulation moth compound eye periodic structure pattern can be by setting specific incident angle and polarization state, thereby realization different cycles, the moth compound eye periodicity optical anti-reflection structure pattern of different densities has the advantage periodically good, that the pattern density adjustability is good.
Because laser interferometry can produce nanoscale to the adjustable structure plan of micron order, have pattern character size little, make up advantage flexibly.
Because laser interferometry is made the pattern that the present invention produced and be need not mask, the exposure field area is big, the efficient height, and manufacture craft is simple relatively, has fast, large tracts of land, efficient, the low-cost advantage that realizes moth compound eye periodicity optical anti-reflection structure pattern.
Because the laser interferometry making micro-nano structure that the present invention produced can be realized the preparation of large tracts of land periodic structure by the method for mechanical mobile substrate work stage or interference optics, has the advantage of making large tracts of land periodicity optical anti-reflection structure.
Description of drawings
Fig. 1 realizes the system schematic of moth compound eye structural pattern for the present invention adopts six beam interferences;
Fig. 2 realizes the system light path figure of moth compound eye structural pattern for the present invention adopts six beam interferences;
The moth compound eye two-dimensional structure emulation pattern that Fig. 3 and Fig. 4 produce for the present invention;
Fig. 5 interferes the moth compound eye structural pattern that forms for six beam lasers that CCD gathers.
Embodiment
As shown in Figure 1, realize the system schematic of moth compound eye optics anti-reflection structure pattern for the present invention adopts six beam interferences, the system of the laser interference of employing comprises laser instrument 1, beam expanding lens 2, colimated light system 3, catoptron 4, polarizer 5, beam splitting and dioptric system 6, CCD 7.The laser beam of being sent by laser instrument 1 is after expanding bundle 2 and collimation 3, the mirror 4 that the is reflected light path of turning back, by polarizer 5 light beam is become linearly polarized light, earlier laser beam is divided into six coherent light beams by beam splitting and dioptric system 6 again, again with six every three-beam incidents in X, Y plane respectively of restrainting light, they are shone on the CCD 7 simultaneously with certain incident angle, form moth compound eye periodicity optical anti-reflection structure pattern.
Adopt six beam interferences shown in Figure 2 to realize the system light path figure of moth compound eye structural pattern, beam splitting and dioptric system are made up of 4,5,7,8,13 and nine enocscopes 2,3,6,9,10,11,12,14,15 of five beam splitters respectively.Laser beam is by laser instrument 1 outgoing, enter beam splitting and dioptric system, each beam splitter in five beam splitters 4,5,7,8,13 is divided into two bundle light outgoing with the light beam of incident successively, nine enocscopes 2,3,6,9,10,11,12,14,15 place after the beam splitter, the effect on refractive power road runs up, the putting position and the angle of spectroscope and enocscope in adjustment beam splitting and the dioptric system, behind beam-expanding collimation system 18, six bundles each light beam in the coherent lights is shone on the CCD 16 simultaneously with predefined space incident angle separately.Adjust half-wave plate and polaroid mirror group 17 in every beam optical path, make the light intensity of each the bundle coherent light that participates in interfering consistent, obtain moth compound eye periodicity optical anti-reflection structure pattern shown in Figure 5 with polarization state.
Claims (9)
1. one kind is adopted six beam laser interference techniques to produce moth compound eye periodicity optical anti-reflection structure method of patterning and system, it is characterized in that system comprises: laser instrument, beam-expanding collimation system, beam splitting and dioptric system, polaroid, half-wave plate, CCD etc.The laser beam of sending by laser instrument, by beam splitting and dioptric system laser beam is divided into six bundle coherent lights, by the half-wave plate of every Lu Guangzhong placement in the system and the mirror group of polaroid, six polarization state and the light intensities of restrainting each light path of coherent lights are controlled respectively, make coherent light beam obtain to interfere, on CCD or imaging surface, form the moth compound eye periodicity optical anti-reflection structure pattern of high emulation.
2. method and system according to claim 1 is characterized in that, selects six bundle coherent lights, makes wherein three-beam in same plane, and three-beam is in another plane in addition, and two planes are orthogonal.The two-beam of setting in three light beams is identical in normal both sides and incident angle, the incident angle of remainder light beam is different from this two-beam, the laser beam ranges of incidence angles that makes each light path is 0 ° to 90 °, and set each Shu Xianggan polarized state of light unanimity, interfere the moth compound eye periodicity optical anti-reflection structure pattern that forms high emulation.
3. according to the described method and system of claim 1-2, it is characterized in that the coherent light beam number also can be more than six bundles, selects coherent light beam to satisfy the condition of claim 1, realization forms the moth compound eye periodicity optical anti-reflection structure pattern of high emulation more than the interference of six light beams.
4. according to the described method and system of claim 1-3, it is characterized in that, by conversion with adjust the beam splitter in the beam splitting and dioptric system and relative putting position and the angle between the enocscope in the light path, change the incident angle or the Space Angle of coherent light beam, thereby adjust the parameter of moth compound eye periodicity optical anti-reflection structure pattern.
5. according to the described method and system of claim 1-4, it is characterized in that, can change the parameters such as wavelength, incident angle, Space Angle, polarization state, position phase, light intensity of six beam interference incident beams, make the characteristic dimension of system's interference figure can be adjustable from nanoscale to micron order, thereby obtain the moth compound eye periodicity optical anti-reflection structure pattern of different cycles, density, characteristic dimension and contrast, service band has controllability.
6. according to the described method and system of claim 1-5, it is characterized in that the interference figure characteristic dimension of this system realizes that by incident angle, the Space Angle that changes incident light with displacement of the lines or angular displacement control system moth compound eye structural pattern period is adjustable from the nanoscale to the micron order.
7. according to the described method and system of claim 1-6, it is characterized in that this system can realize large tracts of land moth compound eye periodicity optical anti-reflection structure pattern by beam-expanding system.
8. according to the described method and system of claim 1-7, it is characterized in that this system can realize the periodically preparation of moth compound eye optics anti-reflection structure of large tracts of land by multiexposure, multiple exposure and the mode of lining by line scan.
9. method and system according to claim 8 is characterized in that, this system can realize the periodically preparation of moth compound eye optics anti-reflection structure of large tracts of land by the approach of mechanical mobile substrate work stage or interference optics.
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Cited By (9)
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| CN104708196A (en) * | 2015-01-21 | 2015-06-17 | 长春理工大学 | Manufacturing method for increasing effective photosensitive area of photoelectric material |
| WO2016173474A1 (en) * | 2015-04-28 | 2016-11-03 | 吴翔 | Imaging and forming method using projection operation and back projection method |
| CN106353974A (en) * | 2016-11-23 | 2017-01-25 | 长春理工大学 | Optical system for laser interference photolithography |
| CN108037641A (en) * | 2017-12-14 | 2018-05-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of moth ocular structure preparation system based on efficient intensity distribution and preparation method thereof |
| CN110275229A (en) * | 2019-07-03 | 2019-09-24 | 上海理工大学 | The unrelated anti-reflection film of big field angle wideband polarization and preparation method thereof based on moth eye |
| CN111077735A (en) * | 2018-10-18 | 2020-04-28 | 中国科学院长春光学精密机械与物理研究所 | System and method for preparing double-periodic structure |
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| CN104708196A (en) * | 2015-01-21 | 2015-06-17 | 长春理工大学 | Manufacturing method for increasing effective photosensitive area of photoelectric material |
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| CN106353974A (en) * | 2016-11-23 | 2017-01-25 | 长春理工大学 | Optical system for laser interference photolithography |
| CN108037641A (en) * | 2017-12-14 | 2018-05-15 | 中国科学院长春光学精密机械与物理研究所 | A kind of moth ocular structure preparation system based on efficient intensity distribution and preparation method thereof |
| CN111077735A (en) * | 2018-10-18 | 2020-04-28 | 中国科学院长春光学精密机械与物理研究所 | System and method for preparing double-periodic structure |
| CN111077734A (en) * | 2018-10-18 | 2020-04-28 | 中国科学院长春光学精密机械与物理研究所 | Method and system for manufacturing non-modulation array structure by adopting laser interference photoetching technology |
| CN110275229A (en) * | 2019-07-03 | 2019-09-24 | 上海理工大学 | The unrelated anti-reflection film of big field angle wideband polarization and preparation method thereof based on moth eye |
| CN112172136A (en) * | 2020-08-03 | 2021-01-05 | 广东工业大学 | Moth compound eye bionic optical device based on super-resolution laser radiation and 3D printing method and application thereof |
| CN113134971A (en) * | 2021-04-26 | 2021-07-20 | 长春理工大学 | System and method for manufacturing bionic sharkskin structure |
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