CN106353974A - Optical system for laser interference photolithography - Google Patents
Optical system for laser interference photolithography Download PDFInfo
- Publication number
- CN106353974A CN106353974A CN201611037444.8A CN201611037444A CN106353974A CN 106353974 A CN106353974 A CN 106353974A CN 201611037444 A CN201611037444 A CN 201611037444A CN 106353974 A CN106353974 A CN 106353974A
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- light
- reflecting mirror
- optical system
- flexible optical
- hinge
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention discloses an optical system for laser interference photolithography, relates to the technical field of laser interference photolithography processing and aims to solve the problems that an optical platform is complex in set-up, is easily intervened by outside and is not high in flexibility in the prior art. The system comprises at least one light splitter, at least one reflecting mirror A, a plurality of reflecting mirrors B, at least two flexible optical hinges, at least two half wave plates and at least two polarizers, wherein each flexible optical hinge consists of light guide pipes and joints; every two light guide pipes are connected by one joint; one reflecting mirror B is arranged inside each joint; one half wave plate is arranged in an outlet of each flexible optical hinge; one polarizer is arranged outside each outlet. According to the optical system disclosed by the invention, after a laser beam is subjected to light splitting by the light splitters, the laser beam is reflected by a total reflecting mirror and is coupled to enter the optical hinges; the laser beam is outputted by the tail ends of the optical hinges. According to the technology, the area of equipment is reduced, the consumption of energy is reduced, the adjustment of a complex light path and potential external interference are avoided, and a laser interference processing operation by unprofessional people is facilitated.
Description
Technical field
The present invention relates to laser interference lithography processing technique field, refer to a kind of laser interference lithography optical system.
Background technology
Laser interference photolithography technology is that one kind interferes exposure or direct write to produce periodicity using dual-beam or multi-beam laser
The important technology of the micro-nano array structure of pattern, is mainly used in striped, dot matrix, Kong Zhen and the gradient knot of processing sub-wavelength
The preparation of the orderly and quasi- oldered array structure such as structure.This technology has low cost, large area, high efficiency and achievable curved surface and adds
The features such as work, and these structures also show special function, such as antireflective, self-cleaning surface, total reflection, negative refraction,
False proof etc., cause the very big concern of domestic and international scientist.
Existing laser interference lithographic system great majority are built on optical table using optics microscope group, interfere light
The plane of incidence can be adjusted at any angle around the primary optical axis of incident ray.This system considerably increases interfering beam
The range of accommodation of angle between the plane of incidence, can meet the multiformity of interference pattern.But all there is light path to build outside numerous and diverse, easy being subject to
The deficiencies such as boundary's interference.But laser fiber beam splitting exposure is poorly suited for large area exposure and is applied to high power laser light.
At present, laser interference lithographic system all has respective advantage and deficiency it is impossible to take into account motility, large area, short pulse
The features such as punching and high power.
Content of the invention
In order to solve problems of the prior art, the invention provides a kind of laser interference lithography optical system, should
System solves optical table in prior art and builds complexity, is vulnerable to external interference, the not high problem of flexibility ratio.
The technical scheme that present invention solution technical problem is adopted is as follows:
A kind of laser interference lithography optical system, this system includes: at least one spectroscope, at least one reflecting mirror a, many
Individual reflecting mirror b, at least two flexible optical hinges, at least two half-wave plates and at least two polariscopes；Described flexible optical hinge
Chain is made up of light pipe and joint, and each two light pipe passes through a joint and connects；Each intra articular arranges a reflecting mirror
b；One half-wave plate of setting in the outlet of each flexible optical hinge described, each outlet described is outer to arrange a polarizer；Institute
State light source to emit beam, after spectroscope light splitting, a part of light is reflected in flexible optical hinge；A part of light is saturating
Penetrate, enter in flexible optical hinge after at least one reflecting mirror a reflects, or pass through another spectroscope light splitting, one
Light splitter is reflected in flexible optical hinge；A part of light transmission, enters flexible after at least one reflecting mirror a reflects
In optical hinge；Often bundle light corresponds to a flexible optical hinge；The light beam entering flexible optical hinge is through being arranged on joint
On reflecting mirror b multiple reflections, by half-wave plate and polarizer, the multi beam polarized light obtaining in sample surfaces or internal converges
Interfere, form interference figure.
The invention has the beneficial effects as follows: laser beam of the present invention reflects and coupling after spectroscope light splitting, then through completely reflecting mirror
Close and enter optical hinge, through the output of optical hinge end.This technology is meeting large area, short pulse and high power laser light transmission
Meanwhile, also show motility, reduce the area of equipment, reduce the loss of energy, it is to avoid adjustment to numerous and diverse light path and latent
External interference, facilitate layman to carry out laser interference process operation.
Brief description
Fig. 1 double light beam laser of the present invention interference lithography optical system structure schematic diagram.
Fig. 2 utilizes double light beam laser interference lithography optical system interference pattern.
Fig. 3 present invention three beam laser interference lithography optical system structure schematic diagram.
Fig. 4 utilizes three beam laser interference lithography optical system interference patterns.
In figure: 1, short pulse coherent laser light source, 2, casing, 3, spectroscope, 4, reflecting mirror a, 5, flexible optical hinge, 6,
Joint, 7, light pipe, 8, reflecting mirror b, 9, half-wave plate, 10, polariscope, the 11, second spectroscope, the 12, second reflecting mirror a, 13,
Three reflecting mirror a, 14, light-emitting window and 15, sample.
Specific embodiment
With reference to the accompanying drawings and examples the present invention is described in further details.
As shown in figure 1, bidifly light interference lithography optical system, this system includes: casing 2, spectroscope 3, reflecting mirror a4, eight
Individual reflecting mirror b8,5,16 torsion springs of two flexible optical hinges, two half-wave plates 9 and two polariscopes 10；Spectroscope 3 and anti-
Penetrate mirror a4 to be arranged in casing 2, casing 2 bottom and side arrange light hole, are connected with flexible optical hinge 5.Each flexible light
Learn hinge 5 to be made up of four joints 6 and five light pipes 7, each two light pipe 7 is connected by a joint 6, the two of joint 6
Head setting torsion spring, light pipe 7 is connected with joint 6 by torsion spring, realizes the function of light pipe 7 torsion, arbitrarily changes the position interfered
Put.Wherein light pipe 7 is scalable, when needing to increase or reduce the distance between flexible optical hinge 5 light-emitting window 14, passes through
The length of adjustment light pipe 7 can achieve.Wherein each joint 6 one reflecting mirror b8 of internal setting；Each flexible optical hinge 5
Light-emitting window 14 in one half-wave plate 9 of setting, light-emitting window 14 is outer arranges a polarizer 10 for each；Short pulse coherent laser light source
1 emits beam, and after spectroscope 3 light splitting, a part of light is reflected into 5 in flexible optical hinge；A part of light transmission,
Enter in flexible optical hinge 5 after reflecting mirror a4 reflects；Often bundle light corresponds to a flexible optical hinge 5；Enter flexible
The light beam of optical hinge 5, through the multiple reflections of reflecting mirror b8, by half-wave plate 9 and polarizer 10, realizes the tune of interference pattern
System, the multi beam polarized light obtaining interferes on sample 15 surface or internal convergence, forms interference figure.Sample 15 is generally gold
Genus, alloy, semi-conducting material, photosensitive resin or polymeric material.Sample 15 surface produces striped, dot matrix, Kong Zhen and gradient
Gradient pattern.In the present embodiment, the joint 6 that two light pipes 7 of light-emitting window 14 are connected is set, angle is more than 90 degree, other
The angle in joint 6 is 90 degree, and that is, length and direction by adjusting light pipe 7 realize interfering of two-beam.Casing 2 and soft
Property optical hinge 5 except light inlet and light-emitting window 14, remaining be full-closed structure.
In experiment, it is 355nm that short pulse coherent laser light source 1 adopts optical maser wavelength, pulse 5-8ns, and frequency 10hz adopts
The mode of dual-beam double-exposure, i.e. second exposure is to ratate 90 degrees sample 15 on the basis of first time exposes, and carries out again
Single exposure.The angle of incidence of two bundle laser is 7 degree；Space Angle is respectively 0 degree and 180 degree；The spot diameter size of laser is
14mm, two bundle laser energies are 1mj, and time of exposure is 10s, and ar-p 3740 selected by photoresist, with 5000 on inp substrate
Rev/min, through spin coating spin coating, front baking, dual-beam double-exposure, after the technological process such as after bake and development, obtain as shown in Figure 2
Interference pattern.
As shown in figure 3, three laser interference lithography optical systems, this system includes: 2, two spectroscopes of casing, three reflections
Mirror a, 12 reflecting mirror b8,5,24 torsion springs of three flexible optical hinges, three half-wave plates 9 and three polariscopes 10；
All of spectroscope and reflecting mirror a are arranged in casing 2, and casing 2 bottom and side arrange light hole, with flexible optical hinge 5
Connect.Each flexible optical hinge 5 is made up of four joints 6 and five light pipes 7, and each two light pipe 7 passes through a joint 6
Connect, two setting torsion spring in joint 6, light pipe 7 is connected with joint 6 by torsion spring, realizes the function of light pipe 7 torsion, with
Meaning changes the position interfered.Wherein light pipe 7 is scalable, when need increase or reduce flexible optical hinge 5 light-emitting window 14 it
Between apart from when, by adjust light pipe 7 length can achieve.Wherein each joint 6 one reflecting mirror b8 of internal setting；Often
14 one half-wave plate 9 of setting in the light-emitting window of individual flexible optical hinge 5, each light-emitting window 14 one polarizer 10 of outer setting；Short
Pulse coherence LASER Light Source 1 emits beam, and after spectroscope 3 light splitting, a part of light is reflected into flexible optical hinge 5
Interior；Another part light transmission, through the second spectroscope 11 light splitting, the reflected mirror a4 of a part of light enters flexible optical hinge
In 5；Another part light line reflection, enters flexible optical hinge after the second reflecting mirror a12 and the 3rd reflecting mirror a13 off axis reflector
In chain 5, substantially reduce the volume of equipment；Often bundle light corresponds to a flexible optical hinge 5；Enter flexible optical hinge 5
Light beam, through the multiple reflections of reflecting mirror b8, by half-wave plate 9 and polarizer 10, realizes the modulation of interference pattern, obtain is many
Bundle polarized light interferes on sample 15 surface or internal convergence, forms interference figure.Sample 15 be generally metal, alloy, half
Conductor material, photosensitive resin or polymeric material.Sample 15 surface produces striped, dot matrix, Kong Zhen and gradient pattern.This
In embodiment, the angle in all joints 6 is 90 degree, that is, pass through to adjust the length of light pipe 7 and the interior change of limited scope is adjacent
The angle of two light pipes 7 realizes interfering of three-beam.Casing 2 and flexible optical hinge 5 except light inlet and light-emitting window,
Remaining is full-closed structure.
In experiment, it is 355nm that short pulse coherent laser light source 1 adopts optical maser wavelength, pulse 5-8ns, and frequency 10hz adopts
The mode of three beam exposure.The spot diameter size of every Shu Jiguang is 14mm, and Space Angle is respectively 0 degree, 120 degree and 240 degree, enters
Firing angle is 12 degree, and laser energy is respectively 1.3mj, 1.3mj and 1mj, and time of exposure is 20s, and ar-p selected by photoresist
3740, with 5000 revs/min on si substrate, through spin coating spin coating, front baking, three beam exposure, the technique stream such as after bake and development
Cheng Hou, obtains interference pattern as shown in Figure 4.
Claims (10)
1. a kind of laser interference lithography optical system is it is characterised in that this system includes: at least one spectroscope, at least one
Reflecting mirror a, multiple reflecting mirror b, at least two flexible optical hinges, at least two half-wave plates and at least two polariscopes；Described
Flexible optical hinge is made up of light pipe and joint, and each two light pipe passes through a joint and connects；Each intra articular is arranged
One reflecting mirror b；One half-wave plate of setting in the outlet of each flexible optical hinge described, each outlet described is outer to arrange one
Polarizer；Described light source emits beam, and after spectroscope light splitting, a part of light is reflected in flexible optical hinge；One
Some light transmission, enters in flexible optical hinge after at least one reflecting mirror a reflects, or passes through another spectroscope
Light splitting, a part of light is reflected in flexible optical hinge；A part of light transmission, is reflected by least one reflecting mirror a
Enter afterwards in flexible optical hinge；Often bundle light corresponds to a flexible optical hinge；The light beam entering flexible optical hinge passes through
It is arranged on the multiple reflections of the reflecting mirror b on joint, by half-wave plate and polarizer, the multi beam polarized light obtaining is in sample surfaces
Or internal convergence interferes, form interference figure.
2. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that described flexible optical cuts with scissors
Chain, half-wave plate are consistent with the number of polariscope；The number of flexible optical hinge is one more than spectroscope.
3. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that the two in described joint sets
Put torsion spring, light pipe is connected with joint by torsion spring, realize the function of reversing.
4. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that described light pipe is scalable
And rotation.
5. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that the angle in described joint is big
In equal to 90 degree.
6. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that also including casing, described
At least one spectroscope and at least one reflecting mirror a are arranged in casing, and casing side arranges incidence hole, is laser entrance, case
Body opposite side arranges light hole, with flexible optical chain connection.
7. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that described casing and flexible light
Learn hinge except light inlet and light-emitting window, remaining is full-closed structure.
8. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that described light source is short pulse
Coherent laser light source.
9. a kind of laser interference lithography optical system according to claim 1 it is characterised in that described sample be metal,
Alloy, semi-conducting material, photosensitive resin and polymeric material.
10. a kind of laser interference lithography optical system according to claim 1 is it is characterised in that described sample surfaces produce
Carded sliver stricture of vagina, dot matrix, Kong Zhen and gradient pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611037444.8A CN106353974A (en) | 2016-11-23 | 2016-11-23 | Optical system for laser interference photolithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611037444.8A CN106353974A (en) | 2016-11-23 | 2016-11-23 | Optical system for laser interference photolithography |
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| CN106353974A true CN106353974A (en) | 2017-01-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201611037444.8A Pending CN106353974A (en) | 2016-11-23 | 2016-11-23 | Optical system for laser interference photolithography |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108057961A (en) * | 2018-01-19 | 2018-05-22 | 广州锐速智能科技股份有限公司 | A kind of non-metallic laser cutting leaded light arm assembly and laser cutting machine |
| CN108257723A (en) * | 2018-01-11 | 2018-07-06 | 乐清市宏牛电气科技有限公司 | Power line lead insulation protecting device with monitoring feedback function |
| CN113805328A (en) * | 2021-09-18 | 2021-12-17 | 中国科学院西安光学精密机械研究所 | Optical system for generating laser array line source with continuously adjustable period and adjusting method thereof |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108257723A (en) * | 2018-01-11 | 2018-07-06 | 乐清市宏牛电气科技有限公司 | Power line lead insulation protecting device with monitoring feedback function |
| CN108057961A (en) * | 2018-01-19 | 2018-05-22 | 广州锐速智能科技股份有限公司 | A kind of non-metallic laser cutting leaded light arm assembly and laser cutting machine |
| CN108057961B (en) * | 2018-01-19 | 2024-03-15 | 广州锐速智能科技股份有限公司 | Nonmetal laser cutting light guide arm device and laser cutting machine |
| CN113805328A (en) * | 2021-09-18 | 2021-12-17 | 中国科学院西安光学精密机械研究所 | Optical system for generating laser array line source with continuously adjustable period and adjusting method thereof |
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Application publication date: 20170125 |