CN102263000A - 一种等离子体微波谐振腔 - Google Patents

一种等离子体微波谐振腔 Download PDF

Info

Publication number
CN102263000A
CN102263000A CN201110172062A CN201110172062A CN102263000A CN 102263000 A CN102263000 A CN 102263000A CN 201110172062 A CN201110172062 A CN 201110172062A CN 201110172062 A CN201110172062 A CN 201110172062A CN 102263000 A CN102263000 A CN 102263000A
Authority
CN
China
Prior art keywords
glass
resonant cavity
straight barrel
baffle ring
plasma microwave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201110172062A
Other languages
English (en)
Other versions
CN102263000B (zh
Inventor
张金燕
王瑞春
夏先辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yangtze Optical Fibre and Cable Co Ltd
Original Assignee
Yangtze Optical Fibre and Cable Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yangtze Optical Fibre and Cable Co Ltd filed Critical Yangtze Optical Fibre and Cable Co Ltd
Priority to CN2011101720627A priority Critical patent/CN102263000B/zh
Publication of CN102263000A publication Critical patent/CN102263000A/zh
Priority to US14/116,889 priority patent/US8807078B2/en
Priority to EP12801846.2A priority patent/EP2725603B1/en
Priority to PCT/CN2012/072226 priority patent/WO2012174890A1/zh
Application granted granted Critical
Publication of CN102263000B publication Critical patent/CN102263000B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/32247Resonators
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01Manufacture of glass fibres or filaments
    • C03B37/012Manufacture of preforms for drawing fibres or filaments
    • C03B37/014Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815Reactant deposition burners or deposition heating means
    • C03B37/01823Plasma deposition burners or heating means
    • C03B37/0183Plasma deposition burners or heating means for plasma within a tube substrate
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192Microwave generated discharge
    • H01J37/32211Means for coupling power to the plasma
    • H01J37/32229Waveguides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)

Abstract

本发明涉及一种用于PCVD光纤预制棒加工机床的等离子体微波谐振腔,包括有谐振腔壳体和与其相联的波导装置,在谐振腔壳体的两端沿谐振腔轴向开设有同轴线的通孔,通过两端通孔安设有贯穿谐振腔腔体和两端通孔的玻璃内衬套,所述的玻璃内衬套包括玻璃直筒体和设置在玻璃直筒体两端的玻璃止挡环,其特征在于在玻璃直筒体的一端或两端设置外螺纹,玻璃止挡环通过其设置的螺孔与玻璃直筒体的端头相联。本发明不仅安装调整方便,大大降低了现场安装操作的难度,而且完全不使用氢、氧气的高温燃烧,有效避免因高温造成谐振腔金属元素的扩散,保证了生产出的光纤预制棒性能和质量稳定;提高了等离子体微波谐振腔使用性能的稳定性和有效使用寿命。

Description

一种等离子体微波谐振腔
技术领域
本发明涉及一种用于PCVD光纤预制棒加工机床的等离子体微波谐振腔,是对现有等离子体微波谐振腔的改进。
背景技术
PCVD即等离子化学气相沉积法是光纤预制棒加工的主要工艺之一,等离子体微波谐振腔是PCVD加工设备的核心部分。等离子体微波谐振腔主要由谐振腔壳体和与其相联的波导装置组成,在谐振腔壳体的两端沿谐振腔轴向开设有同轴线的通孔,通过两端通孔安设有贯穿谐振腔和两端通孔的玻璃内衬套,在玻璃内衬套的两端设置有玻璃止挡环,用于玻璃内衬套的轴向定位。现有的玻璃内衬套一端的玻璃止挡环在制作时与玻璃内衬套的玻璃直筒体制作成一体,另一端的玻璃止挡环需要在玻璃内衬套安装到谐振腔壳体上后将玻璃止挡环安装到玻璃直筒体的末端,然后用燃烧氢、氧气将直筒玻璃最末端熔化后外翻,压住玻璃止挡环。这样的玻璃内衬套结构存在以下几方面的问题:1、不仅现场安装复杂,操作难度大,而且由于熔化石英玻璃需要2000℃以上的温度,在这种高温环境下,谐振腔端部的金属很容易扩散到石英玻璃内衬套中,进而在PCVD的沉积过程中扩散到沉积管中,使光纤预制棒的衰减增加,从而影响光纤预制棒的加工质量;2、熔化后外翻的玻璃冷却后存在一定的应力,在以后使用过程中容易发生玻璃碎裂和破损现象,严重情况下将引起产品报废甚至设备损坏;3、如果使用过程中安装的玻璃环发生松动现象,需要进一步紧固,而玻璃的二次紧固效果不好,很难达到一定要求,进而影响设备的加工性能和产品质量的稳定性;4、由于石英玻璃内衬套与玻璃止挡环是高温粘接在一起,维修或检查谐振腔状态时需要对石英玻璃内衬套及止挡环进行破坏性拆除,这样不仅需要更换新的玻璃内衬套,而且其断裂的玻璃碎片易掉入谐振腔造成谐振腔的损坏。
发明内容
本发明所要解决的技术问题是针对上述现有技术存在的不足而提供一种便于安装和拆卸、安装质量好和使用性能稳定的等离子体微波谐振腔。
本发明为解决上述提出的问题所采用的技术方案为:包括有谐振腔壳体和与其相联的波导装置,在谐振腔壳体的两端沿谐振腔轴向开设有同轴线的通孔,通过两端通孔安设有贯穿谐振腔腔体和两端通孔的玻璃内衬套,所述的玻璃内衬套包括玻璃直筒体和设置在玻璃直筒体两端的玻璃止挡环,其特征在于在玻璃直筒体的一端或两端设置外螺纹,玻璃止挡环通过其设置的螺孔与玻璃直筒体的端头相联。
按上述方案,所述的玻璃直筒体的一端设置与其相联成一体的固定玻璃止挡环,玻璃直筒体的另一端端头设置外螺纹,与设置螺孔的玻璃止挡环相联,构成一端为螺纹联接的玻璃止挡环。
按上述方案,所述的玻璃直筒体和玻璃止挡环均由石英玻璃制成。
按上述方案,所述的玻璃直筒体直径为30~80毫米,端头设置的外螺纹为细牙螺纹,螺距为3~0.85毫米,整个外螺纹的轴向长度为10~20毫米。
按上述方案,所述的玻璃止挡环呈圆环形,螺孔与玻璃直筒体外螺纹相配置,玻璃止挡环的轴向厚度为3~15毫米,环体径向单边宽度为10~35毫米。
按上述方案,在玻璃直筒体一端或两端玻璃止挡环的内侧套装有活动玻璃挡圈。
按上述方案,所述的谐振腔壳体为圆柱型谐振腔壳体或同轴型谐振腔壳体。
本发明的有益效果在于:1、使用安装时,将玻璃内衬套穿入谐振腔和两端通孔,在端头的外螺纹旋上玻璃止挡环,拧紧玻璃止挡环即完成玻璃内衬套的安装和定位,这样不仅安装调整方便,大大降低了现场安装操作的难度,而且完全不使用氢、氧气的高温燃烧,有效避免因高温造成谐振腔金属元素的扩散,保证了生产出的光纤预制棒性能和质量稳定;2、玻璃内衬套采用螺纹安装锁紧结构,有效避免了石英玻璃熔化外翻冷却后易产生应力的缺点,在使用过程中不会出现玻璃碎裂、破损现象,提高了玻璃内衬套的使用寿命;3、使用过程中玻璃内衬套发生松动时,只需将玻璃止挡环继续拧紧一定距离即可,维修和检查时通过玻璃止挡环很容易将玻璃内衬套拆卸,拆卸后的玻璃内衬套能够方便的重新安装和定位,使设备的维修检查成本大大降低;并且拆卸安装不会形成玻璃碎片,进一步提高了等离子体微波谐振腔使用性能的稳定性。
附图说明
图1为本发明一个实施例的正剖视结构图。
图2为本发明另一个实施例的正剖视结构图。
图3为本发明一个实施例中玻璃内衬套的正剖视结构图。
具体实施方式
以下结合附图进一步说明本发明的实施例。
第一个实施例如图1、3所示,为一种圆柱型谐振腔,包括有谐振腔壳体5和与其一侧相联的波导装置10,在谐振腔壳体的两端安设有左、右端盖4、6,左、右端盖上沿谐振腔轴向开设有同轴线的通孔,通过左、右两端通孔安设有贯穿谐振腔腔体和两端通孔的玻璃内衬套7,所述的玻璃内衬套包括玻璃直筒体1,玻璃直筒体的外径为60毫米,玻璃直筒体的一端设置与其相联成一体的固定玻璃止挡环,玻璃直筒体的另一端端头设置外螺纹3,外螺纹为细牙螺纹,螺距为1.5毫米,整个外螺纹的轴向长度为15毫米,外螺纹与设置螺孔的玻璃止挡环2相联,构成一端为螺纹联接的玻璃止挡环,所述的玻璃止挡环呈圆环形,螺孔与玻璃直筒体外螺纹相配置,玻璃止挡环的轴向厚度为6毫米,环体径向单边宽度为18毫米。所述的玻璃直筒体和玻璃止挡环均由石英玻璃制成。其中固定式玻璃止挡环与玻璃直筒体一体成型。
第二个实施例如图2所示,为一种同轴型谐振腔,它与上一个实施例的主要不同在于同轴型谐振腔壳体8的谐振腔中设置有两个同轴套9,两同轴套之间存在有狭缝11,玻璃内衬套穿入两同轴套内孔并贯穿谐振腔轴向。在波导装置内安设有波导天线12.。

Claims (7)

1.一种等离子体微波谐振腔,包括有谐振腔壳体和与其相联的波导装置,在谐振腔壳体的两端沿谐振腔轴向开设有同轴线的通孔,通过两端通孔安设有贯穿谐振腔腔体和两端通孔的玻璃内衬套,所述的玻璃内衬套包括玻璃直筒体和设置在玻璃直筒体两端的玻璃止挡环,其特征在于在玻璃直筒体的一端或两端设置外螺纹,玻璃止挡环通过其设置的螺孔与玻璃直筒体的端头相联。
2.按权利要求1所述的等离子体微波谐振腔,其特征在于所述的玻璃直筒体的一端设置与其相联成一体的固定玻璃止挡环,玻璃直筒体的另一端端头设置外螺纹,与设置螺孔的玻璃止挡环相联,构成一端为螺纹联接的玻璃止挡环。
3.按权利要求1或2所述的等离子体微波谐振腔,其特征在于所述的玻璃直筒体和玻璃止挡环均由石英玻璃制成。
4.按权利要求1或2所述的等离子体微波谐振腔,其特征在于所述的玻璃直筒体直径为30~80毫米,端头设置的外螺纹为细牙螺纹,螺距为3~0.85毫米,整个外螺纹的轴向长度为10~20毫米。
5.按权利要求1或2所述的等离子体微波谐振腔,其特征在于所述的玻璃止档环呈圆环形,螺孔与玻璃直筒体外螺纹相配置,玻璃止挡环的轴向厚度为3~15毫米,环体径向单边宽度为10~35毫米。
6.按权利要求1或2所述的等离子体微波谐振腔,其特征在于在玻璃直筒体一端或两端玻璃止挡环的内侧套装有活动玻璃挡圈。
7.按权利要求1或2所述的等离子体微波谐振腔,其特征在于所述的谐振腔壳体为圆柱型谐振腔壳体或同轴型谐振腔壳体。
CN2011101720627A 2011-06-24 2011-06-24 一种等离子体微波谐振腔 Active CN102263000B (zh)

Priority Applications (4)

Application Number Priority Date Filing Date Title
CN2011101720627A CN102263000B (zh) 2011-06-24 2011-06-24 一种等离子体微波谐振腔
US14/116,889 US8807078B2 (en) 2011-06-24 2012-03-13 Plasma microwave resonant cavity
EP12801846.2A EP2725603B1 (en) 2011-06-24 2012-03-13 Plasma microwave cavity
PCT/CN2012/072226 WO2012174890A1 (zh) 2011-06-24 2012-03-13 一种等离子体微波谐振腔

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2011101720627A CN102263000B (zh) 2011-06-24 2011-06-24 一种等离子体微波谐振腔

Publications (2)

Publication Number Publication Date
CN102263000A true CN102263000A (zh) 2011-11-30
CN102263000B CN102263000B (zh) 2013-05-15

Family

ID=45009595

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2011101720627A Active CN102263000B (zh) 2011-06-24 2011-06-24 一种等离子体微波谐振腔

Country Status (4)

Country Link
US (1) US8807078B2 (zh)
EP (1) EP2725603B1 (zh)
CN (1) CN102263000B (zh)
WO (1) WO2012174890A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012174890A1 (zh) * 2011-06-24 2012-12-27 长飞光纤光缆有限公司 一种等离子体微波谐振腔
CN105502918A (zh) * 2015-12-25 2016-04-20 长飞光纤光缆股份有限公司 一种双腔型等离子体微波谐振腔

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2028245B1 (en) * 2021-05-19 2022-12-05 Draka Comteq Bv A plasma chemical vapor deposition apparatus

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1490268A (zh) * 2003-09-19 2004-04-21 烽火通信科技股份有限公司 一种利用等离子体技术的光纤预制棒加工设备
JP2005247680A (ja) * 2003-12-30 2005-09-15 Draka Fibre Technology Bv Pcvd装置、及びプリフォームを製造する方法
CN1858298A (zh) * 2006-03-16 2006-11-08 长飞光纤光缆有限公司 可调谐等离子体谐振腔
CN101853768A (zh) * 2010-04-09 2010-10-06 长飞光纤光缆有限公司 一种圆柱型等离子体谐振腔

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4965540A (en) * 1987-12-23 1990-10-23 Hewlett-Packard Company Microwave resonant cavity
DE4203369C2 (de) * 1992-02-06 1994-08-11 Ceramoptec Gmbh Verfahren und Vorrichtung zur Herstellung von Vorformen für Lichtwellenleiter
US5311103A (en) * 1992-06-01 1994-05-10 Board Of Trustees Operating Michigan State University Apparatus for the coating of material on a substrate using a microwave or UHF plasma
US5902404A (en) * 1997-03-04 1999-05-11 Applied Materials, Inc. Resonant chamber applicator for remote plasma source
US6715441B2 (en) * 1997-12-31 2004-04-06 Plasma Optical Fibre B.V. PCVD apparatus and a method of manufacturing an optical fiber, a preform rod and a jacket tube as well as the optical fiber manufactured therewith
JP4326146B2 (ja) * 1997-12-31 2009-09-02 プラズマ オプティカル ファイバー ベスローテン フェンノートシャップ Pcvd装置及び光ファイバ、プレフォームロッド及びジャケットチューブを製造する方法並びにこれにより製造される光ファイバ
CN1292624C (zh) * 2004-09-23 2006-12-27 烽火通信科技股份有限公司 等离子体谐振腔装置
CN100352793C (zh) * 2006-01-20 2007-12-05 杨鸿生 用于以天然气制乙烯的槽波导微波化学反应设备及制备方法
CN1858299A (zh) * 2006-03-27 2006-11-08 杭州大华仪器制造有限公司 微波等离子体装置及制备金刚石薄膜和刻蚀碳膜的方法
NL1033783C2 (nl) * 2007-05-01 2008-11-06 Draka Comteq Bv Inrichting voor het uitvoeren van een plasma chemische dampdepositie alsmede werkwijze ter vervaardiging van een optische voorvorm.
CN102263000B (zh) * 2011-06-24 2013-05-15 长飞光纤光缆有限公司 一种等离子体微波谐振腔

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1490268A (zh) * 2003-09-19 2004-04-21 烽火通信科技股份有限公司 一种利用等离子体技术的光纤预制棒加工设备
JP2005247680A (ja) * 2003-12-30 2005-09-15 Draka Fibre Technology Bv Pcvd装置、及びプリフォームを製造する方法
CN1858298A (zh) * 2006-03-16 2006-11-08 长飞光纤光缆有限公司 可调谐等离子体谐振腔
CN101853768A (zh) * 2010-04-09 2010-10-06 长飞光纤光缆有限公司 一种圆柱型等离子体谐振腔

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012174890A1 (zh) * 2011-06-24 2012-12-27 长飞光纤光缆有限公司 一种等离子体微波谐振腔
US8807078B2 (en) 2011-06-24 2014-08-19 Yangze Optical Fibre And Cable Company Ltd. Plasma microwave resonant cavity
CN105502918A (zh) * 2015-12-25 2016-04-20 长飞光纤光缆股份有限公司 一种双腔型等离子体微波谐振腔

Also Published As

Publication number Publication date
EP2725603B1 (en) 2015-10-28
CN102263000B (zh) 2013-05-15
WO2012174890A1 (zh) 2012-12-27
US8807078B2 (en) 2014-08-19
EP2725603A4 (en) 2014-07-30
US20140062300A1 (en) 2014-03-06
EP2725603A1 (en) 2014-04-30

Similar Documents

Publication Publication Date Title
CN102263000B (zh) 一种等离子体微波谐振腔
CN101853768B (zh) 一种圆柱型等离子体谐振腔
RU191066U1 (ru) Узел электрического соединения модуля бланкета с вакуумным корпусом термоядерного реактора
CN104241793A (zh) 一种用于微波传输的弯波导
CN105502918B (zh) 一种双腔型等离子体微波谐振腔
CN105710404A (zh) 一种快换式分体涨紧机构
CN105081014A (zh) 锥套胀紧和键传动相结合的矫直圈锁紧装置
CN202204962U (zh) 紧套光缆光纤连接器
CN201141933Y (zh) 一种用于激光点光源和线光源的透镜装配结构
CN202972266U (zh) 一种双活动接头管路密封结构
CN211457487U (zh) 一种外套水管、管式阴极发射枪及等离子体发生器
CN201965986U (zh) 高散热型光纤复合架空地线
CN215966883U (zh) 一种用于光纤接触件激光点焊的辅助装置
CN112922679A (zh) 安装组件、涡轮外环件、连接件、燃气轮机以及安装方法
CN218563859U (zh) 一种用于隔膜式压缩机的定位螺栓
CN219947202U (zh) 一种蜂窝芯管成型套
CN217417742U (zh) 一种玻璃纤维导丝辊
CN219806924U (zh) 一种电动自行车五通组件及使用该组件的电动自行车
CN219771962U (zh) 芯轴、哈夫环、芯轴组件和芯轴套组
CN204648318U (zh) 火焰筒前端固定结构及其球头衬套组件
CN210091826U (zh) 一种聚合物针式绝缘子
CN213109612U (zh) 摩托车油箱中护罩安装结构
CN214022796U (zh) 弯圆机第四轴结构
CN201677492U (zh) 直角橡塑挤出机机头
CN206958851U (zh) 筒灯

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C56 Change in the name or address of the patentee

Owner name: YANGTZE OPTICAL FIBRE AND CABLE CO., LTD

Free format text: FORMER NAME: CHANGFEI FIBRE-OPTICAL + OPTICAL CABLE CO., LTD.

CP01 Change in the name or title of a patent holder

Address after: 430073 Hubei city of Wuhan province Wuchang two Guanshan Road No. four

Patentee after: Yangtze Optical Fibre and Cable Co., Ltd

Address before: 430073 Hubei city of Wuhan province Wuchang two Guanshan Road No. four

Patentee before: Changfei Fibre-Optical & Optical Cable Co., Ltd.