CN102260847A - Metal rotating target material with low melting point and production technology - Google Patents
Metal rotating target material with low melting point and production technology Download PDFInfo
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- CN102260847A CN102260847A CN2010101846531A CN201010184653A CN102260847A CN 102260847 A CN102260847 A CN 102260847A CN 2010101846531 A CN2010101846531 A CN 2010101846531A CN 201010184653 A CN201010184653 A CN 201010184653A CN 102260847 A CN102260847 A CN 102260847A
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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Abstract
The invention relates to a metal rotating target material with low melting point and a production technology, the rotating target comprises a metal liner and a concentrically surrounded metal outer tube (target material). The melting point of the material of the rotating target liner is higher than 1000 DEG C, the melting point of the target material is lower than 800 DEG C, the target material and the liner are tightly combined. According to a mode designed by the invention, the liner and a cylindrical mould form an inner chamber of the mould in a concentric shaft mode. An annular area melting device is provided out the cylindrical mould. The production technology comprises the following steps: preheating the mould and the liner at first, then injecting the molten metal into the inner chamber of the mould; condensing the metal melt and then displacing the impurities in the target material to one end of the target material by a zone melting method. If remelting and quickly setting are performed for further, the target material with high purity and fine grain can be obtained. The end portion with high content of impurities can be removed after demoulding. The method can be used for producing single metal target materials such as tin, zinc, indium, aluminum, bismuth, antimony and the like with high purity of 5N-8N and alloy target materials which take the above metals with low melting point as mainly elements.
Description
Technical field
The present invention relates to a kind of high-purity low melting point metal rotary target and production technology, this rotary target is made up of a metal inner pipe (bushing pipe) and a metal outer pipe (target) of surrounding with one heart.The fusing point of this rotary target liner material is higher than 1000 ℃, and the fusing point of target material is lower than 800 ℃, and target and bushing pipe are combined closely.Carry out zone melting by the target to casting, the present invention can reduce the contact stain that crucible, stem bar, mold etc. cause target material in the melting casting cycle, even can further improve the purity of target material.In addition, by remelting, fast coagulating, can obtain fine grained texture.The target of producing with the present invention has characteristics such as purity height, crystal grain are tiny.
Background technology
Magnetron sputtering technique is more and more used in hi-tech industry.Hi-tech industry user requires also more and more tighter to the purity of target, tissue etc.For example along with the upgrading of computer chip technology, the requirement of target purity has been increased to 99.999～99.9999% from 99.9～99.99% of the past, simultaneously the target microstructure is also had higher requirement.In general, sputter uniform crystal particles, tiny target help obtaining the high-quality thin film smooth, smooth, that particle is few.
Sputtering target material generally can be divided into two kinds of base types: static planar targets and tubulose rotary target material.Because do not have relative movement between target and the magnet, the material use efficiency of static planar targets has only 20～30% usually.And the relative movement between tubulose rotary target material and the magnet makes that the material use efficiency of rotary target material can be up to 50～70%.Therefore, rotary target obtains people and more and more favors.The manufacture method of rotary target mainly contains thermospray, hot isostatic pressing, extruding, tube rolling, melting casting etc.
1) hot spray process: hot spray process is more suitable for being used to spray the higher metal or alloy of fusing point, since thermospray will near or melt metal be sprayed on the lower matrix of temperature, produce thermal stresses at surface in contact easily, along with the gathering of stress, if the thickness of thermospray is excessive, the outer tube metal ftractures easily, the gas that exists micropore to form is mingled with, and generally the thickness that can obtain is less than 5 millimeters, and compactness is lower, density unevenness, relative density are 80%～90%.
2) hot isostatic pressing: hot isostatic pressing method can obtain high fine and close target, but the manufacturing process complexity of rotary target need be protected processing to bushing pipe, and the making of jacket is also complicated, and cost is higher.
3) extruding, tube rolling: ingot metal can be squeezed into pipe, also can be rolled into pipe.Can directly make target with extruded tube and rolled tube and use, also can be welded on the bushing pipe and use.Produce target with these class methods, not only need extrusion equipment or rolling tube equipment, and the plasticity of target material will be got well.
4) melting casting: can obtain compactness height, target that associativity is good by the melting casting.In order to improve the associativity of bushing pipe and target, apply at the bushing pipe external diameter surface sometimes and adhere to media layer.Owing to the cracking that does not exist the stress concentration problem to cause, the thickness of outer tube target can arrive more than the 10mm.This method is used for the making of low melting point metal or alloy target material more.In melting, casting cycle, target material, particularly high-purity target material because with the contacting of differing materials such as crucible, stem bar, mold, be easy to contaminatedly, cause the target downgrade.
Application for a patent for invention prospectus CN1363716A discloses a kind of melting casting process of rotary target, is applicable to the making of low melting point metal or alloy target material.But this patent of invention does not have the solution of proposition at the material contamination problem that may occur in the melting casting.In addition, the target grain-size of this patent of invention production is 0.3～15mm.Such open grain structure is unfavorable for obtaining high-quality film.
Summary of the invention
The present invention relates to a kind of low melting point metal rotary target and production technology, this rotary target is made up of a metal liner and a metal targets of surrounding with one heart.The fusing point of this rotary target liner material is higher than 1000 ℃, and the fusing point of target is lower than 800 ℃, and the external diameter of the internal diameter of outer tube and bushing pipe is combined closely.Carry out zone melting by the target to casting, the present invention can reduce the contact stain that crucible, stem bar, mold etc. cause target material in the melting casting cycle, even can further improve the purity of target material.By remelting, fast coagulating, target can obtain fine grained texture.The target of producing with the present invention has characteristics such as purity height, crystal grain are tiny.In addition, the present invention relates to the application of this method.
Present method is utilized the principle of siphon by outer tube target material fusing, the metal of molten state is poured in the mold of columnar a, heating and makes outer tube, then purifies, remelting, coagulates processing (seeing figure one) soon.The round shape mold 2 that bushing pipe 3 and one are easily detachable, internal diameter is slightly larger than outer external diameter of pipe is placed on the base 7 in the mode of concentric, constitutes the mold inner chamber jointly, for the outer tube material filling of molten.The round shape mold has an annular zone melting device 1 outward.At first mold and bushing pipe are preheated, extract stopper rod 4 then, the logical flow tube 5 of the metal of molten state from bottom to top injects the mold inner chamber, clogs pouring gate with stopper 4 then.After the molten metal condensation, the row of the impurity in the target is moved on to target one end by zone-melting method.Can obtain the target of high purity, super large crystal grain like this.If further remelting is injected water coolant from bottom to top or the outside water coolant that sprays coagulates target material soon by water injection pipe 6, then can obtain high purity, thin brilliant target.Excise end after the demoulding that foreign matter content is high, and then remainder is machined to the rotary target of certain size.With this method can production purity be the alloy target material of principal element up to monometallic targets such as the tin of 5N～8N, zinc, indium, aluminium, bismuth, antimony and by these low melting point metals.
This method possesses following advantage:
1) before the casting bushing pipe and mold carried out thermal pretreatment, prevented premature solidification in the casting cycle and a large amount of pores of producing, help the uniform distribution of molten metal.
2) can carry out foundry goods enough supplies and shrinkage cavity is minimized, the bubble that is mingled with can upwards be discharged from mold.Move by zone melting is directed slowly, impurity and bubble are discharged, reduced inner micropore simultaneously, obtain higher, the more fine and close target of purity.
3) distribute by controlled temperature, can allow target form uniform columnar crystal structure, also can obtain evenly tiny equiax crystal by cooling off fast.
4) coating between bushing pipe and target, sputter or thermospray adhere to media layer, can improve the bonding force of the two effectively.
5) present method is equipped with rate of heating and the adjustable zone melting device of translational speed, can be bushing pipe and mold preheating before casting, and casting is finished the rear region melting and purified, and is heated to optimal temperature at last and carries out cooling process.
6) present method is equipped with the quick water-cooled design of bushing pipe and mold, can control the size and the form of target crystal grain.
7) the outer tube thickness of the target that can make is 5 millimeters to 20 millimeters, can obtain thick columnar grain by zone melting slowly, also can be by remelting, the tiny and uniform equi-axed crystal of fast cold acquisition.
Description of drawings
Figure is high-purity low melting point metal rotary target production equipment figure.
Claims (10)
1. the manufacture method of a magnetron sputtering rotary target material.This rotary target is made up of a metal liner and a metal outer pipe (target) of surrounding with one heart.This rotary target liner material is a nonmagnetic substance, and its fusing point is higher than 1000 ℃, and the fusing point of target material is lower than 800 ℃, and target and bushing pipe are combined closely.It is characterized in that: the round shape mold that bushing pipe and are easily detachable, internal diameter is slightly larger than the target external diameter constitutes the mold inner chamber jointly in the mode of concentric, for the target material filling of molten.The round shape mold has an annular zone melting device outward.At first mold and bushing pipe are preheated, the metal with molten state from bottom to top injects the mold inner chamber then, clogs pouring gate with stopper then.After the molten metal condensation, the row of the impurity in the target is moved on to target one end by zone-melting method.Can obtain the target of high purity, coarse grain like this.If further remelting, coagulate target material soon, then can obtain high purity, thin brilliant target.
2. press the method for claim 1, it is characterized in that: this outer tube mold obtains by screw threads for fastening by two independent adjustable semicircle models, radially by surround this mold, the annular electromagnetic induction heater that can slide up and down heats and zone melting.
3. by the method for at least one of claim 1 to 2, it is characterized in that: the bushing pipe of this mold and outer tube mold are preheating to the temperature that is higher than the target material fusing point at least, preferably are preheating to 200～800 ℃ temperature range.
4. press the method for at least one of claim 1 to 3, it is characterized in that: the material that can be made into rotary target has monometallic targets such as tin, zinc, indium, aluminium, bismuth, antimony and is the alloy of principal element by these low melting point metals, and their characteristics are that fusing point is less than 800 ℃.
5. by the method for at least one of claim 1 to 4, it is characterized in that: after the molten metal condensation, the row of the impurity in the target is moved on to the target end by zone-melting method.
6. by the method for at least one of claim 1 to 5, it is characterized in that: purify finish after, remelting, coagulate target material soon.
7. make the magnetron sputtering rotary target by the method for claim 1 to 5, target has the thick columnar grain of arranging perpendicular to outer tube-surface.
8. make the magnetron sputtering rotary target by the method for claim 1 to 6, target has fine isometric crystal grains.
9. by the method for at least one of claim 1 to 6, it is characterized in that: this outer tube target can be made into 5 millimeters to 20 millimeters thickness range.
10. by the method for at least one of claim 1 to 6, it is characterized in that: this method can production purity up to low melting point metal or the alloy target material of 5N～8N.
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| CN2010101846531A CN102260847A (en) | 2010-05-27 | 2010-05-27 | Metal rotating target material with low melting point and production technology |
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| CN2010101846531A CN102260847A (en) | 2010-05-27 | 2010-05-27 | Metal rotating target material with low melting point and production technology |
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| CN102260847A true CN102260847A (en) | 2011-11-30 |
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102554149A (en) * | 2011-12-26 | 2012-07-11 | 昆山全亚冠环保科技有限公司 | Continuous casting device for low-melting point alloy rotary target with liner tube and process of continuous casting device |
| CN104032271A (en) * | 2014-06-20 | 2014-09-10 | 江阴恩特莱特镀膜科技有限公司 | Mold and method for producing copper-zinc-tin rotary target |
| CN104480437A (en) * | 2014-12-30 | 2015-04-01 | 山东昊轩电子陶瓷材料有限公司 | Production method for integrally formed cylindrical target |
| CN104907539A (en) * | 2015-05-13 | 2015-09-16 | 基迈克材料科技（苏州）有限公司 | Continuous casting technology of belt material aluminum pipe and aluminum alloy rotating target materials |
| CN107299327A (en) * | 2017-07-25 | 2017-10-27 | 北京兴荣源科技有限公司 | A kind of manufacture method of inexpensive niobium pipe target |
| CN107771224A (en) * | 2015-03-18 | 2018-03-06 | 尤米科尔公司 | The method for forming rotary sputtering target |
| CN109628899A (en) * | 2019-01-24 | 2019-04-16 | 苏州罗纳尔材料科技有限公司 | Rotate zinc-magnesium target and preparation method thereof |
| CN110804726A (en) * | 2019-10-25 | 2020-02-18 | 广西晶联光电材料有限责任公司 | Binding method of rotary target material |
| CN111014624A (en) * | 2019-12-19 | 2020-04-17 | 苏州金江铜业有限公司 | In-situ inter-cooling device for manufacturing hollow beryllium-aluminum alloy structure |
| CN111455326A (en) * | 2020-06-11 | 2020-07-28 | 中国航发航空科技股份有限公司 | Vacuum arc plating device for reducing target material cooling time |
| CN111778486A (en) * | 2019-04-04 | 2020-10-16 | 领凡新能源科技(北京)有限公司 | Rotating target material, and binding method and device for rotating target material |
| CN113463043A (en) * | 2021-06-09 | 2021-10-01 | 先导薄膜材料（广东）有限公司 | Preparation method of rotary target material |
| CN114249301A (en) * | 2021-11-10 | 2022-03-29 | 砹尔法纽克莱(宁波)医疗科技有限公司 | Elution solution and preparation method of radionuclide astatine-211 for targeted nuclide drug |
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| CN1363716A (en) * | 2000-12-19 | 2002-08-14 | W.C.贺利氏股份有限两合公司 | Manufacture of tubular targets |
| US20070074969A1 (en) * | 2005-10-03 | 2007-04-05 | Simpson Wayne R | Very long cylindrical sputtering target and method for manufacturing |
| CN101709454A (en) * | 2009-12-03 | 2010-05-19 | 王�琦 | Rotary sputtering target and method for manufacturing same |
| CN101921988A (en) * | 2010-05-05 | 2010-12-22 | 广州市尤特新材料有限公司 | Silicon-base alloy rotary target material and preparation method thereof |
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2010
- 2010-05-27 CN CN2010101846531A patent/CN102260847A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1363716A (en) * | 2000-12-19 | 2002-08-14 | W.C.贺利氏股份有限两合公司 | Manufacture of tubular targets |
| US20070074969A1 (en) * | 2005-10-03 | 2007-04-05 | Simpson Wayne R | Very long cylindrical sputtering target and method for manufacturing |
| CN101709454A (en) * | 2009-12-03 | 2010-05-19 | 王�琦 | Rotary sputtering target and method for manufacturing same |
| CN101921988A (en) * | 2010-05-05 | 2010-12-22 | 广州市尤特新材料有限公司 | Silicon-base alloy rotary target material and preparation method thereof |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102554149A (en) * | 2011-12-26 | 2012-07-11 | 昆山全亚冠环保科技有限公司 | Continuous casting device for low-melting point alloy rotary target with liner tube and process of continuous casting device |
| CN104032271A (en) * | 2014-06-20 | 2014-09-10 | 江阴恩特莱特镀膜科技有限公司 | Mold and method for producing copper-zinc-tin rotary target |
| CN104480437A (en) * | 2014-12-30 | 2015-04-01 | 山东昊轩电子陶瓷材料有限公司 | Production method for integrally formed cylindrical target |
| CN107771224B (en) * | 2015-03-18 | 2019-08-30 | 先导薄膜材料（广东）有限公司 | The method for forming rotary sputtering target |
| CN107771224A (en) * | 2015-03-18 | 2018-03-06 | 尤米科尔公司 | The method for forming rotary sputtering target |
| CN104907539A (en) * | 2015-05-13 | 2015-09-16 | 基迈克材料科技（苏州）有限公司 | Continuous casting technology of belt material aluminum pipe and aluminum alloy rotating target materials |
| CN107299327A (en) * | 2017-07-25 | 2017-10-27 | 北京兴荣源科技有限公司 | A kind of manufacture method of inexpensive niobium pipe target |
| CN107299327B (en) * | 2017-07-25 | 2019-04-30 | 北京兴荣源科技有限公司 | A kind of manufacturing method of low cost niobium pipe target |
| CN109628899A (en) * | 2019-01-24 | 2019-04-16 | 苏州罗纳尔材料科技有限公司 | Rotate zinc-magnesium target and preparation method thereof |
| CN111778486A (en) * | 2019-04-04 | 2020-10-16 | 领凡新能源科技(北京)有限公司 | Rotating target material, and binding method and device for rotating target material |
| CN110804726A (en) * | 2019-10-25 | 2020-02-18 | 广西晶联光电材料有限责任公司 | Binding method of rotary target material |
| CN111014624A (en) * | 2019-12-19 | 2020-04-17 | 苏州金江铜业有限公司 | In-situ inter-cooling device for manufacturing hollow beryllium-aluminum alloy structure |
| CN111455326A (en) * | 2020-06-11 | 2020-07-28 | 中国航发航空科技股份有限公司 | Vacuum arc plating device for reducing target material cooling time |
| CN113463043A (en) * | 2021-06-09 | 2021-10-01 | 先导薄膜材料（广东）有限公司 | Preparation method of rotary target material |
| CN113463043B (en) * | 2021-06-09 | 2023-05-26 | 先导薄膜材料（广东）有限公司 | Preparation method of rotary target |
| CN114249301A (en) * | 2021-11-10 | 2022-03-29 | 砹尔法纽克莱(宁波)医疗科技有限公司 | Elution solution and preparation method of radionuclide astatine-211 for targeted nuclide drug |
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Application publication date: 20111130 |