CN109628899A - Rotate zinc-magnesium target and preparation method thereof - Google Patents

Rotate zinc-magnesium target and preparation method thereof Download PDF

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Publication number
CN109628899A
CN109628899A CN201910067522.6A CN201910067522A CN109628899A CN 109628899 A CN109628899 A CN 109628899A CN 201910067522 A CN201910067522 A CN 201910067522A CN 109628899 A CN109628899 A CN 109628899A
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China
Prior art keywords
zinc
magnesium
target
preparation
bushing pipe
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
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CN201910067522.6A
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Chinese (zh)
Inventor
曹兴民
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Suzhou Ronald Materials Technology Co Ltd
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Suzhou Ronald Materials Technology Co Ltd
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Priority to CN201910067522.6A priority Critical patent/CN109628899A/en
Publication of CN109628899A publication Critical patent/CN109628899A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C18/00Alloys based on zinc
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021Reactive sputtering or evaporation
    • C23C14/0036Reactive sputtering

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses rotation zinc-magnesium targets and preparation method thereof, are a kind of cylindrical structures comprising the metal liner of hollow tubular, and the target layer being coated on the bushing pipe periphery wall;The target layer is zinc magnesium alloy, wherein the weight percent of magnesium is 2 ~ 5%, remaining is zinc.Bond strength height of the present invention alloy material direct pouring on bushing pipe, with bushing pipe.Using the method poured under resistance furnace crucible, the oxidation scum of solution surface is avoided to enter mold, avoids the oxidizing fire of casting process magnesium elements.It can achieve exhaust deslagging in conjunction with the control of casting rate and cooling velocity using consecutive solidification method from bottom to top, avoid shrinkage cavity, solve the problems, such as the common deficiency of casting.

Description

Rotate zinc-magnesium target and preparation method thereof
Technical field
The present invention relates to a kind of rotation zinc-magnesium targets and preparation method thereof.
Background technique
Zinc oxide (ZnO) film is a kind of direct semiconductor material with wide forbidden band having wide application prospects, at room temperature forbidden band Width is about 3.37eV, exciton binding energy 60meV, has photoelectricity, photosensitive, piezoelectricity and the characteristics such as pressure-sensitive.With the depth of research Enter, finds appropriate doping and the change of preparation process, the characteristics such as the light, electricity, magnetic of film can be optimized to a certain extent, wherein ZnMgO film has unique advantage as a kind of emerging photoelectric material, and Mg doping can effectively adjust ZnO and MgO is formed Ternary compound Zn1-xMgxO forbidden bandwidth, and it improves to 85% or more the transmitance of visible light.Thus, ZnMgO film is with a wide range of applications in fields such as ultraviolet detector, flat-panel monitor, ultraviolet light emitting devices.ZnMgO is thin There are many kinds of the preparation methods of film, wherein reacting and splashing under argon gas appropriate and oxygen atmosphere by ZnMg bianry alloy target It penetrates, forms ZnMgO film on matrix, be a kind of preparation method that can be produced with large area.Plated film target divides shape to be plane Target and rotary target material, the utilization rate of planar targets is 30% or so, and the utilization rate of rotary target material is 80% or more.Rotary target material With utilization rate height, service life is long, reduces and changes the target time, and the uniform advantage of plated film.Therefore rotary target material is current And the preparation of a mainstream and usage mode of target later.
Summary of the invention
The present invention provides a kind of rotation zinc-magnesium target produced by the way of vacuum pressing and casting.
The technical solution of the present invention is to provide a kind of rotation zinc-magnesium targets, are a kind of cylindrical structures, it is characterised in that:
It includes the metal liner of hollow tubular, and the target layer being coated on the bushing pipe periphery wall;The target layer For zinc magnesium alloy, wherein the weight percent of magnesium is 2 ~ 5%, remaining is zinc.
Preferably, the length of the target layer is 500 ~ 4000mm, thickness 5mm ~ 20mm.
Preferably, the target layer is by way of casting on the bushing pipe.
Preferably, target layer both ends are provided with the sealing ring of annular protrusion.
The present invention also provides a kind of preparation methods comprising following steps:
1) blocky or powdery zinc under vacuum conditions, is added into smelting furnace, coverture, heating fusing, heating is then added Temperature is 450 ~ 750 DEG C;
2) blocky or powdery magnesium, heating fusing under vacuum conditions, is added, heating temperature is 450 ~ 750 DEG C;
3) it under vacuum conditions, stirs, so that zinc and magnesium are sufficiently mixed, obtains mixed molten liquid;
4) under vacuum conditions, bushing pipe is fixed in mold, the mixed molten liquid that step 3 is obtained cast in mold and bushing pipe it Between gap;
5) cooling, so that mixed molten liquid solidifies to form pipe;
6) appearance is processed, and by pipe after cooling, is required according to magnetron sputtering board size, is utilized lathe process outer diameter and both ends Sealing ring.
Preferably, it in the step 4), casts from mold bottom injection mixed molten liquid;Raising speed on die casting melt Degree is 400 ~ 500mm/ minutes;450 ~ 550 DEG C of cast temperature.
Preferably, it in the step 5), puts water mist cooler into bushing pipe bottom, water mist cooler is driven by motor under It moves up, cooling obtains pipe;Water mist cooler is promoted 200 ~ 500mm/ of speed minutes.
Preferably, the mold is cast iron die.
Preferably, the smelting furnace pours the resistance furnace of formula under being.
The present invention uses unique technique, high with the bond strength of bushing pipe alloy material direct pouring on bushing pipe, energy Biggish sputter coating power is born, plating membrane efficiency is improved, is that other production technologies are unable to reach.As compo pipe merogenesis Weld the method being bundled on bushing pipe.Using the method poured under resistance furnace crucible, the oxidation scum of solution surface is avoided to enter mould Tool, avoids the oxidizing fire of casting process Mg element.Using consecutive solidification method from bottom to top, in conjunction with casting rate and cooling The control of speed can achieve exhaust deslagging, avoid shrinkage cavity, solves the problems, such as the common deficiency of casting.
Detailed description of the invention
Fig. 1 is the schematic cross-sectional view of the rotation zinc-magnesium target of preferred embodiment;
Fig. 2 is the structural schematic diagram of preparation method of the invention.
Specific embodiment
A specific embodiment of the invention is described in further detail below.
As depicted in figs. 1 and 2, rotation zinc-magnesium target of the invention is cylindrical structure, the metal including hollow tubular Bushing pipe 10, and the target layer 12 being coated on 10 periphery wall of bushing pipe;Target layer 12 is zinc magnesium alloy, wherein the weight of magnesium Measuring percentage is 2 ~ 5%, remaining is zinc.Target layer outer wall is by machining, to meet the requirement of outer diameter and surface roughness, And target layer both ends are provided with the sealing ring 14 of annular protrusion, for installing and sealing.
The present invention is by the way of vacuum pressing and casting, production rotation zinc-magnesium target.
Rotate zinc-magnesium target production preparation flow by the vacuum melting of zinc-magnesium bianry alloy, die casting, water mist cooling, Appearance is processed four parts and is constituted.
1) alloy melting
Alloy composition Mg2 ~ 5wt%, remaining is Zn.Smelting furnace 16 pours the resistance furnace of formula under being, blocked down pour with stopper 18 first Mouthful.Zn is first added in melting, and coverture is added, after fusing, adds Mg.After being completely melt, stir evenly.Rotating piston bastinade, which is opened, to be poured Geat controls casting rate.450 ~ 750 DEG C of smelting temperature.
2) die casting
Using cast iron die 22, in 10 fixing mould 22 of bushing pipe, melt is flowed between cast iron die 22 and bushing pipe 10 by running channel 20 Gap to form pipe to solidify.
To avoid casting pipe there are stomata, achieve the purpose that be vented deslagging, die casting is injected by 22 bottom of mold Process.The casting melt rate of climb of mold 22 is 400 ~ 500mm/ minutes.It is arranged heat block 24 outside mold 22, to ensure to pour 450 ~ 550 DEG C of temperature of casting.
3) cooling
Using water spray cooling mode from bottom to top, achieve the purpose that consecutive solidification, prevents the formation of shrinkage cavity.Water mist is cooling first Device (not shown) puts 10 inner hole bottom of bushing pipe into, is driven by motor and moves from bottom to top, cooling product.Water mist cooler promotes speed Degree 200 ~ 500mm/ minutes.
4) appearance is processed
The casting pipe cast is required according to magnetron sputtering board size, processes outer diameter and both ends installation, seal groove.Target 500 ~ 4000mm of length, thickness 5mm ~ 20mm.
Above embodiments are only the one such embodiment of the present invention, and the description thereof is more specific and detailed, but can not Therefore limitations on the scope of the patent of the present invention are interpreted as.It should be pointed out that for those of ordinary skill in the art, Without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to protection model of the invention It encloses.Therefore, the scope of protection of the patent of the invention shall be subject to the appended claims.

Claims (9)

  1. It is a kind of cylindrical structure 1. rotating zinc-magnesium target, it is characterised in that:
    It includes the metal liner of hollow tubular, and the target layer being coated on the bushing pipe periphery wall;The target layer For zinc magnesium alloy, wherein the weight percent of magnesium is 2 ~ 5%, remaining is zinc.
  2. 2. rotation zinc-magnesium target according to claim 1, it is characterised in that:
    The length of the target layer is 500 ~ 4000mm, thickness 5mm ~ 20mm.
  3. 3. rotation zinc-magnesium target according to claim 1, it is characterised in that:
    The target layer is by way of casting on the bushing pipe.
  4. 4. rotation zinc-magnesium target according to claim 1, it is characterised in that: target layer both ends are provided with convex annular Sealing ring out.
  5. 5. according to claim 1 to the preparation method of 4 one of them rotation zinc-magnesium target, which is characterized in that it includes Following steps:
    1) blocky or powdery zinc under vacuum conditions, is added into smelting furnace, coverture, heating fusing, heating is then added Temperature is 450 ~ 750 DEG C;
    2) blocky or powdery magnesium, heating fusing under vacuum conditions, is added, heating temperature is 450 ~ 750 DEG C;
    3) it under vacuum conditions, stirs, so that zinc and magnesium are sufficiently mixed, obtains mixed molten liquid;
    4) under vacuum conditions, bushing pipe is fixed in mold, the mixed molten liquid that step 3 is obtained cast in mold and bushing pipe it Between gap;
    5) cooling, so that mixed molten liquid solidifies to form pipe;
    6) appearance is processed, and by pipe after cooling, is required according to magnetron sputtering board size, is utilized lathe process outer diameter and both ends Sealing ring.
  6. 6. preparation method according to claim 5, it is characterised in that: in the step 4), inject and mix from mold bottom Melt is cast;The die casting melt rate of climb is 400 ~ 500mm/ minutes;450 ~ 550 DEG C of cast temperature.
  7. 7. preparation method according to claim 5, it is characterised in that: in the step 5), put water mist cooler into lining Bottom of the tube is driven by motor water mist cooler and moves from bottom to top, and cooling obtains pipe;Water mist cooler promotion speed 200 ~ 500mm/ minutes.
  8. 8. preparation method according to claim 5, it is characterised in that: the mold is cast iron die.
  9. 9. preparation method according to claim 5, it is characterised in that: the smelting furnace pours the resistance furnace of formula under being.
CN201910067522.6A 2019-01-24 2019-01-24 Rotate zinc-magnesium target and preparation method thereof Pending CN109628899A (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113463043A (en) * 2021-06-09 2021-10-01 先导薄膜材料(广东)有限公司 Preparation method of rotary target material
CN113862619A (en) * 2021-09-08 2021-12-31 先导薄膜材料(广东)有限公司 Zinc-magnesium target material and preparation method thereof
CN114481053A (en) * 2022-01-25 2022-05-13 北京安泰六九新材料科技有限公司 Magnesium-zinc-aluminum-nickel-vanadium alloy target material and manufacturing method thereof
CN114472807A (en) * 2022-01-11 2022-05-13 先导薄膜材料(广东)有限公司 Casting device and casting method for tin metal rotary target
CN115595539A (en) * 2022-09-15 2023-01-13 先导薄膜材料(广东)有限公司(Cn) Zinc-magnesium target material and preparation method thereof

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CN1196806C (en) * 2000-12-19 2005-04-13 W.C.贺利氏股份有限两合公司 Manufacture of tubular targets
CN101221830A (en) * 2007-12-14 2008-07-16 浙江大学 Electrically conducting transparent film and its preparing process
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CN203741407U (en) * 2014-02-11 2014-07-30 广州市尤特新材料有限公司 Magnetron sputtering rotating target
CN104032271A (en) * 2014-06-20 2014-09-10 江阴恩特莱特镀膜科技有限公司 Mold and method for producing copper-zinc-tin rotary target
CN204224696U (en) * 2014-11-13 2015-03-25 深圳市众诚达应用材料科技有限公司 Magnetron sputtering rotary target material
CN104498877A (en) * 2014-12-15 2015-04-08 中国钢研科技集团有限公司 Zinc-magnesium alloy coating and preparation method thereof
CN204281849U (en) * 2014-09-12 2015-04-22 安泰科技股份有限公司 Rotary target material
CN104907539A (en) * 2015-05-13 2015-09-16 基迈克材料科技(苏州)有限公司 Continuous casting technology of belt material aluminum pipe and aluminum alloy rotating target materials
CN108411261A (en) * 2018-05-31 2018-08-17 米亚索乐装备集成(福建)有限公司 A kind of target processing method and a kind of bone shape target
CN108559952A (en) * 2018-04-27 2018-09-21 天津大学 A kind of preparation method of Mg/Zn graded alloy

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* Cited by examiner, † Cited by third party
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CN1196806C (en) * 2000-12-19 2005-04-13 W.C.贺利氏股份有限两合公司 Manufacture of tubular targets
CN101484605A (en) * 2006-06-02 2009-07-15 贝卡尔特先进涂层公司 Rotatable sputter target
CN101221830A (en) * 2007-12-14 2008-07-16 浙江大学 Electrically conducting transparent film and its preparing process
CN102265376A (en) * 2008-10-24 2011-11-30 应用材料股份有限公司 Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a tar
CN102260847A (en) * 2010-05-27 2011-11-30 苏州晶纯新材料有限公司 Metal rotating target material with low melting point and production technology
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CN108559952A (en) * 2018-04-27 2018-09-21 天津大学 A kind of preparation method of Mg/Zn graded alloy
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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113463043A (en) * 2021-06-09 2021-10-01 先导薄膜材料(广东)有限公司 Preparation method of rotary target material
CN113463043B (en) * 2021-06-09 2023-05-26 先导薄膜材料(广东)有限公司 Preparation method of rotary target
CN113862619A (en) * 2021-09-08 2021-12-31 先导薄膜材料(广东)有限公司 Zinc-magnesium target material and preparation method thereof
CN113862619B (en) * 2021-09-08 2023-10-17 先导薄膜材料(广东)有限公司 Zinc-magnesium target material and preparation method thereof
CN114472807A (en) * 2022-01-11 2022-05-13 先导薄膜材料(广东)有限公司 Casting device and casting method for tin metal rotary target
CN114481053A (en) * 2022-01-25 2022-05-13 北京安泰六九新材料科技有限公司 Magnesium-zinc-aluminum-nickel-vanadium alloy target material and manufacturing method thereof
CN114481053B (en) * 2022-01-25 2024-01-19 北京安泰六九新材料科技有限公司 Magnesium zinc aluminum nickel vanadium alloy target and manufacturing method thereof
CN115595539A (en) * 2022-09-15 2023-01-13 先导薄膜材料(广东)有限公司(Cn) Zinc-magnesium target material and preparation method thereof

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