CN102256429A - 用于euv光源的集光器 - Google Patents
用于euv光源的集光器 Download PDFInfo
- Publication number
- CN102256429A CN102256429A CN2011100945746A CN201110094574A CN102256429A CN 102256429 A CN102256429 A CN 102256429A CN 2011100945746 A CN2011100945746 A CN 2011100945746A CN 201110094574 A CN201110094574 A CN 201110094574A CN 102256429 A CN102256429 A CN 102256429A
- Authority
- CN
- China
- Prior art keywords
- lithium
- euv
- light
- source
- reflecting surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000000463 material Substances 0.000 claims abstract description 45
- 239000012634 fragment Substances 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 31
- 230000004888 barrier function Effects 0.000 claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims description 66
- 230000005855 radiation Effects 0.000 claims description 27
- 229910052799 carbon Inorganic materials 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 11
- 239000011737 fluorine Substances 0.000 claims description 7
- 229910052731 fluorine Inorganic materials 0.000 claims description 7
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 6
- 150000004767 nitrides Chemical class 0.000 claims description 4
- 238000011010 flushing procedure Methods 0.000 claims description 3
- 230000008439 repair process Effects 0.000 claims description 2
- 239000007800 oxidant agent Substances 0.000 claims 4
- 230000001590 oxidative effect Effects 0.000 claims 3
- 229920002120 photoresistant polymer Polymers 0.000 claims 3
- 229910052744 lithium Inorganic materials 0.000 abstract description 129
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract description 110
- 229910052750 molybdenum Inorganic materials 0.000 abstract description 67
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 abstract description 62
- 239000011733 molybdenum Substances 0.000 abstract description 59
- 229910052734 helium Inorganic materials 0.000 abstract description 47
- 239000001307 helium Substances 0.000 abstract description 45
- 239000007789 gas Substances 0.000 abstract description 30
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 abstract description 19
- 238000004544 sputter deposition Methods 0.000 abstract description 14
- 230000007246 mechanism Effects 0.000 abstract description 13
- 238000001704 evaporation Methods 0.000 abstract description 6
- 150000001875 compounds Chemical class 0.000 abstract description 4
- 230000006698 induction Effects 0.000 abstract description 4
- 230000000717 retained effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 96
- 150000002500 ions Chemical class 0.000 description 35
- -1 boryl compound Chemical class 0.000 description 28
- 229910052710 silicon Inorganic materials 0.000 description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 24
- 239000010703 silicon Substances 0.000 description 21
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 18
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 18
- 230000004941 influx Effects 0.000 description 17
- 150000002641 lithium Chemical group 0.000 description 17
- 238000002310 reflectometry Methods 0.000 description 17
- 125000004429 atom Chemical group 0.000 description 16
- 238000009826 distribution Methods 0.000 description 14
- 229910001416 lithium ion Inorganic materials 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 11
- 229910052724 xenon Inorganic materials 0.000 description 11
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 11
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 10
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 9
- 229910052786 argon Inorganic materials 0.000 description 9
- 229910052707 ruthenium Inorganic materials 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 230000010354 integration Effects 0.000 description 8
- 238000009304 pastoral farming Methods 0.000 description 8
- 229910016006 MoSi Inorganic materials 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 6
- 230000006835 compression Effects 0.000 description 6
- 238000007906 compression Methods 0.000 description 6
- 230000007797 corrosion Effects 0.000 description 6
- 238000005260 corrosion Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 230000005284 excitation Effects 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010606 normalization Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 5
- 238000001514 detection method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000002642 lithium compounds Chemical class 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 101100456571 Mus musculus Med12 gene Proteins 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 4
- 230000004907 flux Effects 0.000 description 4
- 230000006870 function Effects 0.000 description 4
- 239000011229 interlayer Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 230000011514 reflex Effects 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910017305 Mo—Si Inorganic materials 0.000 description 3
- 238000002679 ablation Methods 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 229910052580 B4C Inorganic materials 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- 241001347978 Major minor Species 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001900 extreme ultraviolet lithography Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 150000002371 helium Chemical class 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- GALOTNBSUVEISR-UHFFFAOYSA-N molybdenum;silicon Chemical compound [Mo]#[Si] GALOTNBSUVEISR-UHFFFAOYSA-N 0.000 description 2
- 125000004433 nitrogen atom Chemical group N* 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000931526 Acer campestre Species 0.000 description 1
- 241001279686 Allium moly Species 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 235000017899 Spathodea campanulata Nutrition 0.000 description 1
- 229910006249 ZrSi Inorganic materials 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 230000005264 electron capture Effects 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N ferric oxide Chemical compound O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000005040 ion trap Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000243 photosynthetic effect Effects 0.000 description 1
- 239000006187 pill Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 230000011664 signaling Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 150000003438 strontium compounds Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910001432 tin ion Inorganic materials 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
Images
Abstract
Description
Claims (15)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/409,254 | 2003-04-08 | ||
US10/409,254 US6972421B2 (en) | 2000-06-09 | 2003-04-08 | Extreme ultraviolet light source |
US10/798,740 | 2004-03-10 | ||
US10/798,740 US7217940B2 (en) | 2003-04-08 | 2004-03-10 | Collector for EUV light source |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2004800093424A Division CN1771072B (zh) | 2003-04-08 | 2004-04-07 | 用于euv光源的集光器 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN102256429A true CN102256429A (zh) | 2011-11-23 |
CN102256429B CN102256429B (zh) | 2015-01-14 |
Family
ID=43933164
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201110094574.6A Expired - Fee Related CN102256429B (zh) | 2003-04-08 | 2004-04-07 | 一种修复euv光源集光器的方法及装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5006977B2 (zh) |
CN (1) | CN102256429B (zh) |
TW (1) | TWI299505B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108029186A (zh) * | 2015-08-12 | 2018-05-11 | Asml荷兰有限公司 | 经由激光能量调制来稳定液滴-等离子体相互作用的系统和方法 |
CN109718480A (zh) * | 2019-03-05 | 2019-05-07 | 北京中百源国际科技创新研究有限公司 | 一种激光离子癌症治疗装置 |
CN110658694A (zh) * | 2018-06-28 | 2020-01-07 | 台湾积体电路制造股份有限公司 | 用于极紫外光辐射源设备的极紫外光收集器反射镜及极紫外光辐射源设备 |
CN113721043A (zh) * | 2021-08-31 | 2021-11-30 | 西安交通大学 | 一种基于阵列线激光的sicm扫描系统及方法 |
CN113791523A (zh) * | 2016-01-21 | 2021-12-14 | Asml荷兰有限公司 | 用于对euv容器和euv收集器进行靶材料碎片清洁的系统、方法和装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013135033A (ja) * | 2011-12-26 | 2013-07-08 | Gigaphoton Inc | 極端紫外光生成装置 |
EP2853139B1 (en) | 2012-05-21 | 2016-07-13 | ASML Netherlands B.V. | Radiation source |
KR102115543B1 (ko) | 2013-04-26 | 2020-05-26 | 삼성전자주식회사 | 극자외선 광원 장치 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
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US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
US20020084425A1 (en) * | 2001-01-03 | 2002-07-04 | Klebanoff Leonard E. | Self-cleaning optic for extreme ultraviolet lithography |
CN1390360A (zh) * | 1999-11-18 | 2003-01-08 | 西默股份有限公司 | 带有改进脉冲功率系统的等离子聚集光源 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3077422B2 (ja) * | 1992-11-05 | 2000-08-14 | 株式会社ニコン | X線露光装置 |
DE69817663T2 (de) * | 1997-04-23 | 2004-06-24 | Nikon Corp. | Optischer Belichtungsapparat und optisches Reinigungsverfahren |
WO2002052347A1 (en) * | 2000-12-21 | 2002-07-04 | Euv Limited Liability Corporation | Mitigation of radiation induced surface contamination |
JP3467485B2 (ja) * | 2001-07-18 | 2003-11-17 | 松下電器産業株式会社 | 軟x線縮小投影露光装置、軟x線縮小投影露光方法及びパターン形成方法 |
-
2004
- 2004-03-30 TW TW93108686A patent/TWI299505B/zh not_active IP Right Cessation
- 2004-04-07 CN CN201110094574.6A patent/CN102256429B/zh not_active Expired - Fee Related
-
2011
- 2011-03-22 JP JP2011062167A patent/JP5006977B2/ja not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6232613B1 (en) * | 1997-03-11 | 2001-05-15 | University Of Central Florida | Debris blocker/collector and emission enhancer for discharge sources |
CN1390360A (zh) * | 1999-11-18 | 2003-01-08 | 西默股份有限公司 | 带有改进脉冲功率系统的等离子聚集光源 |
US20020084425A1 (en) * | 2001-01-03 | 2002-07-04 | Klebanoff Leonard E. | Self-cleaning optic for extreme ultraviolet lithography |
Non-Patent Citations (1)
Title |
---|
王占山: "极紫外与软X射线非周期多层膜优化设计及初步研制", 《光学仪器》 * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108029186A (zh) * | 2015-08-12 | 2018-05-11 | Asml荷兰有限公司 | 经由激光能量调制来稳定液滴-等离子体相互作用的系统和方法 |
CN108029186B (zh) * | 2015-08-12 | 2021-12-24 | Asml荷兰有限公司 | 经由激光能量调制来稳定液滴-等离子体相互作用的系统和方法 |
CN113791523A (zh) * | 2016-01-21 | 2021-12-14 | Asml荷兰有限公司 | 用于对euv容器和euv收集器进行靶材料碎片清洁的系统、方法和装置 |
TWI774528B (zh) * | 2016-01-21 | 2022-08-11 | 荷蘭商Asml荷蘭公司 | 用於清理靶材碎片沈積物之euv光源 |
CN113791523B (zh) * | 2016-01-21 | 2024-04-09 | Asml荷兰有限公司 | 用于对euv容器和euv收集器进行靶材料碎片清洁的系统、方法和装置 |
CN110658694A (zh) * | 2018-06-28 | 2020-01-07 | 台湾积体电路制造股份有限公司 | 用于极紫外光辐射源设备的极紫外光收集器反射镜及极紫外光辐射源设备 |
CN110658694B (zh) * | 2018-06-28 | 2022-04-01 | 台湾积体电路制造股份有限公司 | 用于极紫外光辐射源设备的极紫外光收集器反射镜及极紫外光辐射源设备 |
US11513441B2 (en) | 2018-06-28 | 2022-11-29 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV radiation source apparatus for lithography |
CN109718480A (zh) * | 2019-03-05 | 2019-05-07 | 北京中百源国际科技创新研究有限公司 | 一种激光离子癌症治疗装置 |
CN113721043A (zh) * | 2021-08-31 | 2021-11-30 | 西安交通大学 | 一种基于阵列线激光的sicm扫描系统及方法 |
Also Published As
Publication number | Publication date |
---|---|
TWI299505B (en) | 2008-08-01 |
TW200504780A (en) | 2005-02-01 |
JP5006977B2 (ja) | 2012-08-22 |
CN102256429B (zh) | 2015-01-14 |
JP2011181935A (ja) | 2011-09-15 |
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Owner name: ASML NETHERLANDS B. V. Free format text: FORMER OWNER: CYMER INC. Effective date: 20150108 |
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Effective date of registration: 20150108 Address after: Horn, Holland Patentee after: ASML HOLLAND INC. Address before: American California Patentee before: CYMER, INC. |
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C56 | Change in the name or address of the patentee |
Owner name: ASML ASML NETHERLANDS B. V. Free format text: FORMER NAME: ASML NETHERLANDS B. V. |
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CP03 | Change of name, title or address |
Address after: Holland Weide Eindhoven Patentee after: ASML Holland Limited Address before: Horn, Holland Patentee before: ASML HOLLAND INC. |
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CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150114 Termination date: 20160407 |