CN102175594B - Device for measuring damage threshold under combined action of three-wavelength pulse laser and debugging method - Google Patents
Device for measuring damage threshold under combined action of three-wavelength pulse laser and debugging method Download PDFInfo
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- CN102175594B CN102175594B CN 201110045915 CN201110045915A CN102175594B CN 102175594 B CN102175594 B CN 102175594B CN 201110045915 CN201110045915 CN 201110045915 CN 201110045915 A CN201110045915 A CN 201110045915A CN 102175594 B CN102175594 B CN 102175594B
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Abstract
The invention discloses a device for measuring a damage threshold under the combined action of a three-wavelength pulse laser and a debugging method. The measuring device is used for separating the three-wavelength pulse laser, singly controlling energy and gathering light beams. And then a light beam coupling system which is matched with an optical distance of a light split system is used for ensuring the time synchronization of the three-wavelength. The method comprises the following steps: primarily aligning by utilizing an alignment laser, two light-transmitting diaphragms and a three-wavelength light beam; utilizing an on-line microscope to monitor the damage information of each wavelength laser to the sensitive photographic paper and calculating the central coordinates of the damage points generated on a measured sample by different wavelengths, by comparing and analyzing the images before and after being radiated with lasers; and referring the central coordinates, and successively adjusting the light spot information of each wavelength till superposing the three-wavelength light spot centers.
Description
Technical field
The present invention relates to optical element resisting laser damage performance test field, particularly three wavelength pulse laser is realized the measurement of optic element damage threshold value under the acting in conjunction of different wave length laser in the method for adjustment of time and spatial synchronization.
Background technology
In the light laser application, frequency multiplication and frequency tripling resolution element all are to use under the acting in conjunction of multi-wavelength, Harmonic beam splitter particularly, irradiation when often being subject to three wavelength pulse laser, its optical property and resisting laser damage properties influence the normal operation of whole system.Therefore, resisting laser damage performance, understanding three-wavelength laser action mechanism and the Coupling Damage mechanism under the research three-wavelength pulse laser while irradiation is one of important content of high damage threshold thin film study.Current, the damage performance of optical element under single wavelength effect launched further investigation both at home and abroad, set up corresponding detection codes and standards according to different application demands, progressively pay close attention at present the simultaneously evaluation of the detection of illuminated optical film damage performance of dual-wavelength laser, but also do not acting on simultaneously the relevant report of lower optic element damage performance study both at home and abroad about three-wavelength laser.In addition, also be current technical barrier for the synchronous coupling adjustment of three-wavelength high power pulsed laser, for the Nd:YAG laser instrument, in fundamental frequency omega
1, frequency multiplication ω
2With frequency tripling ω
3During the damage threshold of laser was measured, for the output energy of each wavelength of balance, three wavelength were at 1/e
2The spot diameter at place is generally 0.25～0.45mm, and it is spatially synchronous as much as possible in order to guarantee three wavelength lasers, need to be with light beam 90% peak power area coincidence, guaranteeing that peak power separately can both act on same position, thereby realize truly three-wavelength irradiation simultaneously.Therefore and the spot diameter at light beam 90% peak power place is approximately 50～100 μ m, require the degree of regulation of coaxial coupling＜50 μ m, and the uncertainty of Nd:YAG pulsed laser spot position is about 20 μ m, and this has also significantly increased the difficulty of light beam regulation.
Current, regulating the coaxial coupled method of multi-wavelength all is to adopt the CCD camera directly to record the facula position of each wavelength usually, then adopts stepper motor or other device for precisely regulating that facula position is finely tuned, and overlaps to realize the multi-wavelength light beam.But because the laser of high power density can directly damage the CCD camera, therefore need to increase a plurality of high reflecting elements and neutral density attenuator and decay laser energy with protection CCD camera.But a plurality of high reflector plates are different to the refraction side-play amount of different wave length with the neutral density attenuator, can cause actual departing from after element is removed; What is more important, the attenuator of differential declines multiple is different to the transmitance of different wave length, with fundamental frequency omega
1With frequency tripling ω
3Be example, can reach 10
3And more than, force different wave length to need the attenuating elements of varying number; In addition, this debugging enironment and the difference that true applied environment exists have all significantly increased measuring error.
Summary of the invention
The present invention provides a kind of device for measuring damage threshold under combined action of three-wavelength pulse laser and Method of Adjustment in order to solve the deficiency of above-mentioned technology, and namely three-wavelength pulse laser is in the method for adjustment of time and spatial synchronization.
For reaching above purpose, solution of the present invention is:
A kind of device for measuring damage threshold under combined action of three-wavelength pulse laser, it comprises: be arranged in order in light path
Main laser is for generation of the laser beam of three different wave lengths;
Beam splitting system is for the laser beam that the laser beam of three wavelength is separated into three single wavelength;
Energy regulating system is used for the energy of the laser beam of each single wavelength of independent regulation;
Whether automatically controlled shutter is for passing through of the laser beam of independently controlling each single wavelength;
Condenser lens is used for independence to the focusing of the laser beam of each single wavelength;
The light beam coupling system is used for the laser beam of single wavelength is mixed;
Collimation laser and logical light diaphragm are used for mixed laser beam is tentatively collimated;
The pulse width detection system is for detection of the pulse width of each wave length laser beams;
Energy detection system is for detection of the energy of each wave length laser beams;
The beam quality analysis system is for detection of the beam quality of each wave length laser beams;
Sample monitoring and grasping system are used for clamping and detect the information of the hot spot of the impaired loci that sample produces after by the pulse laser irradiation after collimating.
Further, described main laser comprises: be arranged in order in light path
The first laser instrument produces the basic frequency laser light beam;
/ 2nd wave plates, the direction of vibration of change basic frequency beam linearly polarized light;
Frequency multiplication and frequency tripling crystal, basic frequency beam produce frequency multiplication and frequency tripled laser behind frequency multiplication and frequency tripling crystal.
Described beam splitting system comprises: be arranged in order in light path
The double-frequency laser light beam separation unit is isolated the double-frequency laser light beam from the laser beam of different wave length;
The frequency tripled laser light beam separation unit is isolated the frequency tripled laser light beam from the laser beam of different wave length.
Described energy regulating system, automatically controlled shutter, condenser lens and light beam coupling system are arranged at respectively on the light path of laser beam of each single wavelength, and wherein, energy regulating system comprises 1/2nd wave plates and polarization spectro element.
The light path of described light beam coupling system and beam splitting system is complementary.
Described sample is controlled by motorized precision translation stage; Described sample is detected in real time by online microscope.
Described pulse width detection system adopts photodiode and oscillograph monitoring, to detect and to judge whether the light beam of three wavelength is synchronous in time; Described energy detection system adopts the energy meter monitoring; Described beam quality analysis system adopts the monitoring of hot spot analyser.
Described logical light diaphragm is two.
The different wave length bundle is converged by different focus lens group respectively, changes the relative position of focus lens group, can change arbitrarily different wave length at the spot diameter of measurement point, is implemented in the adjusting of the lower different optical maser wavelength maximum energy-density of identical energy output.
Utilize above-mentioned measurement mechanism to carry out the method for optical path adjusting, comprise the following steps:
1. sample is placed in the measuring position, by online microscope alignment sample, adopts dark ground illumination, pictures taken;
2. after the laser irradiation, sample produces the impaired loci corresponding with facula information, adopts the picture after online microscope photographing sample damages;
3. by the picture before and after the laser irradiation is compared, processes, calculate the center of impaired loci, determine Position of Laser-Spot Center with this;
4. obtain successively three wavelength pulse laser spot center position separately, utilize motorized precision translation stage that sample is moved to reposition before each the measurement;
5. take the center of minimal wave length laser as reference, regulate respectively the light beam coupling system, successively control the in addition centers of two bundle laser beams with this, until and the center of minimal wave length laser overlap.
Described sample is photographic paper.
Owing to adopted such scheme, the present invention has following characteristics: the present invention proposes device for measuring damage threshold under combined action of three-wavelength pulse laser, three-wavelength laser can be in time with the space on synchronously, by to the converging separately of the independent control of three-wavelength energy, light beam, can regulate arbitrarily different wave length in spot diameter and the energy density ratio of measurement point; The invention allows for the method for adjustment of the coaxial coupling of a kind of three-wavelength pulse laser light beam, by the Treatment Analysis to impaired loci image after the laser irradiation, can obtain the coordinate of different wave length beam center, and regulate, until overlap, realized under the measurement environment of reality, the three-wavelength facula position directly being regulated.
Description of drawings
Fig. 1 is the synoptic diagram of damage threshold under combined action of three-wavelength pulse laser proving installation of the present invention.
Before Fig. 2 (a) is laser irradiation, the picture that the measuring position of sample is taken under details in a play not acted out on stage, but told through dialogues.
After Fig. 2 (b) is laser irradiation, the picture that the measuring position of sample is taken under details in a play not acted out on stage, but told through dialogues.
Fig. 2 (c) is Fig. 2 (a) and Fig. 2 (b) comparative analysis, carries out image and processes.
Fig. 2 (d) is through calculating, obtaining the centre coordinate O of impaired loci
3
Embodiment
The present invention is further illustrated below in conjunction with the accompanying drawing illustrated embodiment.
Consult Fig. 1, device for measuring damage threshold under combined action of three-wavelength pulse laser,
It is included in the first laser instrument 1 that is arranged in order on the light path, produces basic frequency beam;
/ 2nd wave plates 2, change the direction of vibration of basic frequency beam linearly polarized light, regulate 1/2nd wave plates 2 and will change basic frequency laser through frequency multiplication and frequency tripling conversion efficiency behind frequency multiplication and the frequency tripling crystal 3, can obtain fundamental frequency, frequency multiplication and the frequency tripled laser of different maximum output energies by regulating 1/2nd wave plates 2;
Frequency multiplication and frequency tripling crystal 3, basic frequency beam produce frequency multiplication and frequency tripled laser behind frequency multiplication and frequency tripling crystal 3;
Frequency tripled laser wave beam separative element, comprise the high reflective film 6 of the high reflection of frequency tripled laser, fundamental frequency and double-frequency laser antireflection film 4 and frequency tripled laser, the high reflection of frequency tripled laser, fundamental frequency and double-frequency laser antireflection film 4 are Harmonic beam splitter, allow the high reflection of frequency tripled laser but fundamental frequency and double-frequency laser antireflection, can be with frequency tripled laser and other two wavelength separated out; The high reflective film 6 of frequency tripled laser allows the frequency tripled laser yawing moment;
Double-frequency laser wave beam separative element, comprise the high reflective film 7 of the high reflection of double-frequency laser, fundamental frequency and frequency tripled laser antireflection film 5 and double-frequency laser, the high reflection of double-frequency laser, fundamental frequency and frequency tripled laser antireflection film 5 are the frequency multiplication diffusion barrier, allow the high reflection of double-frequency laser but fundamental frequency and frequency tripled laser antireflection, can be with double-frequency laser and other two wavelength separated out; The high reflective film 7 of double-frequency laser allows the double-frequency laser yawing moment;
Energy regulating system comprises 1/2nd wave plate 8-1,8-2,8-3 and polarization spectro element 9-1,9-2,9-3, is arranged at respectively on the light path of fundamental frequency, frequency multiplication and frequency tripling light beam the energy of each wavelength laser of independent regulation;
Automatically controlled shutter 10-1,10-2,10-3 are arranged at respectively on fundamental frequency, frequency multiplication and the frequency tripling light path, can independently control each wavelength laser and whether pass through;
Condenser lens 11-1,11-2,11-3 are arranged at respectively on fundamental frequency, frequency multiplication and the frequency tripling light path, independent each light beam are focused on, and dwindling spot diameter, thereby improve the energy density of laser;
Basic frequency laser high-reflecting film 13-1, the high reflection of double-frequency laser, the high reflection of fundamental frequency and frequency tripled laser antireflection film 13-2 and frequency tripling, fundamental frequency and double-frequency laser antireflection film 13-3, be arranged at respectively fundamental frequency, on frequency multiplication and the frequency tripling light path, with fundamental frequency, frequency multiplication and frequency tripled laser mix, wherein, the high reflection of basic frequency laser high-reflecting film 13-1 and double-frequency laser, the distance of fundamental frequency and frequency tripled laser antireflection film 13-2 and the high reflection of double-frequency laser, the distance of fundamental frequency and frequency tripled laser antireflection film 5 and the high reflective film 7 of double-frequency laser is equidistant, the high reflection of basic frequency laser high-reflecting film 13-1 and frequency tripling, the distance of fundamental frequency and double-frequency laser antireflection film 13-3 and the high reflection of frequency tripled laser, the distance of fundamental frequency and double-frequency laser antireflection film 4 and the high reflective film 6 of frequency tripled laser is equidistant;
Collimation laser 12 and diaphragm 14-1,14-2 tentatively collimate mixed laser, adopt two diaphragms to limit the diminishing focused beam of spot diameter at diverse location, improve the collimation precision;
The high reflective film 15-1 of three-wavelength laser, photodiode 16 and oscillograph 17, three wavelength lasers of fundamental frequency, frequency multiplication and frequency tripling after the high reflective film 15-1 of three-wavelength laser will tentatively collimate reflect, and with three beam deflection directions, photodiode 16 and oscillograph 17 detections are measured the pulse width of each wavelength laser by the small part light beam of the high reflective film 15-1 of three-wavelength laser transmission;
Prism wedge 18-1, neutral density attenuator 19, the high reflective film 15-2 of three-wavelength laser and hot spot analyser 21, prism wedge 18-1 goes out sub-fraction laser with the three-wavelength separation by laser in the light path, carries out the measurement of optical quality; Neutral density attenuator 19 is energy of the sub-fraction laser separated by prism wedge 18-1 of decay, enters into hot spot analyser 21 with less energy; The high reflective film 15-2 of three-wavelength laser will reflect through three wavelength lasers of fundamental frequency, frequency multiplication and the frequency tripling of neutral density attenuator 19 decay; 21 pairs of laser through the high reflective film 15-2 reflection of three-wavelength laser of hot spot analyser carry out beam quality and detect;
Prism wedge 18-2 and energy meter 20, prism wedge 18-2 are that the laser that prism wedge 18-1 separates is isolated sub-fraction laser again, carry out the measurement of energy; 20 pairs of energy meters carry out energy measuring through the isolated laser of prism wedge 18-2;
Sample 22, motorized precision translation stage 23 and online microscope 24, sample 22 places on the motorized precision translation stage 23, thereby can regulate the position of sample 22, simultaneously, through the isolated laser emission of prism wedge 18-2 on sample 22, and the damage image that has online microscope 24 to take sample 22 under the different wave length effects; Wherein, prism wedge 18-1 is to the distance of sample 22, with prism wedge 18-1 through neutral density attenuator 19, equidistant to the distance of hot spot analyser 21 through the high reflective film 15-2 of three-wavelength laser;
Computing machine 25 receives the damage pictorial information of laser pulse width, optical quality, beam energy and microscope photographing, and processes.
The adjustment scheme of three-wavelength pulse laser time synchronized is as follows:
The basic frequency beam that described the first laser instrument 1 produces passes through frequency multiplication and frequency tripling crystal 3 at first through 1/2nd wave plates 2, produces frequency multiplication and frequency tripled laser, and this moment, three-wavelength laser mixed, and is synchronous in time.The high reflection of frequency tripled laser, fundamental frequency and the high reflection of double-frequency laser antireflection film 4 and double-frequency laser, fundamental frequency and frequency tripled laser antireflection film 5 separate to realize respectively the independent control of each wavelength with double-frequency laser to frequency tripling, and utilize different focus lens group that light beam is focused on; The light beam coupling system (comprises basic frequency laser high-reflecting film 13-1, the high reflection of double-frequency laser, the high reflection of fundamental frequency and frequency tripled laser antireflection film 13-2 and frequency tripling, fundamental frequency and double-frequency laser antireflection film 13-3) again three-wavelength laser is mixed, the high reflection of basic frequency laser high-reflecting film 13-1 and double-frequency laser, the distance of fundamental frequency and frequency tripled laser antireflection film 13-2 and the high reflection of double-frequency laser, the distance of fundamental frequency and frequency tripled laser antireflection film 5 and the high reflective film 7 of double-frequency laser is equidistant, the high reflection of basic frequency laser high-reflecting film 13-1 and frequency tripling, the distance of fundamental frequency and double-frequency laser antireflection film 13-3 and the high reflection of frequency tripled laser, the distance of fundamental frequency and double-frequency laser antireflection film 4 and the high reflective film 6 of frequency tripled laser is equidistant, this moment, three-wavelength light beam light path was identical, realized time synchronized.
The checking means: can utilize the pulsewidth of 16 pairs of three-wavelength light beams of photodiode of super fast response to measure simultaneously, if the pulsewidth center overlaps, then pulsewidth curve rule, round and smoothly be approximate Gaussian distribution, prove the three-wavelength time synchronized; If depart from the pulsewidth center, then image is irregular a multi-peaks structure, and three-wavelength time this moment fails synchronously, needs further adjusting.
Consult first Fig. 1, the adjustment scheme of the coaxial coupling of three-wavelength pulse laser light beam is as follows:
Preliminary collimation: three-wavelength mixes through the light beam coupling system, by collimation laser, two logical light diaphragms, is tentatively collimated before the high reflective film 15-1 of three-wavelength laser.
Consult Fig. 2, precise alignment: the damage image that adopts online microscope 24 to take sample 22 under the different wave length effect, by picture being processed the facula position that calculates each impaired loci, regulate respectively basic frequency laser high-reflecting film 13-1, the high reflection of double-frequency laser, fundamental frequency and frequency tripled laser antireflection film 13-2 and the high reflection of frequency tripling, fundamental frequency and double-frequency laser antireflection film 13-3, until the facula position of three wavelength overlaps.
Concrete steps are as follows:
1. sample 22 is fixed on motorized precision translation stage 23, online microscope 24 is aimed at the position of pulse laser irradiation sample 22, adopts dark ground illumination, and pictures taken before laser irradiation is such as Fig. 2 a;
2. the energy density of frequency tripling light beam is modulated suitable numerical value, irradiation sample 22, the impaired loci of generation certain size, pictures taken is such as Fig. 2 b;
3. Fig. 2 b and Fig. 2 a are subtracted each other, carry out afterwards the picture processings such as filtering, gray scale adjusting, binaryzation, obtain picture, such as Fig. 2 c.And calculate the center O of impaired loci according to formula (1) and (2)
3, such as Fig. 2 d;
(X, Y) is the coordinate of each position of picture, and z is the pixel value of each position.
4. similarly, with the suitable numerical value of the energy density of frequency multiplication light beam modulation, irradiation sample 22 produces the impaired loci of certain size, and picture is carried out Treatment Analysis, calculates impaired loci center O
2
5. with O
3Be reference, regulate the relative position of the high reflection of double-frequency laser, fundamental frequency and frequency tripled laser antireflection film 13-2, utilize motorized precision translation stage 23 to move sample 22 to reposition after each the adjusting, 4. repeating step obtains the centre coordinate of current impaired loci position, until the O that newly calculates
2And O
3Overlap or reach in the error range of permission, then stop the adjusting of frequency multiplication light beam;
6. same, with the suitable numerical value of the energy density of basic frequency beam modulation, irradiation sample 22 produces the impaired loci of certain size, and picture is carried out Treatment Analysis, calculates impaired loci center O
1
7. with O
3Be reference, regulate the relative position of basic frequency laser high-reflecting film 13-1, utilize motorized precision translation stage 23 to move sample 22 to reposition after each the adjusting, 6. repeating step obtains the centre coordinate of current impaired loci position, until the O that newly calculates
1And O
3Overlap or reach in the error range of permission, then stop the adjusting of basic frequency beam;
8. the laser of three wavelength irradiation sample 22 simultaneously, the impaired loci that produces is carried out Treatment Analysis, if there is hot spot irregular or a plurality of light spot shapes occur, then 4.～7. repeating step is regulated the facula position of frequency multiplication and fundamental frequency, until overlap, regulate and finish.Here sample is the photographic paper of record impaired loci information.
The above-mentioned description to embodiment is can understand and apply the invention for ease of those skilled in the art.The person skilled in the art obviously can easily make various modifications to these embodiment, and needn't pass through performing creative labour being applied in the General Principle of this explanation among other embodiment.Therefore, the invention is not restricted to the embodiment here, those skilled in the art should be within protection scope of the present invention for improvement and modification that the present invention makes according to announcement of the present invention.
Claims (9)
1. device for measuring damage threshold under combined action of three-wavelength pulse laser, it is characterized in that: it comprises: be arranged in order in light path
Main laser is for generation of the laser beam of three different wave lengths;
Beam splitting system is for the laser beam that the laser beam of three wavelength is separated into three single wavelength;
Energy regulating system is used for the energy of the laser beam of each single wavelength of independent regulation;
Whether automatically controlled shutter is for passing through of the laser beam of independently controlling each single wavelength;
Condenser lens is used for independence to the focusing of the laser beam of each single wavelength;
The light beam coupling system is used for the laser beam of single wavelength is mixed;
Collimation laser and logical light diaphragm are used for mixed laser beam is tentatively collimated;
The pulse width detection system is for detection of the pulse width of each wave length laser beams;
Energy detection system is for detection of the energy of each wave length laser beams;
The beam quality analysis system is for detection of the beam quality of each wave length laser beams;
Sample monitoring and grasping system are used for clamping and detect the information of the hot spot of the impaired loci that sample produces after by the pulse laser irradiation after collimating;
Described main laser comprises:
The first laser instrument in that light path is arranged in order produces the basic frequency laser light beam;
/ 2nd wave plates, the direction of vibration of change basic frequency beam linearly polarized light;
Frequency multiplication and frequency tripling crystal, basic frequency beam produce frequency multiplication and frequency tripled laser behind frequency multiplication and frequency tripling crystal.
2. device as claimed in claim 1, it is characterized in that: described beam splitting system comprises: at the double-frequency laser light beam separation unit that light path is arranged in order, isolate the double-frequency laser light beam from the laser beam of different wave length;
The frequency tripled laser light beam separation unit is isolated the frequency tripled laser light beam from the laser beam of different wave length.
3. device as claimed in claim 1, it is characterized in that: described energy regulating system, automatically controlled shutter, condenser lens and light beam coupling system, be arranged at respectively on the light path of laser beam of each single wavelength, wherein, energy regulating system comprises 1/2nd wave plates and polarization spectro element.
4. device as claimed in claim 1, it is characterized in that: the light path of described light beam coupling system and beam splitting system is complementary.
5. device as claimed in claim 1, it is characterized in that: described sample is controlled by motorized precision translation stage; Described sample is detected in real time by online microscope.
6. device as claimed in claim 1 is characterized in that: described pulse width detection system adopts photodiode and oscillograph monitoring, to detect and to judge whether the light beam of three wavelength is synchronous in time; Described energy detection system adopts the energy meter monitoring; Described beam quality analysis system adopts the monitoring of hot spot analyser.
7. device as claimed in claim 1, it is characterized in that: described logical light diaphragm is two.
8. utilize the Method of Adjustment of device claimed in claim 1, it is characterized in that: comprise the following steps:
1. sample is placed in the measuring position, by online microscope alignment sample, adopts dark ground illumination, pictures taken;
2. after the laser irradiation, sample produces the impaired loci corresponding with facula information, adopts the picture after online microscope photographing sample damages;
3. by the picture before and after the laser irradiation is compared, processes, calculate the center of impaired loci, determine Position of Laser-Spot Center with this;
4. obtain successively three wavelength pulse laser spot center position separately, utilize motorized precision translation stage that sample is moved to reposition before each the measurement;
5. take the center of minimal wave length laser as reference, regulate respectively the light beam coupling system, successively control the in addition centers of two bundle laser beams with this, until and the center of minimal wave length laser overlap.
9. method as claimed in claim 8, it is characterized in that: described sample is photographic paper.
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| CN102889932B (en) * | 2012-09-25 | 2014-06-04 | 山东神戎电子股份有限公司 | Thermal imager and method for resisting strong-light damage |
| CN103162941B (en) * | 2013-03-01 | 2016-11-16 | 长春理工大学 | A kind of optical thin film and photoelectric device surface laser device for measuring damage threshold |
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| CN103226057B (en) * | 2013-03-27 | 2015-04-08 | 同济大学 | Multifunctional high-efficiency laser damage test device and method in vacuum environment |
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| CN109186958B (en) * | 2018-09-19 | 2023-07-21 | 西安工业大学 | Multi-light coaxial laser damage threshold testing device and implementation method |
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| CN111504612B (en) * | 2020-04-30 | 2022-03-25 | 中国科学院空天信息创新研究院 | Testing arrangement of many light sources laser damage threshold value |
| CN113390342B (en) * | 2021-06-21 | 2023-03-14 | 中国工程物理研究院激光聚变研究中心 | Method for judging position of damage point of multi-pass amplification laser system |
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| JP4528075B2 (en) * | 2003-09-19 | 2010-08-18 | 独立行政法人科学技術振興機構 | Laser damage evaluation method for optical materials |
| US8139209B2 (en) * | 2008-11-10 | 2012-03-20 | The Boeing Company | System and method for measuring a laser-induced damage threshold in an optical fiber |
| CN101806657B (en) * | 2010-03-17 | 2012-05-09 | 中国科学院上海光学精密机械研究所 | Device and method for measuring damage threshold value of optical thin film irradiated by dual-wavelength laser simultaneously |
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