CN102169293B - Method for adjusting parallelism of measurement light paths of workpiece table and mask table - Google Patents
Method for adjusting parallelism of measurement light paths of workpiece table and mask table Download PDFInfo
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- CN102169293B CN102169293B CN 201010114170 CN201010114170A CN102169293B CN 102169293 B CN102169293 B CN 102169293B CN 201010114170 CN201010114170 CN 201010114170 CN 201010114170 A CN201010114170 A CN 201010114170A CN 102169293 B CN102169293 B CN 102169293B
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Abstract
The invention discloses a method for adjusting the parallelism of the measurement light paths of a workpiece table and a mask table, comprising the steps of: adjusting the light path of a laser interferometer of the workpiece table and adjusting a prism module to ensure that the first light path L1 and the second light path L3 of the light emitted by the laser interferometer of the workpiece table are parallel to each other; irradiating the third light path onto a reflection mirror of a plate bearing table and installing a detection device to ensure that the reflected light is irradiated onto the detection device; pushing the plate bearing table and detecting the fluctuation of a formed light spot by the detection device; adjusting the moving direction of the plate bearing table to ensure that the fluctuation range of the light spot is minimum; detaching the detection device and the prism module and installing a semi-transparent semi-reflection prism and the detection device on the light path of the plate bearing table; pushing the plate bearing table and detecting the fluctuation of a formed light spot by the detection device; and adjusting the light path of a laser interferometer of the mask table to ensure that the fluctuation range of the light spot is minimum. In the invention, the accurate positioning of the laser measurement light paths of the workpiece table and the mask table is realized through simply adjusting the light paths by utilizing a method of mutually referencing the principle and the standard of optics.
Description
Technical field
The present invention relates to a kind of work stage and mask platform and measure the control method of light path parallel, relate in particular to a kind of work stage of optical principle and the mutual reference of benchmark and control method that mask platform is measured light path parallel of utilizing.
Background technology
Photoetching is meant the graphics chip on a series of masks is transferred to the complex techniques process on the silicon chip equivalent layer successively through exposure system.In lithographic equipment, work stage and mask platform are for realizing accurately location, and measuring system all adopts laser interferometer measurement.
When work stage and the integrated assembling of mask platform reality, the laser optical path of work stage requires parallel with the mask platform laser optical path.Common way is to utilize the locating surface of work stage and mask platform laser interferometer to regulate, and perhaps regulates through instrumentation.But, cause assembly tooling complicated with regard to doing greatly because work stage and mask platform in height have very big distance.And receive the influence in space, only do not have just can use when integrated in other subsystems.Manufacturing to frock also requires very high in addition.In practical application, effect is not fine.In addition, detect work stage and mask platform laser whether parallel also have only through coaxillay aligned method just can realize.Like this, if the installation depth of parallelism of the Laser Measurement of work stage and mask platform not in indication range, just can't utilize this frock to regulate again.
Summary of the invention
In order to solve the aforementioned problems in the prior; The invention provides a kind of work stage and mask platform and measure the control method of light path parallel; May further comprise the steps: at first; After work stage laser interferometer light path being regulated through the work stage wafer-supporting platform, regulate the prism module, make the light that the work stage laser interferometer penetrates the first before inciding the prism module light path with penetrate through the prism module after the light path parallel of third part; The light path of the third part after the prism module penetrates directly shines mask platform and holds on the catoptron of bed, assembles pick-up unit this moment, makes the illumination of holding the mirror reflects of bed through mask platform be mapped on the pick-up unit; Promote mask platform and hold bed, make mask platform hold bed and pass through the guide rail slide block, detect the fluctuation of hot spot formed thereon simultaneously through pick-up unit along guide rail movement; Regulate the direction of motion that mask platform is held bed, make that the amplitude of the hot spot fluctuation that forms on the pick-up unit is minimum; Disassemble pick-up unit and prism module, semi-transparent semi-reflecting prism and pick-up unit are installed in mask platform hold on the bed light path; Promote mask platform and hold bed, detect the fluctuation of hot spot formed thereon through pick-up unit; Regulate mask platform laser interferometer light path, make that the amplitude of the hot spot fluctuation that on pick-up unit, forms is minimum.
Wherein, pick-up unit can be a detection lug, also can be the CCD receiver.
According to technical scheme of the present invention, utilize the method for optical principle and the mutual reference of benchmark, through simple adjusting light path, realized the accurate location of work stage and mask platform laser measurement light path.
Description of drawings
Fig. 1 is that according to one preferred embodiment of the present invention work stage wafer-supporting platform light path and mask platform held bed guide rail Principles of Regulation figure;
Fig. 2 has schematically shown the mask platform among Fig. 1 and has held bed guide rail and light path;
Fig. 3 is that according to one preferred embodiment of the present invention mask platform is held bed light path Principles of Regulation figure;
Fig. 4 is that the work stage wafer-supporting platform light path and the mask platform of another preferred embodiment according to the present invention held bed guide rail Principles of Regulation figure;
Fig. 5 is that the mask platform of another preferred embodiment according to the present invention is held bed light path Principles of Regulation figure.
Embodiment
Below, describe in detail according to a preferred embodiment of the invention in conjunction with accompanying drawing.
Referring to figs. 1 through Fig. 3, after the light path of work stage laser interferometer 105b being regulated earlier, regulate prism module 102 through work stage wafer-supporting platform 104, make that the first light path L1 of the light that work stage laser interferometer 105b penetrates is parallel with the second light path L3.
The light path of adjusting directly shines mask platform and holds on the catoptron of bed 101, and install detection lug 106 this moment, makes the illumination of holding bed 101 reflections through mask platform be mapped on the detection lug 106.
Promote mask platform and hold bed 101, on guide rail 201, move, make mask platform hold bed 101 and move along guide rail 201 through guide rail slide block 202.Shine mask platform like this and hold the just fluctuation on detection lug 106 of light path on the bed 101, this explanation mask platform is held bed 101 travel directions and laser interferometer light path and not parallel.The amplitude of hot spot fluctuation is big more on detection lug 106, and mask platform is held bed 101 travel directions and laser, and to relate to the depth of parallelism of appearance light path poor more.
Then regulate mask platform and hold the direction of motion of bed 101, the hot spot fluctuating range that makes laser facula on detection lug 106, form is minimum.It is parallel with the work stage laser optical path that this shows that mask platform is held the direction of motion of bed 101.
Dismantle then detection lug 106 and prism module 102 are installed in mask platform with detection lug 106 and semi-transparent semi-reflecting prism 301 and hold on the bed light path.
Promote mask platform and hold bed 101, and observe the hot spot fluctuation situation on the detection lug 106.
Regulate mask platform laser interferometer light path, the hot spot fluctuating range that makes laser facula on detection lug 106, form is minimum.It is parallel with the work stage laser optical path that this shows that mask platform is held the direction of motion of bed 101.
In addition, reference path can be regulated the position of the reference mirror on the projection lens 103 with said method on the mask platform.
Fig. 4 and Fig. 5 show the work stage of another preferred embodiment according to the present invention and the control method that mask platform is measured light path parallel.The difference of itself and embodiment shown in Figure 13 only is detection lug 106 usefulness CCD receivers 302 are replaced, to obtain higher resolution.For the sake of brevity, this embodiment is repeated no more.
It may be noted that before implementing according to the method for the invention, work stage laser interferometer light path need be regulated and finished, mask platform kinematic axis guide rail 201 and 202 needs in proper working order, and prism module 102 needs calibration to finish.
According to the method for the invention, its precision budget is following:
Work stage and mask platform laser optical path degree of regulation are θ=θ 1+ θ 2+ θ 3, and θ 1 is the degree of regulation of mask platform guide rail and work stage light path, and θ 2 is degrees of regulation of mask platform guide rail and mask platform light path, and θ 3 is precision of mask platform air-float guide rail.
The degree of regulation θ 1 of mask platform guide rail and work stage light path: whole optical path length is L1+L2+L3, the stroke Δ L of mask platform guide rail.Laser facula is at the minimal ripple Δ e of detection lug, and Δ e is the distance of the hot spot fluctuation that can discern of naked eyes.Following algorithm is arranged:
θ1＝Δe/[2(L1+L2+L3+ΔL)]
Work stage is 1500mm to the length of mask platform light path, and the stroke of mask platform is 500mm, and Δ e is 0.2mm, and then θ 1 is 50 microradians.
The degree of regulation θ 2 of mask platform guide rail and mask platform light path:
θ2＝Δe/[2(L0+ΔL)]
Wherein L0 is 300mm, and then θ 2 is 125 differential of the arcs.
The precision of mask platform air-float guide rail can accomplish to be in 5 differential of the arcs.So a whole set of light path degree of regulation is 180 differential of the arcs.
The present invention has the following advantages: 1) disposable can the depth of parallelism of the laser measurement light path of work stage and mask platform being adjusted within the index; 2) kinematic axis and the measurement axis of work stage and mask platform are mated; 3) after the integrated completion of complete machine, also can use this frock; 4) simple and convenient.
Described in this instructions is preferred specific embodiment of the present invention, and above embodiment is only in order to explain technical scheme of the present invention but not limitation of the present invention.All those skilled in the art are under this invention's idea through the available technical scheme of logical analysis, reasoning, or a limited experiment, all should be within like the scope of the present invention that claim defined.
Claims (3)
1. work stage and mask platform are measured the control method of light path parallel, it is characterized in that, regulate in work stage laser interferometer light path to finish, and mask platform kinematic axis guide rail is in proper working order, and after the calibration of prism module finishes, may further comprise the steps:
At first; After work stage laser interferometer light path being regulated through the work stage wafer-supporting platform; Regulate the prism module, make first light path before inciding the prism module of the light that the work stage laser interferometer penetrates with penetrate through the prism module after second light path parallel;
Second light path after the prism module penetrates directly shines mask platform and holds on the catoptron of bed, assembles pick-up unit this moment, makes the illumination of holding the mirror reflects of bed through mask platform be mapped on the pick-up unit;
Promote mask platform and hold bed, make mask platform hold bed and pass through the guide rail slide block, detect the fluctuation of hot spot formed thereon simultaneously through pick-up unit along guide rail movement;
Regulate the direction of motion that mask platform is held bed, make that the amplitude of the hot spot fluctuation that forms on the pick-up unit is minimum;
Disassemble said pick-up unit and prism module, semi-transparent semi-reflecting prism and said pick-up unit are installed in mask platform hold on the bed light path;
Promote mask platform and hold bed, detect the fluctuation of hot spot formed thereon through pick-up unit;
Regulate mask platform laser interferometer light path, make that the amplitude of the hot spot fluctuation that on pick-up unit, forms is minimum.
2. work stage as claimed in claim 1 and mask platform are measured the control method of light path parallel, it is characterized in that said pick-up unit is a detection lug.
3. work stage as claimed in claim 1 and mask platform are measured the control method of light path parallel, it is characterized in that said pick-up unit is the CCD receiver.
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| CN 201010114170 CN102169293B (en) | 2010-02-26 | 2010-02-26 | Method for adjusting parallelism of measurement light paths of workpiece table and mask table |
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| CN 201010114170 CN102169293B (en) | 2010-02-26 | 2010-02-26 | Method for adjusting parallelism of measurement light paths of workpiece table and mask table |
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| CN102169293B true CN102169293B (en) | 2012-11-14 |
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| CN106091992B (en) * | 2016-08-23 | 2018-09-11 | 中冶陕压重工设备有限公司 | Plane milling and boring machine bed ways parallelism detecting device and detection method |
| CN112815876A (en) * | 2020-12-31 | 2021-05-18 | 合肥视涯技术有限公司 | Binocular head-mounted display equipment parallelism detection device and method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101082778A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | On-line testing apparatus of projection objective |
| CN101221368A (en) * | 2008-01-21 | 2008-07-16 | 上海微电子装备有限公司 | Real-time detecting and correcting device and method for position of object plane and image plane |
| CN101436006A (en) * | 2008-12-17 | 2009-05-20 | 上海微电子装备有限公司 | Double-surface position alignment apparatus and method |
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| US20040119964A1 (en) * | 2002-12-18 | 2004-06-24 | Nikon Corporation | Double isolation fine stage |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101082778A (en) * | 2007-07-10 | 2007-12-05 | 上海微电子装备有限公司 | On-line testing apparatus of projection objective |
| CN101221368A (en) * | 2008-01-21 | 2008-07-16 | 上海微电子装备有限公司 | Real-time detecting and correcting device and method for position of object plane and image plane |
| CN101436006A (en) * | 2008-12-17 | 2009-05-20 | 上海微电子装备有限公司 | Double-surface position alignment apparatus and method |
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Address after: 201203 Zhangjiang Road, Zhangjiang hi tech park, Pudong District, Shanghai, 1525 Co-patentee after: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang Road, Zhangjiang hi tech park, Pudong District, Shanghai, 1525 Co-patentee before: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |