KR101033855B1 - System of 2d code detection and thickness measurement for glass substrate, and method of the same - Google Patents
System of 2d code detection and thickness measurement for glass substrate, and method of the same Download PDFInfo
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- KR101033855B1 KR101033855B1 KR1020100085897A KR20100085897A KR101033855B1 KR 101033855 B1 KR101033855 B1 KR 101033855B1 KR 1020100085897 A KR1020100085897 A KR 1020100085897A KR 20100085897 A KR20100085897 A KR 20100085897A KR 101033855 B1 KR101033855 B1 KR 101033855B1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0242—Testing optical properties by measuring geometrical properties or aberrations
- G01M11/025—Testing optical properties by measuring geometrical properties or aberrations by determining the shape of the object to be tested
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K7/00—Methods or arrangements for sensing record carriers, e.g. for reading patterns
- G06K7/10—Methods or arrangements for sensing record carriers, e.g. for reading patterns by electromagnetic radiation, e.g. optical sensing; by corpuscular radiation
- G06K7/14—Methods or arrangements for sensing record carriers, e.g. for reading patterns by electromagnetic radiation, e.g. optical sensing; by corpuscular radiation using light without selection of wavelength, e.g. sensing reflected white light
- G06K7/1404—Methods for optical code recognition
- G06K7/1408—Methods for optical code recognition the method being specifically adapted for the type of code
- G06K7/1417—2D bar codes
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
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Abstract
Description
The present invention relates to a thickness measurement and two-dimensional code (hereinafter referred to as '2D code') detection system and method of the glass substrate, and more particularly, loading, unloading, cleaning operations of the glass substrate The present invention relates to a glass substrate thickness measurement and 2D code detection system and method for automatically and simultaneously performing thickness and 2D code measurement.
The present invention also relates to a glass substrate thickness measurement and 2D code detection system and method for automatically measuring the thickness and 2D code of a glass substrate using a laser.
In the display industry, such as liquid crystal displays (LCDs), plasma display panels (PDPs), organic light emitting diodes (OLEDs), digital cameras, and mobile phone cameras, various glass is widely used in the manufacturing process in the form of thin substrates. Among them, glass substrates (wafers) are widely used in the field of high quality poly TFT-LCD, OLED, digital cameras, mobile phone cameras, and other optical filter substrates and optical communication materials. have.
In addition, bonding to silicon wafers, MEMS, MEMS of fiber optics devices, bio-medical fields, micro-mirrors, polarized beam splitters, dichroic filter substrates, micro glass blocks and pick-ups of lenses, DVD, CDP, etc. Glass wafers of various materials are used in the up prism field.
As such, glass wafers are widely used in the rapidly growing display industry, optical communication, and precision optical devices, and are expected to continue to grow at a high level. In order to maintain continuous growth, accurate quality control and quality improvement are always required for glass wafers. To this end, accurate evaluation and measurement techniques for glass wafer characteristics, that is, flatness and thickness change, are required.
Conventional measuring method of flatness of glass wafer is to measure the flatness of the upper surface of the glass wafer placed on the flat plate by using 3D shape measuring device to measure the flatness and using the parallel beam with Fizeau interferometer. There is a method of measuring the flatness by observing the interference fringes of the reference flat and the upper surface of the glass wafer of the same or larger size than the glass wafer.
Only a straight shape can be measured with a 2D shape measuring instrument. To obtain a 2D shape, the entire area must be scanned with a 3D shape measuring instrument. There are many types of shape measuring instruments, but most can measure only small areas, and large measuring instruments are required to measure glass wafers larger than 200 mm. However, the larger the size, the less accurate the measurement and the higher the price.
1 is a product photograph showing a conventional commercial Fizeau interferometer made for measuring flatness of a plate.
Referring to FIG. 1, a reference lens of at least the same size is required to measure flatness of a flat plate. Therefore, the larger the size of the glass wafer, the larger the measuring device. However, since the measuring device uses a laser beam, when the glass wafer, which is a transparent thin film, is measured because the interference distance is long, all interference patterns generated between the upper and lower surfaces of the glass wafer and the reference plane appear to overlap. Suitable for silicon wafer measurement, but glass wafer measurement is problematic. This problem is a common problem in all commercial Fizeau interferometers.
2 is a view showing the VeriFire MST interferometer of Zygo Inc. and the operating principle of the interferometer, Figure 3 is a view showing a measurement result of measuring the glass wafer with the VeriFire MST interferometer of Zygo.
2 and 3, Zygo's VeriFire MST interferometer is an interferometer for eliminating the problem that all interference fringes appearing between the upper and lower surfaces of the glass wafer and the reference plane by using a special algorithm. Zygo's VeriFire MST interferometer can measure many things such as flatness, thickness change and refractive index of the upper and lower surfaces of the wafer. However, Zygo's VeriFire MST interferometers currently have a measurable size (100 mm in diameter) compared to the size of glass wafers, and the thinner the glass wafer, the more difficult it is to measure thickness (the optical thickness must be at least 1.2 mm). This is expensive and difficult to use in industry.
In addition, as a conventional thickness measuring device for measuring the thickness of a sample, a micrometer is typical, and an air micrometer that emits a constant pressure of air and measures the thickness by means of a flow rate and a pressure change, An electric micrometer etc. which measure thickness using the difference of the electromagnetic property of a coating film, a plating part, and a base material are mentioned.
Conventionally, the thickness of plate glass is measured mainly using a micrometer. However, since the micrometer measures the thickness of the plate glass by a contact method, there is a problem in that the polished glass surface is damaged or soiled by interference.
In addition, since the thickness measuring method of the plate glass using the micrometer is a measuring method by manual measurement by a measurer, not only the measurement work is troublesome, but also the reliability of the measured value is low.
Hereinafter, the conventional prior art for measuring the shape and thickness of the glass substrate is as follows.
Korean Patent Laid-Open Publication No. 2009-0031852 (hereinafter referred to as 'prior art 1') is a large-area glass capable of continuously and rapidly measuring the thickness of a large-area disk such as that used as a substrate for manufacturing a TFT-display. An apparatus and method for measuring thickness of a substrate.
The
Korean Laid-Open Patent Publication No. 2007-0100618 (hereinafter referred to as "
The
Korean Patent Publication No. 0074514 (hereinafter referred to as 'prior art 3') can measure with high precision on the surface of a diffuse reflection object by using a non-contact method using a laser, as well as on the surface of a specular reflection object such as glass. The present invention relates to a system for measuring the shape and thickness of a non-contact mirrored object by a laser capable of simultaneously measuring the thickness of the mirrored object and measuring the thickness of the mirrored object such as glass.
In the
Korean Registered Patent No. 0867197 (hereinafter referred to as “
The
Korean Patent No. 0908639 (hereinafter referred to as “
The
However, the related arts disclose a method of non-contact measurement of the thickness of an object to be measured, such as a glass plate. However, in order to measure the thickness of the object to be measured, it is necessary to manually set the object to be measured manually. Because of the long time-consuming and inconvenient problem.
In addition, in the prior art, there is no mention or disclosure of a system and a method for automatically processing loading and unloading of objects to be measured, cleaning operations, thicknesses, and 2D code measurement operations simultaneously.
The technical problem to be solved by the present invention is to measure the thickness of the glass substrate is automatically performed at the same time loading and unloading, cleaning, thickness and 2D code measurement of the glass substrate and To present a 2D code detection system and method thereof.
In addition, another technical problem to be achieved by the present invention is to provide a thickness measurement and 2D code detection system and method of the glass substrate that can automatically measure the thickness of the glass substrate using a laser (non-contact).
In addition, another technical problem to be achieved by the present invention is a glass substrate thickness measurement and 2D code detection system that can read the matrix at the same time as the thickness measurement using the trigger signal (Trigger Signal) of the 2D matrix (Matrix) and To show you how.
In addition, another technical problem to be achieved by the present invention is to provide a thickness measurement and 2D code detection system and method of the glass substrate that can accurately measure the thickness of the glass substrate even if thin.
The problem of the present invention is not limited to those mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.
As a means for solving the above-described technical problem, the invention described in
delete
The invention as set forth in
According to the invention of
According to the invention of
(Equation 1)
Where
And Is the thickness variation of the(Equation 2)
Where
Is the thickness d of the reference glass substrate K.)The
In addition, as a means for solving the above-described technical problem, the invention described in claim 6, "In the method of measuring the thickness of the glass substrate and the 2D code detection method, (a) the loading and unloading unit by mounting the glass substrate 20 (100), providing a thickness and 2D code automatic measurement system having three seating stages 40 for rotating and rotating the cleaning unit 200 and the measurement unit 300 at the same time; (b) mounting the glass substrate 20 on a seat 40 of the loading and unloading unit 100; (c) transferring the glass substrate 20 to the cleaning unit 200 by simultaneously rotating the seating table 40; (d) cleaning the glass substrate 20 in the cleaning unit 200; (e) transferring the glass substrate 20 to the measurement unit 300 by simultaneously rotating the seating table 40; (f) measuring the thickness of the glass substrate 20 after aligning and vacuum-compressing the glass substrate 20 in the measuring unit 300 and simultaneously detecting a 2D code; (g) transferring the glass substrate 20 to the loading and unloading unit 100 by simultaneously rotating the seating table 40; (h) unloading and inspecting the appearance of the glass substrate 20 in the loading and unloading unit 100; And (i) repeating the steps (b) to (h); and a method for measuring the thickness of the glass substrate and detecting the 2D code.
The method according to
(Equation 1)
Where
And Is the thickness variation of the(Equation 2)
Where
Is the thickness d of the reference glass substrate K.)It provides a thickness measurement and 2D code detection method of the glass substrate, characterized in that to obtain the thickness (t) of the
According to claim 8, the method according to claim 6, wherein the method for detecting the 2D code in the step (f) comprises: detecting the 2D code by performing image processing on an image image of the 2D code of the glass substrate. The thickness measurement of a glass substrate and a 2D code detection method. "
According to the present invention, since the loading and unloading of the glass substrate, the cleaning operation, the thickness and the 2D code measurement operation are automatically performed at the same time, the work time can be greatly reduced and the work efficiency can be improved.
In addition, by using a method of measuring the thickness of the glass substrate in a non-contact manner using a laser oscillator and an image sensor disposed on the glass substrate, it is possible to freely measure the thickness of all parts of the glass substrate without being limited to a specific position. .
In addition, the problem that the finely polished glass surface is damaged or soiled by interference does not occur, and the thickness measurement operation can be automated, and the accuracy of the thickness measurement operation is greatly improved.
In addition, it is possible to automatically measure the thickness of the glass substrate by using a laser in a non-contact manner, and to read the matrix simultaneously with the thickness measurement by using the trigger signal of the 2D matrix. There is.
The effects of the present invention are not limited to those mentioned above, and other effects that are not mentioned will be clearly understood by those skilled in the art from the following description.
1 is a product photograph of a commercial Fizeau interferometer for measuring conventional flatness flatness.
2 is a view showing the VeriFire MST interferometer and operating principle of Zygo
3 is a view showing the measurement results of measuring the glass wafer with Zygo VeriFire MST interferometer
4 is a block diagram of a thickness measuring device of a large-area glass substrate according to the prior art
5 is a configuration diagram of a plate thickness measuring apparatus of a glass substrate according to the prior art
6 is a configuration diagram of a shape and thickness measurement system of a non-contact mirror surface object by a laser according to the prior art
7 is a block diagram of a thickness measuring device of a multilayer film coated glass according to the prior art
8 is a block diagram of a glass wafer shape measuring apparatus according to the prior art
9 is a block diagram of a thickness measurement and two-dimensional code detection system of a glass substrate according to a preferred embodiment of the present invention
10 is a schematic drawing of the thickness measurement and two-dimensional code detection system of a glass substrate according to the present invention
11 is a configuration diagram of the measuring
12 is a view showing a measurement position and the 2D code position of the
13 and 14 are a perspective view and a cross-sectional view schematically showing a first embodiment of the thickness measurement and 2D code detector of the glass substrate
15 is an explanatory diagram for explaining the thickness measurement of a glass substrate, the internal structure of the 2D code detector, and a thickness measuring method;
FIG. 16 is an explanatory diagram for explaining a first method of measuring a thickness of a glass substrate and a thickness of the glass substrate in a 2D code detector; FIG.
17 and 18 are explanatory views for explaining a second method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector.
19 and 20 are explanatory diagrams for explaining a third method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector.
21 is a flowchart illustrating a method of measuring a thickness of a glass substrate and detecting a 2D code according to an exemplary embodiment of the present invention.
DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. As those skilled in the art would realize, the described embodiments may be modified in various different ways, all without departing from the spirit or scope of the present invention. In the drawings, parts irrelevant to the description are omitted in order to clearly describe the present invention, and like reference numerals designate like parts throughout the specification.
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
Glass substrate thickness measurement and two-dimensional code detection system
9 and 10 are schematic and design diagrams of a thickness measurement and two-dimensional code detection system of a glass substrate according to a preferred embodiment of the present invention.
The thickness measurement and 2D code detection system of the glass substrate according to the present invention, as shown in Figure 9 and 10, the loading and
The
The loading and
When the
The
When the
When the 2D code is photographed by the
When the thickness of the
In the loading and
As described above, the thickness measurement and 2D code detection system of the glass substrate according to the present invention greatly reduces the working time because the loading and unloading, the cleaning operation, the thickness and the 2D code measurement operation of the
Of the measuring
FIG. 11 is a configuration diagram of the measuring
As illustrated in FIG. 11, the
Measurement position and 2D code position
12 is a view showing a measurement position and the 2D code position of the
As shown in FIG. 12, a plurality of
The
Advantages of the
The
First Embodiment of Thickness Measurement and 2D Code Detector
13 and 14 are perspective views and cross-sectional views schematically illustrating a thickness measurement of a glass substrate and a first embodiment of a 2D code detector, and FIG. 15 illustrates a thickness measurement of a glass substrate and an internal configuration and a thickness measuring method of the 2D code detector. It is explanatory drawing for the following.
As shown in FIGS. 13 to 15, the thickness measurement of the glass substrate and the first embodiment of the 2D code detector may include one or two or more upper and lower measuring instruments on one side of the upper and lower sides of the
As shown in FIG. 15, the upper and
Examples of basic specifications of the upper and
16 is an explanatory diagram for explaining a first method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector.
In the first method of measuring the thickness of the glass substrate and measuring the thickness of the glass substrate in the 2D code detector, as shown in FIG. 16, incident light is emitted from the
The
Where
And Is the thickness variation of theThe
Where
Is a thickness d of the reference glass substrate K, and is a reference value previously stored before measuring the thickness of theIn
Substituting
Where
And Denotes the amount of change in the position of the laser beam (reflected light) in theIf, in the equation (4)
Is assumed to be "0 (zero)", Only contributes to the sample thickness change. On the contrary, Is assumed to be "zero", Only contributes to the sample thickness change.As described above, in the present invention, the thickness t of the
Therefore, the amount of change of reflected light reflected by the incident light L1 on the upper surface G1 and the lower surface G2 of the glass substrate 20 (
And ), The thickness of the17 and 18 are explanatory views for explaining a second method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector.
The second method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector includes one or two upper or lower sides of one side of the
As illustrated in FIG. 17, the measuring
When the
The
The
Here, n is the refractive index of the
19 and 20 are explanatory diagrams for explaining a third method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector.
The third method of measuring the thickness of the glass substrate and the thickness of the glass substrate in the 2D code detector includes one or two upper or lower sides of one side of the
As shown in FIG. 19, the measuring
When the
Meanwhile, the first reflected light L2 and the second reflected light L3 reflecting the incident light L1 from the
However, in this method, the positions of the third point S3 and the fourth point S4 are changed according to the position of the
In the
The
Substituting Equation 6 into
Here, n is the refractive index of the
In the present invention, through the communication network connected to the
The plate glass thickness measuring method according to the present invention is not limited to use only for measuring the thickness of the plate glass, it can be applied to measure the plate thickness of the transparent material, of course.
21 is a flowchart illustrating a method of measuring a thickness of a glass substrate and detecting a 2D code according to a preferred embodiment of the present invention.
First, in the present invention, as described with reference to Figure 9, the three seating table 40 seated on the
The thickness measurement and 2D code detection method of the glass substrate according to the present invention, as shown in Figure 21, after the
Then, the
Next, after the alignment and vacuum compression of the
After detecting the 2D code of the
Then, the surface of the loading and
The thickness measurement and 2D code detection system and method of the glass substrate according to the present invention configured as described above are automatically performed simultaneously with loading and unloading, cleaning, 2D code detection and thickness measurement of the glass substrate. By doing so, the technical problem of the present invention can be solved.
Preferred embodiments of the present invention described above are disclosed to solve the technical problem, and those skilled in the art to which the present invention pertains (man skilled in the art) various modifications, changes, additions, etc. within the spirit and scope of the present invention. It will be possible to, and such modifications, changes, etc. will be considered to be within the scope of the following claims.
The thickness measurement and 2D code detection system and method of the glass substrate of the present invention can be used in the industrial field of manufacturing glass wafers, and can be used as a technique for providing standardization related to glass wafer measurement.
10: operator 20: glass substrate or object to be measured
21: cell 22: 2D code
30: rotating shaft 40: rotating seat
41: seating legs 50: safety wall
60: packaged product 100: loading and unloading unit
200: washing unit 300: measuring unit
301: frame 310: XY alignment device
320: thickness measurement of the glass substrate and 2D code detector or upper measuring instrument
321: image sensor or video input
322
324: Screen
330: thickness measurement of the glass substrate and 2D code detector or lower measuring instrument
331: image sensor or video input
332: laser oscillator 333: transmission lens
340: 2D code detector 341: luminaire
342: 2D coded image sensor
400: measuring terminal 410: input unit
411: Keyboard 412: Mouse
413: joystick 420: control unit
430: output unit 431: monitor
432: communication port
Claims (8)
A loading and unloading unit 100 for loading and unloading the glass substrate 20, a cleaning unit 200 for cleaning the glass substrate 20, and a 2D code of the glass substrate 20 are detected and thicknessed. The rotating shaft of the center to sequentially convey the glass substrate 20 to the measuring unit 300, the loading and unloading unit 100 and the cleaning unit 200 and the measuring unit 300 to measure simultaneously ( 30 control the operation of the three mounting table 40, the loading and unloading unit 100, the cleaning unit 200, the measurement unit 300 and the seating table 40 rotated by And a measurement terminal 400 which processes the image image captured by the image sensor 321 of the measurement unit 300 and the 2D code to calculate the thickness of the glass substrate 20 and detect the 2D code. ,
The measuring unit 300 is:
Laser oscillator 322 for irradiating incident light L1 to the upper surface G1 of the glass substrate 20, and reflected light L2 reflected from the upper surface G1 of the glass substrate 20 or the glass substrate 20. An upper measuring unit 320 having an image sensor 321 for photographing the points S1 and S2 at which the laser beam is reflected on an upper surface G1 of the upper surface G1;
The laser oscillator 332 irradiates the incident light L1 to the lower surface G2 of the glass substrate 20, and the reflected light L2 reflected from the lower surface G2 of the glass substrate 20 or the glass substrate 20. A lower measuring device 330 having an image sensor 331 for capturing the points S1 and S2 at which the laser beam is reflected on the lower surface G2 of the image; And
2D code image sensor 342 for photographing the 2D code of the glass substrate 20, and the illumination device for irradiating the light to the 2D code portion of the glass substrate 20 during operation of the 2D code image sensor 342 ( 2D code detector 340 with 341;
Thickness measurement and 2D code detection system of the glass substrate comprising a.
When the laser of the laser oscillator (322,332) is an extended laser, the glass further comprises a transmission lens (323, 333) for converting the extended laser into a straight line (dot) laser inside the upper and lower measuring devices (320,330) Substrate thickness measurement and 2D code detection system.
A keyboard 411 and a mouse 412 for inputting an operation command of the thickness and 2D code automatic measurement system, and a joystick 413 for adjusting the X and Y axes of the measurement unit 300 to find the 2D code. An input unit 410;
The thickness of the glass substrate 20 and the 2D code automatic measurement program screen, the monitor 431 for outputting the image image and the 2D code taken by the image sensor 321 on the screen, and measured by the measurement terminal 400 An output unit 430 having a communication port 432 for transmitting and receiving data information through a communication network; And
The loading and unloading unit 100, the cleaning unit 200, the measuring unit 300, and the loading and unloading unit 100 are stored and driven by the thickness and 2D code automatic measurement program. Control unit for automatically controlling the operation of the seat 40, the image sensor 321 and the 2D code image sensor image processing to calculate the thickness of the glass substrate 20 and to measure the 2D code 420;
Thickness measurement and 2D code detection system of the glass substrate comprising a.
The thickness and 2D code automatic measurement system is:
In the measurement terminal, by processing the image image taken from the upper and lower portions of the glass substrate 20, the position change amount of the reflected light of the glass substrate 20 as the measurement sample is calculated by Equation 1 below. ,
(Equation 1)
Where And Is the thickness variation of the glass substrate 20 as compared with the thickness d of the reference glass substrate K, And Is an angle of incident light incident on the glass substrate 20 from the image sensors 321 and 331.)
(Equation 2)
Where Is the thickness d of the reference glass substrate K.)
The above Equation 1 And And calculating the thickness t of the glass substrate 20 as shown in Equation 2 above.
(a) Thickness and 2D code provided with three mounting tables 40 for rotating and simultaneously rotating the loading and unloading unit 100, the cleaning unit 200, and the measuring unit 300 by mounting the glass substrate 20. Providing an automated measurement system;
(b) mounting the glass substrate 20 on a seat 40 of the loading and unloading unit 100;
(c) transferring the glass substrate 20 to the cleaning unit 200 by simultaneously rotating the seating table 40;
(d) cleaning the glass substrate 20 in the cleaning unit 200;
(e) transferring the glass substrate 20 to the measurement unit 300 by simultaneously rotating the seating table 40;
(f) measuring the thickness of the glass substrate 20 after aligning and vacuum-compressing the glass substrate 20 in the measuring unit 300 and simultaneously detecting a 2D code;
(g) transferring the glass substrate 20 to the loading and unloading unit 100 by simultaneously rotating the seating table 40;
(h) unloading and inspecting the appearance of the glass substrate 20 in the loading and unloading unit 100; And
(i) repeating steps (b) to (h);
Thickness measurement and 2D code detection method of the glass substrate comprising a.
The method of measuring the thickness of the glass substrate 20 in the step (f):
By irradiating a laser beam to the upper and lower surfaces of the glass substrate 20 to calculate the position change of the reflected light reflected from the glass substrate 20 from the following equation 1,
(Equation 1)
Where And Is the thickness variation of the glass substrate 20 as compared with the thickness d of the reference glass substrate K, And Is an angle of incident light incident from the image sensors 321 and 331 to the glass substrate 20.)
(Equation 2)
Where Is the thickness d of the reference glass substrate K.)
The thickness t and the 2D code detection method of the glass substrate, characterized in that to obtain the thickness (t) of the glass substrate (20) using the equation (2).
The thickness measurement and 2D code detection method of the glass substrate, characterized in that for detecting the 2D code by image processing the image image photographing the 2D code of the glass substrate.
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KR1020100085897A KR101033855B1 (en) | 2010-09-02 | 2010-09-02 | System of 2d code detection and thickness measurement for glass substrate, and method of the same |
CN201110180119.8A CN102384722B (en) | 2010-09-02 | 2011-06-24 | System of 2D code detection and thickness measurement for glass substrate, and method of the same |
TW100130033A TWI445919B (en) | 2010-09-02 | 2011-08-22 | System of 2d code detection and thickness measurement for glass substrate, and method of the same |
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KR1020100085897A KR101033855B1 (en) | 2010-09-02 | 2010-09-02 | System of 2d code detection and thickness measurement for glass substrate, and method of the same |
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CN100533132C (en) * | 2004-09-06 | 2009-08-26 | 欧姆龙株式会社 | Substrate inspection method and apparatus |
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US20060132289A1 (en) * | 2004-12-20 | 2006-06-22 | Stmicroelectronics Sa | Electromagnetic transponder with no autonomous power supply |
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CN102818538A (en) * | 2012-09-14 | 2012-12-12 | 洛阳兰迪玻璃机器股份有限公司 | Detection system based on modulated glass thread structure laser image |
KR101441439B1 (en) | 2013-01-30 | 2014-09-17 | 니탄 밸브 가부시키가이샤 | Workpiece inspection equipment |
KR20170000936A (en) * | 2015-06-25 | 2017-01-04 | 세메스 주식회사 | Apparatus for aligning measuring head of spectroscope |
KR102257311B1 (en) | 2015-06-25 | 2021-05-31 | 세메스 주식회사 | Apparatus for aligning measuring head of spectroscope |
CN109029274A (en) * | 2018-08-24 | 2018-12-18 | 芜湖凯兴汽车电子有限公司 | Portable type measurement unit is used in a kind of processing of plastic plate |
KR102558478B1 (en) * | 2022-12-05 | 2023-07-21 | (주)에스와이이엔지 | Semiconductor wafer thickness meaturing system |
KR102603605B1 (en) * | 2022-12-05 | 2023-11-17 | (주)에스와이이엔지 | Semiconductor wafer measurement system based on voltage displacement detection |
Also Published As
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CN102384722B (en) | 2014-06-25 |
TWI445919B (en) | 2014-07-21 |
TW201211500A (en) | 2012-03-16 |
CN102384722A (en) | 2012-03-21 |
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