CN102157216A - Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens - Google Patents
Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens Download PDFInfo
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- CN102157216A CN102157216A CN2011100403102A CN201110040310A CN102157216A CN 102157216 A CN102157216 A CN 102157216A CN 2011100403102 A CN2011100403102 A CN 2011100403102A CN 201110040310 A CN201110040310 A CN 201110040310A CN 102157216 A CN102157216 A CN 102157216A
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- 239000000758 substrate Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 22
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- 239000011521 glass Substances 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- 239000010949 copper Substances 0.000 claims description 11
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
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- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
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Abstract
The invention relates to a manufacturing method of a combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens, comprising the following steps of: (1) manufacturing a primary lens of the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens; (2) manufacturing a secondary lens of the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens; and (3) assembling the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens: (M) placing the manufactured primary lens and secondary lens under a microscope, finding out and clamping holding arms of the secondary lens, aligning inlaid lens bodies of the secondary lens to square holes of the primary lens, enabling N inlaid lens bodies of the secondary lens to correspond to N square holes of the primary lens in a one-to-one manner, inlaying and lightly pressing out to finish the manufacture of the combined inlaid two-dimensional focusing X-ray refraction lens. The manufacturing method of the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens, disclosed by the invention, has high precision, the obtained lens axis can be self-calibrated with high precision and the focusing efficiency is high.
Description
Technical field
The present invention relates to a kind of New X ray Microstructure Optics device--the method for making of inserted two-dimension focusing X ray combination refractor is applicable to the occasion that SU-8 material two-dimension focusing X ray combination refractor is made.
Background technology
The X ray compound lens to be A.Snigirev proposed in 1996 a kind of be applicable to sigmatron wave band (being that the X-radiation energy surpasses 5keV), based on the X ray Microstructure Optics device of refraction effect.Have the light path that do not need to turn back, high-temperature stability is good and easily cooling, simple and compact for structure, the lens surface roughness is required advantages such as low.Have wide practical use in ultrahigh resolution radiodiagnosis Science and Technology field.In recent years, very active based on the various radiodiagnosis technical research of X ray compound lens.Analyse experimental system such as the sigmatron fluorescence microbedding that is used for sample element distribution measuring; Utilize the middle sub-microscope of aluminium-material X-ray assembled lens; And be used for sigmatron experimental system of unicellular detection, chemical microanalysis, early stage breast tumor detection etc. or the like.
Initial X ray compound lens is the method that adopts the accurate keyhole of computing machine, produce on aluminum metallic material that tens cylindrical bore of arranging to hundreds of order realize, X ray is carried out one-dimensional focusing, and utilize it to carry out X ray and survey and diagnostic techniques research.Afterwards in order to improve the making precision, the plane micro production technology that adopt (comprise thin film deposition more, technology such as photoetching, electron beam lithography, ion beam etching) making cross sectional shape is the X ray compound lens of circle, paraboloidal, elliptical area shape, the compound lens material expands to aluminium, silicon, lithium, boron, carbon, aluminium oxide, organic material PMMA or the like, the effect that focuses on is improved significantly, be such X ray compound lens still be one-dimensional focusing.Yet X ray is surveyed and the diagnostic techniques application, needs the X ray of micron even sub-micrometer scale to survey hot spot (promptly focusing on focal spot) usually, and is not only the focusing focal line.The X ray compound lens that therefore must development can carry out two-dimension focusing to X-radiation.
At present the X ray compound lens of two-dimension focusing is domestic does not appear in the newspapers as yet, mainly takes dual mode to reach purpose to the X ray two-dimension focusing in the world.The one, two one-dimensional focusing X-ray compound lens quadratures are placed, respectively X-ray beam is carried out horizontal direction line focus and vertical direction line focus, to reach the purpose (C.G.Schroer of two-dimension focusing, et al., Appl.Phys.Lett., 2003, vol.82, pp1485-1487), only need to make mono dimension X-ray composite lens, and do not relate to the manufacturing technology of two-dimensional x-ray compound lens.The 2nd, adopt mould pressing technology to make the X ray compound lens (B.Lengeler of two-dimension focusing, et al., Appl.Phys.Lett., 1999, vol.74 pp3924-3926), promptly at first adopts the precision optical machinery manufacturing technology to make the lens refraction unit mould of paraboloid of revolution shape, the single one by one compound lens of compacting refraction unit on aluminum then, at last compound lens is reflected the unit one by one series arrangement combine and form the X ray compound lens of two-dimension focusing.
Summary of the invention
Not high enough for the manufacture craft precision of the method for making that overcomes existing two-dimension focusing X ray combination refractor, as the to obtain deficiency that the lens calibration accuracy is low, focusing efficiency is low, but the invention provides a kind of manufacture craft precision height, the method for making of the inserted two-dimension focusing X ray combination of SU-8 material refractor that the lens axis high precision self calibration, the focusing efficiency that obtain are high.
The technical solution adopted for the present invention to solve the technical problems is:
The method for making of the inserted two-dimension focusing X ray combination of a kind of SU-8 material refractor, described method for making may further comprise the steps:
(1) making step of female mirror of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(A) use the electron beam lithographic technique to make the lay photoetching mask plate of female mirror of substrate of glass crome metal material, the lay photoetching mask plate of described female mirror is made up of coaxial first circular hole and the square hole of arranging of a plurality of sequence interval, total N of described square hole, described first Circularhole diameter is φ, and the length of side of described square hole is L+ δ;
(B) glass substrate is carried out cleaning;
(C) applying a layer thickness in the glass baseplate surface spin of handling through step (B) is the SU-8 photoresist of L;
(D) to coated SU-8 photoresist expose successively, development and post bake, use the lay photoetching mask plate of female mirror that step (A) makes, make female mirror of inserted two-dimension focusing X ray combination refractor;
(2) making step of the sub-mirror of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(E) use the electron beam lithographic technique to make the lay photoetching mask plate of the sub-mirror of substrate of glass crome metal material, the lay photoetching mask plate of described sub-mirror comprises that clamping limb and a plurality of coaxial square of arranging that is arranged on the clamping limb embed the mirror body, described square embeds total N of mirror body, identical with the square hole number of described female mirror, described square embeds in the mirror body second circular hole, described second Circularhole diameter is φ, the center of circle of second circular hole overlaps with the center that described square embeds the mirror body, the length of side that described square embeds the mirror body is L, described square embeds the mirror body and described clamping limb is an one, and the thickness of described clamping limb is t;
(F) silicon chip substrate is carried out cleaning;
(G) apply one deck BP212 photoresist in the silicon chip substrate surface spin of handling through step (F), and carry out preceding baking;
(H) at the metallic copper film of print superficial growth one deck 200-300 nanometer of handling through step (G);
(I) applying a layer thickness in the print surface spin of handling through step (H) is the SU-8 photoresist of L;
(J) to coated SU-8 photoresist expose successively, development and post bake, use the lay photoetching mask plate of the sub-mirror that step (E) makes;
(K) use BP212 photoresist glue-dispenser to remove the BP212 photoresist, remove silicon chip substrate simultaneously;
(L) use the method for chemical corrosion copper to remove the copper film, make the sub-mirror of inserted two-dimension focusing X ray combination refractor;
(3) number of assembling steps of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(M) female mirror and the sub-mirror that will make place microscopically, find and clamp the clamping limb of sub-mirror, the embedding mirror body of sub-mirror is aimed at the square hole of female mirror, N on the sub-mirror to embed the mirror body corresponding one by one with N square hole on female mirror, embed and compress gently, finish the making of inserted two-dimension focusing X ray combination refractor.
Further, in the described step (A), the distance between the center of circle of described first circular hole and the center of square hole is L, and in the described step (E), the distance that described two squares embed between the mirror body is L.
Further again, the scope of described φ is 40 microns to 240 microns, and the scope of L is 50 microns to 250 microns, and the scope of δ is 1 micron to 2 microns, and the scope of N is 20 to 100, and the scope of t is 50 microns to 100 microns.
Technical conceive of the present invention is: designed a kind of inserted two-dimension focusing X ray combination refractor, comprise glass substrate and female mirror, described female mirror is installed on the described glass substrate, described female mirror comprises female mirror main body and sequence interval is arranged on described female mirror main body cylindrical cavity and square cavities, the center of each cylindrical cavity and square cavities center all are positioned on the same straight line of length direction of described female mirror main body (coaxial arranging), described cylindrical cavity is provided with in order to X ray is reflected to reach first face of cylinder of X-radiation along the focusing of the first cylinder axis vertical direction, each square cavities is embedded in and embeds the mirror body, the cross section of described embedding mirror body is square, described embedding mirror body center is provided with cylindrical hole, described cylindrical hole is provided with in order to X ray is reflected to reach to second face of cylinder of X-radiation along the focusing of the second cylinder axis vertical direction the mutual orthogonal thereto structure in described first face of cylinder and described second face of cylinder.
A plurality of embedding mirror bodies are installed on the clamping limb, and the center distance of adjacent embedding mirror body equates with the center distance of adjacent square cavity.Described embedding mirror body is a square, the diameter of described cylindrical hole is littler than the described square length of side, the center line of described square and the dead in line of described cylindrical hole, the described square length of side of the side ratio of described square cavities is big, and the degree of depth of described cylindrical cavity and the degree of depth of square cavities all equate with the length of side of described square.Distance between the center of described square cavities and the center of cylindrical cavity equates with the length of side of described square.The diameter of described cylindrical cavity is littler than the length of side of described square.The diameter of described cylindrical cavity and the equal diameters of described cylindrical hole.
Described female mirror and sub-mirror through after the microscopically assembling, promptly form the inserted two-dimension focusing X ray combination of the present invention refractor (as shown in Figure 1), and the z axle of coordinate system shown in Figure 1 is the optical axis of described inserted two-dimension focusing X ray combination refractor.The two-dimension focusing function of described inserted two-dimension focusing X ray combination refractor, finish by refraction unit of the two-dimension focusing one by one in it (shown in Fig. 1 c), described two-dimension focusing refraction unit constitutes along y axle, two orthogonal faces of cylinder along the x axle jointly by one.The incident X-rays bundle is along the inserted two-dimension focusing X ray combination of the z direction of principal axis directive of coordinate system as shown in Figure 1 refractor, through the repeatedly refraction of two-dimension focusing refraction unit one by one, after the outgoing of described inserted two-dimension focusing X ray combination refractor, form the two-dimension focusing focal spot.
Beneficial effect of the present invention mainly shows: 1, invented a kind of New X micro structural component--the method for making of inserted two-dimension focusing X ray combination refractor is used for the actual fabrication to this New X ray device; 2, inserted two-dimension focusing X ray combination refractor has individual devices and realizes function to the X-ray beam two-dimension focusing, and calibration accuracy height, convenience; 3, adopt the plane Micrometer-Nanometer Processing Technology, the device depth-to-width ratio is big, and is little to materials limitations, can integrated, disposable Precision Machining moulding.
Description of drawings
Fig. 1 a is the front elevation of the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 1 b is the vertical view of the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 1 c is the enlarged drawing of the local I of two-dimension focusing refraction unit in the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 1 d is the vertical view of the local I of two-dimension focusing refraction unit in the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 2 a is the lay photoetching mask plate synoptic diagram of female mirror of the inserted two-dimension focusing X ray combination of the present invention refractor
Fig. 2 b is the lay photoetching mask plate synoptic diagram of the sub-mirror of the inserted two-dimension focusing X ray combination of the present invention refractor
Wherein: o represents the initial point of rectangular coordinate system, and x, y, z represent x axle, y axle and the z axle of rectangular coordinate system respectively, and g represents optical axis, and a is the shading light part of lay photoetching mask plate.
Embodiment
Below in conjunction with accompanying drawing the present invention is further described.
Embodiment 1
With reference to Fig. 1 a~Fig. 2 b, the method for making of the inserted two-dimension focusing X ray combination of a kind of SU-8 material refractor, concrete steps are as follows:
(1) making step of female mirror of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(A) use the electron beam lithographic technique to make the lay photoetching mask plate of female mirror of substrate of glass crome metal material, the lay photoetching mask plate figure of described female mirror is shown in Fig. 2 a, form along coaxial circular hole of arranging of z axle and square hole successively by a plurality of, total N of described square hole, identical with the embedding mirror body number of described sub-mirror, described Circularhole diameter is φ, and the length of side of described square hole is L+ δ;
(B) glass substrate is carried out cleaning;
(C) applying a layer thickness in the glass baseplate surface spin of handling through step (B) is the SU-8 photoresist of L;
(D) to coated SU-8 photoresist expose successively, development and post bake, the lay photoetching mask plate that uses step (A) to make is made female mirror of inserted two-dimension focusing X ray combination refractor.
(2) making step of the sub-mirror of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(E) use the electron beam lithographic technique to make the lay photoetching mask plate of the sub-mirror of substrate of glass crome metal material, the lay photoetching mask plate figure of described sub-mirror is shown in Fig. 2 b, form along coaxial square embedding mirror body and the clamping limb of arranging of z axle successively by a plurality of, described square embeds total N of mirror body, identical with the square hole number of described female mirror, described square embeds in the mirror body circular hole, described Circularhole diameter is φ, the center of circle of circular hole overlaps with the center that described square embeds the mirror body, the length of side that described square embeds the mirror body is L, affiliated square embeds the mirror body and described clamping limb is an one, and the thickness of affiliated clamping limb is t;
(F) silicon chip substrate is carried out cleaning;
(G) apply one deck BP212 photoresist in the silicon chip substrate surface spin of handling through step (F), and carry out preceding baking;
(H) at the metallic copper film of print superficial growth one deck 200 nanometers of handling through step (G);
(I) applying a layer thickness in the print surface spin of handling through step (H) is the SU-8 photoresist of L;
(J) to coated SU-8 photoresist expose successively, development and post bake, the lay photoetching mask plate that uses step (E) to make;
(K) use BP212 photoresist glue-dispenser to remove the BP212 photoresist, remove silicon chip substrate simultaneously;
(L) use the method for conventional chemical corrosion copper to remove the copper film, make the sub-mirror of inserted two-dimension focusing X ray combination refractor.
(3) number of assembling steps of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
The female mirror and the sub-mirror of the inserted two-dimension focusing X ray combination of the described SU-8 material that (M) will make refractor place microscopically, find and clamp the clamping limb of sub-mirror, the embedding mirror body of sub-mirror is aimed at the square hole of female mirror, noting on the sub-mirror N, to embed the mirror body corresponding one by one with N square hole on female mirror, embed and compress gently, finish the making of inserted two-dimension focusing X ray combination refractor.
In the described step (A), the distance between the center of circle of described first circular hole and the center of square hole is L, and in the described step (E), the distance that described two squares embed between the mirror body is L.
The inserted two-dimension focusing X ray combination refractor of present embodiment comprises glass substrate, and a female mirror and a sub-mirror that embeds female mirror that is positioned on the glass substrate is formed (as shown in Figure 1) jointly.Described glass substrate is as the base of inserted two-dimension focusing X ray combination refractor, described female mirror is produced on the glass substrate, female mirror comprise female mirror material of main part and on material of main part tactic cylindrical cavity and square cavities constitute jointly, described square cavities is used for embedding sub-mirror.Described sub-mirror comprises clamping limb and embeds the mirror body and form jointly that described embedding mirror body is a square, and there is cylindrical hole the square center, and the embedding mirror body of described sub-mirror embeds the square cavities of female mirror from the top of described female mirror.The refraction to X ray is finished on the face of cylinder of the cylindrical hole in cylindrical cavity in described female mirror and the described sub-mirror, reaches the focusing of X-radiation along the cylinder axis vertical direction.The two-dimension focusing function of described inserted two-dimension focusing X ray combination refractor, finish by refraction unit of the two-dimension focusing one by one in it (shown in Fig. 1 c), described two-dimension focusing refraction unit constitutes along y axle, two orthogonal faces of cylinder along the x axle jointly by one.The incident X-rays bundle is along the inserted two-dimension focusing X ray combination of the z direction of principal axis directive of coordinate system as shown in Figure 1 refractor, through the repeatedly refraction of two-dimension focusing refraction unit one by one, after the outgoing of described inserted two-dimension focusing X ray combination refractor, form the two-dimension focusing focal spot.
Wherein: φ is 40 microns, and L is 50 microns, and δ is 1 micron, and N is 20, and t is 50 microns.
Embodiment 2
With reference to Fig. 1 a~Fig. 2 b, all making steps are identical with embodiment 1, and just wherein φ is 240 microns, and L is 250 microns, and δ is 2 microns, and N is 100, and t is 100 microns, and copper film thickness is 250 nanometers in the step (H).
Embodiment 3
With reference to Fig. 1 a~Fig. 2 b, all making steps are identical with embodiment 1, and just wherein φ is 200 microns, and L is 210 microns, and δ is 1.5 microns, and N is 80, and t is 80 microns, and copper film thickness is 300 nanometers in the step (H).
The described content of the embodiment of this instructions only is enumerating the way of realization of inventive concept; protection scope of the present invention should not be regarded as only limiting to the concrete form that embodiment states, protection scope of the present invention also reach in those skilled in the art conceive according to the present invention the equivalent technologies means that can expect.
Claims (3)
1. the method for making of the inserted two-dimension focusing X ray combination of SU-8 material refractor, it is characterized in that: described method for making may further comprise the steps:
(1) making step of female mirror of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(A) use the electron beam lithographic technique to make the lay photoetching mask plate of female mirror of substrate of glass crome metal material, the lay photoetching mask plate of described female mirror is made up of coaxial first circular hole and the square hole of arranging of a plurality of sequence interval, total N of described square hole, described first Circularhole diameter is φ, and the length of side of described square hole is L+ δ;
(B) glass substrate is carried out cleaning;
(C) applying a layer thickness in the glass baseplate surface spin of handling through step (B) is the SU-8 photoresist of L;
(D) to coated SU-8 photoresist expose successively, development and post bake, use the lay photoetching mask plate of female mirror that step (A) makes, make female mirror of inserted two-dimension focusing X ray combination refractor;
(2) making step of the sub-mirror of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(E) use the electron beam lithographic technique to make the lay photoetching mask plate of the sub-mirror of substrate of glass crome metal material, the lay photoetching mask plate of described sub-mirror comprises that clamping limb and a plurality of coaxial square of arranging that is arranged on the clamping limb embed the mirror body, described square embeds total N of mirror body, identical with the square hole number of described female mirror, described square embeds in the mirror body second circular hole, described second Circularhole diameter is φ, the center of circle of second circular hole overlaps with the center that described square embeds the mirror body, the length of side that described square embeds the mirror body is L, described square embeds the mirror body and described clamping limb is an one, and the thickness of described clamping limb is t;
(F) silicon chip substrate is carried out cleaning;
(G) apply one deck BP212 photoresist in the silicon chip substrate surface spin of handling through step (F), and carry out preceding baking;
(H) at the metallic copper film of print superficial growth one deck 200-300 nanometer of handling through step (G);
(I) applying a layer thickness in the print surface spin of handling through step (H) is the SU-8 photoresist of L;
(J) to coated SU-8 photoresist expose successively, development and post bake, use the lay photoetching mask plate of the sub-mirror that step (E) makes;
(K) use BP212 photoresist glue-dispenser to remove the BP212 photoresist, remove silicon chip substrate simultaneously;
(L) use the method for chemical corrosion copper to remove the copper film, make the sub-mirror of inserted two-dimension focusing X ray combination refractor;
(3) number of assembling steps of the inserted two-dimension focusing X ray combination of described SU-8 material refractor:
(M) female mirror and the sub-mirror that will make place microscopically, find and clamp the clamping limb of sub-mirror, the embedding mirror body of sub-mirror is aimed at the square hole of female mirror, N on the sub-mirror to embed the mirror body corresponding one by one with N square hole on female mirror, embed and compress gently, finish the making of inserted two-dimension focusing X ray combination refractor.
2. the method for making of the inserted two-dimension focusing X ray combination of SU-8 material as claimed in claim 1 refractor, it is characterized in that: in the described step (A), distance between the center of circle of described first circular hole and the center of square hole is L, in the described step (E), the distance that described two squares embed between the mirror body is L.
3. the method for making of the inserted two-dimension focusing X ray combination of SU-8 material as claimed in claim 1 or 2 refractor, it is characterized in that: the scope of described φ is 40 microns to 240 microns, the scope of L is 50 microns to 250 microns, the scope of δ is 1 micron to 2 microns, the scope of N is 20 to 100, and the scope of t is 50 microns to 100 microns.
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CN102214493A (en) * | 2011-03-16 | 2011-10-12 | 浙江工业大学 | Method for manufacturing metal paraboloid-shaped two-dimensionally-focused X-ray combined refractor |
WO2012122751A1 (en) * | 2011-03-16 | 2012-09-20 | 浙江工业大学 | Method for fabricating paraboloidal type two-dimensional focusing x-ray combined refraction lens |
CN108417288A (en) * | 2018-04-23 | 2018-08-17 | 浙江工业大学 | A kind of production method of micromation X-ray array combination refractor integrated package |
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