CN201199454Y - Nanometer focusing X ray combined lens - Google Patents
Nanometer focusing X ray combined lens Download PDFInfo
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- CN201199454Y CN201199454Y CNU2008200818674U CN200820081867U CN201199454Y CN 201199454 Y CN201199454 Y CN 201199454Y CN U2008200818674 U CNU2008200818674 U CN U2008200818674U CN 200820081867 U CN200820081867 U CN 200820081867U CN 201199454 Y CN201199454 Y CN 201199454Y
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- focusing
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Abstract
The utility model relates to a nano focusing X-ray combination lens, comprising a lens body and a substrate which is positioned at the lower part of the lens body; the lens body is opened with a plurality of through hole-shaped air gaps which are distributed in a line, and each through hole-shaped air gap and the lens body material form a refraction unit of the combination lens together; the cross section of the air gap takes the shape of an ellipse; the largest caliber size of the air gap corresponding to the direction of the short axis of the ellipse is less than the size of the short axis of the ellipse; the long axles of the ellipse corresponding to the air gap are in the same line; the size of the ellipse corresponding to the air gap is reduced gradually; according to the arrangement from large to small, an incident X-ray bundle firstly injects and passes through the refraction unit which has the elliptic air gaps with largest size.
Description
(1) technical field
The utility model belongs to X ray Microstructure Optics device, especially can realize the microstructure X ray optical device that nanoscale focuses on to X ray, is applicable to sigmatron wave band (〉 5keV) radiation carries out the occasion of one-dimensional focusing and imaging.
(2) background technology
The X ray compound lens to be A.Snigirev proposed in 1996 a kind of be applicable to sigmatron wave band (being that the X-radiation energy surpasses 5keV), based on the X ray Microstructure Optics device of refraction effect.Have the light path that do not need to turn back, high-temperature stability is good and easily cooling, simple and compact for structure, the lens surface roughness is required advantages such as low.Have wide practical use in ultrahigh resolution radiodiagnosis Science and Technology field.In recent years, very active based on the various radiodiagnosis technical research of X ray compound lens.Analyse experimental system such as the sigmatron fluorescence microbedding that is used for sample element distribution measuring; Utilize the middle sub-microscope of aluminium-material X-ray assembled lens; And be used for sigmatron experimental system of unicellular detection, chemical microanalysis, early stage breast tumor detection etc. or the like.
Along with above-mentioned application is more and more higher to the resolution requirement of radiodiagnosis technology, need the yardstick of radiodiagnosis light beam more and more littler, preferably can reach sub-micron even nanometer scale.Yet the focal spot of general X ray compound lens is usually at several microns, tens microns even tens microns.Therefore, it is extremely important to the performance of improving the radiodiagnosis system how further to reduce the focal spot size of X ray compound lens.
Theoretically, reduce the focal spot size of X ray compound lens, can realize by how much bores that reduce each lens unit in the X ray compound lens and the number that increases lens unit.Yet how much bores that reduce lens unit just mean the numerical aperture that reduces the X ray compound lens, make X ray compound lens light collecting light ability variation.On the other hand, increase the number of lens unit in the X ray compound lens, then can make the absorption of X ray compound lens increase, loss just increases considerably.Simultaneously, the lens unit number is many more, and its optical axis calibrator is difficult more, if Micrometer-Nanometer Processing Technologies such as use photoetching are made compound lens, the increase of lens unit number also will be exposed the restriction of area size.
The present domestic report of not seeing as yet about nano-focusing X ray lens combination, the prior art that realizes the X ray nano-focusing in the world are (C.Schroer, the et al. that realizes by how much bores that reduce lens unit, Appl.Phys.Lett., 2003, vol.82, pp1485-1487).Lens unit in the prior art X ray compound lens adopts paraboloidal, its manufacturing process is earlier compound lens to be scribed on the Cr film with the electron beam lithographic method, and then with the transcription of reactive ion bundle lithographic method to the Si material, finish the making of compound lens, the representative value of how much bores of lens unit is several microns in the compound lens, 20 microns of the gauges of compound lens, about 100 nanometers of the focal spot size of focusing.There is following shortcoming in this technology: 1, the numerical aperture of X ray compound lens is very little, and in the magnitude of several microns to tens microns, so light collecting light ability is very poor; 2, the paraboloidal of lens is not desirable face shape, but therefore desirable face shape (being elliptical area shape) being similar under the paraxial approximation condition can not make the X ray compound lens reach desirable focusing performance; 3, owing to adopted fine manufacturing technology, machining precision is higher, but because the compound lens depth dimensions is made technology limitation, causes device to be very limited at the light harvesting bore of depth direction, and and then influenced the X-radiation transmitance largely; 4, the plane micro production technology that combines with reactive ion bundle etching phase of electron beam lithography is ripe to the fine manufacture craft of Si material, and bigger for the other materials restriction.
(3) summary of the invention
In order to overcome the shortcoming that the compound lens light collecting light ability is poor in the prior art, the lens focus performance is not ideal enough, the X-radiation transmitance is low, manufacturing technology technology is big to materials limitations, the utility model proposes that a kind of lens light collecting light ability is strong, the lens focus performance is good, X-radiation transmitance height, adapt to the nano-focusing X ray lens combination of existing ripe plane micro production technology.
The technical scheme that its technical matters that solves the utility model adopts is:
A kind of nano-focusing X ray lens combination, comprise lens body, be positioned at the lining base of lens body below, have the through hole shape air-gap that a plurality of linearly orders are arranged on the described lens body, each through hole shape air-gap constitutes the refraction unit of a compound lens with the lens body material, the cross sectional shape of described air-gap is oval, the maximum caliber size of the corresponding ellipse short shaft direction of described air-gap is less than the ellipse short shaft size, the transverse of described air-gap correspondence is located along the same line, the oval size of described air-gap correspondence reduces gradually, descending series arrangement, incident X-rays Shu Shouxian incident and by having the refraction unit of the oval air-gap of full-size.How much bores of described refraction unit are by the elliptic geometry size decision of its air-gap, and how much bores of described a kind of nano-focusing X ray lens combination are by how much bore decisions of the refraction unit of how much bore maximums.
Maximum how much bores of the refraction unit of described compound lens are at 400 microns-1000 micrometer ranges, and minimum how much bores are at 20 microns-40 micrometer ranges.
The thickness range of described lens is at 40 microns-100 microns.
Described lens body material can be for one of following: 1. PMMA, 2. aluminium, 3. aluminium oxide.
Described lens lining base is organic glass or glass material.
The beneficial effects of the utility model mainly show: the structure that 1, adopts lens refraction cell geometry bore to reduce gradually, and gradual change type ground is reduced to tens nanometers to several nanometers with the focusing focal spot of compound lens, realizes the purpose of nano-focusing; 2, the light collecting light ability of this nano-focusing X ray lens combination therefore can be comparable with the light collecting light ability of common X ray compound lens mainly by maximum how much oval bore decisions, and compared with the prior art, light collecting light ability increases substantially; 3, optimize the face shape shape of X ray compound lens refraction unit, adopt elliptical area shape, aberration is almost nil, and the focal spot mass ratio is better, helps reaching to the perfect effect that focuses on of plane X ray incident wave; 4, adopt accurate LIGA manufacturing technology, the device depth-to-width ratio is big, so depth direction light harvesting bore also can increase substantially, and then X ray efficient can increase substantially; 5, little to materials limitations, can integrated, disposable Precision Machining moulding.
(4) description of drawings
Fig. 1 is the structural representation of a kind of nano-focusing X ray lens combination of the utility model
1-lining base, 2-lens body, 3-air-gap
(5) embodiment
Below in conjunction with accompanying drawing the utility model is further described.
Embodiment 1:
As shown in Figure 1, a kind of nano-focusing X ray lens combination, comprise lens body 2, be positioned at the lining base 1 of lens body below, have the through hole shape air-gap 3 that a plurality of linearly orders are arranged on the described lens body, each through hole shape air-gap constitutes the refraction unit of a compound lens with the lens body material, the cross sectional shape of described air-gap is oval, the maximum caliber size of the corresponding ellipse short shaft direction of described air-gap is less than the ellipse short shaft size, the transverse of described air-gap correspondence is located along the same line, the oval size of described air-gap correspondence reduces gradually, descending series arrangement, incident X-rays Shu Shouxian incident and by having the refraction unit of the oval air-gap of full-size.How much bores of described refraction unit are by the elliptic geometry size decision of its air-gap, and how much bores of described a kind of nano-focusing X ray lens combination are by how much bore decisions of the refraction unit of how much bore maximums.Maximum how much bores of the refraction unit of described a kind of nano-focusing X ray lens combination are 400 microns, and minimum how much bores are 20 microns.The thickness of described lens is 40 microns.
Described lens body material can be for one of following: 1. PMMA, 2. aluminium, 3. aluminium oxide.
Described lens lining base is organic glass or glass material.
Embodiment 2:
As shown in Figure 1, a kind of nano-focusing X ray lens combination, comprise lens body 2, be positioned at the lining base 1 of lens body below, have the through hole shape air-gap 3 that a plurality of linearly orders are arranged on the described lens body, each through hole shape air-gap constitutes the refraction unit of a compound lens with the lens body material, the cross sectional shape of described air-gap is oval, the maximum caliber size of the corresponding ellipse short shaft direction of described air-gap is less than the ellipse short shaft size, the transverse of described air-gap correspondence is located along the same line, the oval size of described air-gap correspondence reduces gradually, descending series arrangement, incident X-rays Shu Shouxian incident and by having the refraction unit of the oval air-gap of full-size.How much bores of described refraction unit are by the elliptic geometry size decision of its air-gap, and how much bores of described a kind of nano-focusing X ray lens combination are by how much bore decisions of the refraction unit of how much bore maximums.Maximum how much bores of the refraction unit of described a kind of nano-focusing X ray lens combination are 1000 microns, and minimum how much bores are 40 microns.The thickness of described lens is 100 microns.
Described lens body material can be for one of following: 1. PMMA, 2. aluminium, 3. aluminium oxide.
Described lens lining base is organic glass or glass material.
Embodiment 3:
As shown in Figure 1, a kind of nano-focusing X ray lens combination, comprise lens body 2, be positioned at the lining base 1 of lens body below, have the through hole shape air-gap 3 that a plurality of linearly orders are arranged on the described lens body, each through hole shape air-gap constitutes the refraction unit of a compound lens with the lens body material, the cross sectional shape of described air-gap is oval, the maximum caliber size of the corresponding ellipse short shaft direction of described air-gap is less than the ellipse short shaft size, the transverse of described air-gap correspondence is located along the same line, the oval size of described air-gap correspondence reduces gradually, descending series arrangement, incident X-rays Shu Shouxian incident and by having the refraction unit of the oval air-gap of full-size.How much bores of described refraction unit are by the elliptic geometry size decision of its air-gap, and how much bores of described a kind of nano-focusing X ray lens combination are by how much bore decisions of the refraction unit of how much bore maximums.Maximum how much bores of the refraction unit of described a kind of nano-focusing X ray lens combination are 800 microns, and minimum how much bores are 30 microns.The thickness of described lens is 70 microns.
Described lens body material can be for one of following: 1. PMMA, 2. aluminium, 3. aluminium oxide.
Described lens lining base is organic glass or glass material.
Claims (4)
1. nano-focusing X ray lens combination, comprise lens body, be positioned at the lining base of lens body below, it is characterized in that: have the through hole shape air-gap that a plurality of linearly orders are arranged on the described lens body, each through hole shape air-gap constitutes the refraction unit of a compound lens with the lens body material, the cross sectional shape of described air-gap is oval, the maximum caliber size of the corresponding ellipse short shaft direction of described air-gap is less than the ellipse short shaft size, the transverse of described air-gap correspondence is located along the same line, the oval size of described air-gap correspondence reduces gradually, descending series arrangement, incident X-rays Shu Shouxian incident and by having the refraction unit of the oval air-gap of full-size.
2. nano-focusing X ray lens combination as claimed in claim 1, it is characterized in that: maximum how much bores of the refraction unit of described compound lens are at 400 microns-1000 micrometer ranges, minimum how much bores are at 20 microns-40 micrometer ranges, and the thickness range of described lens is at 40 microns-100 microns.
3. nano-focusing X ray lens combination as claimed in claim 1 or 2 is characterized in that: described lens body material can be for one of following: 1. PMMA, 2. aluminium, 3. aluminium oxide.
4. nano-focusing X ray lens combination as claimed in claim 3 is characterized in that: described lens lining base is organic glass or glass material.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200818674U CN201199454Y (en) | 2008-01-07 | 2008-01-07 | Nanometer focusing X ray combined lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNU2008200818674U CN201199454Y (en) | 2008-01-07 | 2008-01-07 | Nanometer focusing X ray combined lens |
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| Publication Number | Publication Date |
|---|---|
| CN201199454Y true CN201199454Y (en) | 2009-02-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNU2008200818674U Expired - Fee Related CN201199454Y (en) | 2008-01-07 | 2008-01-07 | Nanometer focusing X ray combined lens |
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| CN (1) | CN201199454Y (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102157216A (en) * | 2011-02-17 | 2011-08-17 | 浙江工业大学 | Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens |
-
2008
- 2008-01-07 CN CNU2008200818674U patent/CN201199454Y/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102157216A (en) * | 2011-02-17 | 2011-08-17 | 浙江工业大学 | Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C17 | Cessation of patent right | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20090225 Termination date: 20120107 |