CN102157216B - Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens - Google Patents
Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens Download PDFInfo
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- CN102157216B CN102157216B CN2011100403102A CN201110040310A CN102157216B CN 102157216 B CN102157216 B CN 102157216B CN 2011100403102 A CN2011100403102 A CN 2011100403102A CN 201110040310 A CN201110040310 A CN 201110040310A CN 102157216 B CN102157216 B CN 102157216B
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- 239000011521 glass Substances 0.000 claims description 18
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
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Abstract
The invention relates to a manufacturing method of a combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens, comprising the following steps of: (1) manufacturing a primary lens of the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens; (2) manufacturing a secondary lens of the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens; and (3) assembling the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens: (M) placing the manufactured primary lens and secondary lens under a microscope, finding out and clamping holding arms of the secondary lens, aligning inlaid lens bodies of the secondary lens to square holes of the primary lens, enabling N inlaid lens bodies of the secondary lens to correspond to N square holes of the primary lens in a one-to-one manner, inlaying and lightly pressing out to finish the manufacture of the combined inlaid two-dimensional focusing X-ray refraction lens. The manufacturing method of the combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens, disclosed by the invention, has high precision, the obtained lens axis can be self-calibrated with high precision and the focusing efficiency is high.
Description
Technical field
The present invention relates to a kind of New X ray Microstructure Optics device--the method for making of inserted two-dimension focusing X ray combination refractor is applicable to the occasion that SU-8 material two-dimension focusing X ray combination refractor is made.
Background technology
The X ray compound lens to be A.Snigirev proposed in 1996 a kind of be applicable to sigmatron wave band (being that the X-radiation energy surpasses 5keV), based on the X ray Microstructure Optics device of refraction effect.Have the light path of need not turning back, high-temperature stability is good and be prone to cooling, simple and compact for structure, the lens surface roughness is required advantages such as low.Have wide practical use in ultrahigh resolution radiodiagnosis Science and Technology field.In recent years, very active based on the various radiodiagnosis technical research of X ray compound lens.Sigmatron fluorescence microbedding such as being used for sample element distribution measuring is analysed experimental system; Utilize the middle sub-microscope of aluminium-material X-ray assembled lens; And be used for sigmatron experimental system of unicellular detection, chemical microanalysis, early stage breast tumor detection etc. or the like.
Initial X ray compound lens is the method that adopts the accurate keyhole of computing machine; Produce on aluminum metallic material that tens cylindrical bore of arranging to hundreds of order realize; X ray is carried out one-dimensional focusing, and utilize it to carry out X ray and survey and Research on Diagnosis.Afterwards in order to improve the making precision; The planar micro manufacturing technologies that adopt (comprise thin film deposition more; Technology such as photoetching, electron beam lithography, ion beam etching) making cross sectional shape is the X ray compound lens of circle, paraboloidal, elliptical area shape; The compound lens material expands to aluminium, silicon, lithium, boron, carbon, aluminium oxide, organic material PMMA or the like, and the effect of focusing is improved significantly, be such X ray compound lens still be one-dimensional focusing.Yet X ray is surveyed and the diagnostic techniques application, needs the X ray of micron even sub-micrometer scale to survey hot spot (promptly focusing on focal spot) usually, and is not only the focusing focal line.The X ray compound lens that therefore must development can carry out two-dimension focusing to X-radiation.
The X ray compound lens of two-dimension focusing is domestic does not at present appear in the newspapers as yet, mainly takes dual mode to reach the purpose to the X ray two-dimension focusing in the world.The one, two one-dimensional focusing X-ray compound lens quadratures are placed, respectively X-ray beam is carried out horizontal direction line focus and vertical direction line focus, to reach the purpose (C.G.Schroer of two-dimension focusing; Et al., Appl.Phys.Lett., 2003; Vol.82; Pp1485-1487), only need to make mono dimension X-ray composite lens, and do not relate to the manufacturing technology of two-dimensional x-ray compound lens.The 2nd, adopt mould pressing technology to make X ray compound lens (B.Lengeler, et al., the Appl.Phys.Lett. of two-dimension focusing; 1999; Vol.74 pp3924-3926), promptly at first adopts the precision optical machinery manufacturing technology to make the lens refraction unit mould of paraboloid of revolution shape; The single one by one compound lens of compacting refraction unit on aluminum then, at last with compound lens reflect the unit one by one series arrangement combine and form the X ray compound lens of two-dimension focusing.
Summary of the invention
Not high enough for the manufacture craft precision that overcomes the method for making that has two-dimension focusing X ray combination refractor, as the to obtain deficiency that the lens calibration accuracy is low, focusing efficiency is low, but the present invention provides the method for making of the high inserted two-dimension focusing X ray combination of the SU-8 material refractor of a kind of manufacture craft precision lens axis high precision self calibration, focusing efficiency high, that obtain.
The technical solution adopted for the present invention to solve the technical problems is:
The method for making of the inserted two-dimension focusing X ray combination of a kind of SU-8 material refractor, said method for making may further comprise the steps:
(1) making step of female mirror of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(A) make the lay photoetching mask plate of female mirror of substrate of glass crome metal material with the electron beam lithographic technique; The lay photoetching mask plate of said female mirror is made up of coaxial first circular hole and the square hole of arranging of a plurality of sequence interval; Total N of said square hole; Said first Circularhole diameter is φ, and the length of side of said square hole is L+ δ;
(B) glass substrate is carried out clean;
(C) be the SU-8 photoresist of L applying a layer thickness through the spin of step (B) glass substrate processed surface;
(D) to coated SU-8 photoresist make public successively, development and post bake, use the lay photoetching mask plate of female mirror that step (A) processes, process female mirror of inserted two-dimension focusing X ray combination refractor;
(2) making step of the sub-mirror of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(E) make the lay photoetching mask plate of the sub-mirror of substrate of glass crome metal material with the electron beam lithographic technique; The lay photoetching mask plate of said sub-mirror comprises that clamping limb and a plurality of coaxial square of arranging that is arranged on the clamping limb embed the mirror body, and said square embeds total N of mirror body, and is identical with the square hole number of said female mirror; Said square embeds in the mirror body has second circular hole; Said second Circularhole diameter is φ, and the center of circle of second circular hole overlaps with the center that said square embeds the mirror body, and the length of side that said square embeds the mirror body is L; Said square embeds the mirror body and said clamping limb is an one, and the thickness of said clamping limb is t;
(F) silicon chip substrate is carried out clean;
(G) apply one deck BP212 photoresist in the silicon chip substrate surface spin of handling through step (F), and carry out preceding baking;
(H) at the metallic copper film of print superficial growth one deck 200-300 nanometer of handling through step (G);
(I) applying a layer thickness in the print surface spin of handling through step (H) is the SU-8 photoresist of L;
(J) to coated SU-8 photoresist make public successively, development and post bake, use the lay photoetching mask plate of the sub-mirror that step (E) processes;
(K) use BP212 photoresist glue-dispenser to remove the BP212 photoresist, remove silicon chip substrate simultaneously;
(L) use the method for chemical corrosion copper to remove the copper film, process the sub-mirror of inserted two-dimension focusing X ray combination refractor;
(3) number of assembling steps of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(M) female mirror and the sub-mirror that will process place microscopically; Find and clamp the clamping limb of sub-mirror; The embedding mirror body of sub-mirror is aimed at the square hole of female mirror; N on the sub-mirror to embed the mirror body corresponding one by one with N square hole on female mirror, and embedding also compresses gently, accomplishes the making that inserted two-dimension focusing X ray makes up refractor.
Further, in the said step (A), the distance between the center of circle of said first circular hole and the center of square hole is L, and in the said step (E), the distance that said two squares embed between the mirror body is L.
Further again, the scope of said φ is 40 microns to 240 microns, and the scope of L is 50 microns to 250 microns, and the scope of δ is 1 micron to 2 microns, and the scope of N is 20 to 100, and the scope of t is 50 microns to 100 microns.
Technical conceive of the present invention is: designed a kind of inserted two-dimension focusing X ray combination refractor; Comprise glass substrate and female mirror; Said female mirror is installed on the said glass substrate; Said female mirror comprises female mirror main body and sequence interval is arranged on said female mirror main body cylindrical cavity and square cavities; The center of each cylindrical cavity and square cavities center all are positioned on the same straight line of length direction of said female mirror main body (coaxial arranging), and said cylindrical cavity is provided with in order to X ray is reflected to reach first face of cylinder of X-radiation along the focusing of the first cylinder axis vertical direction, and each square cavities is embedded in and embeds the mirror body; The cross section of said embedding mirror body is square; Said embedding mirror body center is provided with cylindrical hole, and said cylindrical hole is provided with in order to X ray is reflected to reach second face of cylinder of X-radiation along the focusing of the second cylinder axis vertical direction, the mutual orthogonal thereto structure in said first face of cylinder and said second face of cylinder.
A plurality of embedding mirror bodies are installed on the clamping limb, and the center distance of adjacent embedding mirror body equates with the center distance of adjacent square cavity.Said embedding mirror body is a square; The diameter of said cylindrical hole is littler than the said square length of side; The center line of said square and the dead in line of said cylindrical hole; The said square length of side of the side ratio of said square cavities is big, and the degree of depth of said cylindrical cavity and the degree of depth of square cavities all equate with the length of side of said square.Distance between the center of said square cavities and the center of cylindrical cavity equates with the length of side of said square.The diameter of said cylindrical cavity is littler than the length of side of said square.The diameter of said cylindrical cavity and the equal diameters of said cylindrical hole.
Said female mirror and sub-mirror through after the microscopically assembling, promptly form the inserted two-dimension focusing X ray combination of the present invention refractor (as shown in Figure 1), and the z axle of coordinate system shown in Figure 1 is the optical axis of said inserted two-dimension focusing X ray combination refractor.The two-dimension focusing function of said inserted two-dimension focusing X ray combination refractor; Accomplish by refraction unit of the two-dimension focusing one by one in it (shown in Fig. 1 c); Said two-dimension focusing refraction unit constitutes along y axle, two orthogonal faces of cylinder along the x axle by one jointly.The incident X-rays bundle is along the inserted two-dimension focusing X ray combination of the z direction of principal axis directive of coordinate system as shown in Figure 1 refractor; Through the repeatedly refraction of two-dimension focusing refraction unit one by one; After the outgoing of said inserted two-dimension focusing X ray combination refractor, form the two-dimension focusing focal spot.
Beneficial effect of the present invention mainly shows: 1, invented a kind of New X micro structural component--the method for making of inserted two-dimension focusing X ray combination refractor is used for the actual fabrication to this New X ray device; 2, inserted two-dimension focusing X ray combination refractor has the function of individual devices realization to the X-ray beam two-dimension focusing, and calibration accuracy is high, convenient; 3, adopt the plane Micrometer-Nanometer Processing Technology, the device depth-to-width ratio is big, and is little to materials limitations, can integrated, disposable Precision Machining moulding.
Description of drawings
Fig. 1 a is the front elevation of the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 1 b is the vertical view of the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 1 c is the enlarged drawing of the local I of two-dimension focusing refraction unit in the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 1 d is the vertical view of the local I of two-dimension focusing refraction unit in the inserted two-dimension focusing X ray combination of the present invention refractor.
Fig. 2 a is the lay photoetching mask plate synoptic diagram of female mirror of the inserted two-dimension focusing X ray combination of the present invention refractor
Fig. 2 b is the lay photoetching mask plate synoptic diagram of the sub-mirror of the inserted two-dimension focusing X ray combination of the present invention refractor
Wherein: o representes the initial point of rectangular coordinate system, and x, y, z represent x axle, y axle and the z axle of rectangular coordinate system respectively, and g representes optical axis, and a is the shading light part of lay photoetching mask plate.
Embodiment
Below in conjunction with accompanying drawing the present invention is further described.
Embodiment 1
With reference to Fig. 1 a～Fig. 2 b, the method for making of the inserted two-dimension focusing X ray combination of a kind of SU-8 material refractor, concrete steps are following:
(1) making step of female mirror of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(A) make the lay photoetching mask plate of female mirror of substrate of glass crome metal material with the electron beam lithographic technique; The lay photoetching mask plate figure of said female mirror is shown in Fig. 2 a; Form along coaxial circular hole of arranging of z axle and square hole successively by a plurality of, total N of said square hole is identical with the embedding mirror body number of said sub-mirror; Said Circularhole diameter is φ, and the length of side of said square hole is L+ δ;
(B) glass substrate is carried out clean;
(C) be the SU-8 photoresist of L applying a layer thickness through the spin of step (B) glass substrate processed surface;
(D) to coated SU-8 photoresist make public successively, development and post bake, the lay photoetching mask plate that uses step (A) to process is processed female mirror of inserted two-dimension focusing X ray combination refractor.
(2) making step of the sub-mirror of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(E) make the lay photoetching mask plate of the sub-mirror of substrate of glass crome metal material with the electron beam lithographic technique, the lay photoetching mask plate figure of said sub-mirror embeds the mirror body and clamping limb is formed along the coaxial square of arranging of z axle by a plurality of successively shown in Fig. 2 b; Said square embeds total N of mirror body; Identical with the square hole number of said female mirror, said square embeds in the mirror body has circular hole, and said Circularhole diameter is φ; The center of circle of circular hole overlaps with the center that said square embeds the mirror body; The length of side that said square embeds the mirror body is L, and affiliated square embeds the mirror body and said clamping limb is an one, and the thickness of affiliated clamping limb is t;
(F) silicon chip substrate is carried out clean;
(G) apply one deck BP212 photoresist in the silicon chip substrate surface spin of handling through step (F), and carry out preceding baking;
(H) at the metallic copper film of print superficial growth one deck 200 nanometers of handling through step (G);
(I) applying a layer thickness in the print surface spin of handling through step (H) is the SU-8 photoresist of L;
(J) to coated SU-8 photoresist make public successively, development and post bake, the lay photoetching mask plate that uses step (E) to process;
(K) use BP212 photoresist glue-dispenser to remove the BP212 photoresist, remove silicon chip substrate simultaneously;
(L) use the method for conventional chemical corrosion copper to remove the copper film, process the sub-mirror of inserted two-dimension focusing X ray combination refractor.
(3) number of assembling steps of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
The female mirror and the sub-mirror of the inserted two-dimension focusing X ray combination of the said SU-8 material that (M) will process refractor place microscopically; Find and clamp the clamping limb of sub-mirror; The embedding mirror body of sub-mirror is aimed at the square hole of female mirror; Noting on the sub-mirror N, to embed the mirror body corresponding one by one with N square hole on female mirror, and embedding also compresses gently, accomplishes the making that inserted two-dimension focusing X ray makes up refractor.
In the said step (A), the distance between the center of circle of said first circular hole and the center of square hole is L, and in the said step (E), the distance that said two squares embed between the mirror body is L.
The inserted two-dimension focusing X ray combination refractor of present embodiment comprises glass substrate, and a female mirror and a sub-mirror that embeds female mirror that is positioned on the glass substrate is formed (as shown in Figure 1) jointly.Said glass substrate is as the base of inserted two-dimension focusing X ray combination refractor; Said female mirror is produced on the glass substrate; Female mirror comprise female mirror material of main part and on material of main part tactic cylindrical cavity constitute jointly with square cavities, said square cavities is used for the sub-mirror of embedding.Said sub-mirror comprises clamping limb and embeds the mirror body and form jointly that said embedding mirror body is a square, and there is cylindrical hole the square center, and the embedding mirror body of said sub-mirror embeds the square cavities of female mirror from the top of said female mirror.The refraction to X ray is accomplished on the face of cylinder of the cylindrical hole in cylindrical cavity in said female mirror and the said sub-mirror, reaches the focusing of X-radiation along the cylinder axis vertical direction.The two-dimension focusing function of said inserted two-dimension focusing X ray combination refractor; Accomplish by refraction unit of the two-dimension focusing one by one in it (shown in Fig. 1 c); Said two-dimension focusing refraction unit constitutes along y axle, two orthogonal faces of cylinder along the x axle by one jointly.The incident X-rays bundle is along the inserted two-dimension focusing X ray combination of the z direction of principal axis directive of coordinate system as shown in Figure 1 refractor; Through the repeatedly refraction of two-dimension focusing refraction unit one by one; After the outgoing of said inserted two-dimension focusing X ray combination refractor, form the two-dimension focusing focal spot.
Wherein: φ is 40 microns, and L is 50 microns, and δ is 1 micron, and N is 20, and t is 50 microns.
With reference to Fig. 1 a～Fig. 2 b, all making steps are identical with embodiment 1, and just wherein φ is 240 microns, and L is 250 microns, and δ is 2 microns, and N is 100, and t is 100 microns, and copper film thickness is 250 nanometers in the step (H).
Embodiment 3
With reference to Fig. 1 a～Fig. 2 b, all making steps are identical with embodiment 1, and just wherein φ is 200 microns, and L is 210 microns, and δ is 1.5 microns, and N is 80, and t is 80 microns, and copper film thickness is 300 nanometers in the step (H).
The described content of the embodiment of this instructions only is enumerating the way of realization of inventive concept; Protection scope of the present invention should not be regarded as and only limit to the concrete form that embodiment states, protection scope of the present invention also reach in those skilled in the art conceive according to the present invention the equivalent technologies means that can expect.
Claims (3)
1. the method for making of the inserted two-dimension focusing X ray combination of SU-8 material refractor, it is characterized in that: said method for making may further comprise the steps:
(1) making step of female mirror of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(A) make the lay photoetching mask plate of female mirror of substrate of glass crome metal material with the electron beam lithographic technique; The lay photoetching mask plate of said female mirror is made up of coaxial first circular hole and the square hole of arranging of a plurality of sequence interval; Total N of said square hole; Said first Circularhole diameter is φ, and the length of side of said square hole is L+ δ;
(B) glass substrate is carried out clean;
(C) be the SU-8 photoresist of L applying a layer thickness through the spin of step (B) glass substrate processed surface;
(D) to coated SU-8 photoresist make public successively, development and post bake, use the lay photoetching mask plate of female mirror that step (A) processes, process female mirror of inserted two-dimension focusing X ray combination refractor;
(2) making step of the sub-mirror of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(E) make the lay photoetching mask plate of the sub-mirror of substrate of glass crome metal material with the electron beam lithographic technique; The lay photoetching mask plate of said sub-mirror comprises that clamping limb and a plurality of coaxial square of arranging that is arranged on the clamping limb embed the mirror body, and said square embeds total N of mirror body, and is identical with the square hole number of said female mirror; Said square embeds in the mirror body has second circular hole; Said second Circularhole diameter is φ, and the center of circle of second circular hole overlaps with the center that said square embeds the mirror body, and the length of side that said square embeds the mirror body is L; Said square embeds the mirror body and said clamping limb is an one, and the thickness of said clamping limb is t;
(F) silicon chip substrate is carried out clean;
(G) apply one deck BP212 photoresist in the silicon chip substrate surface spin of handling through step (F), and carry out preceding baking;
(H) at the metallic copper film of print superficial growth one deck 200-300 nanometer of handling through step (G);
(I) applying a layer thickness in the print surface spin of handling through step (H) is the SU-8 photoresist of L;
(J) to coated SU-8 photoresist make public successively, development and post bake, use the lay photoetching mask plate of the sub-mirror that step (E) processes;
(K) use BP212 photoresist glue-dispenser to remove the BP212 photoresist, remove silicon chip substrate simultaneously;
(L) use the method for chemical corrosion copper to remove the copper film, process the sub-mirror of inserted two-dimension focusing X ray combination refractor;
(3) number of assembling steps of the inserted two-dimension focusing X ray combination of said SU-8 material refractor:
(M) female mirror and the sub-mirror that will process place microscopically; Find and clamp the clamping limb of sub-mirror; The embedding mirror body of sub-mirror is aimed at the square hole of female mirror; N on the sub-mirror to embed the mirror body corresponding one by one with N square hole on female mirror, and embedding also compresses gently, accomplishes the making that inserted two-dimension focusing X ray makes up refractor.
2. the method for making of the inserted two-dimension focusing X ray combination of SU-8 material as claimed in claim 1 refractor; It is characterized in that: in the said step (A); Distance between the center of circle of said first circular hole and the center of square hole is L; In the said step (E), the distance that said two squares embed between the mirror body is L.
3. the method for making of the inserted two-dimension focusing X ray combination of according to claim 1 or claim 2 SU-8 material refractor; It is characterized in that: the scope of said φ is 40 microns to 240 microns; The scope of L is 50 microns to 250 microns; The scope of δ is 1 micron to 2 microns, and the scope of N is 20 to 100, and the scope of t is 50 microns to 100 microns.
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| CN2011100403102A CN102157216B (en) | 2011-02-17 | 2011-02-17 | Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens |
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| CN2011100403102A CN102157216B (en) | 2011-02-17 | 2011-02-17 | Manufacturing method of combined SU-8-material inlaid two-dimensional focusing X-ray refraction lens |
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| WO2012122751A1 (en) * | 2011-03-16 | 2012-09-20 | 浙江工业大学 | Method for fabricating paraboloidal type two-dimensional focusing x-ray combined refraction lens |
| CN108417288B (en) * | 2018-04-23 | 2020-01-10 | 浙江工业大学 | Manufacturing method of miniaturized X-ray array combined refraction lens integrated assembly |
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