CN104181624A - Method for manufacturing self-supporting single-stage diffraction grating - Google Patents
Method for manufacturing self-supporting single-stage diffraction grating Download PDFInfo
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- CN104181624A CN104181624A CN201410448329.4A CN201410448329A CN104181624A CN 104181624 A CN104181624 A CN 104181624A CN 201410448329 A CN201410448329 A CN 201410448329A CN 104181624 A CN104181624 A CN 104181624A
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Abstract
The invention provides a method for manufacturing a self-supporting single-stage diffraction grating. According to the method, the focused ion beam direct-writing technology is adopted to process the single-stage diffraction transmissive grating on an opaque metal self-supporting absorber film. Geometric accuracy of a feature structure of the single-stage diffraction grating is controlled by setting graph magnification times, working voltage, working current and working depth. The effective area of the single-stage diffraction grating is enlarged by means of the graphic high-accuracy splicing technology so that requirements of the single-stage diffraction grating for geometrical parameter accuracy and lattice structure area can be met. No mask is needed in the focused ion beam direct-writing technology, the processing purpose is achieved by performing dot bombardment on the finished surface through ion beams in a focused state, and therefore, the method has the advantages of being free of a supporting film, simplified in process, convenient to operate and the like. The self-supporting single-stage diffraction quantum lattice grating manufactured by the method has important application value in the fields of inertial confinement nuclear fusion laser plasma diagnosis, spectral analysis and test and the like.
Description
Technical field
The invention belongs to the making field of diffraction grating, be specifically related to a kind of method for making of the self-supporting single diffraction order grating as spectrometer beam splitter or monochromator wavelength separated/selection.
Background technology
Single diffraction order grating is the diffractive-optical element that a kind of light transmission rate is sinusoidal variations, there is high-diffraction efficiency and the excellent advantages such as single diffraction order performance, make it in fields such as inertial confinement fusion laser plasma diagnosis and spectral analysis tests, there is important using value.
The method for making of single diffraction order grating is mainly beamwriter lithography and X-ray lithography at present.First, utilize beamwriter lithography to make the microstructure of single diffraction order grating; Then using this grating as mask plate, adopt X-ray lithography to carry out optical grating construction and copy, just can make large-area single diffraction order grating.This process combines the advantages such as beamwriter lithography high resolving power, figure generative capacity and X-ray lithography greater efficiency, extremely strong penetration capacity.The patent No. is the design invention process that the < < quantum lattice diffracting rasters > > of CN200410081499.X has introduced single diffraction order quantum dot array grating, its last method for making adopting is beamwriter lithography and X-ray lithography, but this grid stroke density is lower, and adopted polyimide to make substrate, the X-ray of incident is had to stronger absorption, have in actual applications certain restriction.And beamwriter lithography and X-ray lithography relate to a series of some loaded down with trivial details techniques such as photoresist spin coating, development, photographic fixing, chemical corrosion and cull removal.Therefore, complex process, cost is high, the cycle is long, manufacture difficulty is large etc., and shortcoming becomes the main restricting factor of applying for the method.
Summary of the invention
The method for making that the object of this invention is to provide a kind of self-supporting single diffraction order grating, it adopts focused ion beam direct writing technology directly in self-supporting metal absorber film, to process the single diffraction order grating of hollow out according to grating design configuration, this process is disposable completing in a system, has that resolution is high, production efficiency is high, absorbed thickness is large, can self-supporting and practical value advantages of higher.
For achieving the above object, technical solution of the present invention is to provide a kind of method for making of self-supporting single diffraction order grating, and its manufacturing process in turn includes the following steps:
Step a: absorbent material selects the metal materials such as gold, nickel, tungsten, copper to do absorbent material;
Step b: the preparation of grating absorber adopts physics or chemical deposition to deposit one deck absorber film in monocrystal silicon substrate;
Step c: etching solution preparation mixes NaOH, deionized water by a certain percentage;
Steps d: silicon base etching is positioned over the monocrystalline silicon piece that is coated with golden film in the etching liquid that step c prepares;
Step e: after the realizing silicon base and corrode completely of self-supporting absorber, absorber film self-supporting at the bottom of center is with the silicon chip of through hole on;
Step f: thermal treatment in vacuum drying chamber is dried processing together with silicon base with transferring to after washed with de-ionized water by the absorber film of self-supporting;
Step g: preparing grating is placed in focused ion beam system by the absorber film preparing in step f, make samples vertical in focused ion beam, import the design configuration of grating, focused ion beam system is processed according to grating design configuration, realize the transfer of raster graphic, in absorber film, obtain the optical grating construction of certain area;
Step h: area of raster expands by accurate sample translation, repeating step g, expands grating useful area.
The method for making of described a kind of self-supporting single diffraction order grating, in the step a described in it, grating absorber is the metal materials such as gold, nickel, tungsten, copper, the thickness of absorbent material in 300 nanometers between 800 nanometers.
The method for making of described a kind of self-supporting single diffraction order grating, in the step b described in it, the technical parameter of etching liquid is:
NaOH 40g
Deionized water 100mL
The method for making of described a kind of self-supporting single diffraction order grating, the technical parameter in the step f described in it in heat treatment process is:
Temperature 45 C
Time 4h
The method for making of described a kind of self-supporting single diffraction order grating, in the step g described in it, grating design configuration is black and white bitmap.
The method for making of described a kind of self-supporting single diffraction order grating, technical parameter when score density is 1000 lines per millimeter in the step g described in it is:
Ion beam voltage 30kV
Ion beam current 96pA
Technical parameter when score density is 2000line/mm is:
Ion beam voltage 30kV
Ion beam current 48pA
Technical parameter when score density is 3000line/mm is:
Ion beam voltage 30kV
Ion beam current 9.7pA
The method for making of described a kind of self-supporting single diffraction order grating, all needs after sample translation each time in the step h described in it to focus on.
The method for making of a kind of self-supporting single diffraction order grating provided by the invention is disposable completing in a system, and processing step is simplified greatly, do not relate to some loaded down with trivial details techniques such as photoresist spin coating, developing fixing, chemical corrosion and cull removal, have simple to operation, facilitate consuming time few, without advantages such as support membranes.
Embodiment
Below in conjunction with specific embodiment, further illustrate the present invention.
The making of embodiment 1 1000 lines per millimeter self-supporting single diffraction order gratings
According to the manufacturing process steps of self-supporting single diffraction order grating, first adopt magnetically controlled DC sputtering at the upper thick gold of sputter one deck 500nm of monocrystalline silicon piece (100), with diamond tool, plated film silicon chip is cut into the square of 10mm * 10mm, then the silicon chip of cutting being placed in to chemical etching solution corrodes, make its back side perforate, wherein the composition of etching solution is: NaOH 40g, deionized water 100mL.After silicon base corrosion perforate, use a large amount of washed with de-ionized water, be then placed in baking oven dry 4h at 45 ℃.Be positioned in two-beam Electronic Speculum system the golden film of handling well is smooth, (operating voltage 15kV under electron beam, working current 0.14nA) utilize diagonal angle coordinate setting to center, in center, look for a reference point to amplify, focus on, operating distance is adjusted to the optimum distance of 5mm(electron beam gun and sample surfaces).Sample stage is tilted 52 °, and under electron beam window, reference point locations can move to Y direction, and mobile sample stage under the window of sample chamber, makes reference point get back to initial position.Operating voltage 30kV is set under ion beam window, and working current 96pA also focuses on, and imports the design drawing of grating, the range of work is set and processes.After machining for the first time, to X-direction translation focusing, import second grating design drawing and implement processing.After machining, X-direction to Y direction, carries out identical translation and processing again, until whole area of raster machines.Prepared self-supporting single diffraction order grating is comprised of the primitive of a series of accurate random alignment.Utilize focused ion beam to carry out zonule cutting and detection to grating, find that circular hole sidewall degree is higher, meet grating diffration requirement.
The making of embodiment 2 2000 lines per millimeter single diffraction order gratings
According to the manufacturing process of the single diffraction order grating described in embodiment 1, difference is that the ion beam working current in technical parameter is 48pA.
The making of embodiment 3 3000 lines per millimeter single diffraction order gratings
According to the manufacturing process of the single diffraction order grating described in embodiment 1, difference is that the ion beam working current in technical parameter is 9.7pA.
The above, be only several good embodiment of the present invention, not the present invention done to the restriction on any shape.Any those of ordinary skill in the art, take focused ion beam direct writing technology as main work sheet order diffraction grating in the situation that not departing from the present invention, all can utilize above-mentioned disclosed method to make many possible changes to technical solution of the present invention.Therefore, every the present invention of disengaging be take focused ion beam direct writing technology in the situation of main single diffraction order grating, according to technology path of the present invention, to any simple change made for any of the above embodiments, all still belongs to the scope of technical solution of the present invention protection.
Claims (9)
1. a method for making for self-supporting single diffraction order grating, in turn includes the following steps:
A: absorbent material selects metal material gold, nickel, tungsten, copper to do absorbent material;
B: the preparation of grating absorber adopts physics or chemical deposition to deposit one deck absorbent material film in monocrystal silicon substrate;
C: etching solution preparation mixes NaOH, deionized water by a certain percentage;
D: silicon base etching is positioned over the monocrystalline silicon piece that is coated with golden film in the etching liquid that step c prepares;
E: after the realizing silicon base and corrode completely of self-supporting absorber, absorber film self-supporting at the bottom of center is with the silicon chip of through hole on;
F: thermal treatment in vacuum drying chamber is dried processing together with silicon base with transferring to after washed with de-ionized water by the absorber film of self-supporting;
G: preparing grating is placed in focused ion beam system by the absorber film preparing in step f, make samples vertical in focused ion beam, import the design configuration of grating, focused ion beam system is processed according to grating design configuration, realize the transfer of raster graphic, in absorber film, obtain the optical grating construction of certain area;
H: area of raster expands by accurate sample translation, repeating step g, expands grating useful area.
2. the method for making of self-supporting single diffraction order grating according to claim 1, is characterized in that, the thickness of described step b absorbent material film is that 300 nanometers are to 800 nanometers.
3. the method for making of a kind of self-supporting single diffraction order grating according to claim 1, is characterized in that, in described step c, etching liquid consists of:
NaOH 40g
Deionized water 100mL.
4. the method for making of self-supporting single diffraction order grating according to claim 1, is characterized in that, the technical parameter in described step f in heat treatment process is:
Temperature 45 C
Time 4h.
5. the method for making of self-supporting single diffraction order grating according to claim 1, is characterized in that, in described step g, grating design configuration is black and white bitmap.
6. the method for making of self-supporting single diffraction order grating according to claim 1, is characterized in that, technical parameter when score density is 1000 lines per millimeter in described step g is:
Ion beam voltage 30kV
Ion beam current 96pA.
7. the method for making of self-supporting single diffraction order grating according to claim 1, is characterized in that, technical parameter when score density is 2000line/mm in described step g is:
Ion beam voltage 30kV
Ion beam current 48pA.
8. the method for making of self-supporting single diffraction order grating according to claim 1, is characterized in that, technical parameter when score density is 3000line/mm in described step g is:
Ion beam voltage 30kV
Ion beam current 9.7pA.
9. the method for making of a kind of self-supporting single diffraction order grating according to claim 1, is characterized in that, all needs to focus in described step h after sample translation each time.
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| CN201410448329.4A CN104181624A (en) | 2014-09-04 | 2014-09-04 | Method for manufacturing self-supporting single-stage diffraction grating |
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| CN201410448329.4A CN104181624A (en) | 2014-09-04 | 2014-09-04 | Method for manufacturing self-supporting single-stage diffraction grating |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113205899A (en) * | 2021-04-25 | 2021-08-03 | 中国工程物理研究院激光聚变研究中心 | X-ray refraction blazed grating and preparation method thereof |
| CN113345619A (en) * | 2021-06-16 | 2021-09-03 | 中国工程物理研究院激光聚变研究中心 | One-dimensional X-ray refraction blazed zone plate |
Citations (5)
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| CN1606704A (en) * | 2002-09-19 | 2005-04-13 | 住友电气工业株式会社 | Diffractive optical device and method for producing same |
| CN1924622A (en) * | 2006-09-22 | 2007-03-07 | 清华大学 | Method for making two-frequency high temperature grating |
| CN101261331A (en) * | 2008-04-21 | 2008-09-10 | 南京大学 | Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method |
| CN103364857A (en) * | 2013-08-08 | 2013-10-23 | 青岛大学 | Wide-spectrum polarization-irrelevant transmission-type grating and preparation method thereof |
| CN103592708A (en) * | 2013-10-16 | 2014-02-19 | 清华大学 | Method for preparing optical grating on surface of test piece |
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2014
- 2014-09-04 CN CN201410448329.4A patent/CN104181624A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1606704A (en) * | 2002-09-19 | 2005-04-13 | 住友电气工业株式会社 | Diffractive optical device and method for producing same |
| CN1924622A (en) * | 2006-09-22 | 2007-03-07 | 清华大学 | Method for making two-frequency high temperature grating |
| CN101261331A (en) * | 2008-04-21 | 2008-09-10 | 南京大学 | Self-supporting transmission metal grating based on nanometer stamping technology and its preparation method |
| CN103364857A (en) * | 2013-08-08 | 2013-10-23 | 青岛大学 | Wide-spectrum polarization-irrelevant transmission-type grating and preparation method thereof |
| CN103592708A (en) * | 2013-10-16 | 2014-02-19 | 清华大学 | Method for preparing optical grating on surface of test piece |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113205899A (en) * | 2021-04-25 | 2021-08-03 | 中国工程物理研究院激光聚变研究中心 | X-ray refraction blazed grating and preparation method thereof |
| CN113345619A (en) * | 2021-06-16 | 2021-09-03 | 中国工程物理研究院激光聚变研究中心 | One-dimensional X-ray refraction blazed zone plate |
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