CN102116706A - Measurement device and method for numerical aperture of projection objective - Google Patents
Measurement device and method for numerical aperture of projection objective Download PDFInfo
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- CN102116706A CN102116706A CN2010100224080A CN201010022408A CN102116706A CN 102116706 A CN102116706 A CN 102116706A CN 2010100224080 A CN2010100224080 A CN 2010100224080A CN 201010022408 A CN201010022408 A CN 201010022408A CN 102116706 A CN102116706 A CN 102116706A
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Abstract
The invention relates to a measurement device for the numerical aperture of a projection objective, which comprises an object surface base, a mobile table and an explorer, wherein the incident light side of the object surface base is provided with a scattering element, and incident light is uniformly scattered on the projection objective; the other side of the projection objective is provided with a pinhole mark, and the pinhole mark diffracts the incident light to be imaged on the image surface through the projection objective; the mobile table is installed on the image surface side of the projection objective and can make high-precision stepping motion in x and y directions; and the explorer is installed on the mobile table. A measurement method comprises the following steps of: selecting the scattering angle of the scattering element according to the setting value of the numerical aperture of the projection objective; moving the pinhole mark on a mask plate to an object surface viewing field; moving the explorer to the image surface viewing field; acquiring a light intensity distribution diagram; and calculating the numerical aperture of the projection objective. By using the in-situ measurement method for the numerical aperture of the projection objective, the in-situ and online measurement of the numerical aperture of the projection objective is realized, and meanwhile, the measurement method is simple and convenient.
Description
Technical field
The present invention relates to a kind of measuring method of projection objective numerical aperture.
Background technology
The numerical aperture of projection objective is to weigh a key index of projection objective performance.At present, the projection objective numerical aperture only can adopt the method for off-line to measure before it is not installed to litho machine.Because after projection objective was installed to litho machine, its performance did not have certain variation before installing, thus the in site measurement of projection objective numerical aperture for guarantee numerical aperture that precision is set is significant.
Summary of the invention
The objective of the invention is to propose a kind of projection objective numerical aperture measuring method, this method can realize the original position and the on-line measurement of projection objective numerical aperture after projection objective is integrated into litho machine, solved that numerical aperture of objective can only carry out off-line measurement and the problem that can't carry out original position and on-line measurement.
A kind of projection objective numerical aperture measurement mechanism comprises:
The object plane substrate;
Object plane substrate incident light one side has dispersing element, and incident light evenly is scattered in projection objective;
The design of object plane substrate opposite side has the pin hole mark, and the pin hole mark is imaged on image planes with the incident light diffraction through projection objective;
Projection objective image planes side is installed a transfer table, and this transfer table can carry out xy to the high precision step motion; And
Detector is installed on the transfer table.
Wherein, described detector is an energy-probe.
Wherein, described detector is CCD or cmos detector.
Wherein, described dispersing element is the coarse plane of pin hole marked back.
A kind of projection objective numerical aperture measuring method comprises the steps:
According to projection objective numerical aperture setting value selective scattering element scattering angle;
Pin hole mark on the mask is moved to the object plane visual field;
Detector is moved to the image planes visual field;
Use detector to gather the light distribution figure;
Calculate the projection objective numerical aperture.
Use the method for a kind of in site measurement projection objective numerical aperture of the present invention, realized the original position and the on-line measurement of numerical aperture of objective, measuring method is simple, convenient simultaneously.
Description of drawings
Figure 1 shows that the measurement structure schematic diagram of projection objective numerical aperture of the present invention;
Figure 2 shows that the incident light and the emergent light synoptic diagram of dispersing element;
Figure 3 shows that detector measurement scanning lattice point;
Figure 4 shows that pin hole mark synoptic diagram;
Figure 5 shows that the pinhole mask synoptic diagram;
Figure 6 shows that and use the preceding objective lens pupil face light distribution of dispersing element;
Figure 7 shows that and use objective lens pupil face light distribution behind the dispersing element;
Figure 8 shows that on-line measurement projection objective numerical aperture flow process;
Figure 9 shows that in site measurement projection objective numerical aperture flow process.
Embodiment
Below, describe in detail according to a preferred embodiment of the invention in conjunction with the accompanying drawings.For convenience of description and highlight the present invention, omitted existing associated components in the prior art in the accompanying drawing, and will omit description these well-known components.
Figure 1 shows that the measurement structure schematic diagram of projection objective numerical aperture of the present invention.The object plane substrate 107 of projection objective 101 is installed on the object plane substrate support unit 105.Object plane substrate 107 at projection objective 101 has pin hole mark 104 near the design of projection objective 101 1 sides, is comprising dispersing element 108 of pin hole mark 104 regional opposite sides installations.The incident light that this dispersing element 108 will incide on it carries out scattering, and the light after the scattering is through object plane substrate 107 back lighting pin hole marks 104, and pin hole mark 104 is imaged onto image planes 109 behind projection objective 101.In distance image planes 109 a distance, a transfer table 102 is installed, this transfer table can carry out xy to the high precision step motion.Detector 103 is installed on transfer table 102.
Measuring principle of the present invention is as follows: as shown in Figure 2, the cone-shaped beam that incides on the dispersing element 108 has certain angle, input aperture 401, and this angle, input aperture 401 is determined by the illuminator numerical aperture.Incident beam forms new cone-shaped beam after dispersing element 108 scatterings, the outgoing aperture angle 402 of this light beam is by numerical aperture of objective decision, and greater than angle, input aperture 401.The scattering angle of dispersing element 108 can be calculated with following formula
α=arcsin (NA)-arcsin (NA σ) ... ... ... ... (formula 1)
Wherein, NA is a projection objective numerical aperture setting value, and σ is the illumination section coherence factor.α is the scattering angle of dispersing element.
This light beam incides on the suprabasil pin hole mark 104 of object plane afterwards, and light beam enters projection objective 101 behind the pin hole diffraction, and its diffraction light will be full of projection objective 101 pupils.Through behind the projection objective 101, the pin hole mark is imaged on image planes 109 places.In position, the light distribution of projection objective pupil plane will be reproduced away from image planes 109.As shown in Figure 3, projection objective image that pupil becomes 501, its radius is the projection objective pupil radius.Utilize the detector 103 on the work stage to measure 501 light distribution of objective lens pupil face, utilize the radius of light distribution computed image 501, can obtain the numerical aperture of projection objective.The projection objective numerical aperture can utilize following formula to calculate:
Wherein, r is the light distribution radius, and f is for measuring the distance of identity distance from image planes, and NA is the projection objective numerical aperture.
Figure 4 shows that pin hole mark synoptic diagram.602 is the width of pin hole mark among the figure, and 601 is transmission region.Figure 5 shows that the pinhole mask synoptic diagram.The upper surface of pinhole mask 503 is worn into rough surface 504.
When the work stage detector is selected CCD or CMOS type detector for use, can realize the on-line measurement and the calibration of projection objective numerical aperture.Its on-line measurement comprises the steps: pin hole mark on the mask is moved to center, object plane visual field with the calibration flow process; The work stage detector is moved to center, image planes visual field; Detector is gathered the light distribution figure under quiescent conditions; Calculate the projection objective numerical aperture according to graphical distribution; The numerical aperture and the setting value that measure are compared, and adjust the numerical aperture setting according to difference.
When the work stage detector is selected energy or power type photodetector for use, can realize the in site measurement and the calibration of projection objective numerical aperture.Its in site measurement flow process comprises the steps: pin hole mark on the mask is moved to center, object plane visual field; The work stage detector is moved to center, image planes visual field; Detector carries out stepping in the XY plane, and in each stepping point measurement light intensity, obtains the light distribution of object lens pupil face; Calculate the projection objective numerical aperture according to graphical distribution.
Embodiment 1:
This section is described and is adopted the present invention to carry out the embodiment that numerical aperture is measured.As shown in Figure 1, when carrying out the numerical aperture measurement, lighting system is set to traditional lighting, partial coherence factor is 0.88, if projection objective numerical aperture setting value is 0.63, the scattering angle of the dispersing element of then selecting for use 108 is calculated by formula (1), and stay certain surplus, surplus can adopt 5 degree.
The objective lens pupil face light distribution of using the dispersing element front and back is respectively as Fig. 6 and shown in Figure 7, and after using dispersing element, the objective lens pupil face is filled.Pin hole mark on the mask, as shown in Figure 4, its size can adopt 100um.Detector can use the UV-818 detector that receives ultraviolet light.The suprabasil pin hole of object plane is imaged on the image planes place behind projection objective, on the plane of the distance image planes 0.5mm of place, use transfer table to drive energy-probe and carry out stepping in the XY plane, at each stepping position place, measures the light intensity of this position.The light intensity that energy-probe 103 measures is handled, can be obtained the light distribution 401 of objective lens pupil, as shown in Figure 3.The light intensity that measures is handled, obtained the radius size of light distribution.Can obtain the numerical aperture of projection objective according to formula (2).
Embodiment 2:
As shown in Figure 1, when carrying out the numerical aperture measurement, lighting system is set to traditional lighting, and partial coherence factor is 0.88, if projection objective numerical aperture setting value is 0.63.No longer select dispersing element for use, directly coarse plane is worn at the mask pin hole back side, as shown in Figure 5, the upper surface 502 of pin hole 503 is worn into coarse plane, make its scattering angle greater than 5 degree.Pin hole mark on the mask, its size can adopt 100um.Detector can use the UV-818 detector that receives ultraviolet light.The suprabasil pin hole of object plane is imaged on the image planes place behind projection objective, on the plane of the distance image planes 0.5mm of place, use transfer table to drive energy-probe and carry out stepping in the XY plane, at each stepping position place, measures the light intensity of this position.The light intensity that measures is handled, obtained the radius size of light distribution.Can obtain the numerical aperture of projection objective according to formula (2).
Embodiment 3
As shown in Figure 1, when carrying out the numerical aperture measurement, lighting system is set to traditional lighting, and partial coherence factor is 0.88, if projection objective numerical aperture setting value is 0.63.No longer select dispersing element for use, directly coarse plane is worn at the mask pin hole back side, as shown in Figure 5, the upper surface 502 of pin hole 503 is worn into coarse plane, make its scattering angle greater than 5 degree.Pin hole mark on the mask, its size can adopt 100um.Detector can use CCD or the cmos detector that receives ultraviolet light.The suprabasil pin hole of object plane is imaged on the image planes place behind projection objective, on the plane of the distance image planes 0.5mm of place, use CCD or cmos detector directly to write down the pupil plane image.The light intensity that measures is handled, obtained the radius size of light distribution.Can obtain the numerical aperture of projection objective according to formula (2).
Described in this instructions is several preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (5)
1. projection objective numerical aperture measurement mechanism is characterized in that comprising:
The object plane substrate;
Object plane substrate incident light one side has dispersing element, and incident light evenly is scattered in projection objective;
The design of object plane substrate opposite side has the pin hole mark, and the pin hole mark is imaged on image planes with the incident light diffraction through projection objective;
Projection objective image planes side is installed a transfer table, and this transfer table can carry out xy to the high precision step motion; And detector is installed on the transfer table.
2. projection objective numerical aperture measurement mechanism as claimed in claim 1 is characterized in that described detector is an energy-probe.
3. projection objective numerical aperture measurement mechanism as claimed in claim 1 is characterized in that described detector is CCD or cmos detector.
4. projection objective numerical aperture measurement mechanism as claimed in claim 1 is characterized in that described dispersing element is the coarse plane of pin hole marked back.
5. use measuring method, it is characterized in that comprising step as the device of one of claim 1-4:
According to projection objective numerical aperture setting value selective scattering element scattering angle;
Pin hole mark on the mask is moved to the object plane visual field;
Detector is moved to the image planes visual field;
Use detector to gather the light distribution figure;
Calculate the projection objective numerical aperture.
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| CN103439868A (en) * | 2013-09-01 | 2013-12-11 | 中国科学院光电技术研究所 | Device and method for measuring numerical aperture of projection objective |
| CN104516210A (en) * | 2013-10-08 | 2015-04-15 | 上海微电子装备有限公司 | Telecentric measurement apparatus and telecentric measurement method used in lens in lithography machine |
| CN106154761A (en) * | 2015-04-15 | 2016-11-23 | 上海微电子装备有限公司 | A kind of veiling glare measurement apparatus and measuring method |
| CN106403808A (en) * | 2015-07-29 | 2017-02-15 | 上海微电子装备有限公司 | Apparatus and method for measuring appearance of through silicon via |
| CN106802232A (en) * | 2017-03-16 | 2017-06-06 | 北京航空航天大学 | A kind of microcobjective numerical aperture measuring method and system based on total reflection |
| CN108803248A (en) * | 2018-05-03 | 2018-11-13 | 中国科学院光电研究院 | The on-line measuring device and method of the numerical aperture of projection objective |
| CN109916598A (en) * | 2019-04-26 | 2019-06-21 | 北京航空航天大学 | A kind of microcobjective numerical aperture measurement method based on diffraction grating |
| CN109959342A (en) * | 2017-12-26 | 2019-07-02 | 长光华大基因测序设备（长春）有限公司 | The detection method and device of numerical aperture of objective |
| CN110686871A (en) * | 2019-05-20 | 2020-01-14 | 苏州大学 | Numerical aperture measuring device and method of self-focusing lens |
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| US6750968B2 (en) * | 2000-10-03 | 2004-06-15 | Accent Optical Technologies, Inc. | Differential numerical aperture methods and device |
| CN100343622C (en) * | 2003-05-29 | 2007-10-17 | 中国科学院光电技术研究所 | Quick determining method for micro-lens structural parameters and surface deformation |
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| CN103439868B (en) * | 2013-09-01 | 2015-06-24 | 中国科学院光电技术研究所 | Device and method for measuring numerical aperture of projection objective |
| CN103439868A (en) * | 2013-09-01 | 2013-12-11 | 中国科学院光电技术研究所 | Device and method for measuring numerical aperture of projection objective |
| CN104516210A (en) * | 2013-10-08 | 2015-04-15 | 上海微电子装备有限公司 | Telecentric measurement apparatus and telecentric measurement method used in lens in lithography machine |
| CN104516210B (en) * | 2013-10-08 | 2016-09-28 | 上海微电子装备有限公司 | Telecentric measuring method for photoetching machine lens |
| CN106154761B (en) * | 2015-04-15 | 2018-06-26 | 上海微电子装备（集团）股份有限公司 | A kind of spuious optical measurement instrument and measuring method |
| CN106154761A (en) * | 2015-04-15 | 2016-11-23 | 上海微电子装备有限公司 | A kind of veiling glare measurement apparatus and measuring method |
| CN106403808A (en) * | 2015-07-29 | 2017-02-15 | 上海微电子装备有限公司 | Apparatus and method for measuring appearance of through silicon via |
| CN106802232A (en) * | 2017-03-16 | 2017-06-06 | 北京航空航天大学 | A kind of microcobjective numerical aperture measuring method and system based on total reflection |
| CN109959342A (en) * | 2017-12-26 | 2019-07-02 | 长光华大基因测序设备（长春）有限公司 | The detection method and device of numerical aperture of objective |
| CN109959342B (en) * | 2017-12-26 | 2021-04-13 | 长春长光华大智造测序设备有限公司 | Method and device for detecting numerical aperture of objective lens |
| CN108803248A (en) * | 2018-05-03 | 2018-11-13 | 中国科学院光电研究院 | The on-line measuring device and method of the numerical aperture of projection objective |
| CN108803248B (en) * | 2018-05-03 | 2024-04-02 | 中国科学院光电研究院 | On-line detection device and method for numerical aperture of projection objective |
| CN109916598A (en) * | 2019-04-26 | 2019-06-21 | 北京航空航天大学 | A kind of microcobjective numerical aperture measurement method based on diffraction grating |
| CN110686871A (en) * | 2019-05-20 | 2020-01-14 | 苏州大学 | Numerical aperture measuring device and method of self-focusing lens |
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Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |