CN102107162A - Spray device - Google Patents
Spray device Download PDFInfo
- Publication number
- CN102107162A CN102107162A CN 201010568156 CN201010568156A CN102107162A CN 102107162 A CN102107162 A CN 102107162A CN 201010568156 CN201010568156 CN 201010568156 CN 201010568156 A CN201010568156 A CN 201010568156A CN 102107162 A CN102107162 A CN 102107162A
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- China
- Prior art keywords
- spray
- jet pipe
- substrate
- frame
- treatment fluid
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- Cleaning Or Drying Semiconductors (AREA)
- Spray Control Apparatus (AREA)
Abstract
The invention discloses a spray device, which is suitable for spraying treating solution to a substrate in a display. The spray device comprises a stander, a linear driver, a spray bracket, a horizontal conveying device and a plurality of spray pipes, wherein the substrate is carried on the horizontal conveying device; the horizontal conveying device is used for driving the substrate to be conveyed in the horizontal direction; the spray bracket is movably connected to the stander and is positioned above the substrate; the linear driver is used for driving the spray bracket to do straight reciprocating motion in the horizontal direction; the movement direction of the spray bracket is perpendicular to the conveying direction of the substrate; the spray pipes are arranged on the spray bracket in parallel and are provided with treating solution inlets which are communicated with the treating solution; and a plurality of pinhole-shaped spray nozzles are formed on one side, which faces the substrate, of each of the spray pipes. The spray device is suitable for cleaning a semiconductor substrate, has a simple structure, is convenient to manipulate and is uniform in spraying.
Description
Technical field
The present invention relates to a kind of sprinkling equipment, relate in particular to a kind of spray equipment that substrate in the display is sprayed the treatment fluid cleaning.
Background technology
Produce semiconductor storage or flat-panel monitors such as LCD, plasma scope and organic light emitting diode display will carry out various repetitions usually on substrates such as semiconductor substrate and glass substrate cell processing.For example, on semiconductor substrate or glass substrate, carry out handling, carry out various cell processing such as patterned process and cleaning to film such as film, thereby on substrate, form circuitous pattern, and these cell processing use usually the various process equipments that are in the clean room to carry out with some particular processing methods with various electric and optical signatures.Concrete, be that treatment fluid is supplied on the substrate carrying out methods such as etching or cleaning and dry processing on the semiconductor substrate.For example, in cleaning, various clean solutions are transported on the spray equipment and supply on the substrate from spray equipment again, with will be such as the Impurity removal on the semiconductor substrates such as glass substrate.But existing spray equipment all exists complex structure, the technological deficiency wayward, that motion is loaded down with trivial details.
Therefore, need a kind of can the cleaning to semiconductor substrate, simple in structure, control conveniently, spray uniform spray equipment.
Summary of the invention
The object of the present invention is to provide a kind of can the cleaning to semiconductor substrate, simple in structure, control conveniently, spray uniform spray equipment.
To achieve these goals, the invention provides a kind of spray equipment, be applicable to the substrate in the display is advanced to spray treatment fluid, comprise frame, linear actuator, the spray support, horizontal feed device and some jet pipes, described base plate carrying is on described horizontal feed device, described horizontal feed device drives described substrate and transmits in the horizontal direction, described spray support is movably connected on the described frame and is positioned at the top of described substrate, described linear actuator drives described spray support and does straight reciprocating motion in the horizontal direction, the direction of motion of described spray support is perpendicular to the transmission direction of described substrate, described jet pipe is parallel being installed on the described spray support, described jet pipe offers the treatment fluid inlet port that is communicated with treatment fluid, and described jet pipe is provided with some nozzles that are the pin hole shape towards a side of described substrate.
Preferably, described jet pipe is uniformly distributed on the described spray support.A plurality of described jet pipes are distributed on the described spray support, can effectively improve spray efficient.
Preferably, described treatment fluid inlet port is opened in the middle part of described jet pipe and straight up.Treatment fluid inlet straight up makes treatment fluid enter easily.
Preferably, described nozzle is uniformly distributed on the described jet pipe and straight down.Described nozzle can spray vaporific treatment fluid, and treatment fluid is directly fallen on the described substrate, makes described substrate spray very evenly.
Preferably, described spray support comprises jet pipe bearing frame, back shaft and power transmission shaft, described jet pipe is fixed on the described jet pipe bearing frame, described power transmission shaft is and is horizontally disposed with and an end is fixedlyed connected with described jet pipe bearing frame, the other end of described power transmission shaft is connected with described linear actuator, described back shaft is and is horizontally disposed with and an end is fixed on the described frame, and the other end of described back shaft is on the described frame of being connected in of slip.By the rectilinear motion of described power transmission shaft and described back shaft, make described jet pipe bearing frame along moving back and forth with the axial vertical direction of described substrate throughput direction, further make described substrate spray more evenly.
Preferably, described horizontal feed device comprises rotation motor and some roller shafts, is socketed with roller on the described roller shaft, and described roller shaft is installed on the described frame uniformly and is positioned at same plane, described rotation motor drives described roller shaft and rotates, and described base plate carrying is on described roller.Thereby drive described roller rolling by driving described roller shaft rotation, make described roller drive described substrate and move, simple in structure, transmission is reliable, and control is easy.
Compared with prior art, because the present invention places described jet pipe on described spray support, and a plurality of described nozzles that are the pin hole shape are set on described Effuser device, described nozzle can be with described treatment fluid ejection, making treatment fluid be vaporific falls on the described substrate, by utilizing linear actuator to drive described spray support, make described spray support along moving back and forth with the axial vertical direction of described substrate throughput direction, thereby make spray more even, whole spray equipment is simple in structure, control conveniently, be suitable for semiconductor substrate is cleaned, develop, technology such as etching and demoulding.
Description of drawings
Fig. 1 is the structural representation of spray equipment of the present invention.
The specific embodiment
As shown in Figure 1, spray equipment 100 of the present invention comprises the frame (not shown), the linear actuator (not shown), spray support 1, horizontal feed device 2 and some jet pipes 3, described horizontal feed device 2 comprises rotation motor (not shown) and some roller shafts 21, be socketed with roller 22 on the described roller shaft 21, described roller shaft 21 is installed on the described frame uniformly and is positioned at same plane, described rotation motor drives described roller shaft 21 and rotates, described substrate 200 is carried on the described roller 22, and described horizontal feed device 2 drives described substrate 200 and transmits in the horizontal direction.Described spray support 1 is movably connected on the described frame and is positioned at the top of described substrate 200, comprise jet pipe bearing frame 11, back shaft 12 and power transmission shaft 13, described jet pipe 3 is fixed on the described jet pipe bearing frame 11, described power transmission shaft 13 is and is horizontally disposed with and an end is fixedlyed connected with described jet pipe bearing frame 11, the other end of described power transmission shaft 13 is connected with described linear actuator, described back shaft 12 is and is horizontally disposed with and an end is fixed on the described frame, and the other end of described back shaft 12 is on the described frame of being connected in of slip.Described linear actuator drives described spray support 1 and does straight reciprocating motion in the horizontal direction, the direction of motion of described spray support 1 is perpendicular to the transmission direction of described substrate 200, described jet pipe 3 is parallel and is installed on evenly distributedly on the described spray support 1, described jet pipe 3 offers the treatment fluid inlet port 31 that is communicated with treatment fluid, described treatment fluid inlet port 31 is opened in the middle part of described jet pipe 3 and straight up, described jet pipe 3 is provided with some nozzles 32 that are the pin hole shape towards a side of described substrate 200, and described nozzle 32 is uniformly distributed on the described jet pipe 3 and straight down.
Comprehensively above-mentioned, the operation principle to described spray equipment 100 is described in detail below, and is as follows:
During work, described substrate 200 is positioned on the described horizontal feed device 2, drive described horizontal feed device 2 motions then, described roller shaft 21 rotates and drives described roller 22 rotations, described roller 22 drives described substrate 200, described substrate 200 is moved below described jet pipe 3 lentamente, at this moment, the treatment fluid that will have certain pressure injects in the described jet pipe 3 from described treatment fluid inlet port 31, and by described nozzle 32 ejections, because described nozzle 32 is a pinhole nozzle, the treatment fluid of ejection is vaporific and falls on the described substrate 200, simultaneously, the described power transmission shaft 13 of linear actuator linear drives, described power transmission shaft 13 drives described spray support 1, and described spray support 1 is moving back and forth with the axial vertical direction of described substrate 200 throughput directions, thereby described substrate 200 is sprayed equably.
Because the present invention places a plurality of described jet pipes 3 on described spray support 1, and a plurality of described nozzles 32 that are the pin hole shape are set on described jet pipe 3, described nozzle 32 can be with described treatment fluid ejection, making treatment fluid be vaporific falls on the described substrate 200, utilize linear actuator to drive described spray support 1 by described power transmission shaft 13 and described back shaft 12, make described spray support 1 along moving back and forth with the axial vertical direction of described substrate 200 throughput directions, not only improve spray efficient but also make spray more even, whole spray equipment 100 is simple in structure, control conveniently, be suitable for semiconductor substrate is cleaned, develop, technology such as etching and demoulding.
The described frame that spray equipment of the present invention 100 is involved and the operation principle of described linear actuator are well known to those of ordinary skill in the art, no longer are described in detail at this.
Above disclosed only is preferred embodiments of the present invention, can not limit the present invention's interest field certainly with this, and therefore the equivalent variations of being done according to the present patent application claim still belongs to the scope that the present invention is contained.
Claims (6)
1. spray equipment, be applicable to the substrate in the display is advanced to spray treatment fluid, it is characterized in that: comprise frame, linear actuator, the spray support, horizontal feed device and some jet pipes, described base plate carrying is on described horizontal feed device, described horizontal feed device drives described substrate and transmits in the horizontal direction, described spray support is movably connected on the described frame and is positioned at the top of described substrate, described linear actuator drives described spray support and does straight reciprocating motion in the horizontal direction, the direction of motion of described spray support is perpendicular to the transmission direction of described substrate, described jet pipe is parallel being installed on the described spray support, described jet pipe offers the treatment fluid inlet port that is communicated with treatment fluid, and described jet pipe is provided with some nozzles that are the pin hole shape towards a side of described substrate.
2. spray equipment as claimed in claim 1 is characterized in that: described jet pipe is uniformly distributed on the described spray support.
3. spray equipment as claimed in claim 1 is characterized in that: described treatment fluid inlet port is opened in the middle part of described jet pipe and straight up.
4. spray equipment as claimed in claim 1 is characterized in that: described nozzle is uniformly distributed on the described jet pipe and straight down.
5. as any described spray equipment among the claim 1-4, it is characterized in that: described spray support comprises jet pipe bearing frame, back shaft and power transmission shaft, described jet pipe is fixed on the described jet pipe bearing frame, described power transmission shaft is and is horizontally disposed with and an end is fixedlyed connected with described jet pipe bearing frame, the other end of described power transmission shaft is connected with described linear actuator, described back shaft is and is horizontally disposed with and an end is fixed on the described frame, and the other end of described back shaft is on the described frame of being connected in of slip.
6. spray equipment as claimed in claim 1, it is characterized in that: described horizontal feed device comprises rotation motor and some roller shafts, be socketed with roller on the described roller shaft, described roller shaft is installed on the described frame uniformly and is positioned at same plane, described rotation motor drives described roller shaft and rotates, and described base plate carrying is on described roller.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010568156 CN102107162A (en) | 2010-12-01 | 2010-12-01 | Spray device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010568156 CN102107162A (en) | 2010-12-01 | 2010-12-01 | Spray device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN102107162A true CN102107162A (en) | 2011-06-29 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201010568156 Pending CN102107162A (en) | 2010-12-01 | 2010-12-01 | Spray device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN102107162A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103042004A (en) * | 2013-01-15 | 2013-04-17 | 东莞市盛威光电科技有限公司 | Washing mechanism of touch screen etching demoulding production line |
| CN104051311A (en) * | 2014-07-08 | 2014-09-17 | 深圳市华星光电技术有限公司 | Base plate conveying device and strong acid or strong base etching process suitable for wet process |
| CN109225713A (en) * | 2017-04-28 | 2019-01-18 | 均豪精密工业股份有限公司 | Platform-type flusher |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2174018A (en) * | 1985-04-03 | 1986-10-29 | E V D Engineering Co Ltd | Liquid dispensing apparatus |
| US6390106B1 (en) * | 1999-10-29 | 2002-05-21 | Au Optronics Corp. | Multidirectional liquid sprayer used in a wet process |
| CN1398424A (en) * | 2000-12-12 | 2003-02-19 | 住友精密工业株式会社 | Oscillating shower transfer type substrate treatment device |
| CN101615576A (en) * | 2004-07-19 | 2009-12-30 | 三星电子株式会社 | Substrate processing apparatus and use its substrate processing method using same |
| CN201410484Y (en) * | 2009-05-13 | 2010-02-24 | 北京京东方光电科技有限公司 | Rolling-brush cleaning device |
| CN201537550U (en) * | 2009-09-25 | 2010-08-04 | 柏腾科技股份有限公司 | Jet flow generator making reciprocating rectilinear movement |
| CN201930863U (en) * | 2010-12-01 | 2011-08-17 | 东莞宏威数码机械有限公司 | Baseplate spraying device |
-
2010
- 2010-12-01 CN CN 201010568156 patent/CN102107162A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2174018A (en) * | 1985-04-03 | 1986-10-29 | E V D Engineering Co Ltd | Liquid dispensing apparatus |
| US6390106B1 (en) * | 1999-10-29 | 2002-05-21 | Au Optronics Corp. | Multidirectional liquid sprayer used in a wet process |
| CN1398424A (en) * | 2000-12-12 | 2003-02-19 | 住友精密工业株式会社 | Oscillating shower transfer type substrate treatment device |
| CN101615576A (en) * | 2004-07-19 | 2009-12-30 | 三星电子株式会社 | Substrate processing apparatus and use its substrate processing method using same |
| CN201410484Y (en) * | 2009-05-13 | 2010-02-24 | 北京京东方光电科技有限公司 | Rolling-brush cleaning device |
| CN201537550U (en) * | 2009-09-25 | 2010-08-04 | 柏腾科技股份有限公司 | Jet flow generator making reciprocating rectilinear movement |
| CN201930863U (en) * | 2010-12-01 | 2011-08-17 | 东莞宏威数码机械有限公司 | Baseplate spraying device |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103042004A (en) * | 2013-01-15 | 2013-04-17 | 东莞市盛威光电科技有限公司 | Washing mechanism of touch screen etching demoulding production line |
| CN104051311A (en) * | 2014-07-08 | 2014-09-17 | 深圳市华星光电技术有限公司 | Base plate conveying device and strong acid or strong base etching process suitable for wet process |
| WO2016004666A1 (en) * | 2014-07-08 | 2016-01-14 | 深圳市华星光电技术有限公司 | Substrate conveying device and strong acid or base etching process applicable for wet process |
| CN109225713A (en) * | 2017-04-28 | 2019-01-18 | 均豪精密工业股份有限公司 | Platform-type flusher |
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