CN102096342A - 显影装置 - Google Patents
显影装置 Download PDFInfo
- Publication number
- CN102096342A CN102096342A CN2009102316972A CN200910231697A CN102096342A CN 102096342 A CN102096342 A CN 102096342A CN 2009102316972 A CN2009102316972 A CN 2009102316972A CN 200910231697 A CN200910231697 A CN 200910231697A CN 102096342 A CN102096342 A CN 102096342A
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- developer solution
- sensor
- solution injector
- developing apparatus
- injector
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- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
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Claims (11)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2009102316972A CN102096342A (zh) | 2009-12-09 | 2009-12-09 | 显影装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN2009102316972A CN102096342A (zh) | 2009-12-09 | 2009-12-09 | 显影装置 |
Publications (1)
Publication Number | Publication Date |
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CN102096342A true CN102096342A (zh) | 2011-06-15 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN2009102316972A Pending CN102096342A (zh) | 2009-12-09 | 2009-12-09 | 显影装置 |
Country Status (1)
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CN (1) | CN102096342A (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103615441A (zh) * | 2013-12-16 | 2014-03-05 | 无锡市海联舰船附件有限公司 | 减摇水舱液压泵站液位控制装置 |
CN110568733A (zh) * | 2018-06-06 | 2019-12-13 | 台湾积体电路制造股份有限公司 | 半导体工艺及半导体设备 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61162049A (ja) * | 1985-01-11 | 1986-07-22 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版の処理方法 |
JP2766485B2 (ja) * | 1988-09-13 | 1998-06-18 | 東京エレクトロン株式会社 | 現像装置 |
JPH11283907A (ja) * | 1998-03-31 | 1999-10-15 | Sony Corp | レジスト現像装置 |
US20020164414A1 (en) * | 2001-05-01 | 2002-11-07 | Tokyo Electron Limited | Method for changing concentration of treatment solution and treatment solution supply apparatus |
CN201438260U (zh) * | 2009-05-19 | 2010-04-14 | 中芯国际集成电路制造(上海)有限公司 | 应用于涂敷显影装置的显影罐 |
CN201556028U (zh) * | 2009-12-07 | 2010-08-18 | 无锡华润上华半导体有限公司 | 显影设备 |
-
2009
- 2009-12-09 CN CN2009102316972A patent/CN102096342A/zh active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61162049A (ja) * | 1985-01-11 | 1986-07-22 | Konishiroku Photo Ind Co Ltd | 感光性平版印刷版の処理方法 |
JP2766485B2 (ja) * | 1988-09-13 | 1998-06-18 | 東京エレクトロン株式会社 | 現像装置 |
JPH11283907A (ja) * | 1998-03-31 | 1999-10-15 | Sony Corp | レジスト現像装置 |
US20020164414A1 (en) * | 2001-05-01 | 2002-11-07 | Tokyo Electron Limited | Method for changing concentration of treatment solution and treatment solution supply apparatus |
CN201438260U (zh) * | 2009-05-19 | 2010-04-14 | 中芯国际集成电路制造(上海)有限公司 | 应用于涂敷显影装置的显影罐 |
CN201556028U (zh) * | 2009-12-07 | 2010-08-18 | 无锡华润上华半导体有限公司 | 显影设备 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103615441A (zh) * | 2013-12-16 | 2014-03-05 | 无锡市海联舰船附件有限公司 | 减摇水舱液压泵站液位控制装置 |
CN110568733A (zh) * | 2018-06-06 | 2019-12-13 | 台湾积体电路制造股份有限公司 | 半导体工艺及半导体设备 |
CN110568733B (zh) * | 2018-06-06 | 2023-06-09 | 台湾积体电路制造股份有限公司 | 半导体工艺及半导体设备 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
ASS | Succession or assignment of patent right |
Owner name: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Free format text: FORMER OWNER: WUXI CSMC SEMICONDUCTOR CO., LTD. Effective date: 20120312 Free format text: FORMER OWNER: WUXI HUARUN SHANGHUA TECHNOLOGY CO., LTD. Effective date: 20120312 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: 214061 WUXI, JIANGSU PROVINCE TO: 214028 WUXI, JIANGSU PROVINCE |
|
TA01 | Transfer of patent application right |
Effective date of registration: 20120312 Address after: 214028 Xinzhou Road, Wuxi national hi tech Industrial Development Zone, Jiangsu, China, No. 8 Applicant after: Wuxi Huarun Shanghua Technology Co., Ltd. Address before: 214061 No. 5 Hanjiang Road, national hi tech Industrial Development Zone, Wuxi, Jiangsu, China Applicant before: Wuxi CSMC Semiconductor Co., Ltd. Co-applicant before: Wuxi Huarun Shanghua Technology Co., Ltd. |
|
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20110615 |