CN101988988B - 光偏转器、光偏转器的制造方法及图像显示装置 - Google Patents
光偏转器、光偏转器的制造方法及图像显示装置 Download PDFInfo
- Publication number
- CN101988988B CN101988988B CN201010245852.9A CN201010245852A CN101988988B CN 101988988 B CN101988988 B CN 101988988B CN 201010245852 A CN201010245852 A CN 201010245852A CN 101988988 B CN101988988 B CN 101988988B
- Authority
- CN
- China
- Prior art keywords
- movable platen
- light
- described movable
- elastic supporting
- supporting part
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 37
- 238000000034 method Methods 0.000 title claims abstract description 35
- 239000000758 substrate Substances 0.000 claims description 44
- 238000005530 etching Methods 0.000 claims description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 230000031700 light absorption Effects 0.000 claims 21
- 238000002347 injection Methods 0.000 claims 3
- 239000007924 injection Substances 0.000 claims 3
- 230000003287 optical effect Effects 0.000 description 29
- 238000004544 sputter deposition Methods 0.000 description 16
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 12
- 229910052804 chromium Inorganic materials 0.000 description 11
- 239000011651 chromium Substances 0.000 description 11
- 230000006870 function Effects 0.000 description 11
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- 230000008569 process Effects 0.000 description 6
- 238000001039 wet etching Methods 0.000 description 6
- 230000015556 catabolic process Effects 0.000 description 5
- 238000006731 degradation reaction Methods 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001312 dry etching Methods 0.000 description 2
- 238000001579 optical reflectometry Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N9/00—Details of colour television systems
- H04N9/12—Picture reproducers
- H04N9/31—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM]
- H04N9/3129—Projection devices for colour picture display, e.g. using electronic spatial light modulators [ESLM] scanning a light beam on the display screen
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Micromachines (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009181273 | 2009-08-04 | ||
| JP2009-181273 | 2009-08-04 | ||
| JP2010-106624 | 2010-05-06 | ||
| JP2010106624A JP5655365B2 (ja) | 2009-08-04 | 2010-05-06 | 光偏向器、光偏向器の製造方法および画像表示装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101988988A CN101988988A (zh) | 2011-03-23 |
| CN101988988B true CN101988988B (zh) | 2015-08-26 |
Family
ID=43534658
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010245852.9A Expired - Fee Related CN101988988B (zh) | 2009-08-04 | 2010-08-03 | 光偏转器、光偏转器的制造方法及图像显示装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8830550B2 (enExample) |
| JP (1) | JP5655365B2 (enExample) |
| CN (1) | CN101988988B (enExample) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5842356B2 (ja) * | 2011-03-24 | 2016-01-13 | セイコーエプソン株式会社 | アクチュエーター、光スキャナーおよび画像形成装置 |
| JP5909862B2 (ja) * | 2011-04-06 | 2016-04-27 | セイコーエプソン株式会社 | アクチュエーター、光スキャナーおよび画像形成装置 |
| JP5842837B2 (ja) * | 2013-01-30 | 2016-01-13 | セイコーエプソン株式会社 | アクチュエーター、光スキャナーおよび画像形成装置 |
| JP6107292B2 (ja) * | 2013-03-25 | 2017-04-05 | セイコーエプソン株式会社 | 光スキャナーの製造方法、光スキャナー、画像表示装置およびヘッドマウントディスプレイ |
| DE102013206377B4 (de) * | 2013-04-11 | 2021-07-29 | Robert Bosch Gmbh | Mikromechanische Struktur und entsprechendes Herstellungsverfahren |
| US10042191B2 (en) * | 2014-12-11 | 2018-08-07 | Mitsubishi Electric Corporation | Optical Transmitter |
| JP2018185446A (ja) * | 2017-04-27 | 2018-11-22 | セイコーエプソン株式会社 | 反射防止膜、光デバイスおよび反射防止膜の製造方法 |
| US12474476B2 (en) * | 2020-12-28 | 2025-11-18 | Beijing Voyager Technology Co., Ltd. | Solid-state light steering system |
| US20230314792A1 (en) * | 2022-04-01 | 2023-10-05 | Microsoft Technology Licensing, Llc | Light Shield for MEMS Scanner |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6392775B1 (en) * | 1998-01-13 | 2002-05-21 | Seagate Technology Llc | Optical reflector for micro-machined mirrors |
| CN1503007A (zh) * | 2002-11-21 | 2004-06-09 | 台达电子工业股份有限公司 | 膜应力平衡镀膜方法 |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6831765B2 (en) * | 2001-02-22 | 2004-12-14 | Canon Kabushiki Kaisha | Tiltable-body apparatus, and method of fabricating the same |
| JP3862623B2 (ja) * | 2002-07-05 | 2006-12-27 | キヤノン株式会社 | 光偏向器及びその製造方法 |
| US6891655B2 (en) * | 2003-01-02 | 2005-05-10 | Micronic Laser Systems Ab | High energy, low energy density, radiation-resistant optics used with micro-electromechanical devices |
| JP4062225B2 (ja) * | 2003-09-30 | 2008-03-19 | ブラザー工業株式会社 | 光スキャナおよびそれを備えた画像形成装置 |
| JP2006039156A (ja) * | 2004-07-27 | 2006-02-09 | Citizen Miyota Co Ltd | プレーナ型アクチュエータ、及びその製造方法 |
| CN100468081C (zh) * | 2005-06-03 | 2009-03-11 | 鸿富锦精密工业（深圳）有限公司 | 光学元件 |
| JP4655977B2 (ja) * | 2006-03-22 | 2011-03-23 | ブラザー工業株式会社 | 光スキャナ、及び、光走査装置、及び、画像表示装置、及び、網膜走査型画像表示装置、及び、光スキャナにおける梁部の形成方法 |
| WO2007145290A1 (ja) * | 2006-06-14 | 2007-12-21 | Panasonic Corporation | 振動子、これを用いた共振器およびこれを用いた電気機械フィルタ |
| DE102008012810B4 (de) * | 2007-04-02 | 2013-12-12 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Optisches Bauelement mit einem Aufbau zur Vermeidung von Reflexionen |
| US8068268B2 (en) * | 2007-07-03 | 2011-11-29 | Qualcomm Mems Technologies, Inc. | MEMS devices having improved uniformity and methods for making them |
-
2010
- 2010-05-06 JP JP2010106624A patent/JP5655365B2/ja not_active Expired - Fee Related
- 2010-08-03 US US12/849,182 patent/US8830550B2/en active Active
- 2010-08-03 CN CN201010245852.9A patent/CN101988988B/zh not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6392775B1 (en) * | 1998-01-13 | 2002-05-21 | Seagate Technology Llc | Optical reflector for micro-machined mirrors |
| CN1503007A (zh) * | 2002-11-21 | 2004-06-09 | 台达电子工业股份有限公司 | 膜应力平衡镀膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101988988A (zh) | 2011-03-23 |
| JP5655365B2 (ja) | 2015-01-21 |
| US8830550B2 (en) | 2014-09-09 |
| US20110032589A1 (en) | 2011-02-10 |
| JP2011053646A (ja) | 2011-03-17 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150826 |