CN101950778A - Solar silicon water wet-process automatic separating method - Google Patents

Solar silicon water wet-process automatic separating method Download PDF

Info

Publication number
CN101950778A
CN101950778A CN2010102706961A CN201010270696A CN101950778A CN 101950778 A CN101950778 A CN 101950778A CN 2010102706961 A CN2010102706961 A CN 2010102706961A CN 201010270696 A CN201010270696 A CN 201010270696A CN 101950778 A CN101950778 A CN 101950778A
Authority
CN
China
Prior art keywords
silicon chip
silicon
water
conveyer belt
silicon chips
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN2010102706961A
Other languages
Chinese (zh)
Inventor
董维来
孙红喆
陈伟
孙建中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN2010102706961A priority Critical patent/CN101950778A/en
Publication of CN101950778A publication Critical patent/CN101950778A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

The invention discloses a solar silicon water wet-process automatic separating method, which comprises the following steps: striking the side face of multiple silicon chips stacked together by using a high-pressure air-liquid mixed jet flow in a water tank to inject the air and water mixed flow into the spaces between the multiple silicon chips to destroy the inter-layer vacuum which leads to the adhesion of the silicon chips stacked together; and when the silicon waster on a top layer floats up under the action of the buoyancy force of air bubbles after the inter-layer vacuum is destroyed, absorbing the floating cells by using an absorbing and conveying device and carrying the cells away from the water tank, and thus, separating the silicon chips gradually. The solar silicon water wet-process automatic separating method has the advantages of placing the silicon chips to be separated in water to prevent the silicon chips from pollution and oxidization in the air, adopting vacuum absorption, realizing the flexible contact of a conveying belt in a whole process, reducing chip breakage rate and reducing silicon chip pollution caused by human factors.

Description

Solar silicon wafers wet method auto plate separation method
Technical field
The present invention relates to a kind of solar silicon wafers (hereinafter to be referred as silicon chip) sharding method, particularly relate to a kind of silicon chip wet method auto plate separation method.
Background technology
Along with the develop rapidly of solar energy industry, make the demand of silicon chip increase day by day, silicon chip after finishing cutting, coming unstuck need be packed monolithic in the anchor clamps so that subsequent handling is handled, traditional method is the manual burst anchor clamps of packing into, yet manual burst pollutes silicon chip and fragmentation rate height easily.And in the current era of industrialization high speed development, manual operations can not have been satisfied the demand of industry, and this just needs a kind of auto plate separation method, does not still have this class methods at present and occurs.
Summary of the invention
The objective of the invention is to overcome the shortcoming of prior art, a kind of auto plate separation method that the silicon chip that stacks can be separated and carries out piecewise is provided.
Solar silicon wafers wet method auto plate separation method of the present invention, it may further comprise the steps: the side of the multi-disc silicon chip that in tank, utilizes the high-pressure gas-liquid mixing jet to impact to be stacked together, cause the interlayer negative pressure of adhesion between the silicon chip that is stacked together with destruction at the fluid-mixing that injects empty G﹠W between the multi-disc silicon chip; Be positioned at the silicon chip on upper strata after the interlayer negative pressure is destroyed because the battery sheet that utilizes this moment the absorption conveyer to draw piecewise to float and with its carrying effluent trough, so that the multi-disc silicon chip separates is piecewise upwards floated in the bubble buoyancy effect.
Beneficial effect of the present invention and advantage are: will treat that the branch silicon chip is placed in the water, avoided silicon chip to be exposed to and polluted in the air and oxidation and absorption of employing negative pressure and omnidistance flexible contact of conveyer belt realization, further reduce fragment rate, reduced the wafer contamination that human factor is introduced simultaneously.
Description of drawings
Fig. 1 is the general structure schematic diagram of the device of solar silicon wafers wet method auto plate separation method employing of the present invention;
Fig. 2 is the supply assembly structural representation in the device shown in Figure 1;
Fig. 2-the 1st, the structural representation of translation driving device in the device shown in Figure 2;
Fig. 3 is the gas-liquid mixed ejection assemblies structural representation in the device shown in Figure 1;
Fig. 3-the 1st, the gas-liquid mixed jeting effect schematic diagram in the device shown in Figure 3;
Fig. 4 is the absorption transfer assembly structural representation in the device shown in Figure 1;
Fig. 4-the 1st, the absorption transfer assembly upward view in the device shown in Figure 4.
Embodiment
Describe the present invention below in conjunction with the drawings and specific embodiments.
Solar silicon wafers wet method auto plate separation method of the present invention, it may further comprise the steps: the side of the multi-disc silicon chip that in tank, utilizes the high-pressure gas-liquid mixing jet to impact to be stacked together, cause the interlayer negative pressure of adhesion between the silicon chip that is stacked together with destruction at the fluid-mixing that injects empty G﹠W between the multi-disc silicon chip; The silicon chip that is positioned at the upper strata after the interlayer negative pressure is destroyed is because the battery sheet that utilizes this moment the absorption conveyer to draw piecewise to float and with its carrying effluent trough, so that the multi-disc silicon chip separates is piecewise upwards floated in the bubble buoyancy effect.
Described high-pressure gas-liquid mixing jet utilizes preferably that the mode of bubbling forms below hydraulic spray; The absorption transport process of described absorption conveyer is preferably taken the water between conveyer belt mounting panel and the superiors' silicon chip that floated away by drawing water, ambient water has little time to replenish, between conveyer belt mounting panel and the superiors' silicon chip of having floated, form local decompression, silicon chip is attached on the proal conveyer belt under local decompression's effect, thereby the battery sheet is carried away.
As shown in Figure 1, the solar silicon wafers wet method auto plate separation device of realizing the inventive method comprises the supply assembly 1 that is used to place silicon chip, the absorption transfer assembly 2 that is used to separate the gas-liquid mixed ejection assemblies 3 of silicon chip and is used to carry silicon chip, and preferred three part assembly central axes are provided with.Gas-liquid mixed ejection assemblies 3 is installed on supply assembly 1 dead ahead of silicon chip.Absorption transfer assembly 2 is installed on directly over the supply assembly 1, becomes the rear end of 20 ° of-30 ° of angles and absorption transfer assembly to flush with supply assembly 1 rear end with horizontal plane.
As shown in Figure 2, supply assembly 1 comprises places the silicon chip loading fixture 1-2 that silicon chip is used, and silicon chip 1-1 to be separated is stacked to be positioned on the silicon chip loading fixture 1-2, and silicon chip loading fixture 1-2 is fixed on the translation plates 1-5, and translation plates 1-5 is arranged on main mounting panel 1-3 top.Translation plates 1-5 is driven and can vertically be moved by translation driving device 1-4.Translation driving device 1-4 can be shown in Fig. 2-1, and figure cathetus motor 1-6 drives the push rod 1-8 motion that links to each other with translation plates, and to realize that translation plates moves up and down, main mounting panel 1-3 bottom is provided with black box 1-7 to prevent that liquid spills in the groove.In the course of work, the removed back of upper strata silicon chip translation driving device drives translation plates and moves up, thereby compensates the height space that removed silicon chip stays, and prepares for drawing follow-up silicon chip.
As shown in Figure 3, described gas-liquid mixed ejection assemblies 3 comprises first and second two hydraulic spray 3-1,3-2 and two groups of pressure-air bubbling device 3-3,3-4.The first pressure-air bubbling device is arranged on the front lower place of described first hydraulic spray, and the second pressure-air bubbling device is arranged on the front lower place of described second hydraulic spray.
Water after the first hydraulic spray 3-1 will pressurize when working shown in Fig. 3-1 vertically is the covering of the fan ejection, current mix with the bubble that the first pressure-air bubbling device 3-3 of the first hydraulic spray 3-1 front lower place is produced, form the first gas-liquid mixed jet 3-6, in like manner: the second hydraulic spray 3-2 cooperates the formation second gas-liquid mixed jet 3-5 with the second pressure-air bubbling device 3-4.The first and second gas-liquid mixed jet 3-6,3-5 impacts the silicon chip 1-1 to be separated in its place ahead jointly, the gas-liquid mixed jet enters the slit between silicon chip 1-1 to be separated, under the buoyancy of the air that is launched into shown in the floating one-tenth Fig. 3-1 of the silicon chip on upper strata shown in state, silicon chip is successfully separated.
As Fig. 4, shown in Fig. 4-1, described absorption transfer assembly 2 comprises the conveyer belt 2-4 that links to each other with conveyor drive arrangement, described conveyer belt is installed in the both sides of conveyer belt mounting panel 2-1, described conveyer belt mounting panel flushes setting from the horizontal by 20 ° of-30 ° of angle settings and its rear end with silicon chip loading fixture rear end, the drinking-water pipe joint is housed on the conveyer belt mounting panel, the conveyer belt mounting panel is equipped with the adsorption plate 2-6 that has a plurality of holes towards battery sheet side, hole on the adsorption plate communicates with the drinking-water pipe joint, and described conveyer belt mounting panel is installed on the main mounting panel by jockey.Conveyer belt 2-4 is furnished with conveyer belt tensioning apparatus 2-3, and conveyor drive arrangement is connected to drive conveyer belt by being with synchronously with synchronous pulley 2-2.In the course of work, water pump draws water by the adsorption plate hole, adsorption plate and the water that swims between the uppermost silicon chip (as Fig. 3-1) are taken away, thereby between adsorption plate and silicon chip, form local decompression, silicon chip is because local decompression's effect is attached to the conveyer belt surface, conveyer belt drives silicon chip and travels forward, and silicon chip is removed.
This device working method as follows:
Whole device is arranged in the tank, silicon slice placed is placed on the supply assembly 1, utilize the high-pressure gas-liquid mixing jet to impact the silicon chip side that is sticked together owing to the interlayer negative pressure in tank, the fluid-mixing that injects empty G﹠W between silicon chip causes the interlayer negative pressure of silicon chip adhesion with destruction; The destroyed back of interlayer negative pressure silicon chip upwards floats owing to the bubble buoyancy effect, and utilization absorption this moment transfer assembly is drawn the battery sheet and it is carried effluent trough, to reach the purpose of separating silicon chip piecewise.The principle of absorption transfer assembly is by drawing water the water between conveyer belt mounting panel and the superiors' silicon chip that floated to be taken away, ambient water has little time to replenish, between conveyer belt mounting panel and the superiors' silicon chip of having floated, form local decompression, silicon chip is attached on the proal conveyer belt under local decompression's effect, thereby the battery sheet is carried away.
Embodiment 1
The interlayer negative pressure of adhesion between the silicon chip that is stacked together is caused in the side of the multi-disc silicon chip that utilizes the high-pressure gas-liquid mixing jet to impact in tank to be stacked together with destruction at the fluid-mixing that injects empty G﹠W between the multi-disc silicon chip; The silicon chip that is positioned at the upper strata after the interlayer negative pressure is destroyed is because the bubble buoyancy effect is upwards floated, and the battery sheet that utilizes this moment the absorption conveyer to draw piecewise to float and with its carrying effluent trough separates the multi-disc silicon chip piecewise.
To treat that the branch silicon chip is placed in the water, avoided silicon chip to be exposed to and polluted in the air and oxidation and absorption of employing negative pressure and omnidistance flexible contact of conveyer belt realization, compare battery sheet wet separation technology with the traditional-handwork burst and greatly reduce dress basket fragment rate, burst fragmentation rate is lower than 0.1%, reduces by 0.5% silicon chip loss late than traditional-handwork burst.

Claims (2)

1. solar silicon wafers wet method auto plate separation method, it is characterized in that it may further comprise the steps: the side of the multi-disc silicon chip that in tank, utilizes the high-pressure gas-liquid mixing jet to impact to be stacked together, cause the interlayer negative pressure of adhesion between the silicon chip that is stacked together with destruction at the fluid-mixing that injects empty G﹠W between the multi-disc silicon chip; The silicon chip that is positioned at the upper strata after the interlayer negative pressure is destroyed is because the battery sheet that utilizes this moment the absorption conveyer to draw piecewise to float and with its carrying effluent trough, so that the multi-disc silicon chip separates is piecewise upwards floated in the bubble buoyancy effect.
2. according to the described solar silicon wafers wet method of claim 1 auto plate separation method, it is characterized in that: described high-pressure gas-liquid mixing jet is that utilization mode of bubbling below hydraulic spray forms; The absorption transport process of described absorption conveyer is for taking the water between conveyer belt mounting panel and the superiors' silicon chip that floated away by drawing water, ambient water has little time to replenish, between conveyer belt mounting panel and the superiors' silicon chip of having floated, form local decompression, silicon chip is attached on the proal conveyer belt under local decompression's effect, thereby the battery sheet is carried away.
CN2010102706961A 2010-09-02 2010-09-02 Solar silicon water wet-process automatic separating method Pending CN101950778A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2010102706961A CN101950778A (en) 2010-09-02 2010-09-02 Solar silicon water wet-process automatic separating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN2010102706961A CN101950778A (en) 2010-09-02 2010-09-02 Solar silicon water wet-process automatic separating method

Publications (1)

Publication Number Publication Date
CN101950778A true CN101950778A (en) 2011-01-19

Family

ID=43454203

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2010102706961A Pending CN101950778A (en) 2010-09-02 2010-09-02 Solar silicon water wet-process automatic separating method

Country Status (1)

Country Link
CN (1) CN101950778A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102299049A (en) * 2011-07-30 2011-12-28 太原风华信息装备股份有限公司 Petal-basket floating silicon chip automation separation mechanism
CN102294332A (en) * 2011-08-08 2011-12-28 江西金葵能源科技有限公司 Method for cleaning silicon wafer linearly cut by diamond
CN102427095A (en) * 2011-08-11 2012-04-25 浙江大学台州研究院 Solar silicon wafer automatic wafer separator based on cyclic distribution device and wafer separation method thereof
CN102614977A (en) * 2012-03-06 2012-08-01 董维来 Automatic separation method for solar silicon wafers or other flaky objects in water
CN102623372A (en) * 2012-03-27 2012-08-01 江西赛维Ldk太阳能高科技有限公司 Automatic wafer-separating device for wet silicon wafers
CN105428465A (en) * 2015-12-31 2016-03-23 苏州博阳能源设备有限公司 Silicon chip separating device
CN109560004A (en) * 2017-09-26 2019-04-02 天津环鑫科技发展有限公司 A kind of automatic circular silicon chip inserting machine structure

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1379708A (en) * 1999-10-16 2002-11-13 Acr洁净室自动控制技术有限公司 Method and device for isolating plate-like substrates
CN1853265A (en) * 2003-08-04 2006-10-25 S.O.I.Tec绝缘体上硅技术公司 Method of detaching a semiconductor layer
CN101405832A (en) * 2006-03-13 2009-04-08 Rec斯坎沃佛股份有限公司 Method for separating wafers from a stack of wafers
WO2009074317A1 (en) * 2007-12-11 2009-06-18 Gebr. Schmid Gmbh & Co. Method of, and apparatus for, separating wafers from a wafer stack
CN101652849A (en) * 2006-12-19 2010-02-17 Rec斯坎沃佛股份有限公司 The method and apparatus that is used for se aration of silicon wafers

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1379708A (en) * 1999-10-16 2002-11-13 Acr洁净室自动控制技术有限公司 Method and device for isolating plate-like substrates
CN1853265A (en) * 2003-08-04 2006-10-25 S.O.I.Tec绝缘体上硅技术公司 Method of detaching a semiconductor layer
CN101405832A (en) * 2006-03-13 2009-04-08 Rec斯坎沃佛股份有限公司 Method for separating wafers from a stack of wafers
CN101652849A (en) * 2006-12-19 2010-02-17 Rec斯坎沃佛股份有限公司 The method and apparatus that is used for se aration of silicon wafers
WO2009074317A1 (en) * 2007-12-11 2009-06-18 Gebr. Schmid Gmbh & Co. Method of, and apparatus for, separating wafers from a wafer stack

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102299049A (en) * 2011-07-30 2011-12-28 太原风华信息装备股份有限公司 Petal-basket floating silicon chip automation separation mechanism
CN102299049B (en) * 2011-07-30 2013-06-12 太原风华信息装备股份有限公司 Petal-basket floating silicon chip automation separation mechanism
CN102294332A (en) * 2011-08-08 2011-12-28 江西金葵能源科技有限公司 Method for cleaning silicon wafer linearly cut by diamond
CN102427095A (en) * 2011-08-11 2012-04-25 浙江大学台州研究院 Solar silicon wafer automatic wafer separator based on cyclic distribution device and wafer separation method thereof
CN102614977A (en) * 2012-03-06 2012-08-01 董维来 Automatic separation method for solar silicon wafers or other flaky objects in water
CN102623372A (en) * 2012-03-27 2012-08-01 江西赛维Ldk太阳能高科技有限公司 Automatic wafer-separating device for wet silicon wafers
CN102623372B (en) * 2012-03-27 2014-07-02 江西赛维Ldk太阳能高科技有限公司 Automatic wafer-separating device for wet silicon wafers
CN105428465A (en) * 2015-12-31 2016-03-23 苏州博阳能源设备有限公司 Silicon chip separating device
CN109560004A (en) * 2017-09-26 2019-04-02 天津环鑫科技发展有限公司 A kind of automatic circular silicon chip inserting machine structure

Similar Documents

Publication Publication Date Title
CN201820777U (en) Automatic solar silicon wafer separator by wet process
CN101950778A (en) Solar silicon water wet-process automatic separating method
CN102272913A (en) Wafer separating apparatus, wafer separating/transferring apparatus, wafer separating method, wafer separating/transferring method and solar cell wafer separating/transferring method
KR20100100957A (en) Method of, and apparatus for, separating wafers from a wafer stack
CN202474010U (en) Automatic wet silicon wafer separating device
CN102623372A (en) Automatic wafer-separating device for wet silicon wafers
KR102351390B1 (en) Solar module partial peeling device
CN100540256C (en) A kind of high-pressure water sand-spraying deflashing machine
CN106783709B (en) Glass sheet feeding mechanism in lamination process of solar cell module
CN1496944A (en) Workpiece advancing equipment
CN103601015A (en) Piece separating and conveying device
JP2009120311A (en) Supply device of glass substrate
CN107824988B (en) A kind of energy-saving and environment-friendly electronic waste automatic cutting recyclable device
JP5965316B2 (en) Wafer separation apparatus, wafer separation transfer apparatus, wafer separation method, wafer separation transfer method, and solar cell wafer separation transfer method
CN202487547U (en) Wet silicon wafer automatic separation device
CN102556680A (en) Silicon wafer feeding lifting table of charging and discharging system of plate-type PECVD (Plasma Enhanced Chemical Vapor Deposition) equipment
CN204857697U (en) Brilliant first cleaning machine for feed quick -witted
CN109979870B (en) Automatic burst feed mechanism of silicon wafer
CN102299049B (en) Petal-basket floating silicon chip automation separation mechanism
CN104016154A (en) Silicon wafer separating device
CN202527276U (en) Feeding box of jet floatation machine
CN113320936A (en) Automatic piece separating and feeding mechanism
CN104193134B (en) A kind of Floatation Thickening Sludge device
KR101290139B1 (en) Method for Separating Wafer, and Separation Apparatus
KR101447940B1 (en) The device for separation a sheet to solar cell wafer with a vacuum adsorption and separation function

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20110119