CN101925688A - 用于控制真空蒸发中蒸汽流的方法和装置 - Google Patents
用于控制真空蒸发中蒸汽流的方法和装置 Download PDFInfo
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- CN101925688A CN101925688A CN2008801257824A CN200880125782A CN101925688A CN 101925688 A CN101925688 A CN 101925688A CN 2008801257824 A CN2008801257824 A CN 2008801257824A CN 200880125782 A CN200880125782 A CN 200880125782A CN 101925688 A CN101925688 A CN 101925688A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (23)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
BE2007/0618 | 2007-12-21 | ||
BE2007/0618A BE1017912A3 (fr) | 2007-12-21 | 2007-12-21 | Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide. |
EP08150579.4 | 2008-01-23 | ||
EP08150579 | 2008-01-23 | ||
PCT/EP2008/068202 WO2009083546A1 (fr) | 2007-12-21 | 2008-12-22 | Procede et dispositifs de controle d'un flux de vapeur en evaporation sous vide |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101925688A true CN101925688A (zh) | 2010-12-22 |
CN101925688B CN101925688B (zh) | 2012-12-05 |
Family
ID=40521542
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008801257824A Active CN101925688B (zh) | 2007-12-21 | 2008-12-22 | 用于控制真空蒸发中蒸汽流的方法和装置 |
Country Status (8)
Country | Link |
---|---|
US (2) | US9458533B2 (zh) |
EP (1) | EP2231895B1 (zh) |
JP (1) | JP5740552B2 (zh) |
KR (1) | KR101644467B1 (zh) |
CN (1) | CN101925688B (zh) |
AU (1) | AU2008342644B2 (zh) |
BR (1) | BRPI0821332B1 (zh) |
WO (1) | WO2009083546A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108456856A (zh) * | 2017-02-22 | 2018-08-28 | 萨特隆股份公司 | 用于基材、特别是眼镜镜片的真空涂布的箱式涂布设备 |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101442939B1 (ko) * | 2010-04-12 | 2014-09-22 | 샤프 가부시키가이샤 | 증착장치 및 증착방법 |
JPWO2013125598A1 (ja) * | 2012-02-23 | 2015-07-30 | 旭硝子株式会社 | フッ素含有有機ケイ素化合物薄膜の製造装置、及び、製造方法 |
WO2015100730A1 (zh) * | 2014-01-03 | 2015-07-09 | 北京航空航天大学 | 一种直写式真空蒸发系统及其方法 |
US9488452B1 (en) * | 2015-04-22 | 2016-11-08 | Battelle Energy Alliance, Llc | Apparatus for rendering at least a portion of a device inoperable and related methods |
CN107227443B (zh) * | 2017-08-04 | 2019-07-02 | 京东方科技集团股份有限公司 | 吸附遮挡装置及具有该装置的蒸镀设备 |
DE102020121923A1 (de) | 2020-08-21 | 2022-02-24 | Materials Center Leoben Forschung Gmbh | Pvd-verfahren und vorrichtung hierfür |
EP4084040A1 (en) * | 2021-04-29 | 2022-11-02 | voestalpine Stahl GmbH | Method and devices for plasma treatment |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4278528A (en) * | 1979-10-09 | 1981-07-14 | Coulter Systems Corporation | Rectilinear sputtering apparatus and method |
JPS58133374A (ja) * | 1982-02-04 | 1983-08-09 | Ulvac Corp | 真空蒸着多層膜形成装置 |
JPS60251273A (ja) * | 1984-05-28 | 1985-12-11 | Mitsubishi Heavy Ind Ltd | 真空蒸発装置の蒸発量制御方法 |
JPH0754287Y2 (ja) * | 1992-01-22 | 1995-12-18 | 日新製鋼株式会社 | 真空蒸着装置 |
JPH07335553A (ja) * | 1994-06-08 | 1995-12-22 | Tel Varian Ltd | 処理装置および処理方法 |
JPH108241A (ja) * | 1996-06-25 | 1998-01-13 | Mitsubishi Heavy Ind Ltd | 真空蒸着装置 |
JP3901773B2 (ja) * | 1996-11-26 | 2007-04-04 | 三菱重工業株式会社 | 真空蒸着装置 |
US6387147B2 (en) | 1998-02-06 | 2002-05-14 | Kao Corporation | Fertilizer composition |
US20010005553A1 (en) * | 1999-11-10 | 2001-06-28 | Witzman Matthew R. | Linear aperture deposition apparatus and coating process |
EP1182272A1 (fr) * | 2000-08-23 | 2002-02-27 | Cold Plasma Applications C.P.A. | Procédé et dispositif permettant le dépôt de couches métalliques en continu par plasma froid |
IT1320693B1 (it) * | 2000-10-06 | 2003-12-10 | Fiat Ricerche | Dispositivo per la regolazione di un flusso d'aria in un condotto, con attuatore a memoria di forma integrato, particolarmente per sistemi |
JP4704605B2 (ja) * | 2001-05-23 | 2011-06-15 | 淳二 城戸 | 連続蒸着装置、蒸着装置及び蒸着方法 |
US20040002623A1 (en) | 2002-06-28 | 2004-01-01 | Tihiro Ohkawa | Encapsulation of spent ceramic nuclear fuel |
US7169232B2 (en) * | 2004-06-01 | 2007-01-30 | Eastman Kodak Company | Producing repetitive coatings on a flexible substrate |
US7927659B2 (en) * | 2005-04-26 | 2011-04-19 | First Solar, Inc. | System and method for depositing a material on a substrate |
ATE520799T1 (de) * | 2005-10-26 | 2011-09-15 | Applied Materials Gmbh & Co Kg | Vorrichtung zum bedampfen von substraten |
-
2008
- 2008-12-22 CN CN2008801257824A patent/CN101925688B/zh active Active
- 2008-12-22 US US12/809,724 patent/US9458533B2/en active Active
- 2008-12-22 WO PCT/EP2008/068202 patent/WO2009083546A1/fr active Application Filing
- 2008-12-22 AU AU2008342644A patent/AU2008342644B2/en active Active
- 2008-12-22 EP EP08867165.6A patent/EP2231895B1/fr active Active
- 2008-12-22 KR KR1020107013853A patent/KR101644467B1/ko active IP Right Grant
- 2008-12-22 JP JP2010538797A patent/JP5740552B2/ja active Active
- 2008-12-22 BR BRPI0821332-1A patent/BRPI0821332B1/pt active IP Right Grant
-
2016
- 2016-10-03 US US15/284,435 patent/US10323319B2/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108456856A (zh) * | 2017-02-22 | 2018-08-28 | 萨特隆股份公司 | 用于基材、特别是眼镜镜片的真空涂布的箱式涂布设备 |
CN108456856B (zh) * | 2017-02-22 | 2021-10-22 | 萨特隆股份公司 | 用于基材的真空涂布的箱式涂布设备 |
Also Published As
Publication number | Publication date |
---|---|
CN101925688B (zh) | 2012-12-05 |
BRPI0821332A2 (pt) | 2015-06-16 |
AU2008342644A1 (en) | 2009-07-09 |
US10323319B2 (en) | 2019-06-18 |
EP2231895A1 (fr) | 2010-09-29 |
KR20100102129A (ko) | 2010-09-20 |
KR101644467B1 (ko) | 2016-08-12 |
WO2009083546A1 (fr) | 2009-07-09 |
US20100272921A1 (en) | 2010-10-28 |
AU2008342644B2 (en) | 2014-06-12 |
JP5740552B2 (ja) | 2015-06-24 |
EP2231895B1 (fr) | 2017-10-18 |
US9458533B2 (en) | 2016-10-04 |
BRPI0821332B1 (pt) | 2019-03-26 |
US20170088936A1 (en) | 2017-03-30 |
JP2011506776A (ja) | 2011-03-03 |
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Effective date of registration: 20160414 Address after: Swiss Neuhausen Patentee after: Advanced electroplating AG Address before: Switzerland Rhine falls Neuhausen Patentee before: Ind Plasma Services & Technolo |
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Effective date of registration: 20211228 Address after: Carle Stein, Germany Patentee after: Songcun Co.,Ltd. Address before: Swiss Neuhausen Patentee before: Advanced electroplating AG |
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