CN101917784B - 一种具有凹槽形加热膜区的三维微型加热器及其制作方法 - Google Patents
一种具有凹槽形加热膜区的三维微型加热器及其制作方法 Download PDFInfo
- Publication number
- CN101917784B CN101917784B CN 201010278255 CN201010278255A CN101917784B CN 101917784 B CN101917784 B CN 101917784B CN 201010278255 CN201010278255 CN 201010278255 CN 201010278255 A CN201010278255 A CN 201010278255A CN 101917784 B CN101917784 B CN 101917784B
- Authority
- CN
- China
- Prior art keywords
- heating film
- groove
- film region
- heater
- overarm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 91
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 56
- 238000000034 method Methods 0.000 claims abstract description 52
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 51
- 239000010703 silicon Substances 0.000 claims abstract description 51
- 239000000758 substrate Substances 0.000 claims abstract description 44
- 238000009413 insulation Methods 0.000 claims abstract description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 73
- 239000010410 layer Substances 0.000 claims description 49
- 229920002120 photoresistant polymer Polymers 0.000 claims description 38
- 238000005530 etching Methods 0.000 claims description 34
- 239000000377 silicon dioxide Substances 0.000 claims description 33
- 238000005260 corrosion Methods 0.000 claims description 27
- 230000007797 corrosion Effects 0.000 claims description 27
- 238000001259 photo etching Methods 0.000 claims description 26
- 238000004518 low pressure chemical vapour deposition Methods 0.000 claims description 22
- 238000001020 plasma etching Methods 0.000 claims description 21
- 239000012528 membrane Substances 0.000 claims description 20
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 19
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 19
- 238000005516 engineering process Methods 0.000 claims description 18
- 238000010884 ion-beam technique Methods 0.000 claims description 17
- 239000007788 liquid Substances 0.000 claims description 14
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 10
- 239000002131 composite material Substances 0.000 claims description 10
- 238000009713 electroplating Methods 0.000 claims description 10
- 239000003292 glue Substances 0.000 claims description 10
- 238000005507 spraying Methods 0.000 claims description 10
- 238000002360 preparation method Methods 0.000 claims description 9
- UUWCBFKLGFQDME-UHFFFAOYSA-N platinum titanium Chemical compound [Ti].[Pt] UUWCBFKLGFQDME-UHFFFAOYSA-N 0.000 claims description 8
- 229910052697 platinum Inorganic materials 0.000 claims description 7
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 7
- 230000003647 oxidation Effects 0.000 claims description 6
- 238000007254 oxidation reaction Methods 0.000 claims description 6
- 238000001039 wet etching Methods 0.000 claims description 6
- 238000005229 chemical vapour deposition Methods 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 5
- 238000007599 discharging Methods 0.000 claims description 5
- 238000006243 chemical reaction Methods 0.000 claims description 4
- 239000012467 final product Substances 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 4
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 238000000992 sputter etching Methods 0.000 claims description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 239000010931 gold Substances 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 239000000725 suspension Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims 1
- 230000002349 favourable effect Effects 0.000 abstract 2
- 238000000347 anisotropic wet etching Methods 0.000 abstract 1
- 239000012141 concentrate Substances 0.000 abstract 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 abstract 1
- 239000010408 film Substances 0.000 description 100
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 27
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 18
- -1 M.Gall Chemical compound 0.000 description 6
- 239000003054 catalyst Substances 0.000 description 4
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010278255 CN101917784B (zh) | 2010-09-10 | 2010-09-10 | 一种具有凹槽形加热膜区的三维微型加热器及其制作方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN 201010278255 CN101917784B (zh) | 2010-09-10 | 2010-09-10 | 一种具有凹槽形加热膜区的三维微型加热器及其制作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101917784A CN101917784A (zh) | 2010-12-15 |
CN101917784B true CN101917784B (zh) | 2013-03-20 |
Family
ID=43325136
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN 201010278255 Active CN101917784B (zh) | 2010-09-10 | 2010-09-10 | 一种具有凹槽形加热膜区的三维微型加热器及其制作方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN101917784B (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103922274A (zh) * | 2014-04-30 | 2014-07-16 | 中国科学院上海微系统与信息技术研究所 | 一种三维红外光源及其制作方法 |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102256386A (zh) * | 2011-05-20 | 2011-11-23 | 中国科学院上海微系统与信息技术研究所 | 具有非均匀线间距加热电阻丝的矩形微型加热器及方法 |
CN102256387A (zh) * | 2011-05-20 | 2011-11-23 | 中国科学院上海微系统与信息技术研究所 | 具有非均匀线宽加热电阻丝的矩形微型加热器及方法 |
CN103058126B (zh) * | 2012-11-30 | 2015-11-25 | 北京遥测技术研究所 | 一种三维石英微机械结构表面电极的加工方法 |
CN104437686B (zh) * | 2013-09-18 | 2016-01-13 | 中国科学院理化技术研究所 | 微加热器 |
CN104401928B (zh) * | 2014-11-25 | 2016-08-17 | 广东万事泰集团有限公司 | 一种硅材料热源结构及其制作方法 |
US10605827B2 (en) * | 2015-12-14 | 2020-03-31 | Universidade Federal De Menas Gerais-Ufmg | Metallic device for scanning probe microscopy and method for manufacturing same |
CN105847492A (zh) * | 2016-03-14 | 2016-08-10 | 捷开通讯(深圳)有限公司 | 一种手机及其外壳 |
CN105873249B (zh) * | 2016-05-30 | 2022-09-27 | 京东方科技集团股份有限公司 | 加热器、传感器、智能终端及加热器的制作方法 |
CN106698331B (zh) * | 2017-01-17 | 2018-11-02 | 中国科学院上海微系统与信息技术研究所 | 一种包含梁膜结构的单晶硅红外热堆结构及其制作方法 |
CN107404775B (zh) * | 2017-08-04 | 2023-05-05 | 南京邮电大学 | 一种基于多孔硅绝热层的微加热板及其制备方法 |
CN108011030B (zh) * | 2017-12-27 | 2019-12-17 | 中国科学院上海微系统与信息技术研究所 | 一种SiC热电堆型高温热流传感器及其制备方法 |
CN108751122B (zh) * | 2018-05-17 | 2020-09-15 | 中国科学院上海微系统与信息技术研究所 | 一种三维微型加热器及其制备方法 |
CN110715681B (zh) * | 2018-07-12 | 2021-02-19 | 山东大学 | 一种金金热压键合制备高反射膜光学腔的方法 |
CN110040678B (zh) * | 2019-04-18 | 2021-06-18 | 中国科学院上海微系统与信息技术研究所 | 微传感器及其制备方法 |
CN110057388B (zh) * | 2019-05-13 | 2021-04-27 | 山东大学 | 一种基于金金键合制备穿孔结构光学腔f-p光纤传感器的方法 |
CN110182754B (zh) * | 2019-05-17 | 2021-10-29 | 中国科学院上海微系统与信息技术研究所 | 一种具有微纳结构增强的微加热器及其制备方法 |
CN113514499A (zh) * | 2020-04-10 | 2021-10-19 | 中国石油化工股份有限公司 | 内嵌式三维结构微加热板及制备方法、气体传感器 |
CN113120853A (zh) * | 2021-04-06 | 2021-07-16 | 桂林电子科技大学 | 一种微米级硅基微热板精确温控系统 |
CN116731841A (zh) * | 2022-11-10 | 2023-09-12 | 南方科技大学 | 微针加热扩增结构、快速核酸检测芯片、装置与方法 |
CN116170906A (zh) * | 2022-12-06 | 2023-05-26 | 东北林业大学 | 一种支撑梁的mems微加热器及其制造方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100422070C (zh) * | 2005-08-12 | 2008-10-01 | 中国科学院上海微系统与信息技术研究所 | 一种由硅和二氧化硅共同支撑的可移动微结构及制作方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH087093B2 (ja) * | 1993-08-13 | 1996-01-29 | 日本電気株式会社 | 熱型赤外線センサ |
-
2010
- 2010-09-10 CN CN 201010278255 patent/CN101917784B/zh active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100422070C (zh) * | 2005-08-12 | 2008-10-01 | 中国科学院上海微系统与信息技术研究所 | 一种由硅和二氧化硅共同支撑的可移动微结构及制作方法 |
Non-Patent Citations (1)
Title |
---|
JP特开平7-55557A 1995.03.03 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103922274A (zh) * | 2014-04-30 | 2014-07-16 | 中国科学院上海微系统与信息技术研究所 | 一种三维红外光源及其制作方法 |
CN103922274B (zh) * | 2014-04-30 | 2016-01-13 | 中国科学院上海微系统与信息技术研究所 | 一种三维红外光源的制作方法 |
Also Published As
Publication number | Publication date |
---|---|
CN101917784A (zh) | 2010-12-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101917784B (zh) | 一种具有凹槽形加热膜区的三维微型加热器及其制作方法 | |
CN101932146B (zh) | 具有圆弧形凹槽加热膜区的三维微型加热器及制作方法 | |
CN101917783A (zh) | 具有弧度可调的圆弧形加热膜区的三维微型加热器及方法 | |
CN101795505B (zh) | 一种具有网孔结构加热膜的低功耗微型加热器及制作方法 | |
US20090151429A1 (en) | Micro gas sensor and manufacturing method thereof | |
CN107345826B (zh) | 一种热式气体流量传感器及其制备方法 | |
Iliescu et al. | Stress control in masking layers for deep wet micromachining of Pyrex glass | |
CN104142359B (zh) | 一种mems气体传感器及其加工方法 | |
CN108318548B (zh) | 一种单悬梁气体传感器、传感器阵列及传感器的制备方法 | |
CN101938862B (zh) | 一种具有螺管式加热电阻的三维微型加热器及其制作方法 | |
CN109827654A (zh) | 一种空气声质点振速敏感元件及其封装方式 | |
CN102175287A (zh) | 一种基于mems技术的流量计芯片的测量部件及其制作方法 | |
CN204129000U (zh) | 一种mems气体传感器 | |
CN112758888A (zh) | 一种带有硅通孔的硅mems微结构的加工工艺 | |
CN107316829B (zh) | 基于tmah的气相刻蚀方法及气相刻蚀装置 | |
CN210626385U (zh) | 一种具有四支撑悬梁结构的电阻式半导体气体传感器 | |
CN113514498A (zh) | 共片加热阵列式气体检测微芯片及制备方法 | |
CN108751122A (zh) | 一种三维微型加热器及其制备方法 | |
CN109613085A (zh) | 一种基于[111]单晶硅的气体敏感芯片阵列及其制作方法 | |
CN108271282A (zh) | 一种微热盘及其制作方法 | |
CN102530847A (zh) | 热绝缘微结构及其制备方法 | |
CN104291263A (zh) | 一种金刚石桥膜结构微型红外光源芯片及制备方法 | |
CN102256386A (zh) | 具有非均匀线间距加热电阻丝的矩形微型加热器及方法 | |
CN103922274B (zh) | 一种三维红外光源的制作方法 | |
CN100396593C (zh) | 单层双材料微悬臂梁热隔离焦平面阵列的制作方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20181008 Address after: 230000 room 1609, F3 building, innovation industry park, 2800 innovation Avenue, Hefei high tech Zone, Anhui. Patentee after: HEFEI MICRO NANO SENSING TECHNOLOGY Co.,Ltd. Address before: 200050 No. 865, Changning Road, Shanghai, Changning District Patentee before: Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences |
|
TR01 | Transfer of patent right | ||
CP03 | Change of name, title or address |
Address after: 230000 building D6, phase I, Zhongan chuanggu Science Park, No. 900, Wangjiang West Road, high tech Zone, Hefei, Anhui Patentee after: Micro nano perception (Hefei) Technology Co.,Ltd. Country or region after: China Address before: 230000 room 1609, F3 building, innovation industry park, 2800 innovation Avenue, Hefei high tech Zone, Anhui. Patentee before: HEFEI MICRO NANO SENSING TECHNOLOGY Co.,Ltd. Country or region before: China |
|
CP03 | Change of name, title or address |