CN101884074A - 导电组合物以及用于半导体装置制造中的方法:焊剂材料 - Google Patents

导电组合物以及用于半导体装置制造中的方法:焊剂材料 Download PDF

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Publication number
CN101884074A
CN101884074A CN2008801192618A CN200880119261A CN101884074A CN 101884074 A CN101884074 A CN 101884074A CN 2008801192618 A CN2008801192618 A CN 2008801192618A CN 200880119261 A CN200880119261 A CN 200880119261A CN 101884074 A CN101884074 A CN 101884074A
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CN
China
Prior art keywords
composition
thick film
silver
glass
frit
Prior art date
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Pending
Application number
CN2008801192618A
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English (en)
Chinese (zh)
Inventor
A·F·卡罗尔
K·W·杭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of CN101884074A publication Critical patent/CN101884074A/zh
Pending legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20Conductive material dispersed in non-conductive organic material
    • H01B1/22Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/18Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing free metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/14Conductive material dispersed in non-conductive inorganic material
    • H01B1/16Conductive material dispersed in non-conductive inorganic material the conductive material comprising metals or alloys
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/20Electrodes
    • H10F77/206Electrodes for devices having potential barriers
    • H10F77/211Electrodes for devices having potential barriers for photovoltaic cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Conductive Materials (AREA)
  • Photovoltaic Devices (AREA)
  • Glass Compositions (AREA)
CN2008801192618A 2007-10-18 2008-10-20 导电组合物以及用于半导体装置制造中的方法:焊剂材料 Pending CN101884074A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US98091007P 2007-10-18 2007-10-18
US60/980,910 2007-10-18
PCT/US2008/080447 WO2009052474A1 (en) 2007-10-18 2008-10-20 Conductive compositions and processes for use in the manufacture of semiconductor devices: flux materials

Publications (1)

Publication Number Publication Date
CN101884074A true CN101884074A (zh) 2010-11-10

Family

ID=40279022

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008801192618A Pending CN101884074A (zh) 2007-10-18 2008-10-20 导电组合物以及用于半导体装置制造中的方法:焊剂材料

Country Status (7)

Country Link
US (1) US8187505B2 (https=)
EP (2) EP2191479A1 (https=)
JP (1) JP2011519112A (https=)
KR (1) KR101208136B1 (https=)
CN (1) CN101884074A (https=)
TW (1) TW200937450A (https=)
WO (2) WO2009052343A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103563010A (zh) * 2011-06-13 2014-02-05 E.I.内穆尔杜邦公司 包含基于铋的氧化物的厚膜浆料及其在半导体器件制造中的用途

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1997941B1 (en) * 2006-03-01 2014-12-17 Mitsubishi Gas Chemical Company, Inc. PROCESS FOR PRODUCING ZnO SINGLE CRYSTAL ACCORDING TO METHOD OF LIQUID PHASE GROWTH
NL2000999C2 (nl) * 2007-11-13 2009-05-14 Stichting Energie Werkwijze voor het fabriceren van kristallijn silicium zonnecellen met gebruikmaking van co-diffusie van boor en fosfor.
US20100294353A1 (en) * 2009-05-21 2010-11-25 E. I. Du Pont De Nemours And Company Conductive paste for solar cell electrode
JP5426241B2 (ja) * 2009-06-10 2014-02-26 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー チップ抵抗器の表電極および裏電極
KR101332429B1 (ko) * 2009-12-17 2013-11-22 제일모직주식회사 태양전지 전극용 페이스트 및 이를 이용한 태양전지
KR101045262B1 (ko) * 2009-12-21 2011-06-29 제일모직주식회사 스텔스 다이싱용 반도체용 접착 조성물 및 이를 이용한 접착 필름
CN102314956A (zh) * 2010-07-09 2012-01-11 硕禾电子材料股份有限公司 导电铝胶及其制造方法、太阳能电池及其模块
KR101374359B1 (ko) * 2010-09-15 2014-03-18 제일모직주식회사 태양전지 전극용 페이스트 및 이를 이용하여 제조되는 태양전지
US8562872B2 (en) 2010-09-15 2013-10-22 Cheil Industries, Inc. Paste for solar cell electrode and solar cell prepared using the same
WO2012044281A1 (en) * 2010-09-28 2012-04-05 E. I. Du Pont De Nemours And Company Conductive paste for solar cell electrode
JP2012209148A (ja) * 2011-03-30 2012-10-25 Sony Corp 導電性粒子、導電性ペースト、及び、回路基板
EP2839511A4 (en) 2012-04-18 2015-12-02 Heraeus Precious Metals North America Conshohocken Llc SOLAR CELL CONTACTS WITH INTERMETALLIC NICKEL COMPOSITIONS
WO2015026483A1 (en) * 2013-08-21 2015-02-26 Gtat Corporation Using an active solder to couple a metallic article to a photovoltaic cell
EP3128540B1 (en) * 2014-04-04 2019-06-12 KYOCERA Corporation Thermosetting resin composition, semiconductor device and electrical/electronic component
US10040717B1 (en) 2017-09-18 2018-08-07 Jiangxi Jiayin Science and Technology, Ltd. Thick-film paste with multiple discrete frits and methods for contacting crystalline silicon solar cell emitter surfaces
WO2019183931A1 (zh) * 2018-03-30 2019-10-03 深圳市首骋新材料科技有限公司 晶硅太阳能电池正面导电浆料及其制备方法和太阳能电池
US20200243697A1 (en) * 2019-01-28 2020-07-30 Dupont Electronics, Inc. Solar cell

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4625848B1 (https=) * 1966-04-15 1971-07-26
US4874550A (en) * 1987-08-20 1989-10-17 General Electric Company Thick-film copper conductor inks
US20060001009A1 (en) * 2004-06-30 2006-01-05 Garreau-Iles Angelique Genevie Thick-film conductive paste
US7556748B2 (en) * 2005-04-14 2009-07-07 E. I. Du Pont De Nemours And Company Method of manufacture of semiconductor device and conductive compositions used therein
US7435361B2 (en) 2005-04-14 2008-10-14 E.I. Du Pont De Nemours And Company Conductive compositions and processes for use in the manufacture of semiconductor devices
JP4807063B2 (ja) 2005-12-20 2011-11-02 ソニー株式会社 復号装置、制御方法、およびプログラム
JP2007194580A (ja) * 2005-12-21 2007-08-02 E I Du Pont De Nemours & Co 太陽電池電極用ペースト

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103563010A (zh) * 2011-06-13 2014-02-05 E.I.内穆尔杜邦公司 包含基于铋的氧化物的厚膜浆料及其在半导体器件制造中的用途

Also Published As

Publication number Publication date
KR20100080611A (ko) 2010-07-09
US8187505B2 (en) 2012-05-29
JP2011519112A (ja) 2011-06-30
TW200937450A (en) 2009-09-01
EP2191480A1 (en) 2010-06-02
US20090104457A1 (en) 2009-04-23
KR101208136B1 (ko) 2012-12-04
WO2009052474A1 (en) 2009-04-23
EP2191479A1 (en) 2010-06-02
WO2009052343A1 (en) 2009-04-23

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Application publication date: 20101110