CN101876609B - Micron-nano scale in-situ nano indentation and scratching test system - Google Patents
Micron-nano scale in-situ nano indentation and scratching test system Download PDFInfo
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Abstract
The invention relates to a micron-nano scale in-situ nano indentation and scratching test system which integrates driving, precise loading and signal detection, micron-nano scale mechanics performance testing, ultraprecise scratching processing and high resolution in-situ observing as one. The system is mainly composed of a precise positioning platform at X-axis and Y-axis directions, a precise linear positioning platform at Z-axis direction, a precise indentation driving unit, a load signal and displacement signal detection unit and a high resolution digital microscopic imaging system for observing and storing material deformation and damage conditions in the test process. The precise positioning platform at the X-axis and Y-axis directions is assembled on a base, the precise linear positioning platform at the Z-axis direction is assembled on a side plate, the precise indentation driving unit, a precise mechanical sensor for detecting the indentation material pressure of a diamond tool head and a precise displacement sensor for detecting the indentation depth of the diamond tool head to along the Z-axis direction are assembled on the precise linear positioning platform at the Z-axis direction, and the high resolution digital microscopic imaging system is assembled on a beam.
Description
Technical field
The present invention relates to integrate the precise automatic test system of driving, accurate loading and detection, micro/nano level Mechanics Performance Testing, ultraprecise delineation processing and in-situ observation, particularly for the device of the nanometer pressure/scratch experiment in the Micro Mechanical Properties test of all kinds of test specimens or material, in-situ nano pressure/scratch experiment and micron-nano scale in-situ adamas delineation processing, belong to the fine measuring instrument of optical, mechanical and electronic integration.exact instrument is to promote scientific-technical progress, the important guarantee of social development, the present invention is the special test equipment be used to the Micro Mechanical Properties parameter of measuring all kinds of test specimens or material, can be to the mechanical property of precision element, testing evaluation is carried out in the military service behavior, manufacturing and designing node optimization technique, improve its performance and even improve its serviceable life, and can be under the high-resolution digital micro imaging system distortion of real-time monitored test specimen or material, damage process, help material damage research on mechanism and analysis, and can be used for the processing of adamantine precision ruling trace, to China's exact instrument, microelectric technique, information science, the metallurgical manufacturing, MEMS (micro electro mechanical system), biomedical engineering, the development that the carplane key components and parts such as manufactures and designs at the industrial technology field will have practical value widely, to widen optical element, microelectronic element, the effective way of the domain design-manufacturings such as metallurgical material-this bottleneck of improvement.
Background technology
The measuring technology of micro/nano level material mechanical performance mainly comprises nano impress (Nanoindentation), nanometer cut (Nanoscratch), atomic force microscope (AFM), MEMS (micro electro mechanical system) (MEMS) special test technology (as little stretching etc.) and Related Supporting Technologies etc.According to whether can by the deformation and damage situation of the instrument on-line real time monitoring materials such as electron microscope, being divided into again original position (In situ) test and ex situ (Ex situ) test in test.So-called original position (or in place) test refers to on-line continuous monitoring and analysis to carrying out in the measured piece Mechanics Performance Testing; Corresponding is non-in-situ test (claiming again dystopy or displacement test) with it, before referring to utilize experiment or the test specimen after experiment carry out mechanics property analysis.Most nanometer mechanics research at present rests on the ex situ measuring technology.
(1) support technology in nanometer dynamic performance test-precision drives and detection technique
The Mechanics Performance Testing of nanoscale is to drive and the precision detection of loading force/displacement (or distortion) grows up as support technology take ultraprecise.The accurate driver element of micro/nano level is the important process unit of modern high-tech field, since the middle and later periods in last century, has occurred utilizing the intellectual materials such as electric causing/magnetostriction materials, marmem, piezoelectric ceramics to realize the accurate research that drives.because piezoelectric element can produce accurate controlled distortion under " inverse piezoelectric effect " effect, and has a compact conformation, load-bearing capacity is strong, resolution is high, energy conversion efficiency is high and without advantages such as electromagnetic interference (EMI), study as the precision driving of power conversion element the focus that becomes in recent years with piezoelectric element, and to impact type, Inchworm type, the multiple piezoelectric actuators such as stick-slip formula driving mechanism and micro-displacement work table conduct in-depth research, these achievements in research are in superfinishing, fine operation, exact instrument, the fields such as biomedical engineering have represented comparatively wide application prospect.In the detection of nano-deformation, main by the realization of the means such as optical triangulation method, interferometric method, condenser type detection at present; And in the detection of tiny load, the researchist mainly utilizes sensitive element loading force to be converted to little distortion of flexible member, and then obtains loading force by deflection or electric capacity (or strain) variable quantity that caused by distortion are detected.
(2) ex situ (Ex situ) nanometer press mark/scratch measuring technology
In nanometer mechanics test as can not by the deformation damage of the instrument dynamic surveillance materials such as electron microscope, be " test of ex situ (Ex-situ) nanometer mechanics ".The most nanometer mechanics test of determining at present rests in the ex situ test, and is wherein the most representative with nano impress and nanometer delineation.Nano-indenter test is analyzed loading force, test piece deformation and the load that the diamond tool head imposes on test specimen-press dark curve, the parameters such as material consistency and elasticity modulus of can measuring and monitoring the growth of standing timber by detection.Nanometer delineation can be used to study the characteristics such as the boundary strength of three-dimensional test specimen and film etc. and delineation drag.These two technology are comparatively ripe now, and there is commercially produced product in the companies such as American MTS and Hysitron, Switzerland CSM, Britain MML. and at present, China does not also possess this class technology with independent intellectual property right.
But these commercialization testing tools can't dynamic surveillance material occurs in test deformation damage situation, restricted going deep into of research; Their motion module by a plurality of single-degree-of-freedoms assemble and realize multivariant movement output, cause huge structure, transmission link complicated, increased test error, weakened the anti-interference of system; Owing to mostly adopting electromagnetism or static type of drive to realize accurate drive load, cause this quasi-instrument to have at work more significant electromagnetic interference (EMI).Current China is the independent intellectual property right product of this technology not also.Importer's external equipment is expensive, safeguard that cost of use is high, and the commercial application consideration for military and hi-tech added value field, external high-end technology equipment is to also offset embargo of China, so that restricted to a great extent the development of the subject such as China's material science and microelectric technique and industry.
(3) original position (In situ) nanometer dynamic performance test technology
the in-situ nano mechanical test is based on above multinomial technology and just grows up in recent years in one, once the great attention that proposes namely to be subject to U.S. government, Massachusetts Institute of Technology (MIT) (MIT), University of California Berkeley (UC Berkeley) and Northwest University etc., U.S. Lao Lunsi Berkeley National Laboratory (LBNL) and Lao Lunsi livermore national laboratory (LLNL) etc. and the top Electronic Speculum FEI of manufacturer etc., at USDOE (DOE), under the government organs such as NSFC (NSF) and Ministry of National Defence (DOD) subsidize, dropped into suitable manpower, material resources are carried out this research.
The people such as M.A.Wall of U.S. LLNL and LBNL have taken the lead in developing a kind of in-situ nano impression device of realizing accurate driving by gear motor and piezoelectric element; The people such as A.M.Minor of University of California Berkeley (UC Berkeley) and LBNL have also carried out the nano-indenter test of aluminium film by the diamond tool head that the piezoelectric direct acting drive unit promotes doping under the TEM in-situ monitoring; The people such as a damp academician that the S.Suresh of america's MIT, the Northwestern H.D.Espinosa of university and China's Beijing work are large have also developed the Special testing device based on MEMS technique, respectively atomic little human body cell, nano wire and nanotube etc. are carried out the in-situ nano mechanical test, obtained some significant achievements in research.
Can't the test material mechanics parameter owing to can not detecting that loading force causes but above-mentioned proving installation all exists the device of the people such as the M.A.Wall exploitation of deficiency: LLNL and LBNL, can not study load to the rule that affects of material deformation damage; The device of A.M.Minor etc. obtains loading force by voltage and its deflection relation that is applied on piezoelectric element through conversion, cause testing complex, off-line operation link too much, the model error and the parameter error that also exist loading force to convert have affected the credibility of test result on value; There is the restriction of special purpose based on the proving installation of MEMS technique.Due to these deficiencies, make said apparatus to carry out test to the three-dimensional test specimen more than the characteristic dimension grade, must make the atomic little special test specimen of structure by techniques such as " mask, burn into depositions " in order to test also, the preliminary work complexity is loaded down with trivial details.In addition, because sample dimensions is very small, its fixed form, boundary condition and and the diamond tool head between size effect etc. very remarkable on the test result impact, therefore utilize this test result to remove to estimate the comprehensive mechanical property of weighing the three-dimensional test specimen of large-size and lack credible.
For the research of the in-situ nano mechanical test of three-dimensional test specimen, be detected at present the some work that the J.Michler of Swiss Federal Institute of Technology and R.Rabe, the northeastern Japan W.Gao of university and associate professor Zhao Hongwei place project team etc. carry out.
The people such as J.Michler have developed a kind of in-situ nano scratch test device under European framework planning and Swiss Confederation's government-funded, adopt stick-slip formula (Stick-Slip) drive mechanism as driving power source, utilize the degree of depth and the pressure of capacitive displacement transducer and strain force sensor testing tool head Specimen, and studying the deformation damage situation of gallium arsenide (GaAs) under continuous delineation power effect under scanning electron microscope (SEM) in-situ monitoring.But this device test block full-size Φ 8 * 5mm, loading force resolution 1mN can carry maximum test specimen weight and only be 10g.Be subjected to exist in the restriction work of stick-slip formula Piezoelectric Driving mechanism the backlash phenomenon (amplitude reaches 30-100nm) that can't overcome, and can produce micro breadth oscillation at each period of motion inner core driver element, the positioning error of drive unit also causes loading force to have very large error and uncontrollability, has had a strong impact on measuring accuracy and reliability.
In sum, the in-situ nano mechanical test is generally believed it is the effective ways of brand-new, the most potential research material nanoscale mechanical property and damage mechanism by international academic community and engineering circles, is subject in recent years the great attention of international project circle, academia and department of government concerned.The in-situ nano mechanical testing instrument of commercially produced product only has U.S. Hysitron company to produce at present, and price is very expensive, and China is embargoed; The restriction that all there is certain shortcoming in other some in-situ nano mechanical tests or is subjected to special purpose.
The present invention is to study test specimen or material Micro Mechanical Properties, to damage the precise high-efficiency measuring technology of mechanism as object, proposition is for the new equipment that the in-situ nano impression/delineation is tested of three-dimensional test specimen more than the characteristic dimension grade, conduct a research and develop and advance its industrialization, making up the blank in this field of China, and occupy one seat at the international level.
Summary of the invention
The object of the present invention is to provide a kind of micron-nano scale in-situ nano indentation and scratching test system, this system is a kind of comprehensive precise experiment system of high-performance that integrates driving, loading, detection, micro/nano level Mechanics Performance Testing, ultraprecise delineation processing and home position observation.It by the grand moving adjusting mechanism of the objective table with X, Y-axis precision positioning, Z-direction and accurate be pressed into driver element, for detection of the precise displacement sensor I7 of the displacement of the moving displacement of compression distance Z direction diamond cutter and X, Y-direction objective table, be pressed into for detection of diamond cutter material internal pressure accurate mechanics sensor and be used for observation and the distortion of storage mechanical test process material, accurate micro imaging system and the digital imaging system of damage status form.Objective table with X, Y-axis precision positioning can be realized the precision feeding of workpiece on X, Y direction, the grand moving adjusting mechanism of Z-direction can the rapid adjustment diamond cutter and workpiece between the position, precision is pressed into driver element can realize that diamond cutter is pressed into to material internal, and accurate micro imaging system and digital imaging system are used for distortion, the damage status of observation and storage mechanical test process material.
Above-mentioned purpose of the present invention is achieved through the following technical solutions, and accompanying drawings is as follows:
a kind of micron-nano scale in-situ nano indentation and scratching measuring technology and system, mainly by X, Y and Z-direction locating platform, driving and detecting unit and be used for observation storage test process material deformation, the high-resolution digital micro imaging system of damage status forms, described X, X in Y and Z-direction locating platform, Y direction precisely locating platform 17 passes through can be simultaneously along X, the slide mechanism that Y direction moves is assemblied on base 2, the precision linear locating platform 6 of Z-direction is slidably matched with the side plate 3 that is fixed on base 2, described driving and detecting unit are arranged on the precision linear locating platform 6 of Z-direction, the high-resolution digital micro imaging system be assemblied in the hard-wired crossbeam 10 of base 2 on.
The guide rail that described slide mechanism is mainly arranged by square crossing and the power drag chain of the guide rail application of force is formed, locating platform 17 is arranged on the guide rail II26 that is fixed in pedestal I18, guide rail II26 is arranged on the guide rail III28 that is fixed in pedestal II22 by X-axis moving slider 23, pedestal II22 is fixedly mounted on base 2, locating platform 17 and X-axis moving slider 23 are driven by power drag chain II25 and power drag chain III24 respectively and move along Y-axis and X-direction, and amount of movement is detected and carried out closed-loop control as feedback signal by corresponding Grating Detecting System.
The precision linear locating platform 6 of described Z-direction is driven by power drag chain I4 and moves along Z-direction, and amount of movement is detected and carried out closed-loop control as feedback signal by Grating Detecting System.
Described driving and detecting unit mainly are comprised of flexible hinge, piezoelectric stack, power and displacement transducer and diamond penetrator, flexible hinge 8 is fixedly mounted on locating platform 6 by web joint I7, power sensor 19 is threaded in flexible hinge 8 lower ends, precise displacement sensor 20 is fixedly mounted on web joint I7, diamond penetrator 21 is arranged on power sensor 19 by connecting link, and is locked by lock-screw.
Described high-resolution digital micro imaging system mainly is comprised of crossbeam, web member, guide rod and CCD digital imaging system, the CCD digital imaging system is contained on guide rod 13 by web member IV15 and web member III14, guide rod 13 is fixed on crossbeam 10 by web joint II9, be slidably matched between web member IV15 and web member III14, and by adjusting nut 12 location, web member III14 is slidably mounted on guide rod 13, and by set nut I11 location.
Described driver element is that precision is pressed into driver element, this unit comprises 2 piezoelectric stack I29 and the piezoelectric stack II30 that is contained on flexible hinge 8, and adopt piezoelectric stack I29 and piezoelectric stack II30 to drive simultaneously, strengthen diamond penetrator 21 at the precision feeding stroke of Z-direction.
Technique effect of the present invention is: (mensuration that the test specimen size can reach the mechanical property parameters such as the hardness, elastic modulus, delineation drag of 40mm * 40mm * 10mm) characterizes method of testing and equipment more accurately is provided, and measuring technology or the method load deflection resolution that the present invention proposes reaches nanoscale, loading force resolution reaches little ox level for the three-dimensional material for test of macrofeature size; By the high-resolution digital micro imaging system, the deformation damage situation of material in test is carried out in-situ monitoring, mechanical behavior for the evaluation analysis material under load or military service behavior provide studies means of testing more accurately and effectively, for the deformation damage of setting up material under load and and load and material property between the correlativity rule technological means is provided; The method of optimization processing technology is provided for the nano-diamond delineation processing of complex precise grating etc.Patent of the present invention will play the promotion facilitation to fields such as material science, microelectric technique, precision optics, thin film technique, Ultraprecision Machining and defence and militaries.
Description of drawings
Accompanying drawing 1 is precise automatic nano impress/scratch test apparatus main body part body figure.
Accompanying drawing 2 is mechanism maps of X, Y direction precisely locating platform.
Accompanying drawing 3 is that precision is pressed into the driver element mechanism map
1. supporting seat, 2. base, 3. side plate, 4. power drag chain I, 5. guide rail I, 6.Z axial precision linear locating platform, 7. web joint I, 8. flexible hinge, 9. web joint II, 10. crossbeam, 11. set nut I, 12. adjusting nut, 13. guide rod, 14. web member III, 15. web member IV, 16.CCD digital imaging system, 17.X, the Y direction precisely locating platform, 18. pedestal I, 19. power sensor, 20. precise displacement sensor, 21. diamond penetrator, 22. pedestal II, 23.X axle moving slider, 24. power drag chain III, 25. power drag chain II, 26. guide rail II, 27. Grating Detecting System, 28. guide rail III, 29. piezoelectric stack I, 30. piezoelectric stack II
Embodiment
Further illustrate detailed content of the present invention and embodiment thereof below in conjunction with the accompanying drawing illustrated embodiment.
A kind of micron-nano scale in-situ nano indentation and scratching measuring technology and system, mainly precision linear locating platform 6 and the precision by X, Y direction precisely locating platform 17, Z-direction is pressed into driver element, load signal detecting unit, displacement signal detecting unit, is used for observing the high-resolution digital micro imaging system of storage test process material deformation, damage status to form.Described X, Y direction precisely locating platform 17 are assemblied on base 2, the precision linear locating platform 6 of Z-direction is arranged on side plate 3, precision is pressed into driver element, detection diamond tool head is pressed into the precision force transducer 19 of material pressure and the precise displacement sensor 20 of detection Z direction diamond tool head compression distance is arranged on the precision linear locating platform 6 of Z-direction, and the high-resolution digital micro imaging system is assemblied on crossbeam 10.
Described X, Y direction precisely locating platform 17 mainly are comprised of pedestal I18, pedestal II22, guide rail II26, guide rail III28, X-axis moving slider 23, Grating Detecting System 27, power drag chain III24, power drag chain II25.Locating platform 17 is arranged on guide rail II26, and guide rail II26 is arranged on pedestal I18 by screw, and locating platform 17 drives it by power drag chain II25 and moves along Y direction, and the amount of movement size detects and form closed-loop control by Grating Detecting System 27.Pedestal I18 is arranged on X-axis moving slider 23 by screw, and X-axis moving slider 23 is arranged on guide rail III28, and guide rail III28 is arranged on pedestal II22 by screw, and pedestal II22 is arranged on base 2.Drive X-axis moving slider 23 by power drag chain III24 and move along X-axis, finally drive locating platform 17 according to annexation and move along X-axis, the size of amount of movement is detected by corresponding Grating Detecting System, and realizes closed-loop control, finally realizes precision positioning.
The precision linear locating platform 6 of described Z-direction is arranged on guide rail I5, guide rail I5 is arranged on side plate 3 by screw, driving locating platform 6 by power drag chain I4 moves along Z-direction, the size of amount of movement is measured and is realized closed-loop control as feedback signal by Grating Detecting System, and final realization is accurate mobile.
Described precision is pressed into driver element and detecting unit mainly is comprised of flexible hinge 8, piezoelectric stack I29, piezoelectric stack II30, power sensor 19, precise displacement sensor 20, diamond penetrator 21.Web joint I7 is arranged on locating platform 6 by screw, flexible hinge 8 is arranged on web joint I7 by screw, power sensor 19 is by being threaded in flexible hinge 8 lower ends, precise displacement sensor 20 is arranged on web joint I7 by screw, diamond penetrator 21 is arranged on power sensor 19 by connecting link, and is locked by lock-screw.In test process, the pressing-in force of diamond penetrator 21 is picked up by power sensor 19, and compression distance is picked up by precise displacement sensor 20.The precision movement that precision is pressed on driver element and detecting unit Z-direction is realized by the precision linear locating platform 6 of Z-direction.
Described high-resolution digital micro imaging system mainly is comprised of crossbeam 10, web joint II9, set nut I11, adjusting nut 12, guide rod 13, web member III14, web member IV15, CCD digital imaging system 16.Crossbeam 10 is arranged on base 2, web joint II9 is arranged on crossbeam 10 by screw, guide rod 13 is arranged on web joint II9, web member III14 can move along guide rod 9, locked by set nut I11 when arriving the appropriate location, web member IV15 can move in web member III14 groove by regulating adjusting nut 12, and it is mobile to drive 16 realizations of CCD digital imaging system.Under the high resolving power micro imaging system, can realize mechanical behavior and the dynamic in-situ monitoring of damage status enforcement that material under load in the nanometer press mark/scratch process is occured.
Described precision is pressed into driver element and adopts piezoelectric stack I29, piezoelectric stack II30 to drive simultaneously, can strengthen diamond penetrator 21 at the stroke of Z-direction, and realize the precision feeding on Z-direction.
The present invention is a kind of precise automatic test system, test specimen sticks on X, Y direction precisely locating platform, driving precisely locating platform by the power drag chain on X, Y direction moves along X, Y direction, the size of amount of movement is detected and is realized closed-loop control as feedback signal by corresponding Grating Detecting System, thereby realizes that test specimen is along the precision positioning of X, Y direction.Diamond penetrator is driven by the power drag chain on Z-direction in the precision movement on Z-direction and realizes, and realize self-locking, amount of displacement is detected by corresponding Grating Detecting System and realizes closed-loop control as feedback signal, guarantee mobile accuracy, whether have registration to change to judge whether pressure head touches the test specimen surface according to the power sensor.The pressure head precision is pressed into driver element and is realized by flexible hinge and two piezoelectric stacks of design, has that stroke is large, resolution is high, without advantages such as electromagnetic interference (EMI), structure are small.Detect respectively pressing-in force in pressure head Specimen process and the size of compression distance by precision force transducer and precise displacement sensor, by software programming control the A/D capture card with the force signal synchronous acquisition of the displacement signal of displacement transducer output and the output of power sensor in computing machine, process by data again, obtain load---the depth curve of indentation test.Drive test specimen and realize that along X or Y direction accurate movement can complete the scratch experiment of test specimen by controlling power drag chain on X or Y direction.By the high-resolution digital imaging system on proving installation, can distortion, the damage status of real-time monitored test specimen under the loading force effect.
Consult shown in accompanying drawing 1, X, Y direction precisely locating platform 17 are assemblied on base 2, the precision linear locating platform 6 of Z-direction is arranged on side plate, precision is pressed into driver element, detection diamond tool head is pressed into the precision force transducer 19 of material pressure and the precise displacement sensor 20 of detection Z direction diamond tool head compression distance is arranged on by web joint I7 on the precision linear locating platform 6 of Z-direction, is assemblied in crossbeam 10 for observation and the distortion of storage mechanical test process material, the high-resolution digital micro imaging system of damage status.
Accompanying drawing 2 is mechanism maps of X, Y direction precisely locating platform, locating platform 17 is arranged on guide rail II26, guide rail II26 is arranged on pedestal I18 by screw, locating platform 17 drives it by power drag chain II25 and moves along Y direction, and the amount of movement size detects and form closed-loop control by Grating Detecting System 27.Pedestal I18 is arranged on X-axis moving slider 23 by screw, and X-axis moving slider 23 is arranged on guide rail III28, and guide rail III28 is arranged on pedestal II22 by screw, and pedestal II22 is arranged on base 2.Drive X-axis moving slider 23 by power drag chain III24 and move along X-axis, finally drive locating platform 17 according to annexation and move along X-axis, the size of amount of movement is detected by corresponding Grating Detecting System, and realizes closed-loop control, finally realizes precision positioning.
Accompanying drawing 3 is mechanism maps that precision is pressed into driver element, flexible hinge 8 is arranged on web joint I7 by screw, piezoelectric stack I29, piezoelectric stack II30 are arranged in two corresponding mounting holes of flexible hinge, and use the pad pretension, in experimentation, thereby can driving two piezoelectric stacks simultaneously by the power supply of controlling piezoelectricity fold stack driver, operating personnel realize that diamond penetrator 21 is at the precision feeding of Z-direction.
In nano-indenter test, the degree of depth h of diamond tool head Specimen can record by precise displacement sensor; And imposing on the contact load P of test specimen, the diamond tool head can record by the high-precision force sensor.
According to the relevant knowledge of contact mechanics, the contact stiffness S of test specimen can be expressed as
In conjunction with the correlation theory of Oliver-Pharr, the load at impression test unloading curve top can fit to an exponential function relation with corresponding displacement
P＝α(h-h
f)
m (2)
In formula: α and m are fitting parameter.
(2) formula is carried out at the maximum load place contact stiffness that differential can obtain test specimen
S＝αm(h
max-h
f)
m-1 (3)
In addition, the contact stiffness of test specimen also can be provided by following formula
In formula: A be pressure head this moment with the contact area of test specimen; E
rBe the conversion modulus
In formula: E
sYoung modulus for test specimen; E
iYoung modulus for the diamond tool head; v
sPoisson ratio for test specimen; v
iPoisson ratio for the diamond tool head.
The micro-hardness of material can be expressed as
In formula: H is the hardness of measured material; P is that the diamond tool head is applied to the load on material; A diamond tool head is pressed into the contact area of material, for rectangular pyramid diamond tool head
For triangular pyramid diamond tool head
Wherein h is the contact degree of depth, and α is the central axis of diamond tool head and the angle of its faceted pebble.
In conjunction with above-mentioned theory, by indentation curves and the related data that nano indentation test records, can calculate the performance parameter such as hardness, elastic modulus of measured material test specimen.By instruments such as electron microscopes, the test specimen indented region is observed, and even also can be studied crackle, the situation such as stress distribution microstructure change.
Claims (4)
1. micron-nano scale in-situ nano indentation and scratching test system, mainly by X, Y and Z-direction locating platform, driving and detecting unit and be used for observation storage test process material deformation, the high-resolution digital micro imaging system of damage status forms, it is characterized in that, described X, X in Y and Z-direction locating platform, Y direction precisely locating platform (17) passes through can be simultaneously along X, the slide mechanism that Y direction moves is assemblied on base (2), the precision linear locating platform (6) of Z-direction is slidably matched with the side plate (3) that is fixed on base (2), described driving and detecting unit are arranged on the precision linear locating platform (6) of Z-direction, the high-resolution digital micro imaging system be assemblied in the hard-wired crossbeam of base (2) (10) on,
Described driving and detecting unit mainly are comprised of flexible hinge, piezoelectric stack, power and displacement transducer and diamond penetrator, flexible hinge (8) is fixedly mounted on locating platform (6) by web joint I (7), power sensor (19) is threaded in flexible hinge (8) lower end, precise displacement sensor (20) is fixedly mounted on web joint I (7), diamond penetrator (21) is arranged on power sensor (19) by connecting link, and is locked by lock-screw;
Described high-resolution digital micro imaging system mainly is comprised of crossbeam, web member, guide rod and CCD digital imaging system, the CCD digital imaging system is contained on guide rod (13) by web member IV (15) and web member III (14), guide rod (13) is fixed on crossbeam (10) by web joint II (9), be slidably matched between web member IV (15) and web member III (14), and by adjusting nut (12) location, web member III (14) is slidably mounted on guide rod (13), and by set nut I (11) location.
2. a kind of micron-nano scale in-situ nano indentation and scratching test system according to claim 1, it is characterized in that, the guide rail that described slide mechanism is mainly arranged by square crossing and the power drag chain of the guide rail application of force is formed, X, Y direction precisely locating platform (17) is arranged on the guide rail II (26) that is fixed in pedestal I (18), guide rail II (26) is arranged on the guide rail III (28) that is fixed in pedestal II (22) by X-axis moving slider (23), pedestal II (22) is fixedly mounted on base (2), X, Y direction precisely locating platform (17) and X-axis moving slider (23) are driven by power drag chain II (25) and power drag chain III (24) respectively and move along Y-axis and X-direction, amount of movement is detected and is carried out closed-loop control as feedback signal by corresponding Grating Detecting System.
3. a kind of micron-nano scale in-situ nano indentation and scratching test system according to claim 1, it is characterized in that, the precision linear locating platform (6) of described Z-direction is driven by power drag chain I (4) and moves along Z-direction, and amount of movement is detected and carried out closed-loop control as feedback signal by Grating Detecting System.
4. a kind of micron-nano scale in-situ nano indentation and scratching test system according to claim 1, it is characterized in that, described driver element is that precision is pressed into driver element, this unit comprises 2 piezoelectric stack I (29) and the piezoelectric stack II (30) that is contained on flexible hinge (8), and adopt piezoelectric stack I (29) and piezoelectric stack II (30) to drive simultaneously, strengthen diamond penetrator (21) at the precision feeding stroke of Z-direction.
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| CN103395090A (en) * | 2013-07-19 | 2013-11-20 | 长春理工大学 | Testing apparatus for mechanical grating ruling process |
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| CN102252925A (en) * | 2011-04-19 | 2011-11-23 | 吉林大学 | Nanoindentation/cutting test device |
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