CN101622130B - 正工作辐射敏感性组合物和元件 - Google Patents

正工作辐射敏感性组合物和元件 Download PDF

Info

Publication number
CN101622130B
CN101622130B CN200880006298XA CN200880006298A CN101622130B CN 101622130 B CN101622130 B CN 101622130B CN 200880006298X A CN200880006298X A CN 200880006298XA CN 200880006298 A CN200880006298 A CN 200880006298A CN 101622130 B CN101622130 B CN 101622130B
Authority
CN
China
Prior art keywords
group
alkyl
radiation
following structure
imageable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN200880006298XA
Other languages
English (en)
Chinese (zh)
Other versions
CN101622130A (zh
Inventor
M·勒瓦农
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CN101622130A publication Critical patent/CN101622130A/zh
Application granted granted Critical
Publication of CN101622130B publication Critical patent/CN101622130B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00—Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Light Receiving Elements (AREA)
CN200880006298XA 2007-02-28 2008-02-13 正工作辐射敏感性组合物和元件 Active CN101622130B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/679,962 US7399576B1 (en) 2007-02-28 2007-02-28 Positive-working radiation-sensitive composition and elements
US11/679,962 2007-02-28
PCT/US2008/001878 WO2008106010A1 (en) 2007-02-28 2008-02-13 Positive-working radiation-sensitive compositions and elements

Publications (2)

Publication Number Publication Date
CN101622130A CN101622130A (zh) 2010-01-06
CN101622130B true CN101622130B (zh) 2011-08-03

Family

ID=39469304

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200880006298XA Active CN101622130B (zh) 2007-02-28 2008-02-13 正工作辐射敏感性组合物和元件

Country Status (7)

Country Link
US (1) US7399576B1 (enExample)
EP (1) EP2114676B1 (enExample)
JP (1) JP5134015B2 (enExample)
CN (1) CN101622130B (enExample)
AT (1) ATE469761T1 (enExample)
DE (1) DE602008001436D1 (enExample)
WO (1) WO2008106010A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103917918A (zh) * 2011-11-10 2014-07-09 伊斯曼柯达公司 平版印刷版前体和平版印刷版的制作方法

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7649030B2 (en) * 2007-01-25 2010-01-19 Hewlett-Packard Development Company, L.P. Polyurethane with fluoro-diols suitable for ink-jet printing
EP2047988B1 (en) 2007-10-09 2014-03-12 Agfa Graphics N.V. A lithographic printing plate precursor
US8198011B2 (en) * 2008-02-04 2012-06-12 Eastman Kodak Company Method of imaging and developing positive-working imageable elements
WO2010034795A1 (en) 2008-09-25 2010-04-01 Movea S.A Command by gesture interface
US20100227269A1 (en) 2009-03-04 2010-09-09 Simpson Christopher D Imageable elements with colorants
US8383319B2 (en) 2009-08-25 2013-02-26 Eastman Kodak Company Lithographic printing plate precursors and stacks
US8298750B2 (en) * 2009-09-08 2012-10-30 Eastman Kodak Company Positive-working radiation-sensitive imageable elements
US8936899B2 (en) 2012-09-04 2015-01-20 Eastman Kodak Company Positive-working lithographic printing plate precursors and use
EP2316645B1 (en) 2009-10-27 2012-05-02 AGFA Graphics NV Novel cyanine dyes and lithographic printing plate precursors comprising such dyes
ES2395993T3 (es) * 2010-03-19 2013-02-18 Agfa Graphics N.V. Precursor de plancha de impresión litográfica
US20120129093A1 (en) 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions
US8939080B2 (en) 2010-11-18 2015-01-27 Eastman Kodak Company Methods of processing using silicate-free developer compositions
US8530143B2 (en) 2010-11-18 2013-09-10 Eastman Kodak Company Silicate-free developer compositions
US20120189770A1 (en) * 2011-01-20 2012-07-26 Moshe Nakash Preparing lithographic printing plates by ablation imaging
JP5466720B2 (ja) * 2011-03-31 2014-04-09 富士フイルム株式会社 平版印刷版原版及びその作製方法
US8632940B2 (en) 2011-04-19 2014-01-21 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8722308B2 (en) 2011-08-31 2014-05-13 Eastman Kodak Company Aluminum substrates and lithographic printing plate precursors
US8647811B2 (en) 2012-01-12 2014-02-11 Eastman Kodak Company Positive-working lithographic printing plate precursors
US20130255515A1 (en) 2012-03-27 2013-10-03 Celin Savariar-Hauck Positive-working lithographic printing plate precursors
TWI495956B (zh) * 2014-01-28 2015-08-11 Daxin Materials Corp 感光性樹脂組合物、電子元件及其製造方法
US9229325B2 (en) 2014-02-25 2016-01-05 Eastman Kodak Company Method for making lithographic printing plates
US10635001B2 (en) * 2015-08-21 2020-04-28 Merck Patent Gmbh Patterned bank structures on substrates and formation method
US9588429B1 (en) 2015-09-03 2017-03-07 Eastman Kodak Company Lithographic developer composition and method of use

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050214678A1 (en) * 2004-03-26 2005-09-29 Fuji Photo Film Co., Ltd. Light-sensitive lithographic printing plate
US20050266335A1 (en) * 2004-05-26 2005-12-01 MicroChem Corp., a corporation Photoimageable coating composition and composite article thereof
US20060257785A1 (en) * 2005-05-13 2006-11-16 Johnson Donald W Method of forming a photoresist element

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
IT1169682B (it) * 1983-11-08 1987-06-03 I M G Ind Materiali Grafici Sp Composizione per fotoriproduzioni
US6255033B1 (en) 1999-07-30 2001-07-03 Creo, Ltd. Positive acting photoresist compositions and imageable element
CN1209392C (zh) 2001-05-14 2005-07-06 阿姆诺洼化学有限公司 由含侧氟碳基的环状单体得到的聚合物表面活性剂
WO2004081662A2 (en) 2003-03-14 2004-09-23 Creo Inc. Development enhancement of radiation-sensitive elements
US7282324B2 (en) * 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
TWI371657B (en) 2004-02-20 2012-09-01 Fujifilm Corp Positive resist composition for immersion exposure and method of pattern formation with the same
JP4391285B2 (ja) * 2004-03-26 2009-12-24 富士フイルム株式会社 感光性平版印刷版
US7314691B2 (en) * 2004-04-08 2008-01-01 Samsung Electronics Co., Ltd. Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device
US7279263B2 (en) * 2004-06-24 2007-10-09 Kodak Graphic Communications Canada Company Dual-wavelength positive-working radiation-sensitive elements
JP2006018203A (ja) * 2004-07-05 2006-01-19 Fuji Photo Film Co Ltd 平版印刷版原版
TWI368825B (en) 2004-07-07 2012-07-21 Fujifilm Corp Positive type resist composition for use in liquid immersion exposure and a method of forming the pattern using the same
JP4448767B2 (ja) 2004-10-08 2010-04-14 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US7947421B2 (en) 2005-01-24 2011-05-24 Fujifilm Corporation Positive resist composition for immersion exposure and pattern-forming method using the same
JP4511383B2 (ja) 2005-02-23 2010-07-28 富士フイルム株式会社 ポジ型レジスト組成物及びそれを用いたパターン形成方法
US8741537B2 (en) 2005-03-04 2014-06-03 Fujifilm Corporation Positive resist composition and pattern-forming method using the same

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050214678A1 (en) * 2004-03-26 2005-09-29 Fuji Photo Film Co., Ltd. Light-sensitive lithographic printing plate
US20050266335A1 (en) * 2004-05-26 2005-12-01 MicroChem Corp., a corporation Photoimageable coating composition and composite article thereof
US20060257785A1 (en) * 2005-05-13 2006-11-16 Johnson Donald W Method of forming a photoresist element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103917918A (zh) * 2011-11-10 2014-07-09 伊斯曼柯达公司 平版印刷版前体和平版印刷版的制作方法

Also Published As

Publication number Publication date
WO2008106010A1 (en) 2008-09-04
US7399576B1 (en) 2008-07-15
EP2114676B1 (en) 2010-06-02
DE602008001436D1 (de) 2010-07-15
EP2114676A1 (en) 2009-11-11
ATE469761T1 (de) 2010-06-15
CN101622130A (zh) 2010-01-06
JP5134015B2 (ja) 2013-01-30
JP2010520495A (ja) 2010-06-10

Similar Documents

Publication Publication Date Title
CN101622130B (zh) 正工作辐射敏感性组合物和元件
CN101616804B (zh) 具有碱性显影增强剂的辐射敏感性组合物和元件
CN101903177B (zh) 含显影性增强化合物的辐射敏感性元件
CN101689023B (zh) 含耐溶剂性聚（乙烯醇缩醛）的辐射敏感性组合物和元件
CN101939166B (zh) 正性工作可成像元件的成像和显影方法
CN101861245B (zh) 具有改进的性能的多层可成像元件
CN102497988B (zh) 阳图制版的辐射敏感可成像元件
CN101528465A (zh) 具有改进性质的多层可成像元件
CN102256792B (zh) 阳图制版可成像元件及其制造方法
CN101918216B (zh) 具有改进的耐磨性的可成像元件
CN101296798B (zh) 含有环氧树脂的多层可成像元件及形成图像的方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant