CN101616804B - 具有碱性显影增强剂的辐射敏感性组合物和元件 - Google Patents
具有碱性显影增强剂的辐射敏感性组合物和元件 Download PDFInfo
- Publication number
- CN101616804B CN101616804B CN200880005659.9A CN200880005659A CN101616804B CN 101616804 B CN101616804 B CN 101616804B CN 200880005659 A CN200880005659 A CN 200880005659A CN 101616804 B CN101616804 B CN 101616804B
- Authority
- CN
- China
- Prior art keywords
- imageable
- radiation
- ethoxy
- composition
- hydrogen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Printing Plates And Materials Therefor (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/677,599 | 2007-02-22 | ||
| US11/677,599 US7544462B2 (en) | 2007-02-22 | 2007-02-22 | Radiation-sensitive composition and elements with basic development enhancers |
| PCT/US2008/001880 WO2008103258A1 (en) | 2007-02-22 | 2008-02-13 | Radiation-sensitive compositions and elements with basic development enhancers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101616804A CN101616804A (zh) | 2009-12-30 |
| CN101616804B true CN101616804B (zh) | 2012-12-12 |
Family
ID=39485075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200880005659.9A Expired - Fee Related CN101616804B (zh) | 2007-02-22 | 2008-02-13 | 具有碱性显影增强剂的辐射敏感性组合物和元件 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7544462B2 (https=) |
| EP (1) | EP2121324B1 (https=) |
| JP (1) | JP2010532488A (https=) |
| CN (1) | CN101616804B (https=) |
| WO (1) | WO2008103258A1 (https=) |
Families Citing this family (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080286694A1 (en) * | 2007-05-15 | 2008-11-20 | Yisong Yu | Method to obtain a positive-working thermal lithographic printing master |
| US7723012B2 (en) * | 2007-06-28 | 2010-05-25 | Eastman Kodak Company | Radiation-sensitive compositions and elements with solvent resistant poly(vinyl acetal)s |
| US8084189B2 (en) | 2008-05-22 | 2011-12-27 | Eastman Kodak Company | Method of imaging and developing positive-working imageable elements |
| US8187792B2 (en) * | 2008-08-21 | 2012-05-29 | Eastman Kodak Company | Processing of positive-working lithographic printing plate precursor |
| US8048609B2 (en) * | 2008-12-19 | 2011-11-01 | Eastman Kodak Company | Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s |
| US8298750B2 (en) * | 2009-09-08 | 2012-10-30 | Eastman Kodak Company | Positive-working radiation-sensitive imageable elements |
| ATE555905T1 (de) | 2009-10-27 | 2012-05-15 | Agfa Graphics Nv | Neuartige cyaninfarbstoffe und lithografische druckerplattenvorläufer mit den farbstoffen |
| UA105045C2 (uk) | 2009-10-29 | 2014-04-10 | Майлен Груп | Галотаніни для покривних композицій офсетної друкарської форми |
| ES2395993T3 (es) * | 2010-03-19 | 2013-02-18 | Agfa Graphics N.V. | Precursor de plancha de impresión litográfica |
| JP5612531B2 (ja) | 2010-04-30 | 2014-10-22 | 富士フイルム株式会社 | 平版印刷版用支持体、および平版印刷版原版 |
| US8939080B2 (en) | 2010-11-18 | 2015-01-27 | Eastman Kodak Company | Methods of processing using silicate-free developer compositions |
| US8530143B2 (en) | 2010-11-18 | 2013-09-10 | Eastman Kodak Company | Silicate-free developer compositions |
| US20120129093A1 (en) | 2010-11-18 | 2012-05-24 | Moshe Levanon | Silicate-free developer compositions |
| US20120189770A1 (en) * | 2011-01-20 | 2012-07-26 | Moshe Nakash | Preparing lithographic printing plates by ablation imaging |
| EP2796929B1 (en) | 2011-03-31 | 2015-12-30 | Fujifilm Corporation | Lithographic printing plate precursor and method of preparing the same |
| EP2796928B1 (en) | 2011-03-31 | 2015-12-30 | Fujifilm Corporation | Lithographic printing plate precursor and method of preparing the same |
| US8647811B2 (en) | 2012-01-12 | 2014-02-11 | Eastman Kodak Company | Positive-working lithographic printing plate precursors |
| US20130255515A1 (en) | 2012-03-27 | 2013-10-03 | Celin Savariar-Hauck | Positive-working lithographic printing plate precursors |
| WO2014106554A1 (en) | 2013-01-01 | 2014-07-10 | Agfa Graphics Nv | (ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| WO2014163626A2 (en) * | 2013-04-02 | 2014-10-09 | Empire Technology Development Llc | Dynamic surfaces |
| US9229325B2 (en) | 2014-02-25 | 2016-01-05 | Eastman Kodak Company | Method for making lithographic printing plates |
| EP2933278B1 (en) | 2014-04-17 | 2018-08-22 | Agfa Nv | (Ethylene, vinyl acetal) copolymers and their use in lithographic printing plate precursors |
| EP2944657B1 (en) | 2014-05-15 | 2017-01-11 | Agfa Graphics Nv | (Ethylene, Vinyl Acetal) Copolymers and Their Use In Lithographic Printing Plate Precursors |
| ES2660063T3 (es) | 2014-06-13 | 2018-03-20 | Agfa Nv | Copolímeros (de etileno, vinilacetal) y su uso en precursores de plancha de impresión litográfica |
| EP2963496B1 (en) | 2014-06-30 | 2017-04-05 | Agfa Graphics NV | A lithographic printing plate precursor including ( ethylene, vinyl acetal ) copolymers |
| ES2655798T3 (es) | 2014-12-08 | 2018-02-21 | Agfa Nv | Sistema para reducir los residuos de ablación |
| EP3130465B1 (en) | 2015-08-12 | 2020-05-13 | Agfa Nv | Heat-sensitive lithographic printing plate precursor |
| US9588429B1 (en) | 2015-09-03 | 2017-03-07 | Eastman Kodak Company | Lithographic developer composition and method of use |
| EP3394187A1 (en) * | 2015-12-23 | 2018-10-31 | Sioo Färgkultur AB | Coating compositions and treating method |
| EP3430474A1 (en) | 2016-03-16 | 2019-01-23 | Agfa Nv | Method and apparatus for processing a lithographic printing plate |
| CN106292183A (zh) * | 2016-08-24 | 2017-01-04 | 青岛蓝帆新材料有限公司 | 一种阳图热敏平版印刷版版材 |
| JP2020064082A (ja) | 2017-02-17 | 2020-04-23 | 富士フイルム株式会社 | ポジ型平版印刷版原版、及び、平版印刷版の作製方法 |
| CN106909024B (zh) * | 2017-03-28 | 2020-03-13 | 辽宁靖帆新材料有限公司 | 一种感光性树脂组合物及其应用 |
| EP3637188A1 (en) | 2018-10-08 | 2020-04-15 | Agfa Nv | An effervescent developer precursor for processing a lithographic printing plate precursor |
| US20220082940A1 (en) * | 2019-02-27 | 2022-03-17 | Asahi Kasei Kabushiki Kaisha | Flexographic printing raw plate and manufacturing method of flexographic printing plate |
| EP3778253A1 (en) | 2019-08-13 | 2021-02-17 | Agfa Nv | Method for processing a lithographic printing plate |
| EP4382306A1 (en) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Lithographic printing press make-ready method |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5716753A (en) * | 1995-07-03 | 1998-02-10 | Fuji Photo Film Co., Ltd. | Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same |
| CN1787917A (zh) * | 2003-03-14 | 2006-06-14 | 柯达图像通信加拿大公司 | 辐射敏感元件的显影增强 |
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| GB1245924A (en) | 1967-09-27 | 1971-09-15 | Agfa Gevaert | Improvements relating to thermo-recording |
| US3864133A (en) * | 1970-08-11 | 1975-02-04 | Dainippon Ink & Chemicals | Photo-polymerizable compositions |
| JPS5560944A (en) * | 1978-10-31 | 1980-05-08 | Fuji Photo Film Co Ltd | Image forming method |
| JPS56161537A (en) | 1980-05-16 | 1981-12-11 | Kimoto & Co Ltd | Photosensitive material and its developing method |
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| US4665124A (en) | 1985-08-02 | 1987-05-12 | American Hoechst Corporation | Resin |
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| KR100220951B1 (ko) | 1996-12-20 | 1999-09-15 | 김영환 | 비닐 4-테트라히드로피라닐옥시벤잘-비닐 4-히드록시벤잘-비닐 테트라히드로피라닐에테르-비닐 아세테이트 공중합체, 비닐 4-테트라히드로피라닐옥시벤잘-비닐 테트라히드로피라닐에테르-비닐 아세테이트 공중합체 및 그들의 제조방법 |
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| JP2005275231A (ja) | 2004-03-26 | 2005-10-06 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JP4391285B2 (ja) | 2004-03-26 | 2009-12-24 | 富士フイルム株式会社 | 感光性平版印刷版 |
| US7279263B2 (en) | 2004-06-24 | 2007-10-09 | Kodak Graphic Communications Canada Company | Dual-wavelength positive-working radiation-sensitive elements |
| JP4152928B2 (ja) * | 2004-08-02 | 2008-09-17 | 株式会社シンク・ラボラトリー | ポジ型感光性組成物 |
| JP2006058430A (ja) | 2004-08-18 | 2006-03-02 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
-
2007
- 2007-02-22 US US11/677,599 patent/US7544462B2/en not_active Expired - Fee Related
-
2008
- 2008-02-13 WO PCT/US2008/001880 patent/WO2008103258A1/en not_active Ceased
- 2008-02-13 JP JP2009550887A patent/JP2010532488A/ja active Pending
- 2008-02-13 CN CN200880005659.9A patent/CN101616804B/zh not_active Expired - Fee Related
- 2008-02-13 EP EP08725504.8A patent/EP2121324B1/en not_active Not-in-force
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5716753A (en) * | 1995-07-03 | 1998-02-10 | Fuji Photo Film Co., Ltd. | Positive-working quinone diazide resist composition containing organic phosphoric compound and an amine and process for the formation of fine pattern using same |
| CN1787917A (zh) * | 2003-03-14 | 2006-06-14 | 柯达图像通信加拿大公司 | 辐射敏感元件的显影增强 |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2121324A1 (en) | 2009-11-25 |
| WO2008103258A1 (en) | 2008-08-28 |
| EP2121324B1 (en) | 2014-06-04 |
| CN101616804A (zh) | 2009-12-30 |
| US20080206678A1 (en) | 2008-08-28 |
| US7544462B2 (en) | 2009-06-09 |
| JP2010532488A (ja) | 2010-10-07 |
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| C14 | Grant of patent or utility model | ||
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20121212 Termination date: 20150213 |
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| EXPY | Termination of patent right or utility model |