CN101615570B - Vacuum processing apparatus - Google Patents
Vacuum processing apparatus Download PDFInfo
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- CN101615570B CN101615570B CN200910146244XA CN200910146244A CN101615570B CN 101615570 B CN101615570 B CN 101615570B CN 200910146244X A CN200910146244X A CN 200910146244XA CN 200910146244 A CN200910146244 A CN 200910146244A CN 101615570 B CN101615570 B CN 101615570B
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- container handling
- lid
- container
- cap assembly
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
- H01L21/3065—Plasma etching; Reactive-ion etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
Abstract
The invention provides a vacuum processing apparatus. When a cover covering a top opening of a container body is taken out of a processing container by a processed body, quantities of moisture and grains mixed in the container can be decreased. The vacuum processing apparatus comprises the container body (21) having a loading table (3) of a substrate (S) as the processed body and the cover (22) covering the top opening of the container body (21). When a gap is formed between the cover (22) and the container body (21) in order that the substrate (S) is taken in or out of the processing container (20). A lid part (5) is arranged along an outer periphery of the processing container (20) so as to cover the gap in a region of taking in or taking out of the substrate (S).
Description
Technical field
The present invention relates to for example handled object be carried out the vacuum treatment installation of the plasma treatment of ashing treatment etc.
Background technology
For example in the manufacturing process of semiconductor substrates such as glass substrate and semiconductor wafer, has the operation of substrate being carried out ashing treatment.If carry out an example of the cineration device of this operation according to Figure 18 simple declaration, 1 among the figure has moving into of substrate to take out of mouthfuls 10 vacuum chamber in its side, and this is moved into and takes out of mouthfuls 10 and constitute freely openable by the family of power and influence 11.Be provided with the mounting table that becomes lower electrode 12 that is used for mounting substrate, for example glass substrate S in the inside of this vacuum chamber 1, and become the processing of upper electrode gas supply part 13 relatively being provided with this mounting table 12.And, in vacuum chamber 1, supply with processing gas from handling gas supply part 13, and by not shown exhaust channel by not shown vacuum pump to carrying out vacuum draw in the vacuum chamber 1, on the other hand, apply high frequency voltage from high frequency electric source 14 to above-mentioned mounting table 12, superjacent air space at substrate S forms the plasma of handling gas thus, and then substrate S is carried out ashing treatment.
This ashing treatment device for example has moves into the device of taking out of with substrate between air atmosphere and vacuum chamber, in this device, substrate is moved into when taking out of vacuum chamber, makes the pressure in the chamber return to atmospheric gas pressure; When substrate is carried out ashing treatment, processing pressure will be vacuum-drawn against in the chamber.Therefore, from move into substrate to handle beginning vacuumize the needed time and from processing finish to the atmospheric time of the recovery of taking out of substrate all be necessary, this pressure adjustment is very time-consuming.
Adjust the time for the pressure that shortens the ashing treatment device, the measure that the internal capacity of vacuum chamber is diminished.But, in said apparatus, and when being arranged between the carrying arm (not shown) in the air atmosphere handing-over substrate, take out of the above-mentioned carrying arm of mouthful 10 usefulness and move into substrate from above-mentioned moving into, make the upper side that floats to mounting table 12 on the not shown lifter pin that is contained on the mounting table 12, between this lifter pin and above-mentioned carrying arm, join substrate.Therefore, between mounting table 12 and upper electrode 13, must be useful on the space of handing-over substrate, the internal capacity of cineration device can not be less than below to a certain degree.
Therefore, as shown in figure 19, the present inventor study with regard to following structure.Promptly, container body 1A and lid 1B can be divided cede territory to constitute vacuum chamber 1, open lid 1B, between itself and container body 1A, be formed for joining the opening 15 of substrate S, between chamber and air atmosphere, join substrate S by this opening 15, space between mounting table 12 and the upper electrode 13 is narrowed down, dwindle the internal capacity of chamber 1.
But, there is following problem in this structure of opening lid 1B handing-over substrate S: during handing-over substrate S, because the sidewall of vacuum chamber 1 is along opening in full week, take out of mouthfuls 10 with moving into of opening of existing the sort of sidewall sections and compare the open area and become greatly greatly, so the moisture in the atmosphere also enters chamber 1 easily when joining substrate S.Here can produce following problems: if chamber 1 inside has moisture to enter, when then chamber 1 inner setting being become vacuum atmosphere, it is floating to have steam in the processing atmosphere, handle in the atmosphere just to have hydrogen, and this hydrogen can cause ash rate to uprise; Or owing to move into the amount difference of the moisture that enters chamber 1 when taking out of substrate S, so deviation can occur in handling.In addition, also can produce because the opening of lid 1B, particle can be sneaked in chamber 1 inside, otherwise perhaps can disperse to the problem of the outside of chamber attached to the film of chamber 1 inside.
All described in patent documentation 1 and the patent documentation 2 and made the lid opening substrate be moved into the method for taking out of chamber, but therefore the technology all be not disclosed in the mixed volume reduction that makes moisture and particle when lid is opened in that structure does not solve technical problem of the present invention.
Patent documentation 1: Japanese kokai publication hei 11-54586 communique (Fig. 4-6)
Patent documentation 2: Japanese kokai publication hei 9-129581 communique (Fig. 1)
Summary of the invention
The object of the present invention is to provide a kind ofly at the lid of opening the upper opening portion that clogs container body and handled object is moved into when taking out of container handling, can reduce the technology of the amount of the moisture of sneaking into container handling inside and particle.
For this reason, vacuum treatment installation of the present invention is characterised in that, comprising: have by inside handled object mounting table container body and cover the container handling that the lid of the upper opening portion of this container body constitutes; In order between above-mentioned lid and container body, to form the gap of above-mentioned handled object being moved into or taken out of container handling, make above-mentioned lid carry out the elevating mechanism of lifting with respect to container body; Be used for above-mentioned container handling inside is carried out the vacuum exhaust unit of vacuum exhaust; And, at least in the mode that zone outside the zone covers above-mentioned gap of moving into of handled object, be arranged on the cap assembly of the outer peripheral face of container handling along Zhou Fangxiang when between lid and container body, forming the gap for container handling is moved into or taken out of to above-mentioned handled object.
At this moment, also can comprise the unit that is used for exhaust,, make the space between above-mentioned container handling and the cap assembly become the negative pressure that is lower than the container handling internal pressure with when forming above-mentioned gap.Can also be set as moving into of above-mentioned handled object and take out of the structure that cap assembly is not installed in the zone; Perhaps above-mentioned cap assembly is installed in above-mentioned container handling entire circumference, on this cap assembly, forms moving into of handled object and take out of mouth.In addition, above-mentioned cap assembly can be outstanding laterally crooked again from container handling, and is relative with the outer peripheral face of this container handling.Above-mentioned cap assembly for example is made of rigid element.
In addition, above-mentioned cap assembly is made of the pliability parts, its upper edge side and lower limb side can be separately fixed on lid and the container body.On at least one side of the lower limb side of above-mentioned pliability parts and lower limb side encapsulant is installed, the sealing material can be clipped in the junction surface of lid and container body.Further, above-mentioned container handling inside is set as vacuum atmosphere, above-mentioned encapsulant can dual-purpose be the bubble-tight vacuum encapsulant that is used to keep above-mentioned container handling inside also.
Can also comprise: the installing component that is located at least one side of the upper edge side of above-mentioned pliability parts and lower limb side; Be fixed in the fixed part on the container handling; Be located at least one side's side of this fixed part and above-mentioned installing component,, and select with loading and unloading the operating mechanism of this installing component by state that is pressed in the container handling outer peripheral face and the above-mentioned state of pushing one side of releasing simultaneously in the freely engaging of the opposing party's side.
In addition, can also comprise along Zhou Fangxiang being arranged at above-mentioned container handling, and be used to limit the limiting part of above-mentioned pliability component shape.Can also comprise the dry unit of space supply that is used between above-mentioned container handling and cap assembly with gas.Here, for above-mentioned container handling, for example and air atmosphere between join substrate.
According to the present invention; in the container handling that constitutes by container body and the lid that covers its upper opening portion; when between lid and container body, forming the gap for container handling is moved into or taken out of to handled object; at least moving in the zone outside the zone at handled object; cover above-mentioned gap with cap assembly; therefore the outer air of container handling is difficult to enter container handling inside, can suppress moisture and particle is sneaked in the container handling.
Description of drawings
Fig. 1 is the profile of an example of expression ashing treatment device of the present invention.
Fig. 2 is the stereoscopic figure of the above-mentioned ashing treatment device of expression.
Fig. 3 is the vertical view of the above-mentioned ashing treatment device of expression.
Fig. 4 is the stereoscopic figure of the above-mentioned ashing treatment device of expression effect.
Fig. 5 is the profile of the above-mentioned ashing treatment device of expression effect.
Fig. 6 is the profile of the above-mentioned ashing treatment device of expression effect.
Fig. 7 is the profile of the effect of another example of the above-mentioned ashing treatment device of expression.
Fig. 8 is the stereoscopic figure of other examples of the above-mentioned ashing treatment device of expression.
Fig. 9 is the stereoscopic figure of other examples of the above-mentioned ashing treatment device of expression.
Figure 10 is the stereoscopic figure of other examples of the above-mentioned ashing treatment device of expression.
Figure 11 is the profile of expression cineration device shown in Figure 10.
Figure 12 is the profile of the part of expression ashing treatment device shown in Figure 10.
Figure 13 is the profile of other examples of expression ashing treatment device.
Figure 14 is the profile of other examples of expression ashing treatment device.
Figure 15 is the profile of other examples of expression ashing treatment device.
Figure 16 is the profile of other examples of expression ashing treatment device.
Figure 17 is the profile of other examples of expression ashing treatment device.
Figure 18 is the profile of the existing ashing treatment device of expression.
Figure 19 is the profile of other examples of the existing ashing treatment device of expression.
Symbol description
20 container handlings
21 container bodies
22 lids
23 elevating mechanisms
24 move into to take out of and use peristome
26 vacuum pumps
3 mounting tables (lower electrode)
34 handle gas supply part (upper electrode)
5 cap assemblies
53 exhaust channels
54 exhaust pumps
6 cover sheets
9 cover confinement plates
The S handled object
Embodiment
In the execution mode of following explanation, so that vacuum treatment installation of the present invention for example is applicable to that the structure that the FPD substrate that becomes handled object is carried out the cineration device of ashing treatment is that example describes.Fig. 1 is the sectional arrangement drawing of above-mentioned cineration device, and Fig. 2 is its stereoscopic figure, and Fig. 3 is its vertical view.Above-mentioned cineration device 2 portion within it has the container handling 20 that is used for FPD substrate S is carried out for example angle barrel shape of ashing treatment.The plane of this container handling 20 is four horn shapes; Comprise the container body 21 of upper opening and the lid 22 that is provided with in the mode of the upper opening portion that opens and closes this container body 21; This lid 22 passes through elevating mechanism 23 with respect to container body 21 free liftings; By making lid 22 rise to delivery position, between container body 21 and lid 22, be formed for substrate S is moved into the gap 24 (with reference to Fig. 4) of taking out of this container handling.Above-mentioned container handling 20 is grounded, and, by exhaust channel 25 vacuum pump 26 that becomes the vacuum exhaust unit is connected with the exhaust outlet 21a of the bottom surface of container handling 20 with family of power and influence V1.Be connected with not shown pressure adjustment part on this vacuum pump 26, in container handling 20, keep desirable vacuum degree thus.
In the inside of above-mentioned container handling main body 21, the mounting table 3 that is used for mounting substrate S is configured in container body 21 bottom surfaces by insulating element 30.This mounting table 3 becomes lower electrode, and the top of mounting table 3 is provided with electrostatic chuck 31, applies voltage by high-voltage DC power supply 32, thus with substrate S Electrostatic Absorption on mounting table 3.Be connected with high frequency electric source 33 on this mounting table 3, apply the High frequency power that frequency for example is 13.56 MHz to mounting table as high frequency generating apparatus.Also be provided with the handing-over pin (not shown) that constitutes free lifting on this mounting table 3, handing-over substrate S between the transport mechanism of this handing-over pin and outside is further to these mounting table 3 handing-over handled objects.
On the other hand, the top of the above-mentioned mounting table 3 of container handling 20 is provided with becomes the processing of upper electrode gas supply part 34, with the surperficial subtend of this mounting table 3.Form a plurality of gases hole 35 that spues at the lower surface of this processing gas supply part 34, and supply with the processing gas supply source 38 of the processing gas that is used for ashing treatment to this processing gas supply part 34, by having the gas supply pipe 36 of valve V2 and flow adjustment part 37, be connected with this processing gas supply part 34; Thus, by the gas of handling gas supply part 34 hole 35 that spues, the above-mentioned processing gas that spues of the substrate S on mounting table 3.In this example, for example with mounting table 3 surface and the distance between handling below the gas supply part 34 be made as 40mm～60mm for example.Processing gas as being used for ashing treatment can use oxygen and fluorine gas etc.
Like this, with vacuum pump 26 inner space of container handling 20 is evacuated down to after the decompression state of regulation, by applying High frequency power to mounting table 3, form the plasma of handling gas, ashing treatment substrate S thus at the superjacent air space of substrate S from high frequency electric source 33.This example forms plasma producing apparatus by mounting table 3 and high frequency electric source 33.
In addition, on the faying face of container body 21 and lid 22, be sequentially with labyrinth arrangement 4, plasma seal member 44, shielding helical 45, vacuum seal member 46 from a side near container handling 20 inside.Above-mentioned labyrinth arrangement 4 forms crooked stream on the composition surface of container body 21 and lid 22, lose activity owing to the plasma that generates in the container handling 2 is collided with the wall portion that forms above-mentioned stream, make above-mentioned plasma can from this labyrinth arrangement 4, not go to the outside.Here employed labyrinth arrangement 4 comprises the stream of 2 bendings, for example, forms protuberance 41 in container body 21 sides, and at the recess 42 of lid 22 sides formation corresponding to raised part 41; When container body 21 and lid 22 engage, do not make up under the state of contact,, select its shape and size between protuberance 41 and recess 42, to form the mode of the stream 43 in narrow gap in raised part 41 and recess 42.
Here the gap that forms on the above-below direction of protuberance 41 for example is 0.5mm～1mm, but the gap that forms on the left and right directions of protuberance 41 for example, as shown in Figure 6, is set as 1mm～2mm, and it is big that the gap becomes.Like this, by the stream 43 that forms 2 bendings, increase the gap of the protuberance 41 and the recess 42 of this left and right directions, even the dislocation of the position of left and right directions appearance between the two when container body 21 being closed by lid 22, by bigger with above-mentioned gap, so, can in recess 42, take in protuberance 41 reliably.In addition, even the position of the protuberance 41 in the recess 42 changes, the whole size of above-mentioned stream 43 can not become yet, so can obtain stable labyrinth effect.
Though above-mentioned stream 43 has been taked 2 bendings in this example, stream also can adopt 1 bending, and is perhaps crooked more than 3 times.In addition, though the vertical section of the shape of raised part 41 (recess 42) is four horn shapes, the shape in its vertical section also can be triangle, circle or polygonal.
In addition, above-mentioned plasma is in order to make the plasmas that generate in the container handling 20 not be leaked to the foreign side of sealing parts, to suppress above-mentioned plasma and be provided with contacting of seal member 46 with vacuum with seal member 44, for example, is encircled by the O shape of silicon system and to constitute.And in the foreign side side of above-mentioned plasma with seal member 44, container body 21 and lid 22 engage, and bear huge load on this composition surface, therefore may produce particle; But above-mentioned plasma also has the effect that above-mentioned particle is invaded container handling 20 sides that suppresses with seal member 44.Though on container body 21 and lid 22, all be provided with above-mentioned plasma in this example with seal member 44, also can on the either party, be provided with.Above-mentioned shielding helical 45 is the conducting parts that are made of the elastomer that is used to make conduction between container body 21 and the lid 22, is arranged on container body 21 1 sides in this example.In this example, above-mentioned vacuum constitutes with the O shape ring of seal member 46 by for example trade mark " Palestine and Israel's cover (バ イ ト Application) (Viton) " by name system.
In above-mentioned container handling 20, when stating between container body 21 and the lid 22 when forming above-mentioned gap 24, cap assembly 5 is along Zhou Fangxiang, is provided with in the mode that covers described gap 24 and states cap assembly 5 taking out of zone the zone except moving into of substrate S.In this example, above-mentioned cap assembly for example is made of rigid elements such as aluminium or stainless steels, is arranged on the above-mentioned lid 22 along the sidewall of 3 directions of container handling 20.
And, cap assembly 5 constitutes from container handling 20 side-prominent crooked again to foreign side, relative with the outer peripheral face of this container handling, for example, wall components 52 is set as follows, promptly, make and lid 22 about horizontally disposed plate bodys 51 lateral bending song downwards, from the upper side at the junction surface of the container body 21 of container handling 20 and lid 22 until lower side, and the outer peripheral face of container handling 20 between form under the state of small space, relative with this outer peripheral face.
As shown in Figure 5, when the above-mentioned gap 24 between container body 21 and lid 22 forms, above-mentioned wall components 52 is set as the length that covers above-mentioned gap 24; For example, when forming above-mentioned gap 24,, select its size and the place is set in the mode of the lower side of 50～100mm of the lower end that extends to this gap 24.In addition, the side wall portion of container handling 20 and the width of the small space between the wall components 52 are set as 1mm～10mm.
And, for to the space that forms between the side wall portion of container handling 20 and this cap assembly 5 (hereinafter to be referred as " and the medial region of cap assembly 5) exhaust and exhaust channel 53 is set on this cap assembly 5, and at another distolateral exhaust pump 54 that is connected with of this exhaust channel 53.In this example, for example, as shown in Figure 3, the exhaust channel 53 (53a～53c) be connected, these exhaust channels 53 (53a～53c) be connected on the same exhaust pump 54 that all have on the sidewall of cap assembly 5 and 3 directions of container handling 20; Above-mentioned exhaust channel 53 and exhaust pump 54 have constituted the unit that is used for the medial region of above-mentioned cap assembly 5 is carried out exhaust.
In addition, also be provided with the control part that for example constitutes in this cineration device by computer.This control part comprises data processing division of being made up of program, memory, CPU etc., the order of enrolling in the said procedure is used for carrying control signal from control part to each one of cineration device, carry out each step described later, implement plasma treatment thus substrate S.The storage medium that this program (also comprise about input and show the program of processing parameter) is stored in computer for example in the not shown storage part such as floppy disk, CD, MO (magnetic optical disc), is installed to control part.
Below, the relevant ashing method of the present invention that has used above-mentioned cineration device, being located at transport mechanism (not shown) under the air atmosphere with utilization, substrate S is moved into the situation of taking out of this cineration device is that example describes.At first, for example, in advance cap assembly 5 is carried out exhaust, make the medial region of this cap assembly 5 reach the negative pressure lower slightly, for example the pressure of 93.1kPa (700Torr) degree than atmospheric pressure.And the pressure in making container handling 20 returns under the atmospheric state, makes lid 22 rise to delivery position with elevating mechanism 23, forms above-mentioned gap 24 between container body 21 and lid 22.So-called above-mentioned delivery position refers to, and the size of the above-below direction in for example above-mentioned gap 24 is set to the position about 150mm.Then, substrate S is moved into container handling 20 with the not shown transport mechanism that is arranged on air atmosphere, be positioned in this substrate S level on the mounting table 3 after, again with this substrate S Electrostatic Absorption on mounting table 3.Then, this transport mechanism is withdrawed from from container handling 20 after, lid 22 is descended, close container handling 20.
Then, carry out exhaust with 26 pairs of container handling 20 inside of vacuum pump, make container handling 20 inner sustain specified vacuum degree, for example (10～50mTorr) afterwards, supplies with podzolic gas, for example O with the regulation flow for 1.33～6.65Pa
2And SF
6Gas.On the other hand, supplying with frequency to mounting table 3 is the High frequency power of 13.65MHz, and above-mentioned podzolic gas is carried out plasma.The spike that also contains aerobic in this plasma, the unwanted etchant resist in substrate S surface can be decomposed by the spike of oxygen, and 20 gas is discharged to the outside of container handling 20 by exhaust channel 25 in container handling, carries out ashing treatment like this.
Then, when stopping, stopping the work of vacuum pump 26, make the pressure in the container handling 20 return to atmospheric pressure mounting table 3 supply high frequency electric power.Afterwards, make lid 22 rise to above-mentioned delivery position, form above-mentioned gap 24 with elevating mechanism 23; Substrate S is handed off on the not shown outside transport mechanism, finishes processing this substrate S.At this moment, no matter container handling 20 is closed or opened is continued predischarge all the time in the cap assembly 5.
2 kinds of this cineration devices, lid 22 is risen, between lid 22 and container body 21, form above-mentioned gap 24, by above-mentioned gap 24 substrate S is moved into and take out of container handling 20.At this moment, because handling gas supply part 34 and lid 22 rises together, so between mounting table 3 and processing gas supply part 34, can be forbidden to be ready for use on the space of handing-over substrate S, therefore can be made between mounting table 3 and the processing gas supply part 34 near about 40mm～60mm.Can dwindle the internal capacity of container handling 20 thus, so can shorten the required time of pressure of adjusting in the container handling 20.Therefore, when between container handling 20 and air atmosphere, joining substrate S, at the atmosphere opening that when substrate S joins, makes container handling 20, then reach repeatedly under the situation about vacuumizing of handling atmosphere, can shorten vacuumizing the time required of container handling 20 effectively with atmosphere opening.
Here, when forming above-mentioned gap 24 between container body 21 and the lid 22, in the zone of taking out of except moving into of substrate S the zone, by the gap that forms between cap assembly 5 covering container main bodys 21 and the lid 22, so, even atmosphere enters in the container handling 20 from the outside of container handling 20, also can be stopped by this cap assembly 5.In addition, the setting width in the space between container handling 20 and the cap assembly 5 is very little, so atmosphere is difficult to enter container handling 20 inside, the moisture and the particle that can suppress like this in the atmosphere are sneaked into container handling 20 inside.
In addition, by the medial region exhaust of cap assembly 5 being become to be lower than slightly the negative pressure of container handling 20 pressure (atmospheric pressure), as shown in Figure 5, (the air-flow of 53a～53c) that when open treated container 20, forms from container handling 20 to exhaust channel 53 in the zone of the cap assembly 5 that container handling 20 is installed.At this moment, the lower side of cap assembly 5 becomes open state, and atmosphere is from being inhaled into cap assembly 5 inboards here, and (air-flow of 53a～53c) flows out but the atmosphere that is inhaled into is also along with flowing to exhaust channel 53.
Therefore; when forming above-mentioned gap 24 between container body 21 and the lid 22; form the air-flow that flows to the outside like this around container handling 20, so the inside of atmosphere container handling 20 more difficult to get access, the moisture and the particle that further suppress in the atmosphere are sneaked into container handling 20 inside.
Therefore, can suppress because of sneaking into the ash rate raising that moisture causes in the container handling 20; And, also can suppress to improve homogeneity between ashing treatment internal homogeneity and face because of move into the deviation of the different ashing treatment that cause of moisture mixed volume when taking out of substrate S at every turn.The particle contamination that can suppress in addition, substrate S owing to suppress particle to sneak into the inside of container handling 20.
And when open treated container 20, the particle that adheres in the container handling 20 might disperse to the outside of handling container 20, but is provided with cap assembly 5 near the container handling 20, even particle disperses away, also can be attached on this cap assembly 5.In addition, when the medial region of cap assembly 5 was carried out exhaust, the particle that disperses can (air-flow of 53a～53c) be discharged to the outside, disperses in reason container 20 residing atmosphere so can suppress particle with flowing to exhaust channel 53.
In above-mentioned example, the medial region of cap assembly 5 is often carried out exhaust by exhaust pump 54, but during container handling 20 opens, owing to above-mentioned medial region can be adjusted to the negative pressure lower slightly than atmospheric pressure, so, also can stop exhaust in 20 down periods of container handling.Exhaust channel 53 is provided with the switching valve, can open the switching valve during opening container handling 20, closes when closing reason container 20 and opens and closes the family of power and influence.
In the above description, as shown in Figure 7, cap assembly can be located on the container body 21.Cap assembly 5A in this example is provided with wall components 52A as follows,, makes the lateral bending song upward to the side-prominent plate body 51A of foreign side with respect to container body 21 that is; From the lower side at the junction surface of the container body 21 of container handling 20 and lid 22 until upper side, and the outer peripheral face of container handling 20 between form under the state of small space, relative with this outer peripheral face.
In this structure; when forming above-mentioned gap 24 between container body 21 and the lid 22, be provided with cap assembly 5A be arranged on container handling 20 near, so; atmosphere is difficult to enter the inside of container handling 20, and the moisture and the particle that can suppress in the atmosphere are sneaked into the inside of container handling 20.In addition, can on container handling 20, be provided with as shown in Figure 1 cap assembly 5 and cap assembly 5A as shown in Figure 7; Also can be in the side of container handling 20 overlapping cap assembly 5, the 5A of being provided with.
In addition, as shown in Figure 8, form steam vent 55 along the Width (the Y direction among Fig. 8) of cap assembly 5, the exhaust chamber 56 that size can cover this steam vent 55 is set simultaneously, can carry out exhaust by the interior zone of 53 pairs of cap assemblies 5 of exhaust channel by exhaust chamber 56.This structure can be carried out exhaust to the medial region of cap assembly 5 equably along the Width of cap assembly 5.
In addition, as shown in Figure 9, also cap assembly 57 can be located at container handling 20 entire circumference, on this cap assembly 57, form moving into of substrate S and take out of mouth 58.This cap assembly 57 both can be a structure shown in Figure 1, also can be structure shown in Figure 7, can also 2 structures all be provided with.
Then utilize Figure 10～12 pair other execution modes of the present invention to describe.This example is the example that is made of cap assembly the pliability parts.As above-mentioned pliability parts, can use the sheet rubber that constitutes by trade (brand) name " Palestine and Israel's cover " (Viton) etc., bellows etc.The example of the cover sheet 6 with sheet rubber formation is described in this example.The upper edge side of above-mentioned cover sheet 6 is fixed on the lid 22 by the 1st installing component 61, and its lower limb side is fixed on the container body 21 by the 2nd installing component 62 simultaneously.In this example, the two edges that above-mentioned installing component 61,62 will cover sheet 6 are clipped between the sidewall and installing component 61,62 of container handling 20, under above-mentioned state, by screw 63 spiral shells solid (with reference to Figure 11,12).At this moment, the two edges of cover sheet 6 are provided with seal member 6a, the 6b that O shape ring is formed, and sealing parts 6a, 6b are incorporated in installing component 61,62 inner configuration space 61a, the 62a that form.
And above-mentioned cover sheet 6 is a swelling state when forming above-mentioned gap 24 between container body 21 and lid 22, from the whole coverage gap 24 of side side, is formed for simultaneously moving into and takes out of moving into of substrate S and take out of mouthfuls 64; Cover sheet 6 was deflected when lid 22 was closed, and moved into to take out of mouthfuls 64 and also close.Other structures are identical with above-mentioned execution mode.
Shown in Figure 11 (a), in this structure,, close under the state of container handling 20 in that container body 21 and lid 22 are engaged, substrate S is carried out ashing treatment; Shown in Figure 11 (b), by being risen, lid 22 opens container handling 20, and be installed on handing-over substrate S between the transport mechanism 100 in the air atmosphere, so can be the same with above-mentioned execution mode, dwindle the inner space of container handling 20, the pressure that shortens in the container handling 20 is adjusted the required time.
In addition, move into when taking out of substrate S, cover the gap 24 that forms between container body 21 and the lid 22 with cover sheet 6, only move into as the open area and take out of mouth 64, so can form and the existing peristome of taking out of of moving into that has with family of power and influence's switching with the identical size of structure of peristome.Therefore, move into when taking out of substrate S, can be controlled at and original identical degree sneak into the moisture of container 20 inside and the amount of particle from air atmosphere.And, because cover sheet 6 when case of bending, is moved into and taken out of mouthfuls 64 and also close, can sneak into moisture and particle so also needn't worry very much to cover in the sheet 6 this moment.
More than, as shown in figure 13, the seal member of the lower limb side of cover sheet 6 is clipped in the junction surface of container body 21 and lid 22, the sealing parts are made it to play a role with seal member 65 as vacuum.At this moment, can reduce the number of packages that sets of seal member, simplify the mounting structure of cover sheet 6 simultaneously.
In addition, as shown in figure 14, the seal member 6b of lower limb side of cover sheet 6 is clipped in container body 21 sides and junction surface lid 22, the seal member 6a of upper edge side is clipped in lid 22 sides and junction surface container body 21.At this moment, these seal members 6a, 6b are used for preventing that the moisture of atmosphere and particle etc. from sneaking into container handling 20 inside, vacuum are set with seal member 46 with respect to these seal members 6a, 6b in the side near container handling 20 inside.
In this structure, container body 21 and lid 22 engaged, when beginning container handling 2 inside are vacuumized,, can suppress moisture in the outside atmosphere and particle etc. and sneak into by seal member 6a, the 6b at cover sheet 6 both ends.Therefore, compare with structure shown in Figure 11, it is few with the quantitative change of the moisture in zone 66 between seal member 6a, the 6b of seal member 46 and cover sheet 6 and particle with vacuum in the zone in seal member 46 outsides, this example to enter vacuum.In the process that vacuumizes, giving full play to vacuum needs the regular hour with the sealing function that seal member 46 is played; Moisture and particle have been sneaked into the exterior lateral area of seal member 46 in the time of might arriving above-mentioned vacuum seal effect performance, so the moisture etc. that reduces this zone 66 is effective from vacuum.In addition, cover sheet 6 does not need installing component, so can reduce the number of the component parts of device, can simplify the mounting structure of cover sheet 6 simultaneously.
In addition, cover sheet 6 also can be a mounting structure as shown in figure 15.In this structure, second installing component 62 of container body 21 sides of cover sheet 6 is identical with structure shown in Figure 11, but first installing component 71 of lid 22 sides of cover sheet 6 is installed on the lid 22 by one touch type loading and unloading parts 8.These loading and unloading parts 8 are to be called as from playing locking-type loading and unloading parts, comprise the fixed part 81 and the operating mechanism 82 that are fixed on the container handling 20, this operating mechanism 82 is installed in above-mentioned installing component 71 1 sides, be fastened on simultaneously fixed part 81 1 sides, selection is with a kind of by the state of the outer peripheral face that is pressed in container handling 20 and this state of pushing of releasing of this installing component 71 with freely load and unload.
Particularly, in this example, first installing component 71 of lid 22 sides of cover sheet 6 comprises and can and can be installed in press section 84 on this axial region 83 around trunnion axis around the axial region 83 of trunnion axis motion with moving freely; There are these axial regions 83 and press section 84 to constitute operating mechanism 82.In addition, the seal member 6a of the upper edge side of cover sheet 6 is sandwiched in the configuration space 71a that forms on first installing component 71 with sidewall and the mode between the installing component 71 at lid 22.
In addition, the upper side of the installation site of first installing component 71 on the lid 22 is equipped with fixed part 81, and the latch for printed circuit 85 on the top of the above-mentioned press section 84 of engaging is installed on this fixed part 81.And, axial region 83 is pushed to, so that the top of press section 84 contacts above-mentioned latch for printed circuit 85, thus, above-mentioned latch for printed circuit 85 is pushed on the top of pressing component 84; These parts engagings, first installing component 71 is pressed to the outer peripheral face of container handling 20 by fixed part 81, thereby is installed to (with reference to Figure 15 (a)) on the container handling 20.On the other hand,, then can remove above-mentioned pressing force, shown in Figure 15 (b), first installing component 71 be pulled down from fixed part 81 (lid 22) if depress axial region 83.In this example, for example, but removal and installation first installing component 71 all on every limit of container handling 20 is installed 1 above-mentioned loading and unloading parts 8 at least on every limit of container handling 20.
In addition, the protuberance 72 that protrudes in lid 22 1 sides is arranged on first installing component 71 along Zhou Fangxiang, and on the other hand, 22a is formed at lid 22 1 sides along Zhou Fangxiang with this protuberance corresponding concave part; Thus, though by loading and unloading parts 8 with first installing component 71 when lid 22 is pulled down, this installing component 71 also is in the state that hangs on the lid 22, and can directly not fall down.In addition, in this example, in the lower end side of first installing component 71 and the upper end side of second installing component 62 magnet 73,74 of attracting each other is housed respectively, when unloading first installing component 71, this first installing component 71 can be attracted on second installing component 62 because of magnetic force.
In this structure, when container handling 20 maintenances, when making lid 22 rise to the upper side of above-mentioned delivery position, or cover sheet 6 is when itself exchanging, can pass through operating operation mechanism 82, with one touch type 71 pairs of container handlings 20 of first installing component are loaded and unloaded,, shorten the time that Maintenance Demand Time and cover sheet 6 clearing houses need so can carry out charge and discharge operations to cover sheet 6 at an easy rate.
In addition, relevant one touch type loading and unloading parts 8 can be located at operating mechanism 82 fixed part 81 sides, and latch for printed circuit 85 is located at installing component 71 sides.And, can use a part that hangs with operating mechanism on the latch for printed circuit, push latch for printed circuit with operating mechanism first installing component 71 is pushed the side that is fixed to container handling 20; Under the state of a part that hangs with operating mechanism on the engaging part, this operating mechanism is pulled to lower side, like this, also can push latch for printed circuit by functional unit, first installing component 71 is pushed the side that is fixed to container handling 20.In addition, loading and unloading parts 8 can use when the lower limb side that will cover sheet 6 is installed on the container handling 20; Also can all be installed on the container handling 20 in the upper edge side that will cover sheet 6 and lower limb side both sides.
In addition, as shown in figure 16, can be at container handling 20 upper edge Zhou Fangxiang mounting cup confinement plates 9, this cover confinement plate 9 is for being used to limit the limiting part of cover sheet 6 shapes.In this example, above-mentioned cover confinement plate 9 is located on the container body 21 along Zhou Fangxiang, from the sidewall of said vesse main body 21 to outside horizontal stretching a little, lateral bending song upward again.In addition, in order to carry out exhaust in the zone that above-mentioned container handling 20 and cover sheet 6 are constituted, this cover confinement plate 9 is connected with an other end and is connected exhaust channel 91 on the exhaust pump 92.
In this example, the seal member 6b of lower limb side of cover sheet 6 is clipped in container body 21 sides and composition surface lid 22, on the sidewall of the container body 22 in the zone that sealing parts 6b is set, the fixing above-mentioned seal member 6b from the outside, simultaneously, be provided for cover sheet 6 being clipped in and covering the 2nd installing component 93 between the confinement plate 9 by screw.In addition, the blast pipe that becomes above-mentioned exhaust channel 91 is installed on a plurality of positions of for example covering confinement plate 9 bottoms in the mode that the flange part 91a with its upper end clamps cover sheet 6.
On the other hand, the seal member 6a of cover sheet 6 upper edge side is installed on the sidewall of lid 22 by first installing component 94; This installing component 94 freely is arranged on the sidewall of lid 22 by loading and unloading parts 8 loading and unloading of above-mentioned one touch type.In this example, a part of dual-purpose solid components 81 of lid 22 is provided with latch for printed circuit 85 in installing component 94 sides, and lid 22 (fixed part 81) side is provided with operating mechanism 82.
95a among the figure is provided in a side of the protuberance on first installing component 94, and 95b is the recess that forms on the position corresponding with raised part 95a on the sidewall of container handling 20; Even in this example, when removing the pressing force of operating mechanism 82 generations, first installing component 94 still hangs on the container handling 20 by raised part 95a, can directly not fall.In addition, the upper end side of the lower end side of first installing component 94 and second installing component 93 is respectively equipped with magnet 96a, the 96b that attracts each other.
In addition, inside at lid 22, be formed with and be used in the zone that constitutes by above-mentioned container handling 20 and cover sheet 6, supplying with dry gas feed path 97 with gas, this gas feed path 97 one distolateral by comprising the supply pipe 98a of valve V3 and flow adjustment part 98b, be connected to above-mentioned drying with gas for example on the supply source 98c of dry air, the distolateral regional inner opening that is covered at quilt cover sheet 6 of another of gas feed path 97.In this example, by the supply source 98c of gas feed path 97, gas supply pipe 98a and gas, dry unit with gas is supplied with in the space that is formed between above-mentioned container handling 20 and cover sheet 6.When representing to keep in repair, will cover Figure 17 the state that first installing component 94 of lid 22 sides of sheet 6 unloads from lid 22.
In this structure, often in cover sheet 6 with for example supply of the flow about 130slm dry air, and with exhaust pump 92 exhausts, so that for example cover the pressure for example about 93.1kPa (700Torr) that becomes the negative pressure lower slightly in the sheet 6 than atmospheric pressure.Here, also can replace dry air with gas to the dryings such as internal feed nitrogen of cover sheet 6.
In this structure, shown in Figure 16 (b), lid 22 is risen form above-mentioned gap 24, when carrying out the handing-over of substrate S in the container handling 20, cover sheet 6 is inner for than returning to the low negative pressure of atmospheric container handling 20, so, as shown in the figure, to the outside airflow flowing, container handling 20 atmosphere outside atmosphere are difficult to enter the inside of container handling 20 from container handling 20 inside in formation.Therefore, the moisture and the particle that can suppress to exist in the above-mentioned container handling 20 atmosphere outside atmosphere sneaked into the inside of container handling 20.In addition,, often supply with dry air, and carry out exhaust,, more can suppress sneaking into of moisture so the inside of cover sheet 6 is drying regime at the interior zone of cover sheet 6.In addition, by cover confinement plate 9 is set, even be in the state that does not form gap 24 cover sheets, 6 bendings between container body 21 and the lid 22, also can covers the shape of sheet 6, and limit moving of cover sheet 6 in maintenance.Thus, can suppress because of the friction of cover sheet 6 and move that the particle caused produces and the deterioration of cover sheet 6 itself.
More than, cover confinement plate 9 can be arranged on the container handling 20 along Zhou Fangxiang, for example can be located at lid 22 sides; Shape by these cover confinement plate 9 restriction cover sheets 6 upper side.In addition, cover confinement plate 9 can be set along the Zhou Fangxiang compartment of terrain of container handling 20.And be used to supply with above-mentioned dry unit with gas so long as dry structure with gas is supplied with in the space between container handling 20 and cover sheet 6, just be not limited to above-mentioned example.
And the present invention also can make the space between the dry cap assembly 5 that constitutes by container handling 20 with by rigid material with gas.In addition, can also supply with dryly the time with the flow of for example 130slm,, for example make for example 93.1kPa (700Torr) of pressure that this medial region reaches the negative pressure lower slightly than atmospheric pressure above-mentioned medial region exhaust to the medial region of cap assembly 5 with gas.
Above the present invention is not limited only to the structure of handing-over substrate between container handling 20 and air atmosphere, also is applicable to the structure of handing-over substrate between the carrying room of container handling 20 and vacuum atmosphere.The mode of plasma generation is not only limited to above-mentioned example.And, can also constitute to upper motor 34 High frequency power is provided, also can provide 2 kinds of High frequency power to mounting table 3.And, as handled object, except FPD handled object and LCD handled object isogon substrate, also can be semiconductor wafer; For example, the container handling in the vacuum treatment installation of process semiconductor wafers forms cylindric.
Claims (13)
1. a vacuum treatment installation is characterized in that, comprising:
Container handling, its container body that is had the mounting table of handled object by inside constitutes with the lid that covers the upper opening portion of this container body;
Elevating mechanism makes described lid carry out lifting with respect to container body, to be formed for described handled object is moved into or taken out of the gap of container handling between described lid and container body;
The vacuum exhaust unit, it is used for carrying out vacuum exhaust in the described container handling; With
Cap assembly, be arranged at the outer peripheral face of container handling along Zhou Fangxiang, with when between lid and container body, forming the gap, cover described gap in the zone of taking out of the zone except moving into of handled object at least for container handling is moved into or taken out of to described handled object.
2. vacuum treatment installation as claimed in claim 1 is characterized in that:
Has the unit that carries out exhaust in the mode that when forming described gap, makes space between described container handling and the described cap assembly become the negative pressure that is lower than the pressure in the container handling.
3. vacuum treatment installation as claimed in claim 1 or 2 is characterized in that:
The moving into of described handled object taken out of the zone cap assembly is not set.
4. vacuum treatment installation as claimed in claim 1 or 2 is characterized in that:
Described cap assembly is set at the whole of described container handling on every side, is formed with moving into of handled object and takes out of mouth on this cap assembly.
5. vacuum treatment installation as claimed in claim 1 or 2 is characterized in that:
Described cap assembly constitutes, and is outstanding and then crooked laterally from container handling, relative with the outer peripheral face of this container handling.
6. vacuum treatment installation as claimed in claim 1 or 2 is characterized in that:
Described cap assembly is made of rigid element.
7. vacuum treatment installation as claimed in claim 1 or 2 is characterized in that:
Described cap assembly is made of the pliability parts, and upper edge side and lower limb side are individually fixed on lid and the container body.
8. vacuum treatment installation as claimed in claim 7 is characterized in that:
At least one side of the upper edge side of described pliability parts and lower limb side is provided with seal member, and the sealing parts are clipped in the junction surface of lid and container body.
9. vacuum treatment installation as claimed in claim 8 is characterized in that:
Described container handling inside is made as vacuum atmosphere,
Described seal member dual-purpose is the vacuum seal member that is used for keeping airtightly described container handling inside.
10. vacuum treatment installation as claimed in claim 7 is characterized in that: comprises,
Installing component, it is arranged on the upper edge side and at least one side of lower limb side of described pliability parts;
Fixed part, it is fixed in container handling; With
Operating mechanism, it is arranged at least one side's side of this fixed part and described installing component, and in the freely engaging of the opposing party's side, to this installing component is selected with a side who removes in the state of pushing by the state on the outer peripheral face that is pressed in container handling with loading and unloading.
11. vacuum treatment installation as claimed in claim 7 is characterized in that:
Have limiting part, it is arranged on the described container handling along Zhou Fangxiang, is used to limit the shape of described pliability parts.
12. vacuum treatment installation as claimed in claim 1 is characterized in that:
Have the space that is used between described container handling and described cap assembly and supply with dry unit with gas.
13. vacuum treatment installation as claimed in claim 1 or 2 is characterized in that:
With respect to described container handling, and air atmosphere between carry out the handing-over of substrate.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008166403 | 2008-06-25 | ||
| JP2008166403A JP5062057B2 (en) | 2008-06-25 | 2008-06-25 | Vacuum processing equipment |
| JP2008-166403 | 2008-06-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101615570A CN101615570A (en) | 2009-12-30 |
| CN101615570B true CN101615570B (en) | 2011-11-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200910146244XA Expired - Fee Related CN101615570B (en) | 2008-06-25 | 2009-06-24 | Vacuum processing apparatus |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP5062057B2 (en) |
| KR (1) | KR101059365B1 (en) |
| CN (1) | CN101615570B (en) |
| TW (1) | TW201009979A (en) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8562742B2 (en) * | 2010-04-30 | 2013-10-22 | Applied Materials, Inc. | Apparatus for radial delivery of gas to a chamber and methods of use thereof |
| CN103477721B (en) * | 2011-04-04 | 2016-05-18 | 佳能安内华股份有限公司 | Treating apparatus |
| KR102028913B1 (en) * | 2013-05-31 | 2019-11-08 | 엘지디스플레이 주식회사 | Desorption apparatus and method for manufacturing flat panal display device using threrof |
| TWI600853B (en) * | 2015-06-05 | 2017-10-01 | Hirata Spinning | Chamber device and processing system |
| US10043689B2 (en) | 2015-06-05 | 2018-08-07 | Hirata Corporation | Chamber apparatus and processing system |
| KR102434800B1 (en) | 2015-08-13 | 2022-08-22 | 코웨이 주식회사 | A regeneration tank using regeneration tablets and method of regeneration using the same |
| KR102447481B1 (en) | 2015-08-13 | 2022-09-26 | 코웨이 주식회사 | A regeneration tank having a through-hole element capable of elevating and a softener comprising the same |
| KR101816120B1 (en) | 2015-08-13 | 2018-01-08 | 코웨이 주식회사 | A semiautomatic hydraulic softener |
| JP6774368B2 (en) * | 2017-04-21 | 2020-10-21 | 株式会社Ｓｃｒｅｅｎホールディングス | Maintenance method of heat treatment equipment |
| CN107610997A (en) * | 2017-07-20 | 2018-01-19 | 江苏鲁汶仪器有限公司 | A kind of gaseous corrosion cavity with wafer position detection means |
| KR102400583B1 (en) * | 2017-09-22 | 2022-05-20 | 삼성전자주식회사 | Process chamber for a supercritical process and apparatus for treating substrates having the same |
| JP6956696B2 (en) * | 2017-10-06 | 2021-11-02 | 東京エレクトロン株式会社 | Particle generation suppression method and vacuum device |
| JP7169786B2 (en) * | 2018-06-25 | 2022-11-11 | 東京エレクトロン株式会社 | maintenance equipment |
| JP6818001B2 (en) * | 2018-12-12 | 2021-01-20 | 株式会社Ｓｃｒｅｅｎホールディングス | Processing chamber and substrate processing equipment |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63179522A (en) * | 1987-01-21 | 1988-07-23 | Tokyo Electron Ltd | Ashing apparatus |
| JPH01206625A (en) * | 1988-02-15 | 1989-08-18 | Tokyo Electron Ltd | Ashing |
| JPH06151365A (en) * | 1992-11-13 | 1994-05-31 | Hitachi Ltd | Plasma treatment apparatus |
| JP2828066B2 (en) * | 1996-09-27 | 1998-11-25 | 松下電器産業株式会社 | Plasma cleaning equipment for substrates |
| JP3451894B2 (en) * | 1997-07-29 | 2003-09-29 | 松下電器産業株式会社 | Electronic component plasma processing apparatus and plasma processing method |
| JPH1154484A (en) * | 1997-08-06 | 1999-02-26 | Matsushita Electric Ind Co Ltd | Plasma treatment device and plasma treatment method of electronic component |
| JP4767574B2 (en) | 2005-03-31 | 2011-09-07 | 東京エレクトロン株式会社 | Processing chamber and processing apparatus |
-
2008
- 2008-06-25 JP JP2008166403A patent/JP5062057B2/en not_active Expired - Fee Related
-
2009
- 2009-06-24 CN CN200910146244XA patent/CN101615570B/en not_active Expired - Fee Related
- 2009-06-24 KR KR1020090056585A patent/KR101059365B1/en not_active IP Right Cessation
- 2009-06-24 TW TW098121206A patent/TW201009979A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| KR20100002175A (en) | 2010-01-06 |
| KR101059365B1 (en) | 2011-08-24 |
| TW201009979A (en) | 2010-03-01 |
| CN101615570A (en) | 2009-12-30 |
| JP2010010302A (en) | 2010-01-14 |
| JP5062057B2 (en) | 2012-10-31 |
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