CN101609234B - 液晶显示装置及电子设备 - Google Patents
液晶显示装置及电子设备 Download PDFInfo
- Publication number
- CN101609234B CN101609234B CN2008101614541A CN200810161454A CN101609234B CN 101609234 B CN101609234 B CN 101609234B CN 2008101614541 A CN2008101614541 A CN 2008101614541A CN 200810161454 A CN200810161454 A CN 200810161454A CN 101609234 B CN101609234 B CN 101609234B
- Authority
- CN
- China
- Prior art keywords
- liquid crystal
- distribution
- low resistance
- electrode
- viewing area
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 91
- 238000009826 distribution Methods 0.000 claims description 201
- 239000000463 material Substances 0.000 claims description 6
- 239000000758 substrate Substances 0.000 abstract description 24
- 239000011159 matrix material Substances 0.000 abstract description 3
- 239000010410 layer Substances 0.000 description 45
- 239000010408 film Substances 0.000 description 35
- 230000015572 biosynthetic process Effects 0.000 description 20
- 238000000034 method Methods 0.000 description 13
- 230000001681 protective effect Effects 0.000 description 13
- 230000005684 electric field Effects 0.000 description 9
- 238000005530 etching Methods 0.000 description 8
- 229910021417 amorphous silicon Inorganic materials 0.000 description 6
- 230000003321 amplification Effects 0.000 description 6
- 238000003199 nucleic acid amplification method Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 230000000007 visual effect Effects 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 239000008393 encapsulating agent Substances 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000006378 damage Effects 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 230000008595 infiltration Effects 0.000 description 2
- 238000001764 infiltration Methods 0.000 description 2
- 244000287680 Garcinia dulcis Species 0.000 description 1
- 101100489584 Solanum lycopersicum TFT1 gene Proteins 0.000 description 1
- 101100214488 Solanum lycopersicum TFT2 gene Proteins 0.000 description 1
- -1 acryl Chemical group 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005685 electric field effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 238000004321 preservation Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/121—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode common or background
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/12—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode
- G02F2201/123—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 electrode pixel
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Computer Hardware Design (AREA)
- Geometry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
Description
Claims (8)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007-257177 | 2007-10-01 | ||
JP2007257177 | 2007-10-01 | ||
JP2007257177 | 2007-10-01 | ||
JP2008156290A JP5171412B2 (ja) | 2007-10-01 | 2008-06-16 | 液晶表示装置及び電子機器 |
JP2008156290 | 2008-06-16 | ||
JP2008-156290 | 2008-06-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101609234A CN101609234A (zh) | 2009-12-23 |
CN101609234B true CN101609234B (zh) | 2011-08-03 |
Family
ID=40705804
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008101614541A Expired - Fee Related CN101609234B (zh) | 2007-10-01 | 2008-09-27 | 液晶显示装置及电子设备 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP5171412B2 (zh) |
KR (1) | KR20090033809A (zh) |
CN (1) | CN101609234B (zh) |
TW (1) | TWI399603B (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5500712B2 (ja) | 2009-09-02 | 2014-05-21 | 株式会社ジャパンディスプレイ | 液晶表示パネル |
KR101096336B1 (ko) * | 2009-10-08 | 2011-12-20 | 하이디스 테크놀로지 주식회사 | 에프에프에스 모드 액정표시장치 및 그 제조방법 |
KR20120089505A (ko) | 2010-12-10 | 2012-08-13 | 삼성전자주식회사 | 표시 장치 및 그 제조 방법 |
US20130286314A1 (en) * | 2010-12-27 | 2013-10-31 | Sharp Kabushiki Kaisha | Display element |
JP5961876B2 (ja) * | 2011-08-04 | 2016-08-02 | 株式会社ジャパンディスプレイ | 液晶表示装置 |
JP5862201B2 (ja) * | 2011-10-27 | 2016-02-16 | セイコーエプソン株式会社 | 液晶装置、液晶装置の製造方法、電子機器 |
JP5681822B2 (ja) * | 2014-03-10 | 2015-03-11 | 株式会社ジャパンディスプレイ | 液晶表示パネル |
CN105161505B (zh) | 2015-09-28 | 2018-11-23 | 京东方科技集团股份有限公司 | 一种阵列基板及其制作方法、显示面板 |
JP2019184864A (ja) * | 2018-04-12 | 2019-10-24 | シャープ株式会社 | 表示装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1328268A (zh) * | 2000-05-25 | 2001-12-26 | 精工爱普生株式会社 | 液晶装置、其制造方法及电子装置 |
JP2004333643A (ja) * | 2003-05-01 | 2004-11-25 | Seiko Epson Corp | 電気配線構造、電気配線構造の製造方法、電気配線構造を備えた光学装置用基板、および電気光学装置、ならびに電気光学装置の製造方法 |
CN1662109A (zh) * | 2004-02-24 | 2005-08-31 | 精工爱普生株式会社 | 有机电致发光装置及其制造方法、其所用基板及电子机器 |
CN101038410A (zh) * | 2006-03-15 | 2007-09-19 | 爱普生映像元器件有限公司 | 液晶装置及电子设备 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4724339B2 (ja) * | 1999-09-07 | 2011-07-13 | 株式会社日立製作所 | 液晶表示装置 |
JP2002055352A (ja) * | 2000-08-09 | 2002-02-20 | Nec Corp | 液晶ディスプレイ及び画像表示装置 |
JP2005045016A (ja) * | 2003-07-22 | 2005-02-17 | Nec Electronics Corp | 半導体集積回路 |
US20060091397A1 (en) * | 2004-11-04 | 2006-05-04 | Kengo Akimoto | Display device and method for manufacturing the same |
JP4297103B2 (ja) * | 2005-02-17 | 2009-07-15 | セイコーエプソン株式会社 | 電気光学装置及びその製造方法、並びに電子機器 |
JP2007226199A (ja) * | 2006-01-26 | 2007-09-06 | Epson Imaging Devices Corp | 液晶装置及び電子機器 |
JP4946135B2 (ja) * | 2006-01-31 | 2012-06-06 | カシオ計算機株式会社 | 液晶表示素子 |
-
2008
- 2008-06-16 JP JP2008156290A patent/JP5171412B2/ja not_active Expired - Fee Related
- 2008-09-09 TW TW097134489A patent/TWI399603B/zh not_active IP Right Cessation
- 2008-09-27 CN CN2008101614541A patent/CN101609234B/zh not_active Expired - Fee Related
- 2008-09-30 KR KR1020080095975A patent/KR20090033809A/ko not_active Application Discontinuation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1328268A (zh) * | 2000-05-25 | 2001-12-26 | 精工爱普生株式会社 | 液晶装置、其制造方法及电子装置 |
JP2004333643A (ja) * | 2003-05-01 | 2004-11-25 | Seiko Epson Corp | 電気配線構造、電気配線構造の製造方法、電気配線構造を備えた光学装置用基板、および電気光学装置、ならびに電気光学装置の製造方法 |
CN1662109A (zh) * | 2004-02-24 | 2005-08-31 | 精工爱普生株式会社 | 有机电致发光装置及其制造方法、其所用基板及电子机器 |
CN101038410A (zh) * | 2006-03-15 | 2007-09-19 | 爱普生映像元器件有限公司 | 液晶装置及电子设备 |
Also Published As
Publication number | Publication date |
---|---|
KR20090033809A (ko) | 2009-04-06 |
TW200919055A (en) | 2009-05-01 |
JP5171412B2 (ja) | 2013-03-27 |
CN101609234A (zh) | 2009-12-23 |
JP2009104108A (ja) | 2009-05-14 |
TWI399603B (zh) | 2013-06-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101609234B (zh) | 液晶显示装置及电子设备 | |
CN101231437B (zh) | 液晶显示装置及其制造方法 | |
US10527901B2 (en) | Liquid crystal display device | |
US7855767B2 (en) | Transflective liquid crystal display | |
US7440040B2 (en) | Liquid crystal display device with storage electrode extension | |
CN101359139B (zh) | 液晶显示面板及其制造方法 | |
US7903220B2 (en) | Liquid crystal display device and electronic apparatus | |
US8319904B2 (en) | Liquid crystal display and fabricating method thereof | |
US7289171B2 (en) | Thin film transistor array panel for liquid crystal display having pixel electrode | |
US7903219B2 (en) | Liquid crystal display device | |
US6762815B2 (en) | In-plane switching LCD with a redundancy structure for an opened common electrode and a high storage capacitance | |
US6384878B1 (en) | Liquid crystal display having an electrostatic protection circuit | |
US7773165B2 (en) | Liquid crystal display | |
KR20020013158A (ko) | 횡전계방식 액정표시장치 | |
KR101785912B1 (ko) | 광시야각 액정표시장치용 어레이 기판 | |
JP2009047811A (ja) | 液晶表示装置の製造方法及び液晶表示装置 | |
US7061553B2 (en) | Substrate for display device and display device equipped therewith | |
WO2005036653A1 (en) | Thin film transistor, thin film transistor array panel, and display device | |
JP4650471B2 (ja) | 液晶表示装置、その製造方法及び電子機器 | |
KR101046923B1 (ko) | 박막 트랜지스터 표시판 및 이를 포함하는 액정 표시 장치 | |
US7245342B2 (en) | Array substrate for liquid crystal display device having conductive patterns and fabricating method thereof | |
KR20080051536A (ko) | 액정 표시 장치 | |
JP7274627B2 (ja) | 表示装置 | |
KR100910554B1 (ko) | 박막 트랜지스터 어레이 기판 및 이를 포함하는 액정 표시장치 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: NANKAI UNIVERSITY Free format text: FORMER OWNER: SANYO EPSON IMAGING DEVICES CO. Effective date: 20100802 |
|
C41 | Transfer of patent application or patent right or utility model | ||
COR | Change of bibliographic data |
Free format text: CORRECT: ADDRESS; FROM: NAGANO, JAPAN TO: TOKYO-DU, JAPAN |
|
TA01 | Transfer of patent application right |
Effective date of registration: 20100802 Address after: Tokyo, Japan Applicant after: Sony Corp. Address before: nks Applicant before: Sanyo Epson Imaging Devices Co. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: NIPPON DISPLAY CO., LTD. Free format text: FORMER OWNER: SONY CORPORATION Effective date: 20121115 |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20121115 Address after: Aichi Patentee after: Japan display West Co.,Ltd. Address before: Tokyo, Japan Patentee before: Sony Corp. |
|
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110803 Termination date: 20190927 |
|
CF01 | Termination of patent right due to non-payment of annual fee |