CN101609176A - Metal embedded fused quartz broadband reflection grating - Google Patents
Metal embedded fused quartz broadband reflection grating Download PDFInfo
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- CN101609176A CN101609176A CNA2009100545144A CN200910054514A CN101609176A CN 101609176 A CN101609176 A CN 101609176A CN A2009100545144 A CNA2009100545144 A CN A2009100545144A CN 200910054514 A CN200910054514 A CN 200910054514A CN 101609176 A CN101609176 A CN 101609176A
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- broadband reflection
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 239000005350 fused silica glass Substances 0.000 title claims abstract description 26
- 229910052751 metal Inorganic materials 0.000 title claims abstract description 25
- 239000002184 metal Substances 0.000 title claims abstract description 25
- 238000005530 etching Methods 0.000 claims abstract description 13
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 abstract description 8
- 239000010931 gold Substances 0.000 abstract description 8
- 229910052737 gold Inorganic materials 0.000 abstract description 8
- 238000005516 engineering process Methods 0.000 abstract description 7
- 238000000034 method Methods 0.000 abstract description 7
- 230000003287 optical effect Effects 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 238000004377 microelectronic Methods 0.000 abstract description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000010894 electron beam technology Methods 0.000 abstract 1
- 239000007888 film coating Substances 0.000 abstract 1
- 238000009501 film coating Methods 0.000 abstract 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 7
- 230000010287 polarization Effects 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- 229910052804 chromium Inorganic materials 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- NCGICGYLBXGBGN-UHFFFAOYSA-N 3-morpholin-4-yl-1-oxa-3-azonia-2-azanidacyclopent-3-en-5-imine;hydrochloride Chemical compound Cl.[N-]1OC(=N)C=[N+]1N1CCOCC1 NCGICGYLBXGBGN-UHFFFAOYSA-N 0.000 description 1
- 102100029469 WD repeat and HMG-box DNA-binding protein 1 Human genes 0.000 description 1
- 101710097421 WD repeat and HMG-box DNA-binding protein 1 Proteins 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
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Abstract
A metal embedded fused quartz broadband reflection grating for 800 nm wave band is characterized in that the period of the grating is 450-550 nm, the etching depth is 700-900 nm, the thickness of a gold film is 380-660 nm, and the duty ratio of the grating is 0.4. The invention can lead the diffraction efficiency of the-1 level of the TE polarized light in the wavelength bandwidth of 130 nm (780-910 nm) to be more than 90 percent; when the grating is used at the same grating structure parameter and at a non-Littrow angle, the grating can be in a broadband of 284 nanometers, namely 780-1064 nanometers, and the-1-order diffraction efficiency of TE polarized light is higher than 80%. The metal embedded fused quartz broadband reflection grating is processed by an optical holographic recording technology or an electron beam direct writing device in combination with a microelectronic deep etching process and a film coating technology, is convenient to obtain materials, low in manufacturing cost, capable of being produced in large batch and has important practical prospects.
Description
Technical field
This patent relates to reflective gratings, particularly a kind of metal embedded fused quartz broadband reflective gratings that is used for 800 nano wave lengths.
Background technology
In chirped pulse amplification, people often need the diffraction grating of high-diffraction efficiency, broad wavelength coverage and higher resisting laser damage ability.Recently, people such as Wei Jia have produced the transmission-type grating of this high-diffraction efficiency on fused quartz, and its diffraction efficiency of-1 grade can reach 98% in theory.[formerly technology 1:W.Jia et al., Appl.Opt.47,6058 (2008)].But, in a lot of application, such as in the tuning narrow linewidth oscillator of grating, grating pulse compressor etc., needing reflective gratings.Though traditional multilayered medium grating and simple metal grating can meet the demands, the making of multilayered medium grating is quite complicated, cost of manufacture is higher; The holographic grating of simple metal and the physical strength of ruling grating and resisting laser damage ability a little less than, be not suitable for high power laser system.
Fused quartz is a kind of desirable grating material, and it has high optical quality: stable performance, high damage threshold and from deep ultraviolet to far wide transmission spectrum.Gold is as a kind of metallic reflective coating commonly used, and its intensity and stability are better, and is very high at the reflectivity of infrared region.At present, Chang Yong metallic reflection grating is membraneous material mostly with the gold.Therefore, utilize fused quartz and gold copper-base alloy to be with a wide range of applications in conjunction with making novel embedded reflective gratings.
Rectangular raster is to utilize the deep etching technique of microelectronics, the grating with rectangle flute profile that processes in substrate.The diffraction theory of high density rectangular raster can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, accurately calculate the result by calculation of coding machine program.People such as Moharam have provided the algorithm [formerly technology 2:M.G.Moharam et al., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave theory, can solve the diffraction problem of this class high dencity grating.But as far as we know, so far, also have no talent and be given in the design parameter of the golden embedded reflection grating of making on the fused quartz substrate at 800 nano wave lengths commonly used.
Summary of the invention
The technical problem to be solved in the present invention is to provide a kind of broadband metal embedded fused quartz broadband reflection grating at the laser instrument of using 800 nano wave lengths always.This metal embedded fused quartz broadband reflection grating can make the TE polarized light be higher than 90% in-1 order diffraction efficient under the situation of Littrow incident angle in the wavelength bandwidth of 130 nanometers (780～910 nanometer); And when in the wavelength bandwidth of 284 nanometers (780～1064 nanometer), being higher than 80% in-1 order diffraction efficient under the situation of non-Littrow angle incident.Therefore, this metal embedded fused quartz broadband reflection grating has important practical value in the chirped pulse compress technique.
Technical solution of the present invention is as follows:
A kind of metal embedded fused quartz broadband reflection grating that is used for 800 nano wavebands, its characteristics are that the cycle of this grating is 450～550 nanometers, etching depth 700～900 nanometers, and the thickness of golden film is 380～660 nanometers, and the dutycycle of grating is 0.4.
The cycle of described metal embedded fused quartz broadband reflection grating is 550 nanometers, and the etching depth of grating is 800 nanometers, and the thickness of golden film is 550 nanometers.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of metal embedded fused quartz broadband reflection grating.Zone 1,2,3 all is uniformly, is respectively fused quartz (refractive index n
1=1.45332), golden film (refractive index n
2=0.18-i5.13) and air (refractive index n
3=1.0).The TE polarized incident light corresponding to the direction of vibration of electric field intensity perpendicular to the plane of incidence.The light wave of linear polarization is θ at a certain angle
i=sin
-1(λ/(2*A*n
3)) incident (being defined as the angle, Littrow), λ represents lambda1-wavelength, and Λ represents the grating cycle.
Under optical grating construction as shown in Figure 1, the present invention adopts-1 order diffraction efficient that rigorous coupled wave theory [formerly technology 2] calculated rectangular metal embedded fused quartz broadband reflection grating (dutycycle is 0.4) with the change curve of incident angle as shown in Figure 2, promptly the cycle when grating is that 550 nanometers, etching depth are 800 nanometers, the thickness of gold film is when being 550 nanometers ,-1 order diffraction efficient of this grating in 30 ° angle bandwidth greater than 90%.
As shown in Figure 3, the cycle of grating is 550 nanometers, and the degree of depth is 800 nanometers, and golden film thickness is 550 nanometers, when the incident of angle, Littrow ,-1 order diffraction efficient of the incident light of TE polarization mode in (780～900 nanometer) spectrum width scope of 120 nanometers all can reach more than 90%.
As shown in Figure 4, the incident light of TE polarization mode is when inciding grating near 72 ° of angles (non-Littrow angle), the cycle of grating is 550 nanometers, the degree of depth is 800 nanometers, gold film thickness 550 nanometers, the grating dutycycle is 0.4 o'clock, and-1 order diffraction efficient of the incident light of TE polarization mode in the wide range wide region of (the 780-1064 nanometer) of 284 nanometers all can reach more than 80%.
Description of drawings
Fig. 1 is the geometry of metal embedded fused quartz broadband reflection grating of the present invention.
Among the figure, 1 represents zone 1, and (refractive index is n
1), (refractive index is n to the golden film of 2 representatives
2), 3 represent zone 3, and (refractive index is n
3), 4 represent incident light under the TE polarization mode, and 5 represent-1 order diffraction light under the TE pattern.
Fig. 2 be metal embedded fused quartz broadband reflection grating of the present invention under 800 nano wave lengths ,-1 order diffraction efficient of TE polarization mode is with the change curve of incident angle.
Fig. 3 is to be 550 nanometers, the grating degree of depth 800 nanometers in the metal embedded fused quartz broadband reflection grating cycle of the present invention, golden film thickness 550 nanometers, and dutycycle is 0.4, the bandwidth characteristic curve when the incident of angle, Littrow.
Fig. 4 is to be 550 nanometers, the grating degree of depth 800 nanometers in the metal embedded fused quartz broadband reflection grating cycle of the present invention, golden film thickness 550 nanometers, and dutycycle is 0.4, the bandwidth characteristic curve of (72 ° of incident angles) when the incident of angle, non-Littrow.
Fig. 5 is the holographic grating recording beam path.
7 represent helium cadmium laser among the figure, and 8 represent shutter, and 9 represent beam splitter, and 10,11,12,13 represent catoptron, and 14,15 represent beam expanding lens, and 16,17 represent lens, and 18 represent substrate.
Embodiment
Utilize the micro-optic technology to make high density rectangle polarization beam-splitting grating, deposition layer of metal chromium film on the fused quartz substrate of dry, cleaning at first, and on the chromium film, evenly be coated with the last layer positive photoetching rubber (Shipley, S1818, USA).Adopt the holographic recording mode to write down the grating (see figure 5) then, adopt He-Cd laser instrument 7 (wavelength is 441 nanometers) as recording light source.During the recording holographic grating, shutter 8 is opened, and the arrow beam of light that sends from laser instrument is divided into two arrow beam of lights through beam splitter 9.A branch of by behind the catoptron 10, form wide plane wave through beam expanding lens 14, lens 16; Another bundle forms wide plane wave by behind the catoptron 11 through beam expanding lens 15, lens 17.After two bundle plane waves pass through catoptron 12,13 respectively, on substrate 18, form interference field with 2 θ angles.Grating space periodic (being the spacing of adjacent stripes) can be expressed as Λ=λ/(2*sin θ), and wherein λ is the recording light wavelength.Angle θ is big more for record, and then A is more little, so by changing the size of θ, can control the cycle (periodic quantity can be designed by above-mentioned diffraction efficiency figure) of grating.The holographic recording high dencity grating develops then, then spends chrome liquor again photoengraving pattern is transferred on the chromium film from photoresist, utilizes chemical reagent that unnecessary photoresist is removed.At last, sample is put into the plasma etching that inductively coupled plasma etching machine carries out certain hour, grating is transferred on the fused quartz substrate, it is gold-plated then the quartz substrate that is carved with grating to be put into coating machine, at last spend chrome liquor again the gold on remaining chromium film and the chromium film is peeled off, just obtain the embedded grating of high desnity metal.
Table 1 has provided a series of embodiment of the present invention, in making the process of grating, suitably in selective light grid cycle, etching depth and the groove the thickness of gold-plated film, just can in different bandwidth, obtain the embedded reflection grating of rectangular metal of high-diffraction efficiency.As shown in Table 1, the cycle of this grating is that 450-550 nanometer, etching depth are the 700-900 nanometer, the gold film thickness is the 380-660 nanometer, when the incident angle of 800 nanometer centre wavelengths was the angle, Littrow, the diffraction efficiency of this metal damascene reflection grating in the spectrum width scope of 200 nanometers (720-920 nanometer) was greater than 80%.
The TE polarized light of different wave length was in-1 order diffraction efficiency eta when table 1 pair 800 nano wave lengths were the incident of angle, Littrow, and h is the grating degree of depth, and t is the thickness of golden film, and Λ is the grating cycle
Metal embedded fused quartz broadband reflection grating of the present invention, have simple in structure, physical strength good, angle bandwidth and spectral bandwidth broad, diffraction efficiency be than advantages such as height, it is a kind of very desirable broadband reflection formula grating, utilize holographic grating recording technique or direct electronic beam write device in conjunction with the deep etching technique of microelectronics, can be in enormous quantities, produce at low cost, grating stable performance after the etching, reliable, can be applicable to have important practical prospect in the broadband reflection formula grating pair pulse shortener.
Claims (2)
1, a kind of metal embedded fused quartz broadband reflection grating that is used for 800 nano wavebands, the cycle that it is characterized in that this grating is that 450～550 nanometers, etching depth are 700～900 nanometers, the thickness of golden film is that the dutycycle of 380～660 nanometer gratings is 0.4.
2, metal embedded fused quartz broadband reflection grating according to claim 1, the cycle that it is characterized in that described grating is 550 nanometers, and the etching depth of grating is 800 nanometers, and the thickness of golden film is 550 nanometers.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2009100545144A CN101609176B (en) | 2009-07-08 | 2009-07-08 | Metal embedded fused quartz broadband reflection grating |
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|---|---|---|---|
| CN2009100545144A CN101609176B (en) | 2009-07-08 | 2009-07-08 | Metal embedded fused quartz broadband reflection grating |
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| CN101609176A true CN101609176A (en) | 2009-12-23 |
| CN101609176B CN101609176B (en) | 2010-10-20 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101887140A (en) * | 2010-05-26 | 2010-11-17 | 中国科学院上海光学精密机械研究所 | Broadband all-dielectric multilayer film reflection diffraction grating and design method thereof |
| CN102360090A (en) * | 2011-09-30 | 2012-02-22 | 中国科学院上海光学精密机械研究所 | Broadband metal dielectric reflection grating |
| CN103308968A (en) * | 2012-03-15 | 2013-09-18 | 日立民用电子株式会社 | Optical device and method for manufacturing same |
| CN107942425A (en) * | 2016-10-13 | 2018-04-20 | 上海矽越光电科技有限公司 | Buried-metal type broadband reflection grating and preparation method thereof |
| CN108594347A (en) * | 2018-04-27 | 2018-09-28 | 福州大学 | A kind of low cost terahertz polarization slice processing method |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1270196C (en) * | 2004-07-16 | 2006-08-16 | 中国科学院上海光学精密机械研究所 | 800 nanometer waveband back-incident type high-density quartz reflection grating |
| CN1243257C (en) * | 2004-07-16 | 2006-02-22 | 中国科学院上海光学精密机械研究所 | High-density rectangular deep-etched quartz transmission grating |
| CN100340875C (en) * | 2006-03-08 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | Quartz transmission polarization beam splitting grating with 800 nanometer wave band |
| CN101149444A (en) * | 2007-11-14 | 2008-03-26 | 中国科学院上海光学精密机械研究所 | Fused quartz transmission 1X 2 beam splitting grating |
-
2009
- 2009-07-08 CN CN2009100545144A patent/CN101609176B/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101887140A (en) * | 2010-05-26 | 2010-11-17 | 中国科学院上海光学精密机械研究所 | Broadband all-dielectric multilayer film reflection diffraction grating and design method thereof |
| CN102360090A (en) * | 2011-09-30 | 2012-02-22 | 中国科学院上海光学精密机械研究所 | Broadband metal dielectric reflection grating |
| CN103308968A (en) * | 2012-03-15 | 2013-09-18 | 日立民用电子株式会社 | Optical device and method for manufacturing same |
| CN107942425A (en) * | 2016-10-13 | 2018-04-20 | 上海矽越光电科技有限公司 | Buried-metal type broadband reflection grating and preparation method thereof |
| CN107942425B (en) * | 2016-10-13 | 2021-05-04 | 上海矽越光电科技有限公司 | Buried metal type broadband reflection grating and manufacturing method thereof |
| CN108594347A (en) * | 2018-04-27 | 2018-09-28 | 福州大学 | A kind of low cost terahertz polarization slice processing method |
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| Publication number | Publication date |
|---|---|
| CN101609176B (en) | 2010-10-20 |
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