CN1322339C - High diffraction efficiency quartz transmission grating with 532 nm wavelength - Google Patents
High diffraction efficiency quartz transmission grating with 532 nm wavelength Download PDFInfo
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- CN1322339C CN1322339C CNB2005100265573A CN200510026557A CN1322339C CN 1322339 C CN1322339 C CN 1322339C CN B2005100265573 A CNB2005100265573 A CN B2005100265573A CN 200510026557 A CN200510026557 A CN 200510026557A CN 1322339 C CN1322339 C CN 1322339C
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 21
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 239000010453 quartz Substances 0.000 title claims abstract description 17
- 238000005530 etching Methods 0.000 claims abstract description 8
- 230000010287 polarization Effects 0.000 abstract description 17
- 238000000034 method Methods 0.000 abstract description 9
- 238000004377 microelectronic Methods 0.000 abstract description 4
- 238000001259 photo etching Methods 0.000 abstract description 2
- 238000005516 engineering process Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 230000000875 corresponding effect Effects 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000005350 fused silica glass Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
A532 nm wavelength high diffraction efficiency quartz transmission grating is a high-density rectangular deep etching quartz grating, the linear density of the grating is 1700-1920 lines/mm, the depth of the grating is 0.9-1.1 microns, the duty ratio of the grating is 1/2, the invention can simultaneously realize the + 1-level Bragg transmission diffraction efficiency in TE and TM polarization directions to 532 nm wavelength to be higher than 85%, and especially when the density of the grating is 1830 lines/mm and the depth of the grating is 1 micron, the efficiency of TE and TM polarization modes is both higher than 94%; when the grating density is 1870 lines/mm and the grating depth is 0.9 microns, the +1 order bragg transmission diffraction efficiency in the TE polarization mode has a maximum value of 97.99%. The quartz transmission grating is processed by a microelectronic photoetching process and a deep etching process, has low cost and can be produced in large batch.
Description
Technical field
The present invention relates to grating, particularly a kind of high-diffraction efficiency quartz transmission grating of 532 nano wave lengths.
Background technology
Holographic grating and blazed grating are two kinds of traditional gratings: holographic grating is recorded on the sensitization rete by the interference fringe with two-beam and forms; Blazed grating forms by mechanical scratching.These two kinds of gratings all are surface gratings, do not possess the Bragg effect of body grating, so diffraction efficiency are lower, after the surface plates metallic reflective coating, efficient has a certain amount of raising, but the reflectivity of metallic diaphragm is fixing limited, so can not infinitely improve.
It is to utilize the deep etching technique of microelectronics that rectangle loses grating deeply, and what process in substrate has a grating than deep trouth shape.Because the etching depth of this surface etch grating is darker, so diffraction property is similar to body grating, has high efficiency body grating Bragg diffraction effect, this point is different fully with the plane grating that common surperficial light engraving loses.The high density rectangle loses the grating diffration theory deeply, can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, accurately calculate the result by calculation of coding machine program.People such as Moharam have provided the algorithm of rigorous coupled wave theory, referring to technology 1:M.G.Moharam et al. formerly, J.Opt.Soc.Am.A.12, and 1077 (1995), can solve this class and lose the grating diffration problem deeply.But as far as we know, nobody provides the design parameter of high-density deeply etched rectangular raster at common wavelengths 532 nanometers.
Because high dencity grating polarization often is relevant, practicability then wishes and polarization irrelevant, therefore can realize the high efficiency diffracting effect under the situation that polarization mode freely selects, is in demand in actual use.
Summary of the invention
The technical problem to be solved in the present invention provides a kind of high-diffraction efficiency quartz transmission grating of 532 nano wave lengths, and this grating can move under TE and TM polarization mode simultaneously, and diffraction efficiency is greater than 85%.
Technical solution of the present invention is as follows:
A kind of high-diffraction efficiency quartz transmission grating of 532 nano wave lengths is the deep etching quartz gratings of high density rectangle, and the line density that it is characterized in that this grating is 1700～1920 lines per millimeters, and the degree of depth of grating is 0.9～1.1 micron, and the dutycycle of grating is 1/2.
The line density of described grating is 1830 lines per millimeters, and the degree of depth of grating is 1 micron.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of rectangular raster of the present invention.Zone 1,3 all is uniformly, is respectively air and quartz (refractive index n=1.46).The grating part is in zone 2, and its medium 1,3 periodically is alternately distributed.D represents the thickness of grating; ∧ represents the space periodic of grating, is the inverse of grating space line density l, i.e. ∧=1/l; F represents dutycycle, and its size is the length ratio of convex ridge and groove.The light wave λ of one linear polarization incides on the grating with any angle α: when electric field intensity when the y direction of principal axis vibrates, be the TE ripple; When magnetic vector when the y direction of principal axis vibrates, be the TM ripple.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theory [formerly technology 1] to calculate quartzy grating (dutycycle is 1/2) under 532 nano wave length light incidents, raster density, the degree of depth under TE, TM polarization situation+(corresponding incident angle α satisfies α=sin for 1 grade of Prague transmission diffraction efficient
-1(λ/(2* ∧))), we obtain as drawing a conclusion:
High spatial frequency diffraction grating, line density are higher than 400 lines per millimeters, have very strong polarization correlated.By to the grating degree of depth, raster shape and the optimal design in grating cycle, can realize that grating one-level (as+1 grade) glitters, promptly maximum value (more than 90%) appears in diffraction efficiency.
The present invention obtains the numerical optimization result of high-diffraction efficiency rectangular raster according to Theoretical Calculation; promptly when raster density between 1830 lines per millimeters～1920 lines per millimeters, the grating degree of depth is between 0.9 micron～1.1 microns the time; no matter the TE mould still is the TM mould; one-level Prague transmission diffraction efficient of grating can reach more than 85% under 532 nano wave lengths, has realized freely selecting polarization mode.Particularly working as raster density is 1830 lines per millimeters, and when the grating degree of depth was 1 micron, the efficient of TE and TM polarization mode was all greater than 94%.Special when raster density be 1870 lines per millimeters, when the grating degree of depth is 0.9 micron, under the TE polarization mode+1 grade of transmission diffraction efficient has maximal value 97.99%.
Description of drawings
Fig. 1 is the geometry synoptic diagram that high density rectangle of the present invention loses grating deeply.
Fig. 2 is that high density rectangle of the present invention loses grating (refractive index of fused quartz gets 1.46) deeply
When 1 micron of the grating degree of depth, dutycycle is 1/2, the one-level Prague transmission diffraction efficient of TE/TM pattern 532 nano wave length incidents and the graph of relation of grid stroke density.
Fig. 3 is used for the apparatus structure synoptic diagram that holographic recording mode of the present invention writes down grating, and alphabetical H represents the He-Cr laser instrument, and S ' represents shutter, and R represents catoptron, and S represents spectroscope, and C represents the filtering collimator apparatus, and SB represents substrate.
Embodiment
Utilize the micro-optic technology to make the high density rectangular raster, at first adopt the holographic recording mode to write down the grating (see figure 3): utilize He-Cd laser instrument (wavelength is 0.441 μ m) to send two bundle plane waves and on substrate, form interference field with 2 θ angles.We adopt the glass sheet that is coated with MICROPOSIT series 1818 photoresists as the record substrate, and ∧ represents the space periodic of grating, i.e. the spacing of adjacent stripes, its size is ∧=λ/(2*sin θ), wherein, λ is the recording light wavelength, adopts 0.441 μ m in experiment.Angle θ is big more for record, and then ∧ is more little, by changing the size of θ, can control the cycle of grating, and periodic quantity designs according to table 1, the record high dencity grating.Then, the pattern on the photoresist is transferred on the quartz substrate by microelectronics lithographic technique (wet-chemical or reactive ion dry etching), lost the high dencity grating of (depth value is according to table 1 design) behind the flush away photoresist deeply.
Table 1 has provided a series of embodiment of the present invention, in order to obtain the quartzy grating of rectangle that high-diffraction efficiency, polarization mode are freely selected, in the process of making grating, according to table 1, suitably selective light moire grids density l (lines per millimeter) and grating depth d (micron) just can obtain the rectangle quartz grating that high-diffraction efficiency η, polarization mode freely select.
As shown in Table 1, the line density l of this grating is 1700～1920 lines per millimeters, the depth d of grating is 0.9～1.1 micron, the dutycycle of grating is 1/2, one-level Prague transmission diffraction efficiency eta of grating under TE and TM pattern all greater than 85%, when the degree of depth of grating is 1 micron, when the line density of grating is 1830 lines per millimeters, one-level Prague transmission diffraction efficiency eta of grating under TE and TM pattern all greater than 94%.No matter one-level Prague transmission diffraction efficient of this grating still be the TM mould for the TE mould like this, can both guarantee more than 94%, makes polarization mode freely to select.
The quartzy grating of rectangular etching of the present invention can be used as the anti-reflection reflection device that disappears of penetrating for 532 nano wave lengths, by making full use of holographic grating recording technique, microelectronics photoetching technique and high-density plasma dry method deep etching technology, can be in enormous quantities, produce at low cost, the experiment proved that the stable performance of grating of the present invention, reliable.
Under table 1 TE and the 532 nano wave length incidents of TM polarization mode ,+1 grade of Prague transmission diffraction efficiency eta, l is grid stroke density (lines per millimeter), d is the grating degree of depth (micron)
Claims (2)
1, a kind of high-diffraction efficiency quartz transmission grating of 532 nano wave lengths, it is the deep etching quartz grating of high density rectangle, the line density that it is characterized in that this quartz transmission grating is 1700～1920 lines per millimeters, and the degree of depth of grating is 0.9～1.1 micron, and the dutycycle of grating is 1/2.
2, the high-diffraction efficiency quartz transmission grating of 532 nano wave lengths according to claim 1, the line density that it is characterized in that described quartz transmission grating is 1830 lines per millimeters, the degree of depth of grating is 1 micron.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB2005100265573A CN1322339C (en) | 2005-06-08 | 2005-06-08 | High diffraction efficiency quartz transmission grating with 532 nm wavelength |
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| Application Number | Priority Date | Filing Date | Title |
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| CNB2005100265573A CN1322339C (en) | 2005-06-08 | 2005-06-08 | High diffraction efficiency quartz transmission grating with 532 nm wavelength |
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| CN1322339C true CN1322339C (en) | 2007-06-20 |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8773848B2 (en) | 2012-01-25 | 2014-07-08 | Apple Inc. | Fused glass device housings |
| US9439305B2 (en) | 2010-09-17 | 2016-09-06 | Apple Inc. | Glass enclosure |
| US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100340876C (en) * | 2006-03-22 | 2007-10-03 | 中国科学院上海光学精密机械研究所 | 532 nm wavelength high-density deep-etched quartz transmission polarization beam-splitting grating |
| CN103901515A (en) * | 2012-12-25 | 2014-07-02 | 重庆文理学院 | Rectangular quartz double-polarization blazed grating with 532 nanometer wave band |
| CN109343163B (en) * | 2018-12-06 | 2021-04-20 | 深圳大学 | Manufacturing method of simple-period grating structure and terahertz filter |
| EP3671310A1 (en) * | 2018-12-18 | 2020-06-24 | Thomson Licensing | Optical manipulation apparatus for trapping or moving micro or nanoparticles |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5363238A (en) * | 1992-03-13 | 1994-11-08 | Nippon Packing Co., Ltd. | Diffraction grating |
| JP2000187109A (en) * | 1994-02-08 | 2000-07-04 | Sharp Corp | Production of holographic diffraction grating |
| JP2002214455A (en) * | 2001-01-15 | 2002-07-31 | Sumitomo Electric Ind Ltd | Phase grating mask, method for manufacturing optical waveguide type diffraction grating element, and optical waveguide type diffraction grating element |
| US6545808B1 (en) * | 1997-02-14 | 2003-04-08 | Institut National D'optique | Phase mask with spatially variable diffraction efficiency |
| CN1564050A (en) * | 2004-03-19 | 2005-01-12 | 中国科学院上海光学精密机械研究所 | High-density rectangular deep etching quartz grating |
| CN1588134A (en) * | 2004-07-16 | 2005-03-02 | 中国科学院上海光学精密机械研究所 | High-density rectangular deep-etched quartz transmission grating |
-
2005
- 2005-06-08 CN CNB2005100265573A patent/CN1322339C/en not_active Expired - Fee Related
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5363238A (en) * | 1992-03-13 | 1994-11-08 | Nippon Packing Co., Ltd. | Diffraction grating |
| JP2000187109A (en) * | 1994-02-08 | 2000-07-04 | Sharp Corp | Production of holographic diffraction grating |
| US6545808B1 (en) * | 1997-02-14 | 2003-04-08 | Institut National D'optique | Phase mask with spatially variable diffraction efficiency |
| JP2002214455A (en) * | 2001-01-15 | 2002-07-31 | Sumitomo Electric Ind Ltd | Phase grating mask, method for manufacturing optical waveguide type diffraction grating element, and optical waveguide type diffraction grating element |
| CN1564050A (en) * | 2004-03-19 | 2005-01-12 | 中国科学院上海光学精密机械研究所 | High-density rectangular deep etching quartz grating |
| CN1588134A (en) * | 2004-07-16 | 2005-03-02 | 中国科学院上海光学精密机械研究所 | High-density rectangular deep-etched quartz transmission grating |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9439305B2 (en) | 2010-09-17 | 2016-09-06 | Apple Inc. | Glass enclosure |
| US8773848B2 (en) | 2012-01-25 | 2014-07-08 | Apple Inc. | Fused glass device housings |
| US9459661B2 (en) | 2013-06-19 | 2016-10-04 | Apple Inc. | Camouflaged openings in electronic device housings |
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|---|---|
| CN1693928A (en) | 2005-11-09 |
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