CN101666885B - Broadband high-efficiency fused quartz transmission polarization correlation grating - Google Patents
Broadband high-efficiency fused quartz transmission polarization correlation grating Download PDFInfo
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- CN101666885B CN101666885B CN2009100545125A CN200910054512A CN101666885B CN 101666885 B CN101666885 B CN 101666885B CN 2009100545125 A CN2009100545125 A CN 2009100545125A CN 200910054512 A CN200910054512 A CN 200910054512A CN 101666885 B CN101666885 B CN 101666885B
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 239000005350 fused silica glass Substances 0.000 title claims abstract description 25
- 230000005540 biological transmission Effects 0.000 title claims abstract description 14
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- 238000005530 etching Methods 0.000 claims abstract description 18
- 238000005516 engineering process Methods 0.000 abstract description 7
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- 230000003287 optical effect Effects 0.000 abstract description 6
- 238000004377 microelectronic Methods 0.000 abstract description 3
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- 238000010894 electron beam technology Methods 0.000 abstract 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 6
- 239000000758 substrate Substances 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000011651 chromium Substances 0.000 description 4
- 230000000737 periodic effect Effects 0.000 description 3
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- 101710097421 WD repeat and HMG-box DNA-binding protein 1 Proteins 0.000 description 1
- UIZLQMLDSWKZGC-UHFFFAOYSA-N cadmium helium Chemical compound [He].[Cd] UIZLQMLDSWKZGC-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
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- 238000010276 construction Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000009616 inductively coupled plasma Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
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- 238000005457 optimization Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000000411 transmission spectrum Methods 0.000 description 1
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Abstract
A broadband high-efficiency fused quartz transmission polarization related grating with a waveband of 800 nanometers has a duty ratio of 0.5, a period of 680-720 nanometers and an etching depth of 1150-1250 nanometers for TE polarized light; the period of the grating for TM polarized light is 870-890 nanometers, and the etching depth is 1570-1630 nanometers. The broadband high-efficiency fused quartz transmission grating is processed by combining an optical holographic recording technology or an electron beam direct writing device with a microelectronic deep etching process, has mature process and low manufacturing cost, can be produced in large batch and has important practical prospect.
Description
Technical field
This patent relates to the high-efficiency fused quartz grating, particularly a kind of broadband high-efficiency fused quartz transmission polarization correlation raster of 800 nano wavebands.
Background technology
Grating is widely used in the various optical systems, and one of them important purposes is to be applied in laser instrument, femtosecond pulse compressibility and the wavelength-division multiplex system as dispersion element.Traditional broadband high-efficiency grating that is used for the femtosecond pulse compressibility is divided into two classes more: a class is sinusoidal pattern golden light grid, and its anti-damage threshold is lower, and 0.2J/cm is only arranged
2The another kind of all-dielectric optically grid that are based on back side multilayer dielectric film catoptron, its bandwidth relative narrower (about 40nm) exists the cost height in addition, makes shortcomings such as difficulty.Some bibliographical informations the high-efficiency fused quartz grating, but mainly be the high-level efficiency grating that is used for wavelength 1060 nanometers [formerly technology 1:T.Clausnitzer et al., App.Opt.42,6934 (2003)].Fused quartz is a kind of extraordinary optical material, and it has from deep ultraviolet to far wide transmission spectrum, and very high optical quality is arranged, and temperature stability is good, the laser-damaged threshold value height.With the fused quartz is material, has designed and has made low-loss polarized relevant, high-diffraction efficiency grating and polarization beam-splitting grating.Therefore, considering the high-level efficiency and the broadband character of grating simultaneously, and utilize fused quartz to make the broadband high-efficiency grating of high damage threshold, will be very suitable.
It is to utilize the deep etching technique of microelectronics that the high density rectangle loses grating deeply, and what process in substrate has a grating than deep trouth shape.Because the etching depth of surface etch grating is darker, so diffraction property is similar to body grating, has the Bragg diffraction effect of body grating, this point is different fully with common surperficial light engraving erosion plane grating.The high density rectangle loses the grating diffration theory deeply, can not be explained by simple scalar optical grating diffraction equation, and must adopt the Maxwell equation of vector form and in conjunction with boundary condition, accurately calculate the result by calculation of coding machine program.People such as Moharam have provided the algorithm [formerly technology 2:M.G Moharam et al., J.Opt.Soc.Am.A.12,1077 (1995)] of rigorous coupled wave theory, can solve the diffraction problem of this class high dencity grating.But as far as we know, so far, also have no talent and provide the design parameter of the high-density deeply etched fused quartz transmission grating of broadband high-efficiency at 800 nano wavebands commonly used.
Summary of the invention
The technical problem to be solved in the present invention is the ruddiness at 800 nano wavebands commonly used, a kind of broadband high-efficiency fused quartz transmission polarization correlation raster is provided, this grating is expanded its bandwidth when keeping higher efficiency as far as possible, and requires its diffraction efficiency close as far as possible near wavelength 800 nanometers.
Technical solution of the present invention is as follows:
A kind of broadband high-efficiency fused quartz transmission polarization correlation raster that is used for 800 nano wavebands, the dutycycle of grating are 0.5, and its characteristics are that the cycle for this grating of TE polarized light is that 680~720 nanometers, etching depth are 1150~1250 nanometers; Cycle for this grating of TM polarized light is that 870~890 nanometers, etching depth are 1270~1630 nanometers.
Foundation of the present invention is as follows:
Fig. 1 has shown the geometry of the deep etching quartz grating of broadband high-efficiency high density rectangle.Zone 1,2 all is uniformly, is respectively air (refractive index n
1=1) and fused quartz (refractive index n
2, have dispersion variation with incident wavelength).Grating vector K is positioned at plane of incidence.The TE polarized incident light corresponding to the direction of vibration of electric field intensity perpendicular to the plane of incidence, the TM polarized incident light corresponding to the direction of vibration of magnetic vector perpendicular to the plane of incidence.Incident light (can be expressed as θ=arcsin (400/ Λ/n with 800 nano wave length littrow arrangement
1), incident angle changes with the grating cyclomorphosis) when inciding on the grating face, this grating can be realized broadband high-efficiency-1 order diffraction to TE polarized light or TM polarized light respectively.
Under optical grating construction as shown in Figure 1, the present invention adopts rigorous coupled wave theory [formerly technology 2] to calculate-1 order diffraction efficient of high-density deeply etched fused quartz grating (dutycycle is 0.5) at ruddiness 800 nano wavebands.Obtain the preliminary numerical optimization result of rectangular raster according to Theoretical Calculation, for the TE polarized light, when the cycle of this grating be 680~720 nanometers, when etching depth is 1150~1250 nanometers ,-1 order diffraction efficient-0.5d bandwidth is greater than 230 nanometers, average diffraction efficiency is higher than 89%; For the TM polarized light, the cycle of this grating is 870~890 nanometers, when etching depth is 1570~1630 nanometers, and-1 order diffraction efficient-0.5db bandwidth is greater than 165 nanometers, and average diffraction efficiency is higher than 92%.Further consider that grating diffration efficient is with the wavelength variations curve, investigate near the homogeneity of diffraction efficiency 800 nano wave lengths as can be known, in the characteristic range of grating parameter of the present invention, prominent example corresponding to the different polarization direction can make TE polarized light-1 order diffraction efficient be between 92.0%~94.3% in wavelength is 710 nanometer to 868 nanometer range respectively, its diffraction efficiency with the wavelength variations curve display in Fig. 2 (a); TM polarized light-1 order diffraction efficient is between 93.5%~95.7% in wavelength is 746 nanometer to 852 nanometer range, its diffraction efficiency with the curve display of wavelength variations in Fig. 2 (b).As seen corresponding grating can be realized high efficiency broadband diffraction to TE or TM polarized light respectively, and its diffraction efficiency is very approaching in the respective wavelength scope.Broadband diffraction efficient makes the present invention can become a kind of very desirable femtosecond compression device so uniformly, simultaneously because its simple rectangular raster structure makes this grating have important Practical significance.
Description of drawings
Fig. 1 is the geometry of the broadband high-efficiency fused quartz transmission grating of the present invention's 800 nano wavebands.
Among the figure, 1 represents zone 1, and (refractive index is n
1), 2 represent zone 2, and (refractive index is n
2), 3 represent grating, and 4 represent incident light, and 5 represent 0 order diffraction light, 6 representatives-1 order diffraction light, Λ represents the grating space periodic, and h represents grating depth, and b represents the width (dutycycle f=b/ Λ) of grating projection.
Fig. 2 is at the curve (TE polarized light with the situation of corresponding Littrow angle incident) of broadband high-efficiency fused quartz transmission grating-1 order diffraction efficient of the present invention with wavelength variations
Fig. 3 is at the curve grating (TM polarized light with the situation of corresponding Littrow angle incident) of broadband high-efficiency fused quartz transmission grating-1 order diffraction efficient of the present invention with wavelength variations
Fig. 4 is the holographic grating recording beam path.7 represent helium cadmium laser among the figure, and 8 represent shutter, and 9 represent beam splitter, and 10,11,12,13 represent catoptron, and 14,15 represent beam expanding lens, and 16,17 represent lens, and 18 represent substrate.
Embodiment
Utilize the micro-optic technology to make the high-density deeply etched rectangular raster of broadband high-efficiency, deposition layer of metal chromium film on the fused quartz substrate of dry, cleaning at first, and on the chromium film, evenly be coated with the last layer positive photoetching rubber (Shipley, S1818, USA).Adopt the holographic recording mode to write down the grating (see figure 4) then, adopt He-Cd laser instrument 7 (wavelength is 441 nanometers) as recording light source.During the recording holographic grating, shutter 8 is opened, and the arrow beam of light that sends from laser instrument is divided into two arrow beam of lights through beam splitter 9.A branch of by behind the catoptron 10, form wide plane wave through beam expanding lens 14, lens 16; Another bundle forms wide plane wave by behind the catoptron 11 through beam expanding lens 15, lens 17.After two bundle plane waves pass through catoptron 12,13 respectively, on substrate 18, form interference field with 2 θ angles.Grating space periodic (being the spacing of adjacent stripes) can be expressed as Λ=λ/(2*sin θ), and wherein λ is the recording light wavelength.Angle θ is big more for record, and then Λ is more little, so by changing the size of θ, can control the cycle (periodic quantity can by above-mentioned concrete parameter designing) of grating.The holographic recording high dencity grating develops then, then spends chrome liquor again photoengraving pattern is transferred on the chromium film from photoresist, utilizes chemical reagent that unnecessary photoresist is removed.At last, sample is put into the plasma etching that inductively coupled plasma etching machine carries out certain hour, grating is transferred on the fused quartz substrate, spent chrome liquor more remaining chromium film is removed, just obtain the fused quartz grating of high-density deeply etched surface relief structure.
In the process of making grating, suitably select grating etching depth and cycle, just can get the fused quartz transmission grating of broadband high-efficiency.Cycle for this grating of TE polarized light is that 680~720 nanometers, etching depth are 1150~1250 nanometers; Cycle for this grating of TM polarized light is that 870~890 nanometers, etching depth are 1570~1630 nanometers.The dutycycle of grating is 0.5 o'clock, and to TE polarized light-1 order diffraction, the present invention can be near wavelength 800 nanometers obtains to surpass 90% and very approaching diffraction efficiency at least in 100 nanometer range; For TM polarized light-1 order diffraction, can be near wavelength 800 nanometers obtain to surpass 92% and very approaching diffraction efficiency at least in 80 nanometer wavelength range.As shown in Figures 2 and 3, for the prominent example in the characteristic range of grating parameter of the presently claimed invention, TE polarized light-1 order diffraction efficient in being 710 nanometer to 868 nanometer range, wavelength is between 92.0%~94.3%; TM polarized light-1 order diffraction efficient is between 93.5%~95.7% in wavelength is 746 nanometer to 852 nanometer range, respectively TE or TM polarized light are realized high efficiency broadband diffraction, and its diffraction efficiency is very even in the respective wavelength scope.
Broadband high-efficiency fused quartz transmission polarization correlation raster of the present invention has the characteristics of broadband, high-diffraction efficiency and high laser-damaged threshold value simultaneously, be a kind of very desirable femtosecond pulse compressor, and it is simple in structure, realizes easily.Utilize holographic grating recording technique or direct electronic beam write device in conjunction with the deep etching technique of microelectronics, can be in enormous quantities, low-cost production, grating stable performance after the etching, reliable is a kind of important realization technology that broadband high-efficiency loses the fused quartz grating deeply, has important practical prospect.
Claims (1)
1. broadband high-efficiency fused quartz transmission polarization correlation raster that is used for 800 nano wavebands, the dutycycle of grating is 0.5, it is characterized in that:
To the TE polarized light, the grating cycle is 680~720 nanometers, and etching depth is 1150~1250 nanometers;
To the TM polarized light, the grating cycle is 870~890 nanometers, and etching depth is 1570~1630 nanometers.
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