CN101591764A - 材料成膜装置、制备方法及其制备的有机电致发光器件 - Google Patents
材料成膜装置、制备方法及其制备的有机电致发光器件 Download PDFInfo
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- CN101591764A CN101591764A CN 200810124031 CN200810124031A CN101591764A CN 101591764 A CN101591764 A CN 101591764A CN 200810124031 CN200810124031 CN 200810124031 CN 200810124031 A CN200810124031 A CN 200810124031A CN 101591764 A CN101591764 A CN 101591764A
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- 238000002360 preparation method Methods 0.000 title claims abstract description 50
- 239000000463 material Substances 0.000 title claims abstract description 48
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- 238000001704 evaporation Methods 0.000 claims abstract description 101
- 230000008020 evaporation Effects 0.000 claims abstract description 101
- 238000007740 vapor deposition Methods 0.000 claims abstract description 71
- 238000010438 heat treatment Methods 0.000 claims abstract description 60
- 238000010894 electron beam technology Methods 0.000 claims abstract description 26
- 239000011159 matrix material Substances 0.000 claims abstract description 9
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- 239000010408 film Substances 0.000 claims description 40
- 238000004544 sputter deposition Methods 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 12
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- 229910045601 alloy Inorganic materials 0.000 claims description 6
- 239000000956 alloy Substances 0.000 claims description 6
- 229910052791 calcium Inorganic materials 0.000 claims description 6
- 229910052802 copper Inorganic materials 0.000 claims description 6
- 229910052749 magnesium Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 4
- 239000010409 thin film Substances 0.000 claims description 3
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 150000002739 metals Chemical class 0.000 claims description 2
- 239000010410 layer Substances 0.000 abstract description 30
- 239000012044 organic layer Substances 0.000 abstract description 5
- 230000008859 change Effects 0.000 abstract description 2
- 230000006378 damage Effects 0.000 abstract description 2
- 230000002950 deficient Effects 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 48
- 238000005516 engineering process Methods 0.000 description 11
- 239000011521 glass Substances 0.000 description 11
- 238000005566 electron beam evaporation Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 238000000576 coating method Methods 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000005538 encapsulation Methods 0.000 description 3
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 230000027756 respiratory electron transport chain Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
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- 230000005684 electric field Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- MEYZYGMYMLNUHJ-UHFFFAOYSA-N tunicamycin Natural products CC(C)CCCCCCCCCC=CC(=O)NC1C(O)C(O)C(CC(O)C2OC(C(O)C2O)N3C=CC(=O)NC3=O)OC1OC4OC(CO)C(O)C(O)C4NC(=O)C MEYZYGMYMLNUHJ-UHFFFAOYSA-N 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical group N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000010406 cathode material Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
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- 238000004821 distillation Methods 0.000 description 1
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- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000013528 metallic particle Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
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- 238000012544 monitoring process Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (18)
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CN 200810124031 CN101591764B (zh) | 2008-05-29 | 2008-05-29 | 材料成膜方法及其制备的有机电致发光器件 |
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CN 200810124031 CN101591764B (zh) | 2008-05-29 | 2008-05-29 | 材料成膜方法及其制备的有机电致发光器件 |
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CN101591764A true CN101591764A (zh) | 2009-12-02 |
CN101591764B CN101591764B (zh) | 2013-03-20 |
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Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102639746A (zh) * | 2009-12-09 | 2012-08-15 | 株式会社爱发科 | 有机薄膜的成膜装置以及有机材料成膜方法 |
CN105039923A (zh) * | 2015-08-28 | 2015-11-11 | 安徽大地熊新材料股份有限公司 | 一种永磁材料表面高结合力镀铝膜工艺 |
CN107858652A (zh) * | 2017-12-09 | 2018-03-30 | 四川金英科技有限责任公司 | 一种线性蒸镀源装置 |
CN110541148A (zh) * | 2019-09-26 | 2019-12-06 | 深圳市华星光电半导体显示技术有限公司 | 真空蒸镀装置 |
CN112267094A (zh) * | 2020-10-12 | 2021-01-26 | 赫得纳米科技(昆山)有限公司 | 一种高屏蔽效能ito膜的制造工艺及其设备 |
CN113388884A (zh) * | 2021-06-18 | 2021-09-14 | 北京理工大学 | 一种双坩埚蒸发源 |
CN114182198A (zh) * | 2021-11-18 | 2022-03-15 | 桂林电子科技大学 | 一种az91d镁合金电子束蒸镀铜的方法 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1743508B1 (en) * | 2004-04-09 | 2012-05-23 | LG Chem, Ltd. | Stacked organic light emitting device having high efficiency and high brightness |
CN100497727C (zh) * | 2005-08-25 | 2009-06-10 | 北京有色金属研究总院 | 多功能真空连续镀膜装置 |
-
2008
- 2008-05-29 CN CN 200810124031 patent/CN101591764B/zh active Active
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102639746A (zh) * | 2009-12-09 | 2012-08-15 | 株式会社爱发科 | 有机薄膜的成膜装置以及有机材料成膜方法 |
CN105039923A (zh) * | 2015-08-28 | 2015-11-11 | 安徽大地熊新材料股份有限公司 | 一种永磁材料表面高结合力镀铝膜工艺 |
CN107858652A (zh) * | 2017-12-09 | 2018-03-30 | 四川金英科技有限责任公司 | 一种线性蒸镀源装置 |
CN110541148A (zh) * | 2019-09-26 | 2019-12-06 | 深圳市华星光电半导体显示技术有限公司 | 真空蒸镀装置 |
CN110541148B (zh) * | 2019-09-26 | 2020-10-13 | 深圳市华星光电半导体显示技术有限公司 | 真空蒸镀装置 |
CN112267094A (zh) * | 2020-10-12 | 2021-01-26 | 赫得纳米科技(昆山)有限公司 | 一种高屏蔽效能ito膜的制造工艺及其设备 |
CN113388884A (zh) * | 2021-06-18 | 2021-09-14 | 北京理工大学 | 一种双坩埚蒸发源 |
CN114182198A (zh) * | 2021-11-18 | 2022-03-15 | 桂林电子科技大学 | 一种az91d镁合金电子束蒸镀铜的方法 |
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CN101591764B (zh) | 2013-03-20 |
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Address after: 215300 No. 188 Feng Feng Road, Kunshan hi tech Zone, Jiangsu, Kunshan Patentee after: Suzhou Qingyue Photoelectric Technology Co., Ltd Patentee after: TSINGHUA University Address before: 215300 No. 188 Feng Feng Road, Kunshan hi tech Zone, Jiangsu, Kunshan Patentee before: Kunshan Visionox Technology Co.,Ltd. Patentee before: TSINGHUA University |
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