CN101554098B - 一种软x-射线静电除去装置中软x-射线屏蔽板及其制造方法 - Google Patents
一种软x-射线静电除去装置中软x-射线屏蔽板及其制造方法 Download PDFInfo
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- CN101554098B CN101554098B CN2007800311598A CN200780031159A CN101554098B CN 101554098 B CN101554098 B CN 101554098B CN 2007800311598 A CN2007800311598 A CN 2007800311598A CN 200780031159 A CN200780031159 A CN 200780031159A CN 101554098 B CN101554098 B CN 101554098B
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- 238000004519 manufacturing process Methods 0.000 title claims description 10
- 238000000034 method Methods 0.000 claims description 18
- 230000003068 static effect Effects 0.000 claims description 16
- 239000000463 material Substances 0.000 claims description 6
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 238000005530 etching Methods 0.000 claims description 4
- 238000007599 discharging Methods 0.000 abstract description 4
- 239000011229 interlayer Substances 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 description 19
- 239000000758 substrate Substances 0.000 description 17
- 238000005259 measurement Methods 0.000 description 6
- 150000001450 anions Chemical class 0.000 description 4
- 150000001768 cations Chemical class 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000002360 explosive Substances 0.000 description 3
- 238000011056 performance test Methods 0.000 description 3
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000008034 disappearance Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000001413 cellular effect Effects 0.000 description 1
- 238000007600 charging Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007786 electrostatic charging Methods 0.000 description 1
- 238000011990 functional testing Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 210000003127 knee Anatomy 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05F—STATIC ELECTRICITY; NATURALLY-OCCURRING ELECTRICITY
- H05F3/00—Carrying-off electrostatic charges
- H05F3/06—Carrying-off electrostatic charges by means of ionising radiation
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
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- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
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- Computer Hardware Design (AREA)
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Abstract
Description
Claims (6)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006226515A JP4751275B2 (ja) | 2006-08-23 | 2006-08-23 | 軟x線式静電除去装置に使用する軟x線遮蔽シートおよびその製造方法 |
JP226515/2006 | 2006-08-23 | ||
PCT/JP2007/066260 WO2008023727A1 (fr) | 2006-08-23 | 2007-08-22 | Feuille de blindage par rayons x mous utilisée dans un dispositif de suppression électrostatique par rayons x mous et son procédé de fabrication |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101554098A CN101554098A (zh) | 2009-10-07 |
CN101554098B true CN101554098B (zh) | 2013-01-30 |
Family
ID=39106812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800311598A Active CN101554098B (zh) | 2006-08-23 | 2007-08-22 | 一种软x-射线静电除去装置中软x-射线屏蔽板及其制造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7850366B2 (zh) |
EP (1) | EP2056653B1 (zh) |
JP (1) | JP4751275B2 (zh) |
KR (1) | KR101361082B1 (zh) |
CN (1) | CN101554098B (zh) |
TW (1) | TWI405504B (zh) |
WO (1) | WO2008023727A1 (zh) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104396349B (zh) * | 2012-11-28 | 2016-08-24 | 大科防静电技术咨询(深圳)有限公司 | 气流控制器和静电电荷减少系统 |
MX344409B (es) | 2012-11-28 | 2016-12-14 | Esd Tech Consulting & Licensing Co Ltd | Controlador de corriente de aire y sistema para la reduccion de carga estatica. |
JP6185505B2 (ja) * | 2015-03-31 | 2017-08-23 | 株式会社東海理化電機製作所 | 作動制御装置 |
KR101687363B1 (ko) * | 2015-08-24 | 2016-12-16 | (주)선재하이테크 | X선관에서 방사되는 x선 차폐를 위한 방호 장치 |
CN106680865B (zh) | 2017-03-08 | 2018-11-06 | 沈阳东软医疗系统有限公司 | 一种射线源组件的漏射线测试方法及设备 |
JP7262299B2 (ja) * | 2019-05-16 | 2023-04-21 | ケンブリッジフィルターコーポレーション株式会社 | 軟x線式静電除去装置 |
TWI825975B (zh) * | 2021-09-10 | 2023-12-11 | 美商愛玻索立克公司 | 已清洗的封裝用基板的製造方法以及已清洗的封裝用基板 |
DE102022131991B3 (de) * | 2022-12-02 | 2023-06-29 | Tenneco Gmbh | Modulares Lichtschutzsystem, Baugruppe daraus und Luftreinigungsanlage mit dieser Baugruppe |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001257096A (ja) * | 2000-03-10 | 2001-09-21 | Techno Ryowa Ltd | 静電気対策用吹出口 |
JP2005019044A (ja) * | 2003-06-24 | 2005-01-20 | Kondo Kogyo Kk | 半導体および液晶製造工程における半導体基板および液晶基板表面の静電除去装置 |
CN1619759A (zh) * | 2003-11-17 | 2005-05-25 | 釜山科技园财团法人 | 利用软x射线的防静电装置及其软x射线管的制作方法 |
JP2005339921A (ja) * | 2004-05-26 | 2005-12-08 | Kondo Kogyo Kk | 半導体および液晶製造工程における半導体基板および液晶基板表面の静電除去装置 |
CN1838854A (zh) * | 2005-03-25 | 2006-09-27 | 精工爱普生株式会社 | 软x线屏蔽结构、软x线除静电装置及电离空气放出方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2668512B2 (ja) * | 1994-10-24 | 1997-10-27 | 株式会社レヨーン工業 | 軟x線による物体表面の静電気除去装置 |
US6830934B1 (en) * | 1999-06-15 | 2004-12-14 | Lifescan, Inc. | Microdroplet dispensing for a medical diagnostic device |
US7518136B2 (en) * | 2001-12-17 | 2009-04-14 | Tecomet, Inc. | Devices, methods, and systems involving cast computed tomography collimators |
JP3897791B2 (ja) * | 2005-01-27 | 2007-03-28 | シャープ株式会社 | 携帯式電話機 |
-
2006
- 2006-08-23 JP JP2006226515A patent/JP4751275B2/ja active Active
-
2007
- 2007-08-22 EP EP07792858.8A patent/EP2056653B1/en active Active
- 2007-08-22 CN CN2007800311598A patent/CN101554098B/zh active Active
- 2007-08-22 US US12/438,263 patent/US7850366B2/en active Active
- 2007-08-22 TW TW096131137A patent/TWI405504B/zh active
- 2007-08-22 WO PCT/JP2007/066260 patent/WO2008023727A1/ja active Search and Examination
- 2007-08-22 KR KR1020097005130A patent/KR101361082B1/ko active IP Right Grant
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001257096A (ja) * | 2000-03-10 | 2001-09-21 | Techno Ryowa Ltd | 静電気対策用吹出口 |
JP2005019044A (ja) * | 2003-06-24 | 2005-01-20 | Kondo Kogyo Kk | 半導体および液晶製造工程における半導体基板および液晶基板表面の静電除去装置 |
CN1619759A (zh) * | 2003-11-17 | 2005-05-25 | 釜山科技园财团法人 | 利用软x射线的防静电装置及其软x射线管的制作方法 |
JP2005339921A (ja) * | 2004-05-26 | 2005-12-08 | Kondo Kogyo Kk | 半導体および液晶製造工程における半導体基板および液晶基板表面の静電除去装置 |
CN1838854A (zh) * | 2005-03-25 | 2006-09-27 | 精工爱普生株式会社 | 软x线屏蔽结构、软x线除静电装置及电离空气放出方法 |
Also Published As
Publication number | Publication date |
---|---|
KR101361082B1 (ko) | 2014-02-12 |
EP2056653A1 (en) | 2009-05-06 |
WO2008023727A1 (fr) | 2008-02-28 |
JP4751275B2 (ja) | 2011-08-17 |
TW200818992A (en) | 2008-04-16 |
KR20090045332A (ko) | 2009-05-07 |
US20100176315A1 (en) | 2010-07-15 |
EP2056653B1 (en) | 2018-01-03 |
US7850366B2 (en) | 2010-12-14 |
TWI405504B (zh) | 2013-08-11 |
EP2056653A4 (en) | 2015-02-18 |
CN101554098A (zh) | 2009-10-07 |
JP2008052973A (ja) | 2008-03-06 |
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Address after: Tokyo, Japan Patentee after: Cambridge filter Co.,Ltd. Address before: Tokyo, Japan Patentee before: KONDOH INDUSTRIES, LTD. |
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Effective date of registration: 20220426 Address after: Tokyo, Japan Patentee after: KONDOH INDUSTRIES, LTD. Address before: Tokyo, Japan Patentee before: KONDOH INDUSTRIES, LTD. Patentee before: Cambridge Filter Japan, Ltd. |