CN101506738A - Exposure device for the production of screen print stencils - Google Patents
Exposure device for the production of screen print stencils Download PDFInfo
- Publication number
- CN101506738A CN101506738A CNA2007800315372A CN200780031537A CN101506738A CN 101506738 A CN101506738 A CN 101506738A CN A2007800315372 A CNA2007800315372 A CN A2007800315372A CN 200780031537 A CN200780031537 A CN 200780031537A CN 101506738 A CN101506738 A CN 101506738A
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- China
- Prior art keywords
- exposure device
- laser diode
- light
- exposure
- screen printing
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Abstract
The present invention relates to an exposure device used for manufacturing screen printing stencil (5). The exposure device is provided with a bracket (4) used for the screen printing stencil (5), and an exposure system. The exposure system is provided with at least one light source for generating light and a lens array in photohead (9). Additionally a signal source (computer) for outputting digital signal is provided. The signal source is connected with the exposure system with a mode that the whole screen printing stencil (5) can be exposed correspondingly with the signal. Furthermore the photohead (9) is movable relatively to the screen printing stencil (5). Preferably, the light source is composed of n same-style laser diodes which operate in the wavelength range of 300-450nm, wherein each group of laser diode is installed in a module (12). Commonly a plurality of modules (12) are installed at the exposure unit. The laser diodes can be controlled by the signal of signal source. The light signal of laser diode is guided to a grating plate in the exposure head (9) through the photoconductive fibers of which the number is also n. The light output of the grating plate is guided to a focusing lens array (10) which is suitable for the laser diodes in the aspect of wavelength range in the photohead (9).
Description
Technical field
The present invention relates to a kind of according to exposure device claim 1, that be used to make screen printing stencil.
The present invention be more particularly directed to a kind of exposure device that is used to make screen printing stencil, this exposure device has: the support that is used for screen printing stencil; Exposure system, this exposure system have at least one light source and mirror group in photohead (perhaps being called optical system) of producing light; Have the signal source of output digital signal in addition, this signal source is connected in such a way with this exposure system, and promptly whole screen printing stencil can expose corresponding to these signals, and wherein photohead is movable with respect to screen printing stencil.Therefore it relates to a kind of device that is used to carry out so-called CtS (Computer-to-Screen silk-screen Computer To Plate) method, promptly relate to a kind of like this device, need in this device to be transferred to that the information of printing on the former state (screen printing stencil) is controlled by the digital signal of computing machine and the exposure system by optics provides.
Background technology
By a kind of a kind of exposure device of making the method for silk-screen model and being used for this of being used to of EP-0 953 877 cicada, it has above-mentioned feature.In this device, exposure system has the reflective optics (Speigelsystem) of micro mechanical structure, and it is the movable minitype reflector of part at least that this reflective optics has a plurality of.The reflective optics of this MIniature machinery structure is also known to so-called DMDs (digital micro-mirror device), and can buy on market.In should using, the reflective optics of micro mechanical structure is used for deflection and modulation light, so that can depending on the signal of computing machine, the position of movable minitype reflector changes like this, even the part that is reflected respectively of light or enter light output or do not enter.Here, light output means certainly and deflects to the silk-screen model light of screen printing stencil in other words.Use lasting light at this, for example electrodeless, microwave excited ultraviolet radiator is used as light source.In this external this device, the support and the exposure system that have the silk-screen model relative to each other also are movable.
Although use DMD-integrated package (for example being used for projector) now widely, yet have some significant deficiency according to this device of EP-0 953 877.Because in DMD, relate to the reflective optics of mechanicalness motion, so just have certain boundary certainly in view of in the light of needs modulation, needing to replace very apace.DMD commonly used has the threshold frequency that is approximately 20kHz, and this has finally limited " image taking speed " of screen printing stencil naturally greatly.According to the explanation of manufacturer (German CST company) for relevant apparatus, maximum image taking speed has amounted up to the scope (yet just in " fast " emulsion type with under the situation of very little masterplate thickness) of about 500sq.ft/hr when 65lpi (rows per inch) (square feet number hourly).Accessible image taking speed is certainly also determined (masterplate material of imaging/photosensitive emulsion material and partly need very different ray energies) as required by the ray energy of needs consumption., also stipulated to use the boundary of DMD here, because produce high relatively loss (part of light " be reflected and leave " shows as higher relatively thermal loss, and this thermal loss must be discharged from) all the time by using catoptron.Final must the use with very high-power operation, continuous radiation source is used as light source, this be on the other hand costliness and also link together with relative higher power loss once more in essence (being converted into spendable radiation fully) because of some energy of carrying only.Therefore, once more according to the explanation of manufacturer, use power to be generally the UV light source of 600-1200Watt, it needs special cooling device again with regard to this light source.
Summary of the invention
The objective of the invention is to, propose a kind of improved, exposure device of being used to make screen printing stencil.
This purpose realizes by the feature of claim 1.
According to the present invention proposes: usage quantity be n, in the 300-450nm wavelength coverage laser diode that work, of the same type as light source, this laser diode can be by the signal controlling of signal source (computing machine), the light transmitting fiber that the light signal of laser diode is similarly n by quantity guides to the original screen panel in photohead, and the output of the light of this original screen panel is directed to and is being suitable for (angepasst) focus lamp group laser diode, in photohead aspect the wavelength coverage.
The laser diode that use can directly be modulated has different remarkable advantages.At first, the necessity of continuous operation and the power loss that therefore can significantly reduce whole exposure device have been cancelled.In addition, almost not for the reaction velocity of laser diode (at least in the related herein range of application of printing stencil exposure) is provided with the upper limit, this be because accessible threshold frequency in the GHz scope.In addition, because the simple controllable system property of laser diode and in light path, do not have the catoptron that causes light deflection, therefore cancelled another factor that do not expect, that cause power loss, this is because except the absorption loss in material, needn't consider extra loss in light path (optical module).
Because must use some laser diodes and for the desired spendable laser diode of host material imaging also must be worked in the 300-450nm wavelength coverage according to the solution of the present invention, in addition also owing to the cost reason, so this scheme is not considered up to now fully.But for a period of time, can buy the high-power blue laser diode of in the 405nm wavelength coverage, working at present, (coming from Nichia company) relatively inexpensively.In addition, along with the same blue laser diode used, novel DVD (Digital video disc) technology becomes more and more popular, the price that can be contemplated that blue laser diode can further reduce, and has more attractive force thereby make according to the solution of the present invention with respect to DMD scheme and similar scheme.It is to be noted in addition, (also in the micro mirror chip) must use the chip of selecting (because all pixels all must be fully in action) all the time in the DMD scheme, even and the dmd chip made from high pixel quantity in enormous quantities yet is very expensive always, this makes according to the solution of the present invention and seems attractive, particularly when as providing, the exposure device that is proposed is designed in such a way, and promptly the quantity of employed laser diode is extendible.Aspect software, that is to say in signal source in other words aspect the control computer, but can in view of the matching of control program to be used in other words adjustable come to implement relatively simply this extensibility laser diode of double amount (for example with).Utilize the advantage of this measure to be in addition: the equipment that can supply different scale of price and power grade.
In addition, not only can be used to make flat screen printing stencil but also can be used to make columniform screen printing stencil in principle according to exposure device of the present invention.
Yet the grating of separately controllable light source (being laser diode in this case) is arranged significant for such exposure device.Laser diode self also is not that the exposure that must be installed in for masterplate material is during essential grating is arranged.This is enough to satisfy the demand or rather, and the original screen panel and this original screen panel self that just light transmitting fiber are guided in photohead design like this, even the exposure that light transmitting fiber appears at there for masterplate material is during essential grating is arranged.Therefore original screen panel is a fiber array, and this fiber array holds light transmitting fiber and makes light transmitting fiber be parallel to the optical axis of focus lamp group in rectangle or trapezoidal grating is arranged.Because be designed to: light transmitting fiber all is designed to insertable in both sides, not only still is being connected to the interface of original screen panel at the interface that is connected to laser diode, has therefore demonstrated dirigibility and maintainable advantage.
Therefore, it is the light of laser diode of the optical axis that is parallel to the focus lamp group of n that original screen panel in grating is arranged provides quantity, wherein the light diameter of each the bar light task of corresponding essentially to fibre-optic diameter and focus lamp group is, generate on the masterplate material that needs imaging (exposure) that grating arranges dwindle or amplified images.For the unevenness place of the compensation film plate material that can be in operation, be preferably also fit on automatic focusing system of focus lamp group.
What proposed can be achieved in the exposing unit that makes up with portal-framed structure (Portalbauweise) especially well according to exposure device of the present invention.Owing to need the size of the screen printing stencil of exposure, often be vertically to arrange in order to save this exposing unit in space, that is to say that the support that is used for screen printing stencil is positioned at vertical plane.At this, exposing unit has constituted the exposure device that is used to make screen printing stencil with control module and computer unit.Advantageously, laser diode and light transmitting fiber are in this is set to be inserted in radiating module in the interface unit.
At this, interface unit with module is arranged on the exposing unit place in such a way, promptly this interface unit only one for the exposure masterplate material be on the essential direction of motion along with photohead moves together, keep ground as much as possible little with the quality that will for exposure process, need motion.For example, when the interface unit with module is arranged on the door frame arm of the exposure desk that makes up with portal-framed structure, be exactly this situation.After this interface unit is along with photohead moves on directions X (direction of motion of door frame arm) together relatively slowly, yet not along with photohead moves on Y direction (photohead is in the direction of motion on the door frame arm) together relatively fast.Alternatively, to be fixedly mounted on the exposing unit place also be possible to the interface unit that will have a module.Have so the interface unit of module will be fully not along with photohead for the exposure masterplate material is being motion together on the essential direction of motion.
Another advantage according to exposure device of the present invention beyond all doubtly also is, promptly can use the cheaper mirror group of price by using in the focus lamp group that is suitable for laser diode aspect the wavelength coverage in photohead.That is to say that if utilize with the light source of under the laser diode situation, comparing spectral distribution and come work then because needed focusing accuracy, the mirror group that is used for the spectral range that whole needs hide also just must optimization with broad.Because in exposure device according to the present invention, also be set to be designed to exposure mirror group removable or can reequip, have the different masterplate materials that require aspect the spectrum sensitivity so can adjust this device very simply so that it is suitable for processing with very low expense.
Therefore, with respect to machine scheme commonly used, new machine scheme particularly has quite significant advantage aspect adjustable, maintainability and the extensibility.
Description of drawings
Describe the present invention in detail below with reference to an embodiment.
Shown in unique accompanying drawing:
Fig. 1 illustrate be used to make screen printing stencil, be the exposure device of portal-framed structure.
Embodiment
The exposure device that is used to make screen printing stencil is portal-framed structure and is made of exposing unit 1, control module 2 and computer unit 3 basically.
Exposing unit 1 has vertically disposed machine table at this, and this machine table has the support 4 that is used for (the needs exposure) screen printing stencil 5.Above support 4 and screen printing stencil, door frame arm 6 can be moved on directions X on device 7 at the X-spindle guide.On door frame arm 6, the photohead 9 with focus lamp group 10 can move on the Y direction on device 8 at the Y-spindle guide.Therefore directions X is corresponding to the direction of motion of door frame arm 6.For all being provided with accurate guide piece and precise driving device (not shown) in the motion on the directions X with for the motion on the Y direction.
At the door frame arm 6 other interface units 11 that are equipped with.On this interface unit 11, be provided with: the module 12 of a plurality of heat radiations, this module has the laser diode group; Data distributor 13; With the interface electronics (not shown).In interface unit, the digital signal that comes from as the computer unit 3 of signal source is converted to optical signalling.Because photohead 9 is provided with movingly with respect to the module 12 with laser diode, so signal transfers to photohead 9 by light transmitting fiber through Y-carrier chain 14 by laser diode.
For example four to eight modules 12 can be set on interface unit like this, this module has the group of each 16 laser diode.Then this has drawn altogether that quantity is that n equals 64 to 128 laser diodes, wherein the original screen panel that passes in photohead 9 through Y-carrier chain 14 by each one independent light transmitting fiber of the light of each laser diode output.Advantageously, laser diode is worked in the 300-450nm wavelength coverage, preferably works in the blue light range of 405nm.The laser diode of using in service directly modulating that is to say that laser diode is in due form directly by Digital Signals.
Because door frame arm 6 and interface unit 11 also are provided with respect to machine table or support 4 together movingly, so signal transfers to data distributor 13 by X-carrier chain 15.But opposite with Y-carrier chain 14, this yet will for the control of photohead 9 with and motion on the Y direction necessary signal and power supply take away together.
In this device, the screen printing stencil 5 that is supported by support 4 completely or partially exposes by the motion of photohead on directions X and Y direction.Can draw at this, in general slow than the motion on the Y direction in the motion on the directions X, this is because only must make much smaller mass motion on the Y direction.
The function of control module 2 is basically, the motion of control photohead 9 on X-and Y direction.Necessary for this reason function advantageously realizes in the controller 16 that programmable memory is arranged (SPS-unit).Control module 2 also comprises essential driving circuit that is used for motion control or the like.
The data that need expose on screen printing stencil 5 are provided and have controlled exposure process by computer unit 3 (signal source) at last.From this types of devices, all be known regardless of the function or the function of control module 2 that are computer unit 3 to those skilled in the art, and therefore here do not further specify.
In according to above-described novel machine scheme, also provide, utilized several individual event measures to reach big as far as possible dirigibility, therefore for example utilized following measures:
-realization is used for the module scheme of laser diode, the wherein laser diode that each module 12 has the desired type of fixed qty respectively in interface unit 11 consistently.By therefore attached module can improve exposure device in simple mode image taking speed (extensibility/power improves) is installed.
-can be at the light transmitting fiber of both sides insertion, between the original screen panel in module 12 and photohead 9.This has not only simplified the maintainability of system, but also has simplified extensibility.
-utilize the interchangeability of focus lamp group 10 in photohead 9.By using the focus lamp group with desired laser diode, and the wavelength coverage of this focus lamp group and applied laser diode is complementary, and also can process the very different material that is used for screen printing stencil thus.
Generally speaking, utilize the exposure device that is used to make screen printing stencil according to the present invention to obtain inexpensive high power and extendible system, utilize this system can process the common used material of the screen printing stencil that is useful on basically.
Claims (12)
1. exposure device that is used to make screen printing stencil (5), described exposure device has: the support (4) that is used for described screen printing stencil (5); Exposure system, described exposure system have at least one light source and the mirror group in photohead (9) of producing light; The signal source that has the output digital signal in addition, described signal source is connected in such a way with described exposure system, be that whole described screen printing stencil (5) can be corresponding to these signal exposures, wherein said photohead (9) is movable with respect to described screen printing stencil (5), it is characterized in that, it is n's that described light source has quantity, the laser diode of the same type of in the 300-450nm wavelength coverage, working, described laser diode can be by these signal controlling of described signal source, the light transmitting fiber that the light signal of described laser diode is similarly n by quantity guides to the original screen panel in described photohead (9), and the light of described original screen panel output is directed to and is being suitable for described laser diode aspect the described wavelength coverage, focus lamp group (10) in described photohead (9).
2. exposure device according to claim 1 is characterized in that, described exposure device not only can be used for flat screen printing stencil manufacturing but also can be used for columniform screen printing stencil manufacturing.
3. exposure device according to claim 1 and 2 is characterized in that, uses the directly laser diode of modulation.
4. exposure device according to claim 3 is characterized in that, described laser diode by pulsed, greater than 30mW, be preferably more than in the energy range that equals 200mW and work, can make all commercial general masterplate material imagings.
5. exposure device according to claim 3 is characterized in that described laser diode is preferably worked in the blue light range of 405nm.
6. according to each described exposure device in the claim 1 to 5, it is characterized in that described exposure system is to be extendible aspect described laser diode n, applied in quantity.
7. according to each described exposure device in the claim 1 to 6, it is characterized in that described laser diode and described light transmitting fiber are set to be inserted in the radiating module (12) in the interface unit (11).
8. exposure device according to claim 7, it is characterized in that, described interface unit (11) with described module (12) is provided with in such a way, be that described interface unit does not move together along with described photohead (9) or is along with described photohead moves together, needing the quality of motion to remain on minimum as much as possible for exposure process at one on the essential direction of motion for the exposure masterplate material only.
9. exposure device according to claim 8 is characterized in that, the described interface unit (11) with described module (12) is arranged on the door frame arm (6) of the exposing unit that is configured to portal-framed structure.
10. according to each described exposure device in the claim 1 to 9, it is characterized in that, described original screen panel is a fiber array, and described fiber array holds described light transmitting fiber and makes described light transmitting fiber be parallel to the optical axis of described focus lamp group (10) in rectangle or trapezoidal grating is arranged.
11. exposure device according to claim 10, it is characterized in that, it is many light optical axis, described laser diode n, that be parallel to described focus lamp group (10) that described original screen panel in described grating is arranged provides quantity, wherein the light diameter of each bar light correspond essentially to described fibre-optic diameter and described focus lamp group (10) need to provide on the masterplate material of imaging described grating arranges dwindle or amplified images.
12. exposure device according to claim 11 is characterized in that, described focus lamp group (10) has autofocus device.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06405369.7A EP1892576B1 (en) | 2006-08-25 | 2006-08-25 | Exposure device for producing printing screen |
| EP06405369.7 | 2006-08-25 | ||
| PCT/CH2007/000419 WO2008022485A1 (en) | 2006-08-25 | 2007-08-23 | Exposure device for producing screen printing stencils |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101506738A true CN101506738A (en) | 2009-08-12 |
| CN101506738B CN101506738B (en) | 2011-08-10 |
Family
ID=37714290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007800315372A Expired - Fee Related CN101506738B (en) | 2006-08-25 | 2007-08-23 | Exposure device for the production of screen print stencils |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20080047445A1 (en) |
| EP (1) | EP1892576B1 (en) |
| CN (1) | CN101506738B (en) |
| DK (1) | DK1892576T3 (en) |
| WO (1) | WO2008022485A1 (en) |
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| CN106647185A (en) * | 2016-12-31 | 2017-05-10 | 江苏九迪激光装备科技有限公司 | Silk-screen printing direct platemaking system and platemaking method |
| CN111391475A (en) * | 2020-04-18 | 2020-07-10 | 杨林 | Linear flowing exposure device for printing screen printing plate |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8531648B2 (en) * | 2008-09-22 | 2013-09-10 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
| TWI448830B (en) | 2010-02-09 | 2014-08-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| WO2011104180A1 (en) | 2010-02-23 | 2011-09-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2360528A1 (en) | 2010-02-23 | 2011-08-24 | XPOSE Holding AG | Exposure device for producing print templates and use of same |
| US9041911B2 (en) | 2010-02-25 | 2015-05-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101537289B1 (en) | 2010-04-12 | 2015-07-16 | 에이에스엠엘 네델란즈 비.브이. | Substrate handling apparatus and lithographic apparatus |
| NL2007789A (en) | 2010-12-08 | 2012-06-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| NL2008329A (en) | 2011-03-29 | 2012-10-02 | Asml Netherlands Bv | Lithographic apparatus, method for measuring radiation beam spot position, device manufacturing method, and radiation detector system for a lithographic apparatus. |
| WO2012136434A2 (en) | 2011-04-08 | 2012-10-11 | Asml Netherlands B.V. | Lithographic apparatus, programmable patterning device and lithographic method |
| US9513561B2 (en) | 2011-04-21 | 2016-12-06 | Asml Netherlands B.V. | Lithographic apparatus, method for maintaining a lithographic apparatus and device manufacturing method |
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| NL2009342A (en) | 2011-10-31 | 2013-05-07 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
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| NL2009817A (en) | 2011-12-06 | 2013-06-10 | Asml Netherlands Bv | A lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method of calculating setpoint data and a computer program. |
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| NL2012052A (en) | 2013-01-29 | 2014-08-04 | Asml Netherlands Bv | A radiation modulator for a lithography apparatus, a lithography apparatus, a method of modulating radiation for use in lithography, and a device manufacturing method. |
| US9649837B2 (en) | 2013-03-15 | 2017-05-16 | M&R Printing Equipment, Inc. | Method and apparatus for preparing a screen printing screen |
| CN106647184B (en) * | 2016-12-31 | 2019-06-14 | 江苏九迪激光装备科技有限公司 | A kind of exposure method of write-through screen printing equipment |
| US10576733B2 (en) | 2017-02-14 | 2020-03-03 | M&R Printing Equipment, Inc. | Tuneable flat panel UV exposure system for screen printing |
| JP7118394B2 (en) * | 2018-01-31 | 2022-08-16 | ミタニマイクロニクス株式会社 | Screen mask manufacturing method |
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Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5580698A (en) * | 1988-05-05 | 1996-12-03 | Mografo A/S | Scanner system for successive irradiation of a working surface, particularly for ultra-violet exposure of a photo emulsion on a serigraphic printing frame |
| EP0770495B1 (en) * | 1995-10-24 | 2002-06-19 | Agfa-Gevaert | A method for making a lithographic printing plate involving on press development |
| CA2275625C (en) * | 1996-12-31 | 2007-01-16 | Claus Mayer | Method and apparatus for controlling a photomechanical exposure device |
| ATE256303T1 (en) * | 1998-04-29 | 2003-12-15 | Cst Gmbh | METHOD FOR PRODUCING SCREEN PRINTING FORMS AND AN EXPOSURE DEVICE THEREFOR |
| JP2002202442A (en) * | 2000-11-06 | 2002-07-19 | Fuji Photo Film Co Ltd | Coupling laser beam source and aligner |
| US20020192569A1 (en) * | 2001-05-15 | 2002-12-19 | The Chromaline Corporation | Devices and methods for exposure of photoreactive compositions with light emitting diodes |
| CA2453201A1 (en) * | 2001-07-11 | 2003-01-23 | 4109490 Canada Inc. | Imaging system utilizing light emitting diodes for preparation of print screens |
| US7033450B2 (en) * | 2002-10-17 | 2006-04-25 | Kodak Graphic Communications Canada Company | Flexographic printing method |
| TWI269125B (en) * | 2003-10-29 | 2006-12-21 | Fuji Photo Film Co Ltd | Image recording device and image recording method |
| US20060001849A1 (en) * | 2004-07-01 | 2006-01-05 | Ray Kevin B | Imaging a violet sensitive printing plate using multiple low power light sources |
-
2006
- 2006-08-25 DK DK06405369.7T patent/DK1892576T3/en active
- 2006-08-25 EP EP06405369.7A patent/EP1892576B1/en active Active
-
2007
- 2007-08-23 WO PCT/CH2007/000419 patent/WO2008022485A1/en active Application Filing
- 2007-08-23 CN CN2007800315372A patent/CN101506738B/en not_active Expired - Fee Related
- 2007-08-24 US US11/895,646 patent/US20080047445A1/en not_active Abandoned
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105954974A (en) * | 2016-06-27 | 2016-09-21 | 深圳劲嘉集团股份有限公司 | Silkscreen plate laser plate-making equipment and plate-making method thereof |
| CN106647185A (en) * | 2016-12-31 | 2017-05-10 | 江苏九迪激光装备科技有限公司 | Silk-screen printing direct platemaking system and platemaking method |
| CN111391475A (en) * | 2020-04-18 | 2020-07-10 | 杨林 | Linear flowing exposure device for printing screen printing plate |
Also Published As
| Publication number | Publication date |
|---|---|
| EP1892576A1 (en) | 2008-02-27 |
| EP1892576B1 (en) | 2013-06-12 |
| CN101506738B (en) | 2011-08-10 |
| WO2008022485A1 (en) | 2008-02-28 |
| DK1892576T3 (en) | 2013-09-16 |
| US20080047445A1 (en) | 2008-02-28 |
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