CN101484967B - 二维束密度量测的方法及其装置 - Google Patents

二维束密度量测的方法及其装置 Download PDF

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CN101484967B
CN101484967B CN2007800239218A CN200780023921A CN101484967B CN 101484967 B CN101484967 B CN 101484967B CN 2007800239218 A CN2007800239218 A CN 2007800239218A CN 200780023921 A CN200780023921 A CN 200780023921A CN 101484967 B CN101484967 B CN 101484967B
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bundle
sensor
ion beam
beam current
shade
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CN101484967A (zh
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阿塔尔·古普塔
约瑟·C·欧尔森
葛桔·A·洛里斯
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Varian Semiconductor Equipment Associates Inc
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Varian Semiconductor Equipment Associates Inc
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0437—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using masks, aperture plates, spatial light modulators, spatial filters, e.g. reflective filters
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G01J1/0448—Adjustable, e.g. focussing
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G01J1/4257—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to monitoring the characteristics of a beam, e.g. laser beam, headlamp beam
    • G01J2001/4261—Scan through beam in order to obtain a cross-sectional profile of the beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2446—Position sensitive detectors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
    • H01J2237/24514—Beam diagnostics including control of the parameter or property diagnosed
    • H01J2237/24542—Beam profile
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24571—Measurements of non-electric or non-magnetic variables
    • H01J2237/24578—Spatial variables, e.g. position, distance
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/31701—Ion implantation
    • H01J2237/31703—Dosimetry

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Manufacturing & Machinery (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Measurement Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
CN2007800239218A 2006-06-29 2007-06-06 二维束密度量测的方法及其装置 Active CN101484967B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/477,335 US7453070B2 (en) 2006-06-29 2006-06-29 Methods and apparatus for beam density measurement in two dimensions
US11/477,335 2006-06-29
PCT/US2007/013350 WO2008005137A2 (en) 2006-06-29 2007-06-06 Methods and apparatus for beam density measurement in two dimensions

Publications (2)

Publication Number Publication Date
CN101484967A CN101484967A (zh) 2009-07-15
CN101484967B true CN101484967B (zh) 2011-10-26

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CN2007800239218A Active CN101484967B (zh) 2006-06-29 2007-06-06 二维束密度量测的方法及其装置

Country Status (6)

Country Link
US (1) US7453070B2 (enExample)
JP (1) JP5397623B2 (enExample)
KR (1) KR101330039B1 (enExample)
CN (1) CN101484967B (enExample)
TW (1) TWI405956B (enExample)
WO (1) WO2008005137A2 (enExample)

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GB2427508B (en) * 2004-01-06 2008-06-25 Applied Materials Inc Ion beam monitoring arrangement
US7855361B2 (en) * 2008-05-30 2010-12-21 Varian, Inc. Detection of positive and negative ions
US20110291022A1 (en) * 2010-05-28 2011-12-01 Axcelis Technologies, Inc. Post Implant Wafer Heating Using Light
US20130299722A1 (en) * 2010-11-19 2013-11-14 Advanced Ion Beam Technology, Inc. Ion implantation method and ion implanter
US9711324B2 (en) 2012-05-31 2017-07-18 Axcelis Technologies, Inc. Inert atmospheric pressure pre-chill and post-heat
US9006692B2 (en) * 2013-05-03 2015-04-14 Varian Semiconductor Equipment Associates, Inc. Apparatus and techniques for controlling ion implantation uniformity
US20170005013A1 (en) * 2015-06-30 2017-01-05 Varian Semiconductor Equipment Associates, Inc. Workpiece Processing Technique
JP6489322B2 (ja) * 2016-04-28 2019-03-27 日新イオン機器株式会社 イオンビームエッチング装置
JP6982531B2 (ja) 2018-03-26 2021-12-17 住友重機械イオンテクノロジー株式会社 イオン注入装置および測定装置
US10520360B1 (en) * 2018-07-31 2019-12-31 Northrop Grumman Systems Corporation Automated power-in-the-bucket measurement apparatus for large aperture laser systems
CN111769030B (zh) * 2019-04-02 2024-10-01 北京中科信电子装备有限公司 一种束流竖直方向密度分布的测量装置及方法
CN110444458A (zh) * 2019-08-09 2019-11-12 德淮半导体有限公司 一种检测装置、离子植入设备及离子束剖面的离子浓度分布的可视化方法
US11598890B2 (en) * 2020-06-17 2023-03-07 Battelle Energy Alliance, Llc Ion beam profiling system and related methods
CN114388321B (zh) * 2022-03-24 2022-08-05 广州粤芯半导体技术有限公司 参数获取装置、方法、离子注入方法和半导体工艺设备
KR102441670B1 (ko) * 2022-04-20 2022-09-08 큐알티 주식회사 지능형 빔 세기 계산 시스템, 및 이의 계산 방법
US20240249908A1 (en) * 2023-01-25 2024-07-25 Applied Materials, Inc. Dose Cup Assembly for an Ion Implanter

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JPS5958380A (ja) * 1982-09-29 1984-04-04 Hitachi Ltd 荷電粒子線のビ−ム径及び電流密度測定法
JPH0232290A (ja) * 1988-07-22 1990-02-02 Nec Corp ファラデーケージ
JPH065661Y2 (ja) * 1989-05-02 1994-02-09 株式会社エリオニクス 電流密度分布測定装置
US5282121A (en) * 1991-04-30 1994-01-25 Vari-Lite, Inc. High intensity lighting projectors
JPH0594800A (ja) * 1991-10-03 1993-04-16 Nissin Electric Co Ltd イオンビームスポツト形状認識方法
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GB2427508B (en) * 2004-01-06 2008-06-25 Applied Materials Inc Ion beam monitoring arrangement
JP4179168B2 (ja) * 2004-01-06 2008-11-12 日新イオン機器株式会社 イオンビーム計測方法およびイオン注入装置
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Also Published As

Publication number Publication date
KR20090029273A (ko) 2009-03-20
JP5397623B2 (ja) 2014-01-22
TWI405956B (zh) 2013-08-21
WO2008005137A3 (en) 2008-05-15
JP2009543053A (ja) 2009-12-03
CN101484967A (zh) 2009-07-15
TW200801460A (en) 2008-01-01
KR101330039B1 (ko) 2013-11-15
US7453070B2 (en) 2008-11-18
US20080073550A1 (en) 2008-03-27
WO2008005137A2 (en) 2008-01-10

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