CN101447429A - 双扩散场效应晶体管制造方法 - Google Patents
双扩散场效应晶体管制造方法 Download PDFInfo
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- CN101447429A CN101447429A CNA200710094292XA CN200710094292A CN101447429A CN 101447429 A CN101447429 A CN 101447429A CN A200710094292X A CNA200710094292X A CN A200710094292XA CN 200710094292 A CN200710094292 A CN 200710094292A CN 101447429 A CN101447429 A CN 101447429A
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- diffusion field
- effect transistor
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- manufacturing
- double diffusion
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CN200710094292XA CN101447429B (zh) | 2007-11-27 | 2007-11-27 | 双扩散场效应晶体管制造方法 |
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CN200710094292XA CN101447429B (zh) | 2007-11-27 | 2007-11-27 | 双扩散场效应晶体管制造方法 |
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CN101447429A true CN101447429A (zh) | 2009-06-03 |
CN101447429B CN101447429B (zh) | 2012-07-11 |
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CN200710094292XA Active CN101447429B (zh) | 2007-11-27 | 2007-11-27 | 双扩散场效应晶体管制造方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN106847879A (zh) * | 2017-01-19 | 2017-06-13 | 北京世纪金光半导体有限公司 | 一种斜面沟道的SiC MOSFET器件及制备方法 |
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US5506421A (en) * | 1992-11-24 | 1996-04-09 | Cree Research, Inc. | Power MOSFET in silicon carbide |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106847879A (zh) * | 2017-01-19 | 2017-06-13 | 北京世纪金光半导体有限公司 | 一种斜面沟道的SiC MOSFET器件及制备方法 |
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CN101447429B (zh) | 2012-07-11 |
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Owner name: SHANGHAI HUAHONG GRACE SEMICONDUCTOR MANUFACTURING Free format text: FORMER OWNER: HUAHONG NEC ELECTRONICS CO LTD, SHANGHAI Effective date: 20140115 |
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Free format text: CORRECT: ADDRESS; FROM: 201206 PUDONG NEW AREA, SHANGHAI TO: 201203 PUDONG NEW AREA, SHANGHAI |
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Effective date of registration: 20140115 Address after: 201203 Shanghai city Zuchongzhi road Pudong New Area Zhangjiang hi tech Park No. 1399 Patentee after: Shanghai Huahong Grace Semiconductor Manufacturing Corporation Address before: 201206, Shanghai, Pudong New Area, Sichuan Road, No. 1188 Bridge Patentee before: Shanghai Huahong NEC Electronics Co., Ltd. |