CN101398626A - Photo resist supply device - Google Patents
Photo resist supply device Download PDFInfo
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- CN101398626A CN101398626A CNA2007100464913A CN200710046491A CN101398626A CN 101398626 A CN101398626 A CN 101398626A CN A2007100464913 A CNA2007100464913 A CN A2007100464913A CN 200710046491 A CN200710046491 A CN 200710046491A CN 101398626 A CN101398626 A CN 101398626A
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Abstract
A photoresist supply device comprises a storage vessel used for storing a photoresist, a first temporary storage vessel which is communicated with the storage vessel and used for temporarily storing the photoresist from the storage vessel, a second temporary storage vessel which is communicated with the first temporary storage vessel and used for temporarily storing the photoresist from the first temporary storage vessel, and a first sensor for detecting the state of the photoresist in the first temporary storage vessel, wherein, the detection position of the first sensor is higher than the highest position which can be reached by the photoresist refluxing from the second temporary storage vessel to the first temporary storage vessel. The photoresist supply device can avoid the false alarm of the sensor caused by air bubbles together with the photoresist refluxing to a transmission line under the monitoring of the sensor of the first temporary storage vessel, thus avoiding the impact on the efficiency and the quality of the photolithographic process.
Description
Technical field
The present invention relates to be used in the lithographic fabrication processes provide the photoresist feeding mechanism of photoresist.
Background technology
Photoetching process is one of most important technology in the present semiconductor fabrication process, just can realize the transfer of mask pattern to the practical devices figure by photoetching, thus the quality of photoetching about directly the quality of the final device that forms.
Present photoetching process comprises the following steps: gluing, exposure imaging and etching substantially.The purpose of coating technique is to set up thin and uniform photoresist film in wafer surface.Coating technique at present commonly used is to adopt the dynamically method of spraying, earlier wafer is placed on the plummer, and plummer is with low speed rotation then, this moment the photoresist nozzle with jet-coating photoresit in crystal column surface.The effect of low speed rotation is to help the initial diffusion of photoresist.Can reach uniform photoresist film with more a spot of photoresist in this way.After photoresist extended, plummer accelerated at a high speed, threw photoresist away and made the photoresist expansion, obtained final photoresist film.Described photoresist is generally photosensitive material, and can be to the light sensation light of particular range of wavelengths.When with the light time of resist exposure in specific wavelength, photoresist will sensitization and change its structural property, and photoresist is can sensitization solvable or sensitization is soluble usually.By with different photoresists and exposure light source combination, just can on photoresist, define component graphics.
Usually in order to guarantee the quality of photoetching process, all can there be a cover to be used for the photoresist feeding mechanism that supply light is carved glue.Described photoresist feeding mechanism is for example shown in Figure 1, generally include the storage container 1 that is used to store photoresist, be used for from storage container 1 bottom photoresist extracted pump 3, all link to each other between described pump 3 and the storage container 1 and between pump 3 and the nozzle 2 by transmission pipeline (among Fig. 1 sign) to nozzle 2.Comprise also in the pump 3 that wherein the photoresist that pump 3 is extracted filters to remove the filtrator 4 of impurity from storage container 1.In for example patent No. is to find more information about the photoresist feeding mechanism in 02158677.2 the Chinese patent.
Continue with reference to shown in Figure 1, when the photoresist initial provision, in the transmission pipeline of photoresist feeding mechanism air may residually be arranged, meeting influence photoetching process in the photoresist and air residues in, it is inhomogeneous for example may to cause photoresist to apply, and makes the final component graphics that forms twist.Thereby, existing photoresist feeding mechanism has also set gradually the first temporary container 5 and the second temporary container 6 that is used for temporary photoresist between storage container 1 and pump 3, the capacity of the described first temporary container 5 and the second temporary container 6 is all less than the capacity of storage container 1.The top of the described first temporary container 5 and the second temporary container 6 also is respectively equipped with gas and disengages mouthful (not identifying among the figure), when photoresist is kept in container 6 when nozzle 2 transmit from storage container 1 via the first temporary container 5 and second owing to the extraction of pump 3, air in the described transmission pipeline just can disengage a mouthful discharge by gas, thereby reduces the influence for photoetching process.
And, in order to prevent when the photoresist in the storage container 1 is evacuated, pump 3 still works on, photoresist entrance and exit at the first temporary container 5 is provided with inductor 51 and inductor 52 respectively, outer wall place at the second temporary container 6 is provided with inductor 61, respectively the transmission pipeline and the second temporary container 6 that connect the first temporary container 5 is monitored by described inductor.When described inductor finds that transmission pipeline or described temporary container are evacuated, will report to the police and the photoresist feeding mechanism is stopped.
Yet because pump 3 is not continuous drawing when extracting photoresist, therefore when pump 3 stopped to extract, photoresist just may produce tomography in transmission pipeline, thereby bubble occurs, and can cause false alarm.Such false alarm not only can have a strong impact on the efficient of photoetching process, and may the quality of photoetching process be exerted an influence.
Summary of the invention
The invention provides a kind of photoresist feeding mechanism, solving prior art photoresist feeding mechanism false alarm influences the efficient of photoetching process and the problem of quality.
For addressing the above problem, the invention provides a kind of photoresist feeding mechanism, comprise, be used to store the storage container of photoresist; Be communicated with described storage container, be used for the first temporary container of the photoresist of temporary storage container output; Be communicated with the described first temporary container, be used for the second temporary container of the photoresist of the temporary first temporary container output; And first inductor that is used for surveying the first temporary container photoresist state, wherein, the detecting location of described first inductor is higher than the extreme higher position that the photoresist that refluxes to the described first temporary container from the described second temporary container can arrive.
Optionally, the detecting location of described first inductor is positioned at the photoresist outlet of the first temporary container.
Optionally, the detecting location of described first inductor is positioned on the outer wall of the first temporary container.
Optionally, the correspondence position of the photoresist of described storage container outlet is connected with gas pipeline.
Optionally, the correspondence position of the photoresist outlet of the described first temporary container is provided with gas and disengages mouth.
Optionally, the correspondence position of the photoresist outlet of the described second temporary container is provided with gas and disengages mouth.
Optionally, also comprise second inductor that is used for surveying the second temporary container photoresist state.
Optionally, optionally, the detecting location of described second inductor is positioned at the photoresist outlet of the second temporary container.
Optionally, the detecting location of described second inductor is positioned on the outer wall of the second temporary container.
Compared with prior art, above-mentioned disclosed photoresist feeding mechanism has the following advantages: the detecting location that is used for first inductor of the first temporary container photoresist state of surveying in the above-mentioned disclosed photoresist feeding mechanism, be higher than the extreme higher position that the photoresist that refluxes to the described first temporary container from the described second temporary container can arrive, therefore cause the false alarm of inductor with regard to having avoided because bubble is back to the position that inductor surveys with photoresist, thereby avoided influencing the efficient and the quality of photoetching process.
Description of drawings
Fig. 1 is existing photoresist feeding mechanism synoptic diagram;
Fig. 2 is a kind of embodiment synoptic diagram of photoresist feeding mechanism of the present invention.
Embodiment
The detecting location that is used for first inductor of the first temporary container photoresist state of surveying in the photoresist feeding mechanism of the present invention, be higher than the extreme higher position that the photoresist that refluxes to the described first temporary container from the described second temporary container can arrive, therefore cause the false alarm of inductor with regard to having avoided because bubble is back to the position that inductor surveys with photoresist, thereby avoided influencing the efficient and the quality of photoetching process.
With reference to shown in Figure 2, a kind of embodiment of photoresist feeding mechanism of the present invention comprises:
Be used to store the storage container 10 of photoresist;
Be communicated with storage container 10, be used for the first temporary container 20 of the photoresist of temporary storage container 10 outputs;
Be communicated with the first temporary container 20, be used for the second temporary container 30 of the photoresist of temporary first temporary container 20 outputs;
Be communicated with the second temporary container 30, and the photoresist in the second temporary container 30 is extracted pump 40 to nozzle 50;
The nozzle 50 that is communicated with pump 40,
And the first inductor (not shown) that is used for surveying the first temporary container 20 photoresist states,
Wherein, the detecting location of described inductor is higher than the extreme higher position that the photoresist that refluxes to the described first temporary container from the described second temporary container can arrive.
The correspondence position of the photoresist outlet of described storage container 10 is connected with gas pipeline 11, and for example, if photoresist is exported from the bottom of described storage container 10, then gas pipeline 11 is connected in the top of storage container; If photoresist is from the top output of described storage container 10, then gas pipeline 11 is connected in the bottom of storage container.Details are as follows in the effect of described gas pipeline 11: one, when the photoresist feeding mechanism begins to supply photoresist, by described gas pipeline 11, nitrogen, inert gas or other are not fed with certain pressure with the gas that photoresist reacts, can make to be full of photoresist in the transmission pipeline of photoresist feeding mechanism, so that air that may be residual in the transmission pipeline is discharged; Its two, after the photoresist feeding mechanism is found bubble, feed above-mentioned pressed gas by described gas pipeline 11 and can also manually arrange bubble.The pressure of described feeding gas is 60-100kpa, for example 60kpa, 65kpa, 70kpa, 75kpa, 80kpa, 85kpa, 90kpa, 95kpa, 100kpa.
Be communicated with by transmission pipeline (not identifying among Fig. 2) between the described storage container 10 and the first temporary container 20, described transmission pipeline can be communicated with the described storage container 10 and the first temporary container 20 respectively by for example welding or riveted way.
After preventing that storage container 10 interior photoresists are evacuated, pump 40 still continues operation, also is provided with the storage inductor (not shown) in the photoresist feeding mechanism of present embodiment the photoresist state in the storage container 10 is surveyed.The detecting location of described storage inductor can be positioned on the transmission pipeline of the storage container 10 and the first temporary container 20, and for example the photoresist of the first temporary container 20 enters the mouth on the transmission pipeline at 22 places among Fig. 2, also can be positioned on the outer wall of storage container 10.Because light is different with aerial reflectivity in photoresist, described storage inductor just can judge whether to be evacuated according to the reflectivity to the outer wall emitted light of described transmission pipeline or described storage container 10.
The correspondence position of the photoresist outlet of the described first temporary container 20 is provided with gas and disengages mouth 21.The effect that described gas disengages mouth 21 is as far as possible little by the air content in the photoresist of nozzle 50 ejections at last in order to guarantee.In general, extract photoresist for convenience from the first temporary container 20, the entrance and exit of photoresist is arranged at the top and the bottom of the first temporary container 20 respectively, thereby gas disengages the top that mouth 21 is arranged at the first temporary container 20.When in the transmission pipeline during residual air, can be entered together by the extraction of pump 40 in the first temporary container 20 along with photoresist, and residual air just can disengage mouthful 21 discharges by gas because proportion is lighter.
Be communicated with by transmission pipeline (not indicating among Fig. 2) between the described first temporary container 20 and the second temporary container 30, described transmission pipeline can be communicated with the described first temporary container 20 and the second temporary container 30 respectively by for example welding or riveted way.
Described first inductor that is used for surveying the first temporary container 20 photoresist states is whether be used for surveying in the first temporary container 20 photoresists rarefied equally.The detecting location of described first inductor as previously mentioned, be higher than the extreme higher position that can reach from the photoresist of second temporary container 30 backflows.The detecting location of described first inductor can be positioned on the transmission pipeline of photoresist outlet of the first temporary container 20, and for example the photoresist of the first temporary container 20 exports the transmission pipeline at 23 places among Fig. 2, also can be positioned on the outer wall of the first temporary container 20.Described first inductor is according to just judging whether to be evacuated to the described transmission pipeline or described first reflectivity of keeping in the outer wall emitted light of container 20.
The correspondence position of the photoresist outlet of the described second temporary container 30 is provided with gas and disengages mouth 31, in general, from the second temporary container 30, extract photoresist for convenience, the entrance and exit of photoresist is arranged at the top and the bottom of the second temporary container 30 respectively, thereby gas disengages the top that mouth 31 is arranged at the second temporary container 30.When in the transmission pipeline during residual air, can enter the second temporary container 30 together along with the extraction and the photoresist of pump 40, and residual air just can disengage mouthful 31 discharges by gas because proportion is lighter.Described gas disengage mouthfuls 31 effect and gas disengage mouthfuls 21 identical, also be for the air content in the photoresist that guarantees at last to spray by nozzle 50 as far as possible little.
Be communicated with by transmission pipeline (not identifying among Fig. 2) between described second storage container 30 and the pump 40, described transmission pipeline can be communicated with described second storage container 30 and pump 40 respectively by for example welding or riveted way.
After preventing that the second temporary container 30 interior photoresists are evacuated, pump 40 still continues operation, and the photoresist feeding mechanism of present embodiment is provided with the second inductor (not shown) equally the photoresist states in the second temporary container 30 are surveyed.The detecting location of described second inductor can be positioned on the transmission pipeline of the second temporary container 30 and pump 40, and for example the photoresist of the second temporary container 30 exports on the transmission pipeline at 32 places among Fig. 2, also can be positioned on the outer wall of the second temporary container 30.Because light is different with aerial reflectivity in photoresist, described second inductor is according to just judging whether to be evacuated to the described transmission pipeline or described second reflectivity of keeping in the outer wall emitted light of container 30.
Described pump 40 exits are provided with gas and disengage mouth 41, described gas disengage mouthfuls 41 effect and above-mentioned gas disengage mouthfuls 21 and gas to disengage the effect of mouth 31 identical, be as far as possible little by the air content in the photoresist of nozzle 50 ejections at last equally, just repeated no more here in order to guarantee.
Also include filtrator 42 in the described pump 40, described filtrator 42 is used for the photoresist that pump 40 extracts is filtered, to remove the impurity in the photoresist.Described filtrator 42 is positioned at the bottom of pump 40, the filter medium of described filtrator 42 is generally selected nylon 66 or high density polyethylene (HDPE for use, HighDensity Polythene), described filtrator is selected the pore size filter that adapts for use according to the difference of the viscosity of filtration photoresist.
Be communicated with by transmission pipeline (not indicating among Fig. 2) between described pump 40 and the nozzle 50, described transmission pipeline can be communicated with described pump 40 and nozzle 50 respectively by for example welding or riveted way.
Can also be provided with valve 60 on the transmission pipeline that described pump 40 and nozzle are 50, the effect of described valve 60 is to carry out meticulous control for the photoresist flow, because for the more little component graphics of size, the supply of photoresist requires just strict more, and the inaccurate of supply of any small photoresist all can be caused adverse effect for the growth of component graphics.
Process with a supply photoresist is that example makes that above-mentioned photoresist device is clearer below.
As previously mentioned, when beginning is carried out photoetching for wafer, at first just need apply photoresist at crystal column surface.For a photoetching process, the composition of photoresist is also determined, therefore can deposit in advance in the storage container 10 to use through the photoresist of preparation.When beginning to supply photoresist, pump 40 starts the bottom that begins from storage container 10 and extracts photoresist.
As previously mentioned, the gas that do not react with photoresist of nitrogen, inert gas or other for example, can be at first feed in the storage containers 10, a part of photoresist is extruded from storage container 10, make to be full of photoresist in the transmission pipeline of photoresist feeding mechanism by gas pipeline 11.The pressure of described feeding gas is 60-100 kPa (kpa), for example 60kpa, 65kpa, 70kpa, 75kpa, 80kpa, 85kpa, 90kpa, 95kpa, 100kpa.
And next, photoresist can at first be extracted to from storage container 10 in the first temporary container 20.Because the described first temporary porch, container 20 top is provided with gas and disengages mouth 21, if in the transmission pipeline of 10 of the first temporary container 20 and storage containers, have air, when photoresist entered storage container 10, described air just can disengage mouthful 21 discharges by described gas so.And as previously mentioned, when preventing that photoresist is evacuated, pump 40 still continues operation, also has the detection of storage inductor on the transmission pipeline of the photoresist entry position of the first temporary container 20, and described storage inductor is the light-inductive device.When pump 40 startups begin to extract photoresist from storage container 10, storage inductor is also opened and send probing light in transmission pipeline, owing to have in the transmission pipeline or when not having photoresist, the reflectivity difference of light, thereby storage inductor just can have in the transmission pipeline or not have photoresist according to judging of the reflection ray that receives.
Along with the continuation operation of pump 40, photoresist can be extracted in the second temporary container 30 from the first temporary container 20 subsequently.But because pump 40 is not a continuous service, if at this moment, pump 40 stops to extract, and then the photoresist in the transmission pipeline just might produce tomography, thereby bubble occurs.And owing to the gravity reason, bubble just might be along with a part of photoresist refluxes to the first temporary container 20 from the second temporary container 30.Because the bore of transmission pipeline is less, when bubble was full of in transmission pipeline, first inductor just might think that bubble is that photoresist is found time and reported to the police by mistake.But, in the present embodiment, because the detecting location of first inductor that the transmission pipeline of 30 in the first temporary container 20 and the second temporary container is surveyed is higher than the extreme higher position that the photoresist that refluxes from the described second temporary container 30 can arrive, for example the photoresist of the temporary container 20 of first among Fig. 2 exports 23 places, even the photoresist backflow phenomenon takes place, reside in the bubble in the photoresist because the effect of gravity also there should be no return to the detecting location of described first inductor.Therefore, also having avoided first inductor is that false alarm takes place the rarefied situation of transmission pipeline owing to bubble is thought by mistake, has avoided false alarm to influence the efficient and the quality of photoetching process.
To above-mentioned structrual description, provide one below for example so that explanation is clearer, but be not to be used for foregoing description is limited.For example, the height on the detecting location relative reference plane of first inductor that the photoresist state of the first temporary container 20 is surveyed is 50cm, and the height on the peak relative reference plane of the transmission pipeline between the first temporary container 20 and the second temporary container 30 is 30cm, so owing to the reason of gravity, even photoresist takes place from the reflux course of the second temporary container 30 to the first temporary container 20, the photoresist that refluxes from the second temporary container 30 also can not reach described detecting location, thereby has avoided the false alarm of first inductor.
And after photoresist is extracted to the second temporary container 30, because being provided with gas equally, the porch of the described second temporary container 30 disengages mouth 31, if have air in the transmission pipeline that the first temporary container 20 and the second temporary container are 30, described air just can disengage mouthful 31 discharges by gas.And, be when preventing that photoresist from finding time equally, pump 40 still continues operation, and the detection of second inductor is also arranged at the outer wall of the outlet of the second temporary container 30 or the second temporary container 30.
Continuation is along with the operation of pump 40, and photoresist can be extracted in the pump 40 from the second temporary container 30.The porch of described pump 40 is provided with gas equally and disengages mouthfuls 41, if having air in the transmission pipeline of 40 of the second temporary container 30 and pumps, described air just can disengage mouthful 41 discharges by gas.After photoresist was extracted by pump 40, pump 40 can filter to remove impurity for photoresist by filtrator 42 wherein.The position of filtrator 42 is positioned at the bottom of pump 40, and the filter medium of described filtrator 42 is generally selected " nylon 66 " or high density polyethylene for use, and described filtrator is selected the pore size filter that adapts for use according to the difference of the viscosity of filtration photoresist.
After photoresist filters through the filtrator in the pump 40 42, be delivered to nozzle 50 by pump 40 again.Thereby the supply of described photoresist is by pump 40 controls, and for example when needing the photoresist of 1ul (microlitre), pump 40 will be delivered to the photoresist of 1ul nozzle 50.Further, because at present lithographic dimensioned is more and more littler, for the supply for photoresist is carried out stricter control, on the transmission pipeline of 50 at described pump 40 and nozzle, also be provided with valve 60, described valve 60 is by the control system (not shown) control of photoresist feeding mechanism, control system is determined the time that valve 60 is held open according to the supply of photoresist and the flow velocity of pump 40 output photoresists, when the photoresist of supply is enough, control system will be indicated valve closing, thereby carries out strict control for the supply of photoresist.For example, said process can be realized by following manner, is connected with relay between control system and the valve 60.When pump 40 during to nozzle 50 transmission photoresists, control system is just opened relay, and make valve 60 be switched on and open, and to the time timing of transmission.After the timing time of control system reached required time, control system can block system relay, thus valve 60 close, thereby also end to the process of nozzle 50 transmission photoresists.
When nozzle 50 received the photoresist of pump 40 transmission, described photoresist just can be coated in crystal column surface by nozzle 50 ejections.
In sum, the detecting location that is used for first inductor of the first temporary container photoresist state of surveying in the above-mentioned disclosed photoresist feeding mechanism, be higher than the extreme higher position that the photoresist that refluxes to the described first temporary container from the described second temporary container can arrive, therefore cause the false alarm of inductor with regard to having avoided because bubble is back to the position that inductor surveys with photoresist, thereby avoided influencing the efficient and the quality of photoetching process.
Though the present invention discloses as above with preferred embodiment, the present invention is defined in this.Any those skilled in the art without departing from the spirit and scope of the present invention, all can do various changes and modification, so protection scope of the present invention should be as the criterion with claim institute restricted portion.
Claims (9)
1. a photoresist feeding mechanism comprises: the storage container that is used to store photoresist; Be communicated with described storage container, be used for the first temporary container of the photoresist of temporary storage container output; Be communicated with the described first temporary container, be used for the second temporary container of the photoresist of the temporary first temporary container output; And first inductor that is used for surveying the first temporary container photoresist state, it is characterized in that the detecting location of described first inductor is higher than the extreme higher position that the photoresist that refluxes to the described first temporary container from the described second temporary container can arrive.
2. photoresist feeding mechanism as claimed in claim 1 is characterized in that, the detecting location of described first inductor is positioned at the photoresist outlet of the first temporary container.
3. photoresist feeding mechanism as claimed in claim 1 is characterized in that, the detecting location of described first inductor is positioned on the outer wall of the first temporary container.
4. photoresist feeding mechanism as claimed in claim 1 is characterized in that, the correspondence position of the photoresist outlet of described storage container is connected with gas pipeline.
5. photoresist feeding mechanism as claimed in claim 1 is characterized in that, the correspondence position of the photoresist outlet of the described first temporary container is provided with gas and disengages mouth.
6. photoresist feeding mechanism as claimed in claim 1 is characterized in that, the correspondence position of the photoresist outlet of the described second temporary container is provided with gas and disengages mouth.
7. photoresist feeding mechanism as claimed in claim 1 is characterized in that, also comprises second inductor that is used for surveying the second temporary container photoresist state.
8. photoresist feeding mechanism as claimed in claim 7 is characterized in that, the detecting location of described second inductor is positioned at the photoresist outlet of the second temporary container.
9. photoresist feeding mechanism as claimed in claim 7 is characterized in that, the detecting location of described second inductor is positioned on the outer wall of the second temporary container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007100464913A CN101398626B (en) | 2007-09-26 | 2007-09-26 | Photo resist supply device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2007100464913A CN101398626B (en) | 2007-09-26 | 2007-09-26 | Photo resist supply device |
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| Publication Number | Publication Date |
|---|---|
| CN101398626A true CN101398626A (en) | 2009-04-01 |
| CN101398626B CN101398626B (en) | 2011-08-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100464913A Expired - Fee Related CN101398626B (en) | 2007-09-26 | 2007-09-26 | Photo resist supply device |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955362A (en) * | 2011-08-23 | 2013-03-06 | 和舰科技(苏州)有限公司 | Novel photo-resistive buffer tank |
| CN105314250A (en) * | 2014-05-30 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Fixing and weighing device for photoresist bottle |
| CN106990674A (en) * | 2017-05-23 | 2017-07-28 | 上海华力微电子有限公司 | A kind of photoresist feeding mechanism |
| CN107121897A (en) * | 2017-05-25 | 2017-09-01 | 上海华力微电子有限公司 | A kind of photoresist circuit design |
| CN107899781A (en) * | 2017-11-16 | 2018-04-13 | 上海华力微电子有限公司 | A kind of new real time monitoring jet-coating photoresit system and method for work |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5871028A (en) * | 1996-08-06 | 1999-02-16 | United Microelectronics Corporation | Photoresist solution storage and supply device |
| CN1484024A (en) * | 2002-09-19 | 2004-03-24 | 旺宏电子股份有限公司 | Pipeline bubble monitoring device for photoresist material |
| JP4704228B2 (en) * | 2005-09-06 | 2011-06-15 | 東京応化工業株式会社 | Resist solution supply device and remodeling kit for obtaining the resist solution supply device |
-
2007
- 2007-09-26 CN CN2007100464913A patent/CN101398626B/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102955362A (en) * | 2011-08-23 | 2013-03-06 | 和舰科技(苏州)有限公司 | Novel photo-resistive buffer tank |
| CN105314250A (en) * | 2014-05-30 | 2016-02-10 | 盛美半导体设备（上海）有限公司 | Fixing and weighing device for photoresist bottle |
| CN106990674A (en) * | 2017-05-23 | 2017-07-28 | 上海华力微电子有限公司 | A kind of photoresist feeding mechanism |
| CN107121897A (en) * | 2017-05-25 | 2017-09-01 | 上海华力微电子有限公司 | A kind of photoresist circuit design |
| CN107899781A (en) * | 2017-11-16 | 2018-04-13 | 上海华力微电子有限公司 | A kind of new real time monitoring jet-coating photoresit system and method for work |
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| Publication number | Publication date |
|---|---|
| CN101398626B (en) | 2011-08-17 |
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