CN101398127A - Purge gas supply system and gas removal method - Google Patents
Purge gas supply system and gas removal method Download PDFInfo
- Publication number
- CN101398127A CN101398127A CNA2007101619733A CN200710161973A CN101398127A CN 101398127 A CN101398127 A CN 101398127A CN A2007101619733 A CNA2007101619733 A CN A2007101619733A CN 200710161973 A CN200710161973 A CN 200710161973A CN 101398127 A CN101398127 A CN 101398127A
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- CN
- China
- Prior art keywords
- gas
- gas supply
- supply system
- dashpot
- pipeline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 59
- 238000010926 purge Methods 0.000 title description 3
- 230000008569 process Effects 0.000 claims abstract description 45
- 230000008859 change Effects 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 228
- 238000010438 heat treatment Methods 0.000 claims description 26
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims description 11
- 229910052757 nitrogen Inorganic materials 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 claims description 8
- 239000000460 chlorine Substances 0.000 claims description 7
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 5
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 230000004083 survival effect Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 206010067484 Adverse reaction Diseases 0.000 description 1
- 230000006838 adverse reaction Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000011017 operating method Methods 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/34—Hydrogen distribution
Landscapes
- Filling Or Discharging Of Gas Storage Vessels (AREA)
Abstract
The invention provides a freeing gas supply system and a gas freeing method. The freeing gas supply system is applicable for being connected to a process gas supply system. The freeing gas supply system comprises a gas supply source, a buffer slot, a first gas transmission pipeline and a controller. The gas supply source is used for supplying the freeing gas. The buffer slot is connected with the gas supply source to change the temperature of the freeing gas which goes through the buffer slot. The first gas transmission pipeline is connected with the gas supply source and the buffer slot. And the controller is connected with the buffer slot to regulate the temperature of the buffer slot.
Description
Technical field
The present invention relates to a kind of fluid feed system and sweep-out method, and especially, relate to a kind of removing gas (purge gas) supply system and gas clean-up method.
Background technique
In semiconductor technology, almost each manufacturing equipment all needs various gas to participate in the carrying out of technology.So semi-conductive manufacturing equipment all needs other gas delivery processing system to transmit needed process gas (processing gas).And the planning of gas delivery system also along with the characteristic between various gas with various, and has simple to very complicated design.
Generally speaking, gas delivery system is to be used for the process gas that equipment is required through pipeline and various accessory, and is fed in the equipment.And the needed various process gass of semiconductor technology are normally supplied by the gas cylinder (gas cylinder) that leaves in the gas storage cabinet.During gas cylinder in changing gas storage cabinet, also residual in the pipeline of gas cylinder process gas arranged, cause easily in the residual process gas inflow working environment if connect.Therefore, before changing gas cylinder, can use usually and remove the transfer line that nitrogen (purge nitrogen) comes cleaning procedure gas, so that the process gas in the pipeline is got rid of.
Yet the removing nitrogen under general normal temperature (approximately between between 20 ℃ to 24 ℃) state is for as hydrogen bromide (HBr) or chlorine (Cl
2) etc. the removing effect of the higher process gas of viscosity extremely limited.And in the pipeline of not cleaning out fully, remaining process gas or drop react with aqueous vapor easily, generate hydrogen cloride adverse reaction things such as (HCl), and the safety that causes the valve member corrosion and damage and endanger operator.
Summary of the invention
The invention provides a kind of removing gas supply system, heated nitrogen can be provided, with process gas or drop residual in effective removing pipeline.
The present invention also provides a kind of gas clean-up method, can help thoroughly to remove the survival in the pipeline, to reduce the use amount of removing gas.
The present invention proposes a kind of removing gas supply system, is suitable for being connected to the process gas supply system.This removes gas supply system and comprises gas supply source, dashpot, first gas delivery pipeline and the controller.Gas supply source is used to provide removing gas.Dashpot connects gas supply source, in order to change the temperature by the removing gas of dashpot.The first gas delivery pipeline connects gas supply source and dashpot.Controller connects dashpot, in order to the temperature of regulation and control dashpot.
In an embodiment of the present invention, above-mentioned dashpot comprises heating equipment, with the removing gas of heating by dashpot.
In an embodiment of the present invention, above-mentioned controller for example connects heating equipment.
In an embodiment of the present invention, the temperature after the above-mentioned removing gas heating is between 35 ℃ to 40 ℃.
In an embodiment of the present invention, also comprise the second gas delivery pipeline, connect dashpot and process gas supply system, in order to will remove gas delivery to the process gas supply system.
In an embodiment of the present invention, above-mentioned removing gas for example is nitrogen.
In an embodiment of the present invention, the gas that provided of above-mentioned process gas supply system for example is high viscosity gas.
In an embodiment of the present invention, above-mentioned high viscosity gas for example is hydrogen bromide.
In an embodiment of the present invention, above-mentioned high viscosity gas for example is chlorine.
The present invention also proposes a kind of gas clean-up method, is suitable for cleaning the high viscosity process gas in the pipeline.At first, gas is removed in heating.Then, will through the heating the removing gas delivery to pipeline.Afterwards, discharge removing gas.
In an embodiment of the present invention, gas is removed in above-mentioned heating, makes the temperature of removing gas between 35 ℃ to 40 ℃.
In an embodiment of the present invention, above-mentioned removing gas for example is inert gas (inert gas).
In an embodiment of the present invention, above-mentioned removing gas for example is nitrogen.
In an embodiment of the present invention, above-mentioned high viscosity process gas for example is a hydrogen bromide.
In an embodiment of the present invention, above-mentioned high viscosity process gas for example is a chlorine.
The present invention removes gas supply system because of disposing heatable dashpot and regulation and control dashpot temperature controlling device, therefore, aqueous vapor and remaining process gas or drop can easily be eliminated in the pipeline, and then increase the working life of valve member and improve safety of operators.
In addition, gas clean-up method of the present invention can be removed the survival of high viscosity gas in the pipeline effectively, therefore can reduce the number of times of removing pipeline, reduces the use amount of removing gas, avoids the increase of technology cost.
For above-mentioned feature and advantage of the present invention can be become apparent, preferred embodiment cited below particularly, and cooperate appended graphicly, be described in detail below.
Description of drawings
Fig. 1 is the configuration schematic diagram according to the removing gas supply system of one embodiment of the invention.
Fig. 2 is the flow chart of steps according to the gas clean-up method of one embodiment of the invention.
[main description of reference numerals]
100: remove gas supply system
110,210: gas supply source
120: dashpot
130: controller
140,142,240a, 240b, 240c, 240d, 240e: gas delivery pipeline
144,146,242a, 242b, 242c, 242d: valve member
200: the process gas supply system
220: using end
230: air extractor
244: pipeline
S300, S310, S320: step
Embodiment
Fig. 1 is the configuration schematic diagram according to the removing gas supply system of one embodiment of the invention.
Please refer to Fig. 1, removing gas supply system 100 for example is to be suitable for being connected to process gas supply system 200.The process gas that process gas supply system 200 is provided for example is high viscosity gas, and it can be hydrogen bromide or chlorine.In the present embodiment, be to be that example describes, yet it is not limited to this with the high viscosity gas that removing gas supply system 100 of the present invention is applied in the cleaning procedure gas supply system 200.Certainly, the present invention also can be applicable in other proper domain except using semiconductor manufacturing equipment, and the present invention does not do special qualification in this.
Remove gas supply system 100 and comprise gas supply source 110, dashpot 120, controller 130, gas delivery pipeline 140 and gas delivery pipeline 142.Dashpot 120 for example is to connect gas supply source 110.Controller 130 for example is to be coupled to dashpot 120.
In addition, controller 130 for example is coupled to the heating equipment in the dashpot 120.Operator can set a heating-up temperature at controller 130, with the heating state of regulation and control dashpot 120.In the present embodiment, controller 130 can be proportional plus integral plus derivative controller (proportional-integral-derivative, PID).
What specify is, removing gas delivery to the pipeline of process gas feeding unit 200, removes the dashpot 120 of gas by heating by making, and can improve the temperature of removing gas.Along with removing increasing of gas temperature, aqueous vapor can reduce, its viscosity can reduce and vapour tension can raise and easier gasification.Therefore, use the pipeline of the removing gas cleaning procedure gas supply unit 200 after the heating, can help to allow aqueous vapor and remaining easier being excluded of drop.
Next, will go on to say gas clean-up method of the present invention.
Fig. 2 is the flow chart of steps according to the gas clean-up method of one embodiment of the invention.For gas clean-up method of the present invention is described in detail in detail, below will utilize above-mentioned Fig. 1 to illustrate operating method when removing gas supply system 100 and be applied to cleaning procedure gas supply system 200.Certainly, the following description is to be used for the present invention is described in detail in detail so that those skilled in the art can implement according to this, but is not in order to limit scope of the present invention.
Please be simultaneously with reference to Fig. 1 and Fig. 2, process gas supply system 200 comprises gas supply source 210, using end 220 and gas delivery pipeline 240a, 240b, 240c, 240d, 240e.Gas supply source 210 is used to provide the required gas of technology.Gas supply source 210 for example is that the form with gas cylinder is configured in the gas storage cabinet.The function of gas delivery pipeline 240a, 240b, 240c, 240d, 240e is to be used for the process gas that gas supply source 210 is supplied is sent to using end 220.Gas delivery pipeline 240b for example is that intersection is connected with the two ends of gas delivery pipeline 240c, and its intersection joint is connected to gas delivery pipeline 240a, 240d respectively.On gas delivery pipeline 240b, 240d, be respectively arranged with valve member 242b, 242d.Confluce at gas delivery pipeline 146,240a, 240e for example is provided with valve member 242a.Confluce at gas delivery pipeline 240b, 240c, 240d for example is provided with valve member 242c.Above-mentioned valve member is for example as the control switch of gas delivery pipeline 240a, 240b, 240c, 240d, 240e.In this embodiment, valve member 242a, 242c are reduction valve.
In addition, process gas supply system 200 for example is connected to air extractor 230.Air extractor 230 is used for producing required degree of vacuum when removing pipeline.Air extractor 230 for example is connected to gas delivery pipeline 240b by pipeline 244, and both intersection joints are between valve member 242b and valve member 242c.
Before will changing gas supply source 210, residual in the pipeline have a process gas, then must be earlier provide and remove gas the process gas in the pipeline is removed to remove gas supply system 100.At first, step S300, operator can set heating-up temperature at the controller in removing gas supply system 100 130, with the removing gas of heating by dashpot 120.The temperature of the removing gas through heating is for example between 35 ℃ to 40 ℃.
Continue it, stop gas supply source 210 supply process gass, that is close the switch valve of process gas steel cylinder.Then, open valve member 146, and allow valve member 242a, 242c be in opening state, and make valve member 242b, 242d be in closed condition simultaneously.At this moment, the removing gas through heating can flow into and gassy transfer line 240a, 240c, 240e and portion gas transfer line 240b, 240d (step S310) by self-cleaning gas supply system 100.Make remove gas and in above-mentioned pipeline, continue to stay for some time and make its stable reaction after, Shut-off fitting 146, and open air extractor 230 and will remove gas discharge (step S320).
What specify is for all pipelines that make process gas supply system 200 can both thoroughly be cleaned, therefore can optionally repeat step S310 to step S320.
Afterwards, make valve member 242a, 242b, 242c be in opening state, and make valve member 146,242d be in closed condition, and open air extractor 230 and will detach at gas transmission line 242a, 242b between gas supply source 210 and the using end 220, the gas in 242c, the 242e, and in above-mentioned pipeline the state of formation negative pressure.
Then, open valve member 146, make and remove gas transmission line 242a, 242b, 242c, the 242e (step S310) that gas pours into previous formation negative pressure.Afterwards, Shut-off fitting 146 again, and unlatching air extractor 230 detaches the removing gas (step S320) in gas transmission line 242a, 242b, 242c, the 242e.Then, hocket constantly in the gas delivery pipeline, to pour into and remove gas and will remove the circulation step several that gas detaches.Thus, can be by repeatedly using removing gas to take away gas transmission line 242a, the 242b between gas supply source 210 and using end 220, the residue in 242c, the 242e through heating.When changing the gas cylinder of gas supply source 210, can avoid the interior residue of gas delivery pipeline to influence operator's safety.
In sum, the present invention has following advantage at least:
The removing gas of heating can be removed high viscosity process gas or drop remaining in the pipeline cleaner.
The survival of getting rid of effectively in the pipeline helps to reduce the exhaust cycle number of times of removing gas, reduces the use amount of removing gas, therefore can save the technology cost.
Do not have the common reactant that generates of residual process gas or itself and aqueous vapor in the pipeline, so the situation of valve member corrosion and damage can be improved in the gas delivery system, and then prolong the working life of valve member.
When changing the process gas steel cylinder, can avoid the residue in the pipeline to spread in the working environment, and further promote the operator's that change gas cylinder safety.
Though the present invention discloses as above with preferred embodiment; right its is not in order to limit the present invention; any those of ordinary skills without departing from the spirit and scope of the present invention; when can doing a little change and retouching, so protection scope of the present invention is as the criterion when looking the accompanying Claim book person of defining.
Claims (15)
1. remove gas supply system for one kind, be suitable for being connected to the process gas supply system, comprising:
Gas supply source is in order to provide removing gas;
Dashpot connects this gas supply source, in order to change the temperature by this removing gas of this dashpot;
The first gas delivery pipeline connects this gas supply source and this dashpot; And
Controller connects this dashpot, in order to regulate and control the temperature of this dashpot.
2. removing gas supply system as claimed in claim 1, wherein this dashpot comprises heating equipment, with heating this removing gas by this dashpot.
3. removing gas supply system as claimed in claim 2, wherein this controller connects this heating equipment.
4. removing gas supply system as claimed in claim 2, wherein the temperature after this removing gas heating is between 35 ℃ to 40 ℃.
5. removing gas supply system as claimed in claim 1 also comprises the second gas delivery pipeline, connects this dashpot and this process gas supply system, in order to should remove gas delivery to this process gas supply system.
6. removing gas supply system as claimed in claim 1, wherein this removing gas comprises nitrogen.
7. removing gas supply system as claimed in claim 1, wherein the gas that provided of this process gas supply system comprises high viscosity gas.
8. removing gas supply system as claimed in claim 7, wherein this high viscosity gas comprises hydrogen bromide.
9. removing gas supply system as claimed in claim 7, wherein this high viscosity gas comprises chlorine.
10. a gas clean-up method is suitable for cleaning the high viscosity process gas in the pipeline, comprising:
Gas is removed in heating;
To remove gas delivery to this pipeline through this of heating; And
Discharge this removing gas.
11. removing gas supply system as claimed in claim 10 wherein heats this removing gas, the temperature that makes this removing gas is between 35 ℃ to 40 ℃.
12. removing gas supply system as claimed in claim 10, wherein this removing gas comprises inert gas.
13. removing gas supply system as claimed in claim 12, wherein this removing gas comprises nitrogen.
14. removing gas supply system as claimed in claim 10, wherein this high viscosity process gas comprises hydrogen bromide.
15. removing gas supply system as claimed in claim 10, wherein this high viscosity process gas comprises chlorine.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CNA2007101619733A CN101398127A (en) | 2007-09-27 | 2007-09-27 | Purge gas supply system and gas removal method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CNA2007101619733A CN101398127A (en) | 2007-09-27 | 2007-09-27 | Purge gas supply system and gas removal method |
Publications (1)
Publication Number | Publication Date |
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CN101398127A true CN101398127A (en) | 2009-04-01 |
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CNA2007101619733A Pending CN101398127A (en) | 2007-09-27 | 2007-09-27 | Purge gas supply system and gas removal method |
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Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN102352957A (en) * | 2011-10-13 | 2012-02-15 | 周平 | Electronic grade ultra pure ammonia automatic filling device and method |
CN102374381A (en) * | 2010-08-23 | 2012-03-14 | 无锡华润上华半导体有限公司 | Blowing gas backflow-preventing gas holder device and method for preventing blowing gas backflow |
CN106764436A (en) * | 2016-12-15 | 2017-05-31 | 武汉新芯集成电路制造有限公司 | A kind of special gas distributor box and its part exchanging method |
CN107002253A (en) * | 2015-03-17 | 2017-08-01 | 昭和电工株式会社 | The corrosion method of metal member |
CN108405501A (en) * | 2018-06-06 | 2018-08-17 | 上海正帆科技股份有限公司 | Blowing pipeline device and process gas convey cleaning systems |
CN111650405A (en) * | 2019-03-04 | 2020-09-11 | 东京毅力科创株式会社 | Cleaning method in inspection apparatus and inspection apparatus |
-
2007
- 2007-09-27 CN CNA2007101619733A patent/CN101398127A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102374381A (en) * | 2010-08-23 | 2012-03-14 | 无锡华润上华半导体有限公司 | Blowing gas backflow-preventing gas holder device and method for preventing blowing gas backflow |
CN102374381B (en) * | 2010-08-23 | 2013-09-18 | 无锡华润上华半导体有限公司 | Blowing gas backflow-preventing gas holder device and method for preventing blowing gas backflow |
CN102352957A (en) * | 2011-10-13 | 2012-02-15 | 周平 | Electronic grade ultra pure ammonia automatic filling device and method |
CN102352957B (en) * | 2011-10-13 | 2013-11-20 | 周平 | Electronic grade ultra pure ammonia automatic filling device and method |
CN107002253A (en) * | 2015-03-17 | 2017-08-01 | 昭和电工株式会社 | The corrosion method of metal member |
JPWO2016147605A1 (en) * | 2015-03-17 | 2017-12-28 | 昭和電工株式会社 | Method for reducing corrosion of metal parts |
CN106764436A (en) * | 2016-12-15 | 2017-05-31 | 武汉新芯集成电路制造有限公司 | A kind of special gas distributor box and its part exchanging method |
CN106764436B (en) * | 2016-12-15 | 2018-09-07 | 武汉新芯集成电路制造有限公司 | A kind of spy's gas distributor box and its part exchanging method |
CN108405501A (en) * | 2018-06-06 | 2018-08-17 | 上海正帆科技股份有限公司 | Blowing pipeline device and process gas convey cleaning systems |
CN111650405A (en) * | 2019-03-04 | 2020-09-11 | 东京毅力科创株式会社 | Cleaning method in inspection apparatus and inspection apparatus |
CN111650405B (en) * | 2019-03-04 | 2023-04-28 | 东京毅力科创株式会社 | Cleaning method in inspection device and inspection device |
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Open date: 20090401 |