CN101369155A - Locking control method and system of large-stroke nanometer displacement positioning macro-movement bench - Google Patents
Locking control method and system of large-stroke nanometer displacement positioning macro-movement bench Download PDFInfo
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- CN101369155A CN101369155A CNA2008100406414A CN200810040641A CN101369155A CN 101369155 A CN101369155 A CN 101369155A CN A2008100406414 A CNA2008100406414 A CN A2008100406414A CN 200810040641 A CN200810040641 A CN 200810040641A CN 101369155 A CN101369155 A CN 101369155A
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Abstract
The invention relates to a locking control method of a large-travel nano-displacement and positioning macro-motion table as well as a system thereof. The method comprises the operating steps: (1) a communication interface of a computer (upper computer ) sends an instruction for controlling, firstly, a macro-positioning system is started up to drive the macro-motion table and a micro-motion worktable to move together, and the macro-positioning is finished when the detected positioning error is smaller than the switching threshold value; (2) the computer controls and locks the macro-motion worktable, and is switched to a micro-positioning system dynamically in the meanwhile; and (3) the micro-positioning system controls the micro-motion worktable to further reach the target location required by the system and complete the positioning. The system mainly comprises: the macro-motion table and the micro-motion worktable as well as corresponding driving systems; a grating feedback system; a PMAC controller; a laser interferometer calibration system; a computer system; and a vibration isolation and noise elimination device (an air floatation vibration isolation platform) and the like. The hardware structure of the existing system is configured (a piezoelectric ceramic driving device) by adopting the method as required, when the macro-motion table meets the positioning requirements and stops the movement, piezoelectric ceramics lock the table, thereby improving the positioning accuracy of the system.
Description
Technical field
The present invention relates to a kind of precision positioning technology, is one of MEMS gordian technique, at grand moving platform position stability problem in the nanometer scale precision positioning technology, proposes a kind of large-stroke nanometer displacement position control method and system.
Background technology
Nanometer technology is 21 century one of the most promising new branch of science.Its development is very swift and violent, and has started hi-tech groups such as nanoelectronics, nanomaterial science, nanobiology, nanomechanics, nanometer technology, nanometer micrology and nano measurement thus.Nanometer science and technology may be defined as the engineering science on 0.1～100nm metric space (molecule and atomic level) in a broad sense, and it is the forward position of 21 century scientific technological advance, will cause the important breakthrough of human knowledge and reforming world ability.In October, 1999 is in " the theoretical and instrument symposial of metrology and measurement geared to the 21st century " that China holds, brainstrust is just thought: nanoscale is measured the focus that has become current fields of measurement, at the theory and technology of generation, transmission and the demarcation that will continue to resolve nanoscale new century.Along with the continuous exploration of people to nano science, the nanometer positioning technology has been widely used in many subjects and field, and the rise of particularly contemporary Ultraprecision Machining, nanometer technology, MEMS (micro electro mechanical system) etc. has proposed more and more higher requirement with the measurement that develops the length amount.As at microelectronic, typical live width in 1999 is 180nm, is 100nm to typical live widths in 2006, and typical live width in 2009 will be 70nm, and bearing accuracy should be 1/3～1/4 of live width; In the medical science field, the ultra-thin section on the medical surgery is cut the thick 100 ± 5nm of being; At bioengineering field, the yardstick of DNA is in 2～3nm scope etc.Therefore, the nanometer positioning technology has important use in superfinishing, microelectronic engineering, bioengineering, field of nanometer technology.Along with the continuous development of science and technology, using will be more and more widely, and it will be in aspects such as manufacturing industry, aerospace industry, national defense and military industry and modern medical service performance great potential.And will realize these nanoscale processing and measure the ultraprecise positioning instant nanometer positioning technology that all be unable to do without.
Relevant precise positioning work table is to adopt grand little two-stage controlling and driving mostly both at home and abroad, and bearing accuracy and resolution have carried out the transition to micron order, entered into present nanoscale from submicron order from the millimeter level in past.But when grand moving platform was finished grand motion, though compensate, grand moving platform still had small vibration, and for high-accuracy position system, its influence is very important.At present, substantially all be by studying grand moving platform self-characteristic, start with internally and take indemnifying measure, not retrieving a kind of device that grand moving worktable outside is locked as yet.
Summary of the invention
The objective of the invention is to deficiency at the prior art existence, a kind of large-stroke nanometer displacement positioning macro-movement bench locking control method and system are proposed, based on the grand two-stage drive locating platform of existing nanometer scale, adopt method and system provided by the invention, the existing system hardware configuration is configured improvement (piezoelectric ceramics locking device), by grand location, the grand moving platform of locking, dynamically switch to micropositioner and carry out micrometric displacement compensation, realize the aims of systems position, finish the location.
For achieving the above object, design of the present invention is:
◆ grand location is finished in grand moving platform motion
Grand positioning system is to be used for realizing big stroke location, at first control grand moving platform and move according to preestablishing by the PMAC controller, simultaneously, the metal grating chi of grand moving platform side can also feed back to controller with it in continuous detection and location position in real time, when detected positioning error during, finish grand location less than switching threshold.
◆ lock grand moving platform, finish dynamic switching
When the detected grand moving platform positioning error of controller during less than switching threshold, amplify driving voltage after-applied through amplifier to the piezoelectric ceramics gearing, make piezoelectric ceramics produce displacement immediately and withstand guide rail reducing the gap, thereby grand moving platform is realized locking by the spring that is in contact with it.Simultaneously, PC control dynamically switches to the micropositioner compensate for displacement.
◆ micropositioner carries out the micrometric displacement compensation, reaches system's localizing objects
After dynamically switching to the microposition system by PC control, the micro displacement workbench that is installed on the grand moving platform carries out the micrometric displacement compensation, carry out position feedback to realize the local closed loop of microposition control by micropositioner internal inductance dial gauge, in addition, the micropositioner side is equipped with grating measuring device and is fed back the position location in real time to the PMAC card, in addition, the catoptron that is equipped with on micropositioner is used to realize the positioning error measurement of laser interferometer, thereby realizes grand, little two-stage location.
According to the foregoing invention design, the present invention adopts following technical proposals:
A kind of large-stroke nanometer displacement positioning macro-movement bench locking control method is characterized in that the concrete operations step is as follows:
A. the communication interface of host computer is sent to instruct and is controlled, and at first makes grand positioning system work, and grand moving worktable is realized grand location;
B. lock grand moving worktable by PC control, dynamically switch to the microposition system simultaneously;
C. carry out the target location that micrometric displacement compensated and then reached system requirements by microposition system control micro displacement workbench, finish the location.
Grand moving worktable among the above-mentioned steps a realizes that the method for grand location is: at first control grand moving movable workbench by the PMAC controller according to preestablishing, simultaneously, the metal grating chi of grand moving platform side can also feed back to controller with it in continuous detection and location position in real time, when detected positioning error during, finish grand location less than switching threshold.
The PC control of passing through among the above-mentioned steps b locks grand moving worktable, the method that dynamically switches to simultaneously the microposition system is: when the detected grand moving platform positioning error of controller during less than switching threshold, amplify driving voltage after-applied through amplifier to the piezoelectric ceramics gearing, make piezoelectric ceramics produce displacement immediately and withstand guide rail reducing the gap, thereby grand moving platform is realized locking.
Microposition system control micro displacement workbench among the above-mentioned steps c carries out the micrometric displacement compensation and then reaches the target location of system requirements, the method of finishing the location is: dynamically switch to the microposition system by PC control, the micro displacement workbench that is installed on the grand moving platform carries out the micrometric displacement compensation, carry out position feedback to realize the local closed loop of microposition control by micropositioner internal inductance dial gauge, in addition, catoptron is housed on the micropositioner is used to realize the positioning error measurement of laser interferometer, thereby realize grand, little two-stage location.
A kind of large-stroke nanometer displacement positioning macro-movement bench is decided control system, be applied to the large-stroke nanometer displacement positioning macro-movement bench locking control method, it is characterized in that host computer connects grand moving platform through PMAC controller, motor servo driver, AC servo motor, the encoded device of described grand moving platform, grating measuring device I connect the PMAC controller, and described PMAC controller is connected to grand moving platform through locking device; Described host computer connects micropositioner through the PZT driver, and described micropositioner connects the PMAC controller through grating measuring device II, and described micropositioner connects laser interferometer; Described host computer is a computing machine.
The present invention compared with prior art, have following remarkable advantage: the present invention can reduce the vibration of grand moving platform motion stopping back table top, reduce positioning error, the bearing accuracy of raising system, and the device succinctly be convenient to the operation, usable range is wide, not only is confined to positioning system, through less change, can be applied to the system of similar control function.
Description of drawings
Fig. 1 is a large-stroke nanometer displacement position control method process flow diagram;
Fig. 2 is a large-stroke nanometer displacement positioning system structured flowchart;
Fig. 3 is that large-stroke nanometer displacement positioning macro-movement bench is controlled block diagram surely;
Fig. 4 is a large-stroke nanometer displacement location total system software block diagram;
Fig. 5 is that the large-stroke nanometer displacement positioning table is always schemed;
Fig. 6 is the moving platform stereographic map of large-stroke nanometer displacement positioning macro;
Fig. 7 is that large-stroke nanometer displacement positioning macro-movement bench is decided the local installation diagram of device;
Fig. 8 is that large-stroke nanometer displacement positioning macro-movement bench is decided the device piezo ceramic element;
Fig. 9 is a large-stroke nanometer displacement location micropositioner X-Y scheme;
Embodiment
Details are as follows in conjunction with the accompanying drawings for a preferred embodiment of the present invention: referring to Fig. 2, this large-stroke nanometer displacement positioning macro-movement bench is decided control system: host computer 1 connects grand moving platform 5 through PMAC controller 2, motor servo driver 3, AC servo motor 4, described grand moving platform 5 encoded devices 6, grating measuring device I11 connect PMAC controller 2, and described PMAC controller 2 is connected to grand moving platform 5 through locking device 12; Described host computer 1 connects micropositioner 8 through PZT driver 7, and described micropositioner 8 connects PMAC controller 2 through grating measuring device II9, and described micropositioner 8 connects laser interferometer 10; Described host computer 1 is a computing machine.
Present embodiment is that the little two-stage drive locating platform of large-stroke nanometer displacement positioning macro has designed a kind of macro-movement bench and decides device, and this device is made up of piezoelectric ceramics, spring and support.Fig. 5 is that the large-stroke nanometer displacement positioning table is always schemed, 1. grand moving platform and driving thereof, measurement mechanism 2. micropositioners and driving thereof, measurement mechanism 3. laser interferometer caliberating devices.Fig. 6 is grand moving platform stereographic map, and Fig. 7, Fig. 8 are local installation diagram and the piezo ceramic elements that large-stroke nanometer displacement positioning macro-movement bench is decided device.
Referring to Fig. 1, the operation steps of this large-stroke nanometer displacement positioning macro-movement bench locking control method is as follows:
(1) communication interface of computing machine (host computer) is sent instruction and is controlled, and at first makes grand positioning system work, drives grand, little two grade working tables and moves together, when detected positioning error during less than switching threshold, finishes grand location;
(2) lock grand moving worktable by computer control, dynamically switch to the microposition system simultaneously;
(3), finish the location by microposition system control micro displacement workbench and then reach the target location of system requirements.
Referring to Fig. 2, this large-stroke nanometer displacement positioning system is that host computer (1) connects grand moving platform (5) through PMAC controller (2), motor servo driver (3), AC servo motor (4), the encoded device of described grand moving platform (5) (6), grating measuring device I (11) connect PMAC controller (2), and described PMAC controller (2) is connected to grand moving platform (5) through locking device (12); Described host computer (1) connects micropositioner (8) through PZT driver (7), and described micropositioner (8) connects PMAC controller (2) through grating measuring device II (9), and described micropositioner (8) connects laser interferometer (10).Macro-movement bench shown in Figure 3 is decided device (12) control block diagram.
The detailed position fixing process of the grand little two-stage drive locating platform of large-stroke nanometer displacement is as follows:
1) grand moving platform is assembled by Switzerland Schneeberger company two secondary micron order linear rolling tracks and micron order ball-screw, AC servo motor (3000rpm by band increment agate dish (2048 line), 100w) drive, as shown in Figure 6,1. base 2. rolling guides 3. grating chis 4. read heads 5. grand moving platform 6. leading screws 7. shaft couplings 8. motors 9. scramblers.Wherein, the diameter of ball-screw is Φ 16, helical pitch 4mm, and the line slideway model is the C0 level rolling guide of R3200D, table top displacement maximum can reach 150 millimeters, the rectilinearity 2 μ m/150mm of two groups of linear rolling tracks.Consider that the idle running in the drive disk assembly can bring negative effect to servo-drive system, adopted double nuts structure, guide rail pretension etc. to arrange and subdued the gap.Native system selects for use the AC servo motor of peace river SGMAH series as driving element.Servo motor model number SGMAH-01AAA41, capacity 100W, rated voltage 200V, rated speed 3000r/min allows radial load 78N, and axial load 54N carries 13bit incremental encoder, umber of pulse 2048.The technical indicator of grand moving objective table is as follows:
Working range: 100mm
Resolution: 0.5 μ m
Bearing accuracy: 5 μ m
Repetitive positioning accuracy: ± 1 μ m
Movement velocity: 30mm/s
Grand positioning system comprises: controlling object and positioning measurment system that grand moving platform, metal grating measurement mechanism are formed; Based on grand positioning control system two parts of PMAC, grand positioning system is to be used for realizing big stroke location.At first control grand moving movable workbench according to preestablishing by the PMAC controller, simultaneously, the signal that encoder feedback is returned carries out real time filtering, computing, relatively, judge, instruct to servo-drive system then, rotating speed with the control AC servo motor, direction, start-stop etc., drive topworks's motion, except the scrambler that adopts servomotor to carry carries out the velocity feedback, also adopting resolution is 0.5 μ m Renishaw metal grating chi and read head, realization is fed back in real time to the position of worktable, adopt the control mode of full cut-off ring to guarantee the bearing accuracy of system,, finish the grand position fixing process of grand moving worktable when detected positioning error during less than switching threshold.
2) macro-movement bench is decided device and is made up of piezoelectric ceramics, spring and support, and as shown in Figure 7, piezo ceramic element 10 is fixing with grand moving platform 5, piezo ceramic element as shown in Figure 8,1. piezoelectric ceramics 2. springs 3. supports.Porcelain is selected for use is that the model of east and business Co., Ltd. is AE0505D16, and the maximum elongation amount is 20 μ m.When the positioning error that detects grand moving platform during less than switching threshold, the PMAC card controller will send control signal immediately and decide device (piezo ceramic element 10) to macro-movement bench, the instantaneous generation micro-displacement of meeting after piezoelectric ceramics 1 is applied in voltage, spring that surface of contact by its 5 millimeters x5 millimeters connects 2 passes displacement, withstand guide rail 2, reduce the gap, thereby lock grand moving platform 5.
3) model selected for use of micro displacement workbench is the P-750.10 of PI company, as shown in Figure 9.Impulse stroke is 75 μ m, resolution is 10nm, repetitive positioning accuracy is ± 20nm, the closed loop linearity is 0.1%, maximum load is 10Kg, PI company has carried out modular design with these products, and wherein voltage amplification module (E-505), sensor, location servocontrol module (E-509) and display module (E-515) are installed in the single channel frame E-501, makes whole microposition system architecture compactness, easy to operate.P-750.10 is by low-voltage (0-100v) drive pressure electroceramics (PZT), flexible hinge adopts electrosparking to obtain high resolution, worktable is built-in linear differential inductance amesdial LVDT (linear variable differentialtransformer) is as the microposition feedback transducer, make micropositioner form inner closed-loop control, be easy to guarantee bearing accuracy.Micropositioner has two lead-in wires, and wherein fine rule links to each other with E-505, is to drive lead-in wire, is used for the voltage to PZT input 0-100v, and thick line is a LVDT feedback transducer lead-in wire, links to each other the FEEDBACK CONTROL of realization micropositioner with SENSOR plug on the E-509.
Dynamically switch to the microposition system by computer control, the micro displacement workbench that is installed on the grand moving platform carries out the micrometric displacement compensation, carry out position feedback to realize the local closed loop of microposition control by micropositioner internal inductance dial gauge, in addition, catoptron is housed on the micropositioner is used to realize the positioning error measurement of laser interferometer, thereby realize grand, little two-stage location.
The software block diagram of the big grand little two-stage drive nanometer displacement positioning system of stroke as shown in Figure 4.
Claims (5)
1. large-stroke nanometer displacement positioning macro-movement bench locking control method.It is characterized in that the concrete operations step is as follows:
A. the communication interface of host computer is sent to instruct and is controlled, and at first makes grand positioning system work, and grand moving worktable is realized grand location;
B. lock grand moving worktable by PC control, dynamically switch to the microposition system simultaneously;
C. carry out the target location that micrometric displacement compensated and then reached system requirements by microposition system control micro displacement workbench, finish the location.
2. according to right 1 described large-stroke nanometer displacement positioning macro-movement bench locking control method, it is characterized in that the grand moving worktable among the described step a realizes that the method for grand location is: at first control grand moving movable workbench according to preestablishing by the PMAC controller, simultaneously, the metal grating chi of grand moving platform side can also feed back to controller with it in continuous detection and location position in real time, when detected positioning error during, finish grand location less than switching threshold.
3. according to right 1 described large-stroke nanometer displacement positioning macro-movement bench locking control method, it is characterized in that the PC control of passing through among the described step b locks grand moving worktable, the method that dynamically switches to simultaneously the microposition system is: when the detected grand moving platform positioning error of controller during less than switching threshold, amplify driving voltage after-applied through amplifier to the piezoelectric ceramics gearing, make piezoelectric ceramics produce displacement immediately and withstand guide rail reducing the gap, thereby grand moving platform is realized locking.
4. according to right 1 described large-stroke nanometer displacement positioning macro-movement bench locking control method, it is characterized in that the microposition system control micro displacement workbench among the described step c carries out the target location that micrometric displacement compensated and then reached system requirements, the method of finishing the location is: dynamically switch to the microposition system by PC control, the micro displacement workbench that is installed on the grand moving platform carries out the micrometric displacement compensation, carry out position feedback to realize the local closed loop of microposition control by micropositioner internal inductance dial gauge, in addition, catoptron is housed on the micropositioner is used to realize the positioning error measurement of laser interferometer, thereby realize grand, little two-stage location.
5. a large-stroke nanometer displacement positioning macro-movement bench is decided control system, be applied to according to right 1 described large-stroke nanometer displacement positioning macro-movement bench locking control method, it is characterized in that host computer (1) connects grand moving platform (5) through PMAC controller (2), motor servo driver (3), AC servo motor (4), the encoded device of described grand moving platform (5) (6), grating measuring device I (11) connect PMAC controller (2), and described PMAC controller (2) is connected to grand moving platform (5) through locking device (12); Described host computer (1) connects micropositioner (8) through PZT driver (7), and described micropositioner (8) connects PMAC controller (2) through grating measuring device II (9), and described micropositioner (8) connects laser interferometer (10); Described host computer (1) is a computing machine.
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