CN101354540B - Exposure apparatus and method for producing device - Google Patents

Exposure apparatus and method for producing device Download PDF

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Publication number
CN101354540B
CN101354540B CN2008101609543A CN200810160954A CN101354540B CN 101354540 B CN101354540 B CN 101354540B CN 2008101609543 A CN2008101609543 A CN 2008101609543A CN 200810160954 A CN200810160954 A CN 200810160954A CN 101354540 B CN101354540 B CN 101354540B
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liquid
substrate
recovery
optical system
projection optical
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CN101354540A (en
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长坂博之
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Nikon Corp
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Nikon Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient

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  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

An exposure apparatus exposes a substrate by projecting an image of a predetermined pattern through a liquid onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism which supplies the liquid onto the substrate to form a liquid immersion area on a part of the substrate. The liquid supply mechanism supplies the liquid onto the substrate simultaneously from a plurality of positions which are apart, in a plurality of different directions, from the projection area. The exposure apparatus is capable of forming the liquid immersion area stably and recovering the liquid satisfactorily. It is possible to perform the exposure process accurately while avoiding the outflow of the liquid to the surroundings.

Description

Exposure device and device making method
The application be that February 26, application number in 2004 are 200480005148.9 the applying date, denomination of invention divides an application for the one Chinese patent application of " exposure device, exposure method and device making method ".
Technical field
The present invention relates to be formed with under the state that liquid soaks the zone exposure device and the device making method of exposing patterns on substrate between projection optical system and the substrate.
Background technology
Semiconductor devices and used for liquid crystal display device are the so-called photolithographic method manufacturing of pattern transfer to the photosensitive substrate that is formed on the mask.The exposure device that in this photoetching process operation, uses has the mask microscope carrier and the baseplate carrier of supporting substrate that supports mask, Yi Bian Yi Bian be one by one mobile mask microscope carrier and baseplate carrier via projection optical system the device of the pattern transfer of mask to the substrate.In recent years, further highly integrated corresponding for device pattern hoped the further resolution increasing of projection optical system.Employed exposure wavelength is short more, and perhaps the numerical aperture of projection optical system is big more, and the resolution of projection optical system is high more.Therefore, 1 year year of the exposure wavelength that in exposure device, uses be in the short wavelengthization, and the numerical aperture of projection optical system is also increasing.Yet now the main flow exposure wavelength is the 248nm of KrF PRK, and also practicability of the 193nm of short wavelength's ArF PRK more.In addition, when making public, depth of focus (DOF) is also the same with resolution important.Resolution R and depth of focus δ represent with following formula respectively.
R＝k 1·λ/NA (1)
δ＝±k 2·λ/NA 2 (2)
At this, λ is an exposure wavelength, and NA is the numerical aperture of projection optical system, k 1, k 2It is technological coefficient.Can know that from (1) formula, (2) formula in order to improve resolution R, if shorten exposure wavelength lambda, increase numerical aperture NA, then depth of focus δ narrows down.
If depth of focus δ is narrow; The image planes that then are difficult to relative projection optical system are mated substrate surface, and the nargin during exposure actions might be not enough, thereby; Shorten exposure wavelength as reality; And enlarge the method for depth of focus, for example, proposed disclosed immersion method in No. 99/49504 communique of International Publication.The method of this immersion method is; The liquid of water and organic solvent etc. is full of and forms liquid between the following and substrate surface of projection optical system and soak the zone; The wavelength of the exposing light beam in being utilized in liquid is that (n is a liquid refractive index to airborne 1/n; Generally be about 1.2～1.6) when this point improves resolution, enlarge about n to depth of focus doubly.
, the problem that in above-mentioned technology in the past, has the following stated.So above-mentioned technology is in the past soaked the zone effectively because on one side to prescribed direction moving substrate one side scan exposure the time, can between projection optical system and substrate, form liquid; And its structure is the moving direction of relative substrate; In front of the view field of the picture of the pattern of projection print plate, liquid is provided, the moving direction of liquid from the front side of view field along substrate upwards flows at folk prescription.Yet also can be such structure,, also can switch the position (nozzle) that liquid is provided when the afore mentioned rules direction is switched the moving direction of substrate round about.What clearly know is; Because when this switching, view field is stopped rapidly providing from the liquid of a direction; Beginning provides from the liquid of other direction, so the vibration (so-called water hammer) of liquid takes place between projection optical system and substrate, perhaps between fluid Supplying apparatus self (supply pipe and supply nozzle etc.), vibrates; Generation causes the problem of the deterioration of pattern image; In addition, flow through liquid from single direction, can not fully form liquid between projection optical system and the substrate and soak the such problem in zone so also exist in because its structure is relative view field.
In addition, in above-mentioned technology in the past, because its structure is the recoverer downstream withdrawal liquid of working fluid on the moving direction of aforesaid substrate only of withdrawal liquid, so also produce the fully problem of withdrawal liquid.If fully withdrawal liquid on substrate remaining liquid, by the reason of this remaining liquid cause take place exposure fuzzy maybe.In addition, if thorough withdrawal liquid, then remaining liquid splash to the mechanical part of periphery, also produce make its get rusty wait unusually.And then; If liquid is remaining or splash; Then along with the variation of the environment (humidity etc.) of placing substrate; Owing to the reasons such as change of refractive on the light path of the detection light that causes the interference of light meter that in the microscope carrier position measurement, uses, also have to produce the danger that can not obtain desirable pattern transfer precision.
In addition, when reclaiming the liquid on the substrate, might between liquid withdrawal system self (recovery tube and recovery nozzle etc.), vibrate with the liquids recovery nozzle.If this vibration is delivered to projection optical system and baseplate carrier, perhaps be used to measure the interferometric optics etc. of the position of baseplate carrier, then can not on substrate, form circuit pattern accurately.
Summary of the invention
The present invention In view of the foregoing proposes; Its purpose is to provide a kind of liquid that between projection optical system and substrate, is formed with to soak when carrying out exposure-processed under the regional state; Can reclaim this liquid well when liquid soaks the zone stably forming, prevent the peritropous outflow of liquid or splash etc. can the high precision exposure-processed exposure device, exposure method and device making method.In addition; The object of the present invention is to provide a kind of between projection optical system and substrate, being formed with under the state that liquid soaks the zone during exposure-processed; The influence of the vibration that does not receive in the supply of liquid or produce when reclaiming, exposure device and device making method that can the high precision exposure-processed.
In order to address the above problem the following structure that employing of the present invention is corresponding with Fig. 1～Figure 21 shown in the embodiment.But, be attached to the parenthesized symbol example of this key element only on each key element, the intention of unqualified each key element.
If adopt the 1st form of the present invention, a kind of exposure device (EX) then is provided, it goes up exposure base through projecting to substrate (P) to the picture of the pattern of regulation across liquid (1), comprising:
The projection optical system of the picture of the above-mentioned pattern of projection (PL) on substrate;
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid; From on a plurality of positions that separate with view field (AR1) on different a plurality of directions, on substrate (P), carry out the liquid feed mechanism (10,11,12,13,13A, 14,14A) of the supply of liquid (1) simultaneously.
If employing the present invention; Then be used to form liquid soak the zone the liquid feed mechanism because from different a plurality of directions with the view field position spaced on (promptly; On different many sides of view field, for example if the view field of rectangle then from the X side ,-X side; + Y side ,-at least two regions of Y side) carry out the supply of liquid simultaneously, can between projection optical system and substrate, form desirable liquid and soak the zone.In addition because on a plurality of positions that separate on a plurality of directions, carry out the supply of liquid simultaneously, so on one side moving substrate on one side during exposure-processed, also can form liquid all the time well and soak the zone even change the moving direction of substrate.If the both sides in view field provide liquid simultaneously,,, can project to pattern image on the substrate accurately so can prevent the generation of the vibration (water hammer) of liquid because need not switch the supply position of liquid.
If adopt the 2nd mode of the present invention, then provide through projecting to the exposure device (EX) that substrate (P) is gone up exposure base to the picture of predetermined pattern across liquid (1), comprising:
The projection optical system of the picture of the above-mentioned pattern of projection (PL) on substrate;
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid, the liquid feed mechanism (10,11,12,13,13A, 14,14A) of liquid (1) is provided on substrate (P);
From in the liquids recovery mechanism of the recovery of carrying out the liquid (1) on the substrate (P) on a plurality of positions that separate with view field (AR1) on different a plurality of directions simultaneously (20,21,22,22A).
If employing the present invention; The liquids recovery mechanism that then is used for withdrawal liquid is because from a plurality of positions of on different a plurality of directions, separating with view field (promptly; Different many sides of view field; For example, if the view field of rectangle then be from the X side ,-the X side ,+the Y side ,-at least two sides of Y side) carry out the recovery of liquid simultaneously, so can carry out the recovery of liquid reliably.Thereby, can prevent the generation of the state of residual liquid on substrate, the environmental change that can prevent to make public fuzzy generation and place substrate can project to pattern image on the substrate accurately.
If adopt the 3rd mode of the present invention, then provide through projecting to the exposure device (EX) that substrate (P) is gone up exposure base to the picture of predetermined pattern across liquid (1),
Comprise: the projection optical system of the picture of the above-mentioned pattern of projection (PL) on substrate;
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid, the liquid feed mechanism (10,11,12,13,13A, 14,14A) of liquid (1) is provided on substrate (P);
In the liquids recovery mechanism of the recovery of carrying out the liquid (1) on the substrate (P) on a plurality of positions simultaneously (20,21,22,22A, 22D, 24),
Liquids recovery mechanism (20,21,22,22A, 22D, 24) according to the liquids recovery position with different recovery power withdrawal liquid.
If employing the present invention, then a plurality of positions on substrate carry out liquid simultaneously the liquids recovery mechanism of recovery because corresponding with the liquids recovery position, so can carry out the liquids recovery action smoothly with different recovery power withdrawal liquid.Thereby, can be full of between projection optical system and substrate with the liquid of suitable amount, forming liquid in can the desirable zone on substrate soaks the zone.For example, be set at greatlyyer through recovery power, can carry out liquids recovery smoothly and move than rear side (upstream side) for the liquid that moves (scanning) steering handle front side (downstream) of substrate.Perhaps; Through making along the liquids recovery power of the liquids recovery mechanism of the position configuration that moves (scanning) direction of substrate; Liquids recovery power than along the liquids recovery mechanism of the position configuration of the direction of intersecting with moving direction is big, also can carry out the liquids recovery action smoothly.
If adopt the 4th mode of the present invention, then provide through projecting to the exposure device (EX) that substrate (P) is gone up exposure base to the picture of predetermined pattern across liquid (1), comprising:
The projection optical system of the picture of the above-mentioned pattern of projection (PL) on substrate;
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid, the liquid feed mechanism (10,11,12,13,13A, 14,14A) of liquid (1) is provided on substrate (P);
Carry out the liquids recovery mechanism (20,21,22,22A) of the recovery of the liquid (1) on the substrate (P) in the recovery position that separates from view field (AR1),
Relatively view field (AR1) be configured in liquids recovery mechanism (20,21,22, on the outside of liquids recovery position 22A), be formed with the collecting part (30) of the liquid collection surface (31) of catching liquid (1).
If employing the present invention; Then on the outside of the liquids recovery position of liquids recovery mechanism; Be formed with the collecting part of the liquid collection surface of the specified length of catching liquid through setting; Even suppose thoroughly withdrawal liquid of liquids recovery mechanism, through catching liquid with this collecting part, the unusual generation that also can prevent the peripherad outflow of liquid or splash etc.Thereby, can prevent to dispose the generation of variation of the environment of substrate, can project to pattern image on the substrate with desirable pattern precision.
If adopt the 5th mode of the present invention, then provide through projecting to the exposure device (EX) that substrate (P) is gone up exposure base to the picture of the pattern of regulation across liquid (1):
Comprise: project to the projection optical system (PL) on the substrate to the picture of above-mentioned pattern;
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid, on substrate (P), provide liquid (1) the liquid feed mechanism (10,11,12,13,13A, 14,14A);
Carry out in the recovery position that separates from view field (AR1) recovery of the liquid (1) on the substrate (P) liquids recovery mechanism (20,21,22,22A),
The supply of the liquid (1) that carries out through liquid feed mechanism (10,11,12,13,13A, 14,14A) is carried out between the liquids recovery position of liquids recovery mechanism (20,21,22,22A) and view field (AR1).
If employing the present invention; Then, liquid carries out because providing between the liquids recovery position that is provided at liquids recovery mechanism and the view field of the liquid that mechanism carries out; So when offering view field to liquid smoothly, can from substrate, reclaim the liquid that provides smoothly.
If adopt the 6th mode, then provide through projecting to the exposure method that substrate (P) is gone up exposure base to the picture of predetermined pattern across liquid (1), comprising:
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid, provide and the compatibility of the liquid contact surface (2a) of the front end of projection optical system (PL) than the compatibility also high liquid (1) surperficial with substrate (P);
Project to the picture of predetermined pattern on the substrate (P) via offering the liquid (1) that above-mentioned liquid soaks zone (AR2).
If employing the present invention then can make liquid contact with the liquid contact surface of the front end of projection optical system is closely knit, when can being arranged to stable liquid to the light path between projection optical system and the substrate and soaking state, can reclaim the liquid on the substrate smoothly.
Device making method of the present invention is characterized in that: the exposure device (EX) or the exposure method that use above-mentioned form.If adopt the present invention then have the pattern that forms with good pattern precision, the device that can bring into play desirable performance can be provided.
If adopt the 7th mode of the present invention, then provide across liquid (1) and project to the exposure device (EX) that substrate (P) is gone up exposure base to the picture of predetermined pattern:
The projection optical system of the picture of the above-mentioned pattern of projection (PL) on substrate;
Have supply stream (94A, 95A, 94B, liquid feed mechanism 95B) (10,11,12,41,42) that liquid (1) is provided on substrate (P);
Have the liquid that recovery provides the recovery stream (96A, 97A, 98A, 99A, 96B, 97B, 98B, 99B, 96T, 97T, 98T, liquids recovery mechanism 99T) (20,61,62,63,64,71,72,73,74),
On above-mentioned supply stream and at least one side who reclaims stream the have been formed on lamination laminated member of polylith plate-shaped member (91,92,93).
During immersion exposure; Need provide uniform flow of liquid feeding to soak the zone and need and reclaim therefrom, and the laminated member that exposure device of the present invention possesses forms respectively through being communicated with the polylith plate-shaped member that is formed with stream respectively like these streams that lamination forms at least one side who supplies with stream and reclaim stream.Thereby, even complicated flow path configuration also can form extremely compact, easy and at low cost.
If adopt the 8th mode of the present invention, then provide through projecting to the exposure device (EX) that substrate (P) is gone up exposure base to the pattern image of regulation across liquid (1):
Comprise: project to the projection optical system (PL) on the substrate to the picture of above-mentioned pattern;
Soak zone (AR2) in order on the part on the substrate (P) of the view field that comprises projection optical system (PL) (AR1), to form liquid, the liquid feed mechanism (10) of liquid (1) be provided on substrate (P),
Liquid feed mechanism (10) and projection optical system (PL) are isolated from each other on vibratility.
If adopt exposure device, then on vibratility, be isolated from each other projection optical system and liquid feed mechanism according to the 8th mode.That is, even in the liquid feed mechanism, vibrate, this vibration can not be delivered to projection optical system yet.Thereby, can prevent can project to pattern image on the substrate accurately because the projection optical system vibration causes the unusual generation of pattern image deterioration.
Exposure device further comprises: the 1st support component (100) of support of optical system (PL); On vibratility, be isolated from each other the 2nd support component (102) of support liq feed mechanism (10) with the 1st support component (100).If adopt this structure, then because the 1st support component of support projection optical system separates vibration with the 2nd support component of support liq feed mechanism, so the vibration that in the liquid feed mechanism, takes place can not be delivered to projection optical system.In addition; For example through being arranged to be installed in the 1st support component to the interferometer of the positional information that is used to measure baseplate carrier; The first-class structure of lens barrel that is installed in projection optical system with reference to mirror (fixed mirror); Because not to these interferometers with reference to the mirror transmitting vibrations, thus can carry out accurately baseplate carrier positional information measurement and based on the position control of this measurement result.
If adopt the 9th scheme of the present invention, then provide across liquid (1) and project to the exposure device (EX) that substrate (P) is gone up exposure base to the picture of predetermined pattern:
Project to the projection optical system (PL) on the substrate to the picture of above-mentioned pattern;
Recovery offers the liquids recovery mechanism (20) of the liquid (1) of the part on the substrate (P) of the view field (AR1) that comprises projection optical system (PL),
Liquids recovery mechanism 20 and projection optical system (PL) are isolated from each other on vibratility.
If adopt the exposure device of the 9th mode of the present invention, then because projection optical system and liquids recovery mechanism are isolated from each other on vibratility, so even in liquids recovery mechanism, vibrate, this vibration can not be delivered to projection optical system yet.Thereby, can prevent to cause the unusual generation of pattern image deterioration because of the projection optical system amplitude, can project to the picture of pattern on the substrate accurately.
The exposure device of the 9th mode (EX) may further include: the 1st support component (100) of support projection optical system (PL); On vibratility, be isolated from each other the 2nd support component (102) of support liq recovering mechanism (20) with the 1st support component (100).If adopt this structure, because the 2nd support component of the 1st support component of support projection optical system and support liq recovering mechanism is isolated from each other on vibratility, so the vibration that in liquids recovery mechanism, takes place can not be delivered to projection optical system.In addition; For example through being arranged to be installed in the 1st support component to the interferometer of the positional information that is used to measure baseplate carrier; The first-class structure of lens barrel that is installed in projection optical system with reference to lens barrel (fixed mirror); Because can be to these interferometers with reference to the mirror transmitting vibrations, thus can carry out accurately baseplate carrier positional information measurement and based on the position control of this measurement result.
If adopt the 10th mode of the present invention, then provide to project on the substrate (P) across liquid (1) exposure device (EX) of a plurality of shooting areas on this substrate of sequential exposure the picture of predetermined pattern:
Comprise: project to the projection optical system (PL) on the aforesaid substrate to the picture of above-mentioned pattern;
Soak the zone in order on the part on the substrate of the view field that comprises this projection optical system, to form liquid, from be configured to the supply port relative with aforesaid substrate (13A 14A) provides the liquid feed mechanism (10,11,12,13,14) of liquid,
This liquid feed mechanism provides liquid from above-mentioned supply port continuously during the exposure-processed of carrying out a plurality of shooting areas on the aforesaid substrate.
If adopt the exposure device of the 10th mode of the present invention; Then during the exposure-processed of carrying out a plurality of shooting areas on the substrate; Because moving direction not according to substrate; But liquid is provided continuously from the supply port that is configured on the assigned position, so can prevent the vibration of liquid feed mechanism self and the vibration (water hammer) of liquid, can project to pattern image on the substrate accurately.
If adopt the 11st mode of the present invention, then provide to project on the substrate (P) across liquid (1) exposure device (EX) of a plurality of shooting areas on this substrate of sequential exposure the picture of predetermined pattern:
Project to the projection optical system (PL) on the aforesaid substrate to the picture of above-mentioned pattern;
Soak the zone in order on the part on the substrate of the view field that comprises this projection optical system, to form liquid, from be configured in supply port on the assigned position (13A 14A) provides the liquid feed mechanism (10,11,12,13,14) of liquid,
Have and be configured to the recovery mouth (22A) relative, reclaim the liquids recovery mechanism (20,21,22) of the liquid that provides from the aforesaid liquid feed mechanism with aforesaid substrate,
This liquid feed mechanism during the exposure-processed of carrying out a plurality of shooting areas on the aforesaid substrate from the continuous withdrawal liquid of above-mentioned supply port.
If adopt the exposure device of the 11st mode of the present invention, then during the exposure-processed of carrying out a plurality of shooting areas on the substrate, not according to the moving direction of substrate, but from reclaiming a mouthful continuously withdrawal liquid.Thus, in withdrawal liquid more reliably, can suppress vibration, can project to pattern image on the substrate accurately along with the liquids recovery mechanism self that reclaims beginning and stop.
Device making method of the present invention is characterised in that the exposure device (EX) that uses above-mentioned form.If employing the present invention then can provide to have the pattern that forms with good pattern precision, can bring into play hope the device of performance.
If employing the present invention, even also exposure-processed accurately when then between projection optical system and substrate, having formed under the state that liquid soaks the zone exposure-processed.
Description of drawings
Fig. 1 is a summary pie graph of showing a kind of embodiment of exposure device of the present invention.
Fig. 2 is a planimetric map of showing that the summary as the liquid feed mechanism of characteristic of the present invention and liquids recovery mechanism constitutes.
Fig. 3 is an oblique view of showing that the summary as the liquid feed mechanism of characteristic of the present invention and liquids recovery mechanism constitutes.
Fig. 4 is the cross-sectional side view of showing that the summary as the liquid feed mechanism of characteristic of the present invention and liquids recovery mechanism constitutes.
Fig. 5 shows the figure that is set at the shooting area on the substrate.
Fig. 6 (a) and (b) be the mode chart of showing the liquid trace.
Fig. 7 is the figure that shows another embodiment of liquid feed mechanism and liquids recovery mechanism.
Fig. 8 is the figure that shows another embodiment of liquid feed mechanism and liquids recovery mechanism.
Fig. 9 is the figure that shows another embodiment of liquid feed mechanism and liquids recovery mechanism.
Figure 10 (a) and (b) be the figure that shows another embodiment of liquid feed mechanism.
Figure 11 is the cross-sectional side view of another embodiment of exhibiting collection parts.
Figure 12 is the cross-sectional side view of another embodiment of exhibiting collection parts.
Figure 13 is the oblique view of another embodiment of exhibiting collection parts.
Figure 14 is a brief strabismus map of showing another embodiment of liquid feed mechanism of the present invention and liquids recovery mechanism.
Figure 15 is the figure that shows another embodiment of the slit pipe portion among Figure 14.
Figure 16 is a brief strabismus map of showing another embodiment of liquid feed mechanism of the present invention and liquids recovery mechanism.
Figure 17 is illustrated in stream to form the oblique view of showing the 1st parts in the parts.
Figure 18 (a) and (b) be to form the oblique view of showing the 2nd parts in the parts at stream.
Figure 19 (a) and (b) be to form the oblique view of showing the 3rd parts in the parts at stream.
Figure 20 is a summary pie graph of showing another embodiment of exposure device of the present invention.
Figure 21 is the process flow diagram of an example of showing the manufacturing process of semiconductor devices.
Embodiment
Below, with reference to description of drawings exposure device of the present invention.Fig. 1 is a summary pie graph of showing an embodiment of exposure device of the present invention.In Fig. 1, exposure device EX comprises: the mask microscope carrier MST that supports mask M; The baseplate carrier PST of supporting substrate P; With the throw light on lamp optical system IL of the mask M that masked microscope carrier MST supports of exposing light beam EL; With the pattern image projection exposure of the mask M of exposing light beam EL illumination by the projection optical system PL on the baseplate carrier PST substrate supported P; The control device CONT of the molar behavior of overhead control exposure device EX.
In addition, the exposure device EX of this embodiment is when in fact shortening exposure wavelength raising resolution, is suitable for the liquid immersion exposure apparatus of immersion method for reality enlarges depth of focus, comprising: the liquid feed mechanism 10 that liquid 1 is provided on substrate P; Reclaim the liquids recovery mechanism 20 of the liquid 1 on the substrate P.Exposure device EX during being transferred to the pattern image of mask M on the substrate P, uses the liquid 1 that provides from liquid feed mechanism 10 to soak regional AR2 at the part formation liquid of the substrate P of the AR1 of view field that comprises projection optical system PL at least.Specifically; Exposure device EX is full of liquid 1 between the surface of the optical element 2 of the fore-end of projection optical system PL and substrate P; Via liquid between this projection optical system PL and substrate P 1 and projection optical system PL, project to the pattern image of mask M on the substrate P exposure base P.
At this; In this embodiment; Using the mutual different direction (in the other direction) in the direction of scanning to go up with moved further mask M and substrate P as exposure device EX, is the situation that is formed on the scanning exposure apparatus (so-called scanning stepping exposure device) of pattern exposure on substrate P on the mask M example shows simultaneously.In following explanation; The direction consistent with the optical axis AX of projection optical system PL as Z-direction; Synchronous moving direction (direction of scanning) mask M and substrate P in the plane vertical with Z-direction is set to X-direction, is set to Y direction to the direction vertical with Z-direction and Y direction (non-direction of scanning).In addition, be set to θ X to direction respectively, θ Y, θ Z direction around X axle, Y axle and Z axle.And then said here " substrate " is included in the substrate that has been coated with on the semiconductor wafer as the photoresist of photosensitive material, and " mask " comprises the master reticle that is formed with the device pattern of reduced projection to the substrate.
Lamp optical system IL is with the throw light on system of the mask M that masked microscope carrier MST supports of exposing light beam EL, comprising: the optical integrator of the illumination of the light beam that exposure light source, homogenising penetrate from exposure light source, optically focused are from collector lens, the relay lens of the exposing light beam EL of optical integrator, be set at slot-shaped variable field-of-view aperture etc. to the field of illumination on the mask M of employing exposing light beam EL.The field of illumination of the regulation on the mask M is with the exposing light beam EL illumination of lamp optical system IL with uniform Illumination Distribution.As the exposing light beam EL that penetrates from lamp optical system IL; For example use from bright line (the g line of the ultraviolet region of mercury vapor lamp ejaculation; The h line; The i line) and the extreme ultraviolet light (DUV light) of KrF PRK (wavelength 248nm) etc. and vacuum-ultraviolet light (VUV light) of ArF excimer pulsed laser beam (wavelength 193nm) and F2 laser (wavelength 157nm) etc. etc.In this embodiment, use the ArF excimer pulsed laser beam.
Mask microscope carrier MST is the microscope carrier that supports mask M, can be in the plane vertical with the optical axis AX of projection optical system PL, promptly can 2 dimensions in the XY plane move and can be on θ Z direction minor rotation.Mask microscope carrier MST is driven by the mask microscope carrier drive unit MSTD of linear electric machine etc.Mask microscope carrier drive unit MSTD is controlled by control device CONT.On mask microscope carrier MST, moving lens 50 is set.In addition, on the position relative, laser interferometer 51 is set with moving lens 50.The position and the rotation angle of the 2 dimension directions of the mask M on the mask microscope carrier MST are measured with laser interferometer 51 in real time, and measurement result is outputed to control device CONT.Control device CONT drives mask microscope carrier drive unit MSTD through the measurement result according to laser interferometer 51, confirms to be supported on the position of the mask M on the mask microscope carrier MST.
Projection optical system PL is the system with projection multiplying power β pattern of projection exposed mask M on substrate P of regulation; A plurality of optical elements with comprising the optical element (lens) 2 on the fore-end that is set at the substrate P side constitute, and these used for optical elements lens barrels PK supports.In this embodiment, projection optical system PL is that projection frequency β for example is 1/4 or 1/5 reduction system.And then projection optical system PL waits one of times system and amplification system.In addition, the optical element 2 of the fore-end of the projection optical system PL of this embodiment is configured to relative lens barrel PK can install and remove (replacing), and the liquid 1 that liquid soaks regional AR2 contacts with optical element 2.
Optical element 2 usefulness fluorites form.Fluorite is because high with the compatibility of water; So can make roughly whole closely knit contact of liquid 1 and the liquid contact surface 2a of optical element 2; Promptly; In this embodiment,,, can reliably be full of the light path between optical element 2 and the substrate P with liquid 1 so the density of the liquid contact surface 2a of optical element 2 and liquid 1 is high because the high liquid (water) 1 of compatibility with the liquid contact surface 2a of optical element 2 is provided.And then optical element 2 also can be the quartz high with the compatibility of water.Also can implement hydrophiling (lyophilyization) to the liquid contact surface 2a of optical element 2 in addition and handle, further the compatibility of raising and liquid 1.
Baseplate carrier PST is the microscope carrier of supporting substrate P, comprising: the Z microscope carrier 52 that keeps substrate P via frame substrate; Support the XY microscope carrier 53 of Z microscope carrier 52; Support the pedestal 54 of XY microscope carrier 53.Baseplate carrier PST is driven by the baseplate carrier drive unit PSTD of linear electric machine etc.Baseplate carrier drive unit PSTD controlled device CONT control.Through driving Z microscope carrier 52, control by the position on Z-direction (focal position) of the substrate P of Z microscope carrier 52 maintenances and at θ X the position on the θ Y direction.In addition, through driving XY microscope carrier 53, be controlled at position on the XY direction of substrate P (with the position of the actual parallel direction of image planes of projection optical system PL).Promptly; Focal position and the pitch angle of Z microscope carrier 52 control basal plate P; Make the surface of substrate P and the image planes coupling of projection optical system PL with self-focusing mode and automatic water detection square formula (auto-leveling), XY microscope carrier 53 carries out in the X-direction of substrate P and the location on the Y direction.And then, Z microscope carrier and XY microscope carrier can certainly be set integratedly.
On baseplate carrier PST (Z microscope carrier 52) and baseplate carrier PST the moving lens 55 that moves relative to projection optical system PL together is set.In addition, on the position relative, laser interferometer 56 is set with moving lens 55.The position and the rotation angle of 2 dimension directions of the substrate P on the baseplate carrier PST are measured with laser interferometer 65 in real time, and measurement result is outputed to control device CONT.Control device CONT is through being supported on the location of the substrate P on the baseplate carrier PST according to the measurement result driving substrate microscope carrier drive unit PSTD of laser interferometer 56.
In addition, on baseplate carrier PST (Z microscope carrier 52), as surrounding substrate P, accessory plate 57 is set.Accessory plate 57 has and is maintained at the roughly same plane highly, surface of the substrate P on the frame substrate.At this; Between the edge of substrate P and accessory plate 57, the gap about 0.1～2mm is arranged; And the situation that liquid 1 flows into this slit can take place hardly because of the capillary effect of liquid 1; Even under near the situation the edge of exposure base P, also can use accessory plate 57 maintenance liquid 1 below projection optical system PL.
Liquid feed mechanism 10 is mechanisms that the liquid 1 of regulation is provided on substrate P, comprising: the 1st liquid supply unit 11 and the 2nd liquid supply unit 12 that can feed fluid 1; Have via supply pipe 11A and be connected, offer the liquid of seeing off from the 1st liquid supply unit 11 1 the 1st supply part 13 of the supply port 13A of substrate P with the 1st liquid supply unit 11 with stream; Have via supply pipe 12A and be connected, offer the liquid of seeing off from the 2nd liquid supply unit 12 1 the 2nd supply part 14 of the supply port 14A of substrate P with the 2nd liquid supply unit 12 with stream.1st, the 2nd supply part 13,14 is configured on the surface of substrate P by approaching, is being arranged on the face direction of substrate P on the different each other positions.Specifically, the 1st supply part 13 relative AR1 of view field of liquid feed mechanism 10 are arranged on direction of scanning one side (X side), and the 2nd supply part 14 is set on the opposite side (+X side).
1st, the 2nd liquid feeding parts 11,12 possesses the jar and the force (forcing) pump etc. of accommodating liquid 1 separately, via supply pipe 11A, 12A and supply part 13,14 liquid 1 is provided on substrate P separately.In addition, the liquid of the 1st, the 2nd liquid supply unit 11,12 is supplied with action by control device CONT control, and control device CONT can distinguish the liquid quantity delivered of independent control by the time per unit on 11,12 pairs of substrate P of the 1st, the 2nd liquid supply unit.
In this embodiment, liquid 1 uses pure water.It is to see through the ArF PRK that pure water has more than, and the ultraviolet light (DUV light) of bright line (g line, h line, i line) and the KrF PRK (wavelength 248nm) etc. of the ultraviolet region that penetrates from mercury vapor lamp is seen through.
Liquids recovery mechanism 20 is the mechanisms that reclaim the liquid 1 on the substrate P, comprising: have and the surface of the substrate P recovery part 22 near the recovery mouth 22A of configuration; The liquids recovery portion 21 that is connected with this recovery part 22 via recovery tube 21A with stream.The jar etc. that liquids recovery portion 21 for example possesses the suction device of vacuum pump etc. and accommodates the liquid 1 of recovery, the liquid 1 on the substrate P reclaims via recovery part 22 and recovery tube 21A.The liquids recovery action of liquids recovery portion 21 is with control device CONT control, and control device CONT can control the liquids recovery amount of the time per unit that is undertaken by liquids recovery portion 21.
In addition, on the outside of the recovery part 22 of liquids recovery mechanism 20, configuration is formed with the collecting part 30 of the liquid collection surface 31 of the specified length of catching liquid 1.
Fig. 2 is a planimetric map of showing the summary formation of liquid feed mechanism 10 and liquids recovery mechanism 20, and Fig. 3 is the oblique view that partly cut-away shows.As shown in Figure 2; The AR1 of view field of projection optical system PL is configured to the rectangular shape that a Y direction (non-direction of scanning) makes to become length direction, and the liquid of full of liquid 1 soaks regional AR2 and as comprising the AR1 of view field, is formed on the part on the substrate P.Then, the 1st supply part 13 that the liquid that is used to form the AR1 of view field soaks the liquid feed mechanism 10 of regional AR2 is arranged on direction of scanning one side (X side) by the AR1 of view field relatively, and the 2nd supply part 14 is set on the opposite side (+X side).
Like Fig. 2 and shown in Figure 3, the 1st, the 2nd supply part 13,14 comprises inner space (internal flow path) 13H, the 14H that makes liquid 1 circulation of seeing off from the 1st, the 2nd liquid feeding parts 11,12 respectively; Offer supply port 13A, 14A on the substrate P to the liquid 1 of circulation 13H, 14H in the inner space.And then, though the 2nd liquid supply unit 12 is not shown in Fig. 3, construct the same with the 1st liquid supply unit 11.1st, the supply port 13A of the 2nd supply part 13,14,14A are formed the plane respectively and are seen roughly circular shape, and the size on the Y direction of this supply port 13A, 14A is configured to bigger than the size on the Y direction of view field AR1 at least.Then, be formed on the plane and see that roughly circular-arc supply port 13A, 14A are configured to relative scanning direction (directions X) and clip the AR1 of view field.Liquid feed mechanism 10 is by supply port 13A, 14A; From the relative AR1 of view field on a plurality of positions that different a plurality of directions separate, that is, and from the not homonymy of the AR1 of view field of rectangle (this example; Be the both sides (+directions X side ,-directions X side) of the AR1 of view field) liquid 1 is provided simultaneously.
The recovery part 22 of liquids recovery mechanism 20 is dual endless members, comprises as being formed the continuous recovery mouth 22A of ring-type towards substrate P surperficial; Make from reclaiming mouthful inner space (internal flow path) 22H of the ring-type that the liquid of 22A recovery 1 circulates.The recovery part 22 of liquids recovery mechanism 20 is configured to surround the supply part 13,14 and the AR1 of view field of liquid feed mechanism 10.Then, in the inside of recovery part 22 partition component 23 that is divided into its inner space 22H in a circumferential direction many spaces (partition space) 24 is set with predetermined distance.That is, be arranged to as surrounding the AR1 of view field to cut off the structure of parts 23 in the set inside of the recovery mouth 22A that forms continuously.Connect on each comfortable above-below direction of the partition space 24 that usefulness partition parts 23 are cut apart.Then, the surface that has the end portion that reclaims mouthful 22A and substrate P in the recovery part 22 is approaching, and on the other hand, the upper part is the manifold pipe part 25 as polymerization space portion of a plurality of partition spaces 24 of polymerization on the space.Then, on this manifold pipe part 25, connect the end parts of recovery tube 21A, the other end is connected with liquids recovery portion 21.Liquids recovery mechanism 20 reclaims the liquid 1 on the substrate P through driving liquids recovery portion 21 via reclaiming mouthful 22A (recovery part 22) and recovery tube 21A.That is, the position that is provided with of reclaiming mouthful 22A is the recovery position of carrying out the recovery of the liquid 1 on the substrate P, and liquids recovery mechanism 20 carries out the recovery of the liquid 1 on the substrate P in the recovery position that separates from the AR1 of view field.At this, the recovery mouth 22A of liquids recovery mechanism 20 is structures that the roughly circular encirclement AR1 of view field is seen on the plane.That is, reclaim 4 sides (+directions X side ,-directions X side ,+Y direction side ,-Y direction side) that mouthful 22A is present in the AR1 of view field of rectangle, in other words, on 4 positions that separate on 4 directions of the relative AR1 of view field quadrature.Thereby liquids recovery mechanism 20 usefulness are configured to surround the recovery mouth 22A of the AR1 of view field, can on position spaced on many directions that the AR1 of view field is different relatively, carry out the recovery of the liquid 1 on the substrate P simultaneously.
Then; Separately supply port 13A of the 1st, the 2nd supply part 13,14 of liquid feed mechanism 10,14A are provided with the position, and promptly the structure of the supply position of the liquid 1 on the substrate P is to be set between liquids recovery position (reclaiming the position of mouthful 22A) and the AR1 of view field relatively.That is the supply of the liquid 1 that, is undertaken by liquid feed mechanism 10 is carried out between the liquids recovery position of liquids recovery mechanism 20 and the AR1 of view field.
Fig. 4 shows and the 1st, the 2nd supply part 13,14 of the approaching configuration of substrate P and the major part Zoom Side sectional drawing of recovery part 22.As shown in Figure 4, the 1st, the 2nd supply part 13,14 internal flow path 13H, 14H separately of liquid feed mechanism 10 is configured to the surperficial approximate vertical of relative substrate P.Equally, the internal flow path 22H of the recovery part 22 of liquids recovery mechanism 20 (partition space 24) also is configured to the surperficial approximate vertical of relative substrate P.The supply position (desired location of supply port 13A, 14A) to the liquid 1 of substrate P of then, being undertaken by the 1st, the 2nd supply part 13,14 is set between the liquids recovery position (reclaiming the position that is provided with of mouthful 22A) and the AR1 of view field of liquids recovery mechanism 20.In addition, when projection optical system PL and the 1st, 13,14 each leisure of the 2nd supply part were configured to separate predetermined distance, all being configured to separately of recovery part 22 and the 1st, the 2nd supply part 13,14 only separated predetermined distance.In addition, in this embodiment, the distance of the surface of the distance of the surface of substrate P and supply port 13A, 14A, substrate P and recovery mouthful 22A, the distance of the lower surface of the surface of substrate P and projection optical system PL is configured to roughly the same.In other words, the position (highly) on the lower surface Z-direction separately of supply port 13A, 14A, recovery mouth 22A and projection optical system PL is configured to roughly the same.
Then, the wet diffusion of stain between the lower surface from 14A to the liquid 1 that substrate P provides and the substrate P that are provided as fore-end (optical element 2) on the direction of relative real estate approximate vertical from the supply port 13A of the 1st, the 2nd supply part 13,14, at projection optical system PL.In addition; The AR1 of view field flows out to the liquid 1 in the outside of supply part 13,14 relatively; Be configured in the recovery mouth 22A of the recovery part 2 in these supply part 13,14 outsides with the relative AR1 of view field, be recovered (absorption) in the approximate vertical direction from real estate.
At this, constitute in each parts of liquid feed mechanism 10 and liquids recovery mechanism 20 parts of liquid 1 circulation at least and for example form with the synthetic resin of teflon etc.Thus, can be suppressed in the liquid 1 and comprise impurity.
In the recovery part 22 of liquids recovery mechanism 20 relatively on the outside of the AR1 of view field, the collecting part 30 of the liquid collection surface 31 that is formed with the length of catching the liquid 1 that the recovery part 22 with liquids recovery mechanism 20 can not thoroughly reclaim is set.Collecting part 30 is set on the lateral surface of recovery part 22.Regression aspect 31 is the face (promptly) to the substrate P side in recovery part 30, as shown in Figure 4, and surface level tilts relatively.Specifically, collection surface 31 along with the relative AR1 of view field (liquid soaks regional AR2) toward the outer side, as the surface of relative substrate P separates (making progress), tilt.Collecting part 30 for example forms with the metal of stainless steel etc.
As shown in Figure 2, collecting part 30 is that endless member is seen on the plane, as with recovery part 22 is chimeric, being connected with the lateral surface of recovery part 22.Then, the collection surface 31 of collecting part 30 is configured to surround the AR1 of view field (liquid soaks regional AR2), the liquid in this embodiment soak parts 30 with and following collection surface 31 be that the substantially elliptical shape is seen on the plane.That is, the collection surface 31 of collecting part 30 is a benchmark with the optical axis AX of projection optical system PL, and the length of being arranged to radiate direction is corresponding and different with its position.In this embodiment, the non-relatively direction of scanning of the length of the collection surface 31 in direction of scanning (X-direction) (Y direction) is long.More particularly, the length at the locational collection surface 31 corresponding with the Y direction middle body of the AR1 of view field is the longest.
On collection surface 31, implement the lyophily processing (hydrophilicity-imparting treatment) of the compatibility of raising and liquid 1.In this embodiment, because liquid 1 is water, so collection surface 31 is implemented to be suitable for the surface treatment with the compatibility of water.And then; The photosensitive material of using at the ArF PRK that is coated with water proofing property (about 70～80 ° of contact angles) on the surface of substrate P (for example; Tokyo Applied Chemistry Industrial Co., Ltd. produces TARF-P6100), the liquid compatibility of collection surface 31 relative liquid 1 is also higher than the liquid compatibility of the relative liquid 1 in surface of substrate P.
The surface treatment of collection surface 31 and the polarity of liquid 1 are correspondingly carried out.Because the liquid in this embodiment 1 big water that is polarity, so, for example, give water wettability to this collection surface 31 through material formation film with the big molecular configuration of pure isopolarity as hydrophilicity-imparting treatment to collection surface 31.Perhaps, for collection surface 31, for example also can be through using oxygen (O 2) implement the O of plasma treatment as handling gas 2Plasma treatment is given water wettability.Like this, when making as liquid 1 under the situation of water, hope on collection surface 31, to dispose the processing on surface with the big molecular configuration of OH base isopolarity.At this, the material that is used for the relative liquid 1 usefulness non-solubility of surface-treated film forms.In addition, the lyophily processing can suit to change its treatment conditions according to the material behavior of employed liquid 1.
Below, the method for using above-mentioned exposure device EX pattern image of exposed mask M on substrate P is described.
At this; Exposure device EX in this embodiment moves the device of pattern image projection exposure on substrate P of mask M while mask M and substrate P are gone up in X-direction (direction of scanning); When scan exposure; The pattern image of the part of projection print plate M on the rectangular-shaped AR1 of view field under the fore-end of projection optical system PL; For projection optical system PL, go up and move synchronously at-directions X (perhaps+directions X) with mask M with speed V, go up with speed β V (β is the projection multiplying power) mobile via XY microscope carrier 53 substrate P at+directions X (perhaps-directions X).Then; Shown in the planimetric map of Fig. 5, on substrate P, set a plurality of shooting area S1～S12, behind end exposure to 1 shooting area; Stepping through substrate P is moved; Next shooting area moves to the scanning starting position, below, carry out the scan exposure of each shooting area is handled while use the step-by-step movement scan mode to make substrate P move order.And then, in this embodiment, the mobile simultaneously XY microscope carrier 53 of output of monitoring laser interferometer 56 the optical axis AX of control device CONT hypothesis as projection optical system PL advances along the dotted arrow 58 of Fig. 5.
At first, when mask M was placed on the mask microscope carrier MST, substrate P was placed on baseplate carrier PST and goes up (with reference to Fig. 1); Below; When carrying out the scan exposure processing, control device CONT drives liquid feed mechanism 10, begins carrying out the supply action of liquid on the substrate P.Soak regional AR2 in order to form liquid; The liquid 1 that provides separately from the 1st, the 2nd liquid supply unit 11,12 of liquid feed mechanism 10 is after through supply pipe 11A, 12A; Offer on the substrate P via the 1st, the 2nd supply part 13,14, between projection optical system PL and substrate P, form liquid and soak regional AR2.At this, as shown in Figure 4, flow through the liquid 1 of supply pipe 11A, 12A and on the Width of the internal flow path 13H of supply part 13,14,14H, spread, provide by supply port 13A, the 14A wide scope on substrate P.At this moment, supply port 13A, 14A are configured in X-direction (direction of scanning) both sides of the AR1 of view field, and control device CONT is carried out the supply of liquid 1 on the two side direction substrate P of the AR1 of view field simultaneously by the supply port 13A of liquid feed mechanism 10,14A.
Liquid feed mechanism 10 promptly provides liquid from a plurality of positions that on a plurality of directions (+directions X ,-directions X) that the AR1 of view field is different relatively, separate simultaneously by supply port 13A, 14A on the both sides that are set at the AR1 of view field.Thus, the liquid 1 that offers on the substrate P from supply port 13A, 14A soaks regional AR2 with wideer than view field AR1 at least scope formation liquid.
In this embodiment; When the both sides, direction of scanning from the AR1 of view field provide liquid 1 to substrate P; The liquid of the 1st, the 2nd liquid supply unit 11,12 of control device CONT controlling liquid feed mechanism 10 is supplied with action; With respect to the direction of scanning, the liquid quantity delivered of the time per unit that the front from the AR1 of view field is provided is set for more than the liquid quantity delivered that provides at its opposition side.For example; When while making substrate P under the situation of scanning exposure-processed on the+directions X; The relative AR1 of view field of control device CONT makes from the amount of liquid of-X side (being supply port 13A) recently more than the amount of liquid of+X side (being supply port 14A); On the other hand, while when substrate P is moved under the situation of exposure-processed at-directions X, the AR1 of view field made recently the amount of liquid from-X side is many from the amount of liquid of+X side.
In addition, control device CONT drives liquids recovery mechanism 20, and the liquids recovery action on the substrate P is carried out in the parallel supply action of carrying out the liquid 1 of liquid feed mechanism 10.Thus, as shown in Figure 4, liquid 1 usefulness that from supply port 13A, 14A the AR1 of view field is flow on the substrate P in the outside reclaims a mouthful 22A recovery.From reclaim liquid 1 that mouthful 22A reclaims by cut off partition space 24 that parts 23 separate separately circulate after, accumulate in the manifold pipe part 25.The liquid 1 that accumulates in the manifold pipe part 25 is reclaimed by liquids recovery portion 21 through recovery tube 21A.In this embodiment, possesses the structure that relative 1 liquids recovery portion 21 connects a plurality of partition spaces 24 like this.Then; Liquids recovery mechanism 20 is by the recovery mouth 22A that is configured to surround the AR1 of view field, from the relative AR1 of view field on a plurality of positions that different a plurality of directions separate, promptly; 4 sides (+directions X side from the AR1 of view field of rectangle;-directions X side ,+Y direction side ,-Y direction side) carry out the recovery of the liquid on the substrate P simultaneously.
Control device CONT is undertaken the supply of the liquid 1 on the surface of substrate P and the recovery of the liquid on the substrate P 1 by liquid feed mechanism 10 and liquids recovery mechanism 20 are parallel; The baseplate carrier PST of supporting substrate P is moved in X-direction (direction of scanning), on one side via the liquid between projection optical system PL and the substrate P 1 and projection optical system PL the pattern image projection exposure of mask M on substrate P.At this moment, because liquid feed mechanism 10 simultaneously carries out the supply of liquid 1 from the both sides of the AR1 of view field through supply port 13A, 14A with respect to the direction of scanning, so can be evenly and form liquid well and soak regional AR2.In addition; Liquids recovery mechanism 20 is because carry out the recovery of liquid 1 via the recovery mouth 22A of the recovery part 22 that surrounds the AR1 of view field simultaneously on a plurality of positions around the AR1 of view field of the both sides, direction of scanning that comprise the AR1 of view field, thus prevented 1 pair of substrate P of liquid around outflow or splash.And then, in this embodiment because with the low pure water of the compatibility of the photosensitive material on substrate P surface as liquid 1 supply, so can reclaim by liquids recovery mechanism 20 smoothly.
Fig. 6 (a) is the mode chart of the trace of the liquid 1 when showing on one side on+directions X moving substrate P exposure-processed being set at the 1st shooting area on the substrate P (for example the S1 of Fig. 5, S3 etc.) on one side.In Fig. 6 (a), from supply port 13A, 14A liquid 1 is provided simultaneously for the space between projection optical system PL and the substrate P, as comprising the AR1 of view field, form liquid thus and soak regional AR12.At this; From the relative AR1 of view field be set at-amount of liquid of the time per unit of the liquid 1 that supply port 13A on the X side provides because be configured to than from be set at+amount of liquid of the time per unit of the liquid 1 that the supply port 14A of X side provides is many; So the liquid 1 that provides from supply port 13A is drawn to+substrate P that directions X moves, is configured in the space between projection optical system PL and the substrate P smoothly.In addition, liquid 1 usefulness outside flowing to from supply port 13A, 14A reclaims mouthful 22A and reclaims, and suppresses to flow to substrate P unusual generation on every side.
At this, because substrate P moves to+directions X, thereby the AR1 of view field increases to the amount of liquid of+X side shifting relatively, exists in+the recovery mouth 22A that is provided with the liquids recovery position on the X side situation of withdrawal liquid 1 fully., shown in Fig. 6 (a), at the liquid that can not thoroughly reclaim on the recovery mouth 22A of+X side 1 because from this liquids recovery position be set at+collection surface 31 of collecting part 30 on the X side catches, so can not flow out or be distributed to substrate P around etc. on.At this; Collection surface 31 relative liquid 1 are carried out lyophily to be handled; And because have a surperficial high liquid compatibility than substrate P, so the liquid 1 outside will flowing to from the liquids recovery position of reclaiming mouthful 22A not by substrate P one side-lining, and is collected face 31 1 side-linings.Thus, be suppressed at the unusual generation of remaining liquid 1 grade on the substrate P.
At this because collection surface 31 the liquid that comprises the AR1 of view field soak regional AR2 as benchmark along with direction laterally and upwards direction tilt, so can prevent effectively further that liquid 1 from flowing out to the outside.Promptly; Through upwards direction inclination; For the 1st volume between substrate P and the projection optical system PL (volume corresponding), because the 2nd volume one side of 31 of substrate P and collection surfaces is big, so the liquid 1 that will flow out is remained on the 2nd volume part smoothly with the unit area of substrate P.In addition because upwards square neck is oblique, thereby since the fluid energy that will flow out to the outside along collection surface 31 upwards direction move and be transformed to potential energy, thereby can prevent liquid 1 outflow laterally effectively.
In addition, from be set at+amount of liquid that supply port 14A on the X side provides be configured to relatively from be set at-amount of liquid that supply port 13A on the X side provides is few.Promptly; Because being configured to the recovery mouth 22A of relative+X side is lacking from the liquid quantity delivered of the locational supply port 14A nearer than supply port 13A; So even liquid 1 is drawn to the substrate P to+X side shifting, also can suppress will from substrate P+the X side flows out to outside amount of liquid.
If the exposure-processed of the 1st shooting area finishes, then control device CONT is in order to be configured in the AR1 of view field of projection optical system PL on the 2nd shooting area different with above-mentioned the 1st shooting area stepping moving substrate P.Specifically, for example after relatively the scan exposure processing of shooting area S1 finishes, handle in order shooting area S2 to be carried out scan exposure, control device CONT between 2 shooting area S1 on the substrate P, S2 on Y direction stepping move.At this moment, the quantity delivered between the exposure period at shooting area is different relatively for liquid feed mechanism 10 quantity delivered that makes the liquid 1 during the stepping between 2 shooting areas on the substrate P is moved.Specifically, control device CONT makes liquid feed mechanism during move in stepping to the liquid quantity delivered of the time per unit on the substrate P, lacks than the liquid quantity delivered during the scan exposure of shooting area.Thus; Be suppressed at the liquid quantity delivered of the substrate P during the stepping of not carrying out exposure-processed is moved; Can be suppressed at the liquid consumption the exposure-processed all (carry substrate P on baseplate carrier PST, the exposure-processed of whole shooting area S1～S12 is finished until from baseplate carrier PST unloading).Like this, control device CONT is corresponding with the shift action (stepping moves or scan mobile) of the substrate P of a part that constitutes exposure-processed execution action, changes the 1st, the 2nd liquid supply unit 11, the 12 liquid quantity delivered of time per unit separately.
At this, liquid feed mechanism 10 reduces the quantity delivered of the time per unit of liquid 1 during the stepping of substrate P is moved, and keeps the supply action of (continuously) liquid 1.That is, liquid feed mechanism 10 changes the direction of scanning through changing shooting area, even perhaps when stepwise operation, also keeps (continuously) and supplies with from the liquid of supply port 13A, 14A and move.Like this; During a plurality of shooting area of liquid feed mechanism 10 on the sequential exposure substrate P; Continuously from be set at a plurality of locational supply port 13A, 14A provides liquid 1, changes liquid according to the direction of scanning and supplies with the position, perhaps when stepping is moved, do not change liquid and supply with the position; In other words; Liquid feed mechanism 10 (is placed on baseplate carrier PST to substrate P and goes up the exposure-processed end to whole shooting area S1～S12, until unloading from baseplate carrier PST) before a series of exposure-processed release to 1 substrate P, from a plurality of positions, liquid 1 is provided continuously.Thus, can prevent generation because of the vibration (water hammer) of the supply of liquid 1 and the liquid that stops to cause.
Fig. 6 (b) is a mode chart of showing the trace of the liquid 1 when making substrate P on one side mobile exposure-processed being set at the 2nd shooting area (the for example S2 of Fig. 5, S4 etc.) on the substrate P on-directions X.In Fig. 6 (b), from supply port 13A, 14A liquid 1 is provided for the space between projection optical system PL and the substrate P, as comprising the AR1 of view field, form liquid thus and soak regional AR2.At this; From the relative AR1 of view field be set at+amount of liquid of the time per unit of the liquid 1 that supply port 14A on the X side provides because be configured to than from be set at-amount of liquid of the time per unit of the liquid 1 that supply port 13A on the X side provides is many; So the liquid 1 that provides from supply port 14A by in-substrate P traction that directions X moves, is configured on the space between projection optical system PL and the substrate P smoothly.Control device CONT is corresponding with the moving direction (shift action) of the substrate P of a part that constitutes exposure-processed execution action like this, changes the liquid quantity delivered of the 1st, the 2nd supply port 11,12 time per unit separately.In addition, the liquid 1 outside flowing out to from supply port 13A, 14A is recovered mouthful 22A and reclaims, and inhibition will flow out to the unusual generation around the substrate P.
At this, move at-directions X through making substrate P, the liquid 1 that the collection surface 31 of quilt+X side is caught descends along collection surface 31, reclaims from the recovery mouth 22A of liquids recovery mechanism 20.Thus, can prevent the remaining of liquid 1 and reliably to the outflow of outside.Then; Follow substrate P to the moving of-X side, increase to the amount of liquid of-X side shifting, even can not use thus-the X side reclaims mouthful whole withdrawal liquid 1 of 22A; Also shown in Fig. 6 (b), from this liquids recovery position be set at-collection surface 31 of collecting part 30 on the X side catches liquid 1.
And then at this, collection surface 31 is to be formed the relative AR1 of view field along with direction laterally and upwards square neck is oblique, but also can be level (0 degree).On the other hand; If collection surface 31 tilts downwards; Then because the circulation energy in the outside that will flow out is not converted into potential energy; Even do not reclaim a mouthful 22A like fluid 1 along not moving to collection surface 31 declines when substrate P moves in the opposite direction, reclaim mouthful 22A withdrawal liquid 1 smoothly so can not use.Thereby it is desirable to collection surface 31 is dip plane of the surface level (0 degree) or the direction that makes progress.
And then; Under the many situation of the liquid quantity delivered of the time per unit on the relative substrate P; Under sweep velocity situation at a high speed, because it is many to flow out to the amount of liquid in the outside, so the angle of inclination of collection surface 31 is set at best angle according to these liquid quantity delivereds and sweep velocity.That is, when under the many situation of liquid quantity delivered and under the sweep velocity situation at a high speed, the angle of inclination of collection surface 31 is set greatly.On the other hand, when the angle of inclination of collection surface 31 was excessive, existence can not use collection surface 31 thoroughly to catch the situation of (maintenance) liquid 1.At this; Because through adopting the lyophily processing to strengthen lyophily, the liquid confining force of collection surface 31 increases, so under the situation that increases the angle of inclination; Treatment conditions through changing the lyophily processing are given best lyophily to collection surface 31, also can keep liquid 1 even increase the angle of inclination.Thereby the angle of inclination of collection surface 31 is set at best angle according to each parameter of material behavior (the liquid compatibility of collection surface) of liquid quantity delivered, sweep velocity and liquid etc.
; The formation of the salvage material 22 of this embodiment comprises: a plurality of partition spaces 24 that formed circular recovery mouth 22A continuously, are set at the partition parts 23 of the inside of reclaiming mouthful 22A, cut apart with these partition parts 23, on the manifold pipe part 25 of a plurality of partition spaces 24 of polymerization via recovery tube 21A contact liq recoverer 21.Thus, be provided with 1 and get final product, so can constitute by simplification device because comprise the liquids recovery portion 21 of formations such as vacuum pump.At this, each position of the peripheral direction of recovery part 22 separately on produce the attraction load different state that is used for withdrawal liquid 1, the attractive force of liquids recovery portion 21 reduces thus, existence can not be reclaimed the situation of action smoothly.But, can reclaim action smoothly through partition parts 23 are set.That is, for example because of the reason of the trace of liquid 1, it is opposite in recovery part 22, in the recovery mouth 22A of+X side, only to reclaim (attractions) liquid 1 relatively, in the recovery mouth 22A of-X side, comprises the state of air (swallowing air) attraction.In this case; The air of expansion in the recovery mouth 22A of-X side swallowed the zone; Shown in this embodiment under situation with liquids recovery portion 21 withdrawal liquid of a system since the air of swallowing produce that the attractive force of the vacuum pump that constitutes liquids recovery portion 21 reduces unusually.; On the inside (inner space 22H) of the recovery mouth 22A that forms continuously, be provided with and cut off parts 23; Through separate partition space 24 is set; Because can swallow the zone of air relatively spatially separates the zone that only attracts liquid 1; So can prevent because air is swallowed the expansion in zone or the attractive force of the air influence liquids recovery portion 21 that swallows reduces this unusual generation, even liquids recovery portion 21 is systems thus, liquids recovery mechanism 20 is withdrawal liquid 1 smoothly also.
As stated; Soak regional AR2 in order to form liquid; Because be arranged on the relative AR1 of the view field liquid feed mechanism 10 that (from mutual different many sides of the AR1 of view field) are carried out the supply of the liquid 1 on the substrate P simultaneously on position spaced on different a plurality of directions; Even so substrate P also can smoothly and well form liquid all the time and soak regional AR2 under situation about moving on a plurality of directions that comprise direction of scanning (± directions X) and step direction (± Y direction) between projection optical system PL and substrate P.Thereby, can under high image resolution and wide depth of focus, carry out exposure-processed.
A plurality of shooting areas on sequential exposure treatment substrate P separately the time; Because from a plurality of positions liquid 1 is provided continuously with liquid feed mechanism 10; So can prevent to follow the generation of the liquid vibration that provides and stop (water hammer) of liquid 1, the deterioration of the pattern that can prevent thus to be transferred.
In addition; Liquid feed mechanism 10 is because provide liquid 1 by supply port 13A, 14A from the both sides, direction of scanning of the AR1 of view field; So the liquid that provides in order making 1 to be by in substrate P traction of moving on the direction of scanning and the wet diffusion of stain on the AR1 of view field, as to comprise and form liquid smoothly the AR1 of view field and soak regional AR2.Then; In this embodiment; Liquid feed mechanism 10 is because the relative scanning direction; Make more than the amount of liquid that the amount of liquid that provides from the front of the AR1 of view field provides at its opposition side, flow along the moving direction of substrate P so be provided for substrate P traction that the liquid 1 on the substrate P is moved, the space smoothing ground that is drawn between projection optical system PL and the substrate P disposes.Thereby, even liquid 1 its energize that provides from liquid feed mechanism 10 little also between projection optical system PL and substrate P by configuration smoothly, can form liquid well and soak regional AR2.Then, corresponding to the direction of scanning changing the amount of liquid that provides separately from supply port 13A, 14A, can switch the flow direction of liquid 1.Even thus at+directions X, perhaps-a certain direction of directions X under the situation of scanning substrate P, also can between projection optical system PL and substrate P, form liquid smoothly and soak regional AR2, can obtain high image resolution and wide depth of focus.
In addition; The recovery part 22 of liquids recovery mechanism 20 as surround AR1 of view field and supply part 13, be formed 14 circular; Because (from different many sides of the AR1 of view field) are carried out the recovery of the liquid 1 on the substrate P simultaneously on a plurality of positions that separate on a plurality of directions that relatively AR1 of view field is different, so can prevent the unusual generation that 1 pair of substrate P outside of liquid is flowed out or splashed etc. reliably.Promptly; (exposure-processed of the whole shooting area S1～S12 on relative substrate P finishes before a series of exposure-processed release relevant with 1 substrate P in liquids recovery mechanism 20; Formation liquid soaks the recovery of the liquid 1 of regional AR2 and accomplishes preceding); Because continuously from as surround the such recovery mouth 22A that disposes of the AR1 of view field and reclaim action, so even liquid 1 spreads on any direction in a series of exposure-processed of substrate P is moved, also withdrawal liquid 1 well.In addition, in a series of exposure-processed action relevant, because need not stop attraction, so can suppress to follow liquid to attract the vibration that stops from the liquid that reclaims mouthful 22A with substrate P.
In addition,, seizure can not use the collecting part 30 of the liquid 1 that liquids recovery mechanism 20 thoroughly reclaims, the unusual generation that can prevent the outflow in 1 pair of substrate P outside of liquid or splash etc. through being set.Then, in this embodiment, collection surface 31 is because be formed seeing elliptical shape to the direction of scanning (X-direction) of substrate P outside outflow as the plane of length direction the most easily along liquid 1, so can prevent reliably that liquid 1 from flowing out to the outside.In addition, because collection surface 31 is implemented to improve and the lyophily processing of the compatibility of liquid 1, so can catch the liquid 1 that will flow out well.And then; The liquid compatibility of collection surface 31 is because also high through the surface treatment liquid compatibility more surperficial than substrate P; So because it is non-cohesive on substrate P and be collected face 31 and catch to flow out to outside liquid 1, so can prevent the unusual generation of remaining liquid 1 on the surface of substrate P.In addition; Because the collection surface 31 relative AR1 of view field are along with direction laterally and upwards square neck is oblique; To flow out to outside liquid 1 so can catch well, and, when being reverse direction in the direction of scanning of substrate P; Because the liquid that is captured 1 transmits downwards on collection surface 31, so can use the recovery mouth 22A that is connected with this collection surface 31 to reclaim well.
In addition; Because for immersion exposure with and from liquid feed mechanism 10 provide with the water wettability of the liquid contact surface 2a of the front end of projection optical system PL than and be coated on the also high liquid (water) 1 of water wettability of the lip-deep photosensitive material of substrate P; So when can reliably being full of the light path between projection optical system PL and the substrate P with liquid 1; The liquid (1) that offers on the substrate (P) is reclaimed smoothly, can prevent the outflow of liquid 1 or splash wait unusually.
And then; When in this embodiment, liquid 1 being provided in both sides, direction of scanning from the AR1 of view field; On the direction of scanning, make more than the amount of liquid that provides in a side from the amount of liquid that provides in a side, but the liquid 1 that also can the both sides from the AR1 of view field be provided is set to same amount away from projection optical system near projection optical system.In this case, because the variation of the quantity delivered of liquid 1 does not take place yet, can prevent the generation of water hammer more reliably when the switched scan direction.On the other hand, Yi Bian,, can when suppressing the water hammer generation, suppress the use amount of liquid 1 Yi Bian the amount of liquid that provides from the both sides, direction of scanning of the AR1 of view field is changed according to the direction of scanning through liquid 1 is provided continuously.
And then its formation is in this embodiment, in the exposure-processed action to 1 substrate P, carries out the supply from the liquid 1 of supply port 13A, 14A continuously, does not stop halfway.For example; Its formation can be, make substrate P to+when the scanning of X side is moved, stop only to supply with and liquid 1 be provided from supply port 13A from the liquid of supply port 14A; Make substrate P when the scanning of-X side is moved, stopping liquid from supply port 13A only provides and from supply port 14A liquid 1 is provided.And then its formation can be that when the stepping of substrate P was moved, liquid feed mechanism 10 stopped the supply to the liquid 1 of substrate P.In this case, when the beginning scan exposure, calm down the back scan exposure as long as carry out the supply wait liquid vibration of liquid 1 at the appointed time.Through being arranged to the use amount that such structure can suppress liquid 1.On the other hand.Through continuous feed fluid 1, because need not set the stand-by period of calming down, so can improve turnout up to liquid vibration.
Formation in this embodiment is; Liquid feed mechanism 10 the relative AR1 of view field of supply port 13A, 14A be set on the both sides, direction of scanning, but for example as all surround the AR1 of view field around also can supply port (supply part) be set in the both sides, non-direction of scanning of the AR1 of view field.Then also can to substrate P liquid 1 be provided separately from the supply port that as surrounding the AR1 of view field, is provided with.At this; To the AR1 of view field the both sides, direction of scanning separately with both sides, non-direction of scanning separately on when supply port is set; Promptly; When 4 supply ports of separate setting as surrounding the AR1 of view field, while when making substrate P on the direction of scanning, move exposure-processed, can be from whole liquid 1 that provide of 4 supply ports; Also can only liquid 1 be provided, supply with from the liquid that is set at the supply port on the both sides, non-direction of scanning and stop (perhaps providing on a small quantity) from the supply port that is arranged on the both sides, direction of scanning.Then, to non-direction of scanning moving substrate P the time, also can liquid be provided from the supply port that is set on the both sides, non-direction of scanning.Perhaps, also can be such structure, the supply part of ring-type is set as surrounding the AR1 of view field, via this supply part liquid 1 is provided on substrate P.In this case, get final product with 1 because send to liquid 1 the liquid supply unit of supply part, so can the simplification device structure.On the other hand, shown in above-mentioned embodiment,, then can fully be arranged on liquid to the AR1 of view field and soak on the regional AR2, can suppress the use amount of liquid 1 if the AR1 of view field has supply port 13A, 14A on the both sides, direction of scanning relatively.
In addition; Structure in this embodiment is; The supply port 13A of liquid feed mechanism 10, the relative AP1 of view field of 14A are set on the both sides, direction of scanning; Under situation about fully being full of with liquid 1 between projection optical system PL and the substrate P, can liquid be provided from 1 supply port near the AR1 of view field configuration.In this case, before the end exposure of the whole shootings on 1 substrate P,, the generation of water hammer can be suppressed, the use amount of liquid can be suppressed through liquid being provided continuously from this 1 supply port.
And then; In the above-described embodiment; 1st, the 2nd supply part 13,14 and recovery part 22 separate, but also can connect the 1st, the 2nd supply part 13,14 and recovery part 22, can also be arranged on the link that connects them between the 1st, the 2nd supply part 13,14 and the recovery part 22.In addition, in the above-described embodiment, the situation of Surface Vertical of the relative substrate P of internal flow path 22H of internal flow path 13H, 14H and the recovery part 22 of supply part 13,14 has been described, but also can have been tilted.The internal flow path 13H, 14H (perhaps supply port 13A, 14A) that for example, also can be arranged to make supply part 13,14 are towards the AR1 of view field side.And then, also can make the distance (highly) on surface of relative substrate P of recovery mouth 22A of supply port 13A, 14A and recovery part 22 different.
And then it is desirable to separately of liquids recovery mechanism 20 that comprises the liquid feed mechanism 10 of supply part 13,14 and comprise recovery part 22 is with projection optical system PL and support the support member supports beyond the support component of this projection optical system PL.The transfer of vibration that thus, can prevent generation in liquid feed mechanism 10 and liquids recovery mechanism 20 is to projection optical system PL.Opposite in addition, owing to make projection optical system PL and supply part 13,14 seamless contacts, can also expect to prevent that atmosphere from sneaking into the effect of liquid 1.
Below, another embodiment of the present invention is described.At this, in following explanation,, simplify and perhaps omit its explanation the identical symbol of component part mark identical or equal with above-mentioned embodiment.
The structure of the liquids recovery mechanism 20 of above-mentioned embodiment comprises: 1 liquids recovery portion 21; In this liquids recovery portion 21, connect, have the recovery part 22 that forms circular recovery mouth 22A continuously, but a plurality of liquids recovery portion also can be set via recovery tube 21A.Can be suppressed at thus reclaim mouthful 22A respectively reclaim the discrete of locational recovery power.In addition, control device CONT also can make the recovery power separately of this a plurality of liquids recovery portion different according to the liquids recovery position.Referring to Fig. 7.
Fig. 7 is the figure that shows another embodiment of the present invention, is the plane model figure of showing another example of liquids recovery mechanism 20.In Fig. 7, liquids recovery mechanism 20 comprises: the 1st liquids recovery portion 26; The 2nd liquids recovery portion 27; At the 1st recovery part 28 that connects via recovery tube 26A in the 1st liquids recovery portion 26, the 2nd recoverer 29 that in the 2nd liquids recovery portion 27, connects via recovery tube 27A.1st, the 2nd recovery part 28,29 be formed separately the plane see roughly circular-arc, the 1st recovery part 28 be configured in the AR1 of view field-the X side, on the other hand, the 2nd recovery part 29 be configured in the AR1 of view field+the X side on.And then the 1st, the 2nd recovery part 28,29 is the same with above-mentioned embodiment, possess to the recovery mouth of substrate P one side be set at its inner partition parts.In addition, the recovery of the 1st, the 2nd liquids recovery parts 26,27 action is independently carried out respectively by control device CONT.
During shooting area on the scan exposure substrate P; Control device CONT is when offering liquid 1 on the substrate P by liquid feed mechanism 10; In liquids recovery mechanism 20, drive the 1st, the 2nd liquids recovery portion 26,27 separately, reclaim the liquid 1 on the substrate P.At this, control device CONT makes its difference according to the liquids recovery power of liquids recovery position control liquids recovery mechanism 20.Specifically, control device CONT is with respect to the direction of scanning, is set at the liquids recovery amount (recovery power) at the time per unit of the front of the AR1 of view field than the liquids recovery amount at its opposition side and also lacks.That is, be increased in liquids recovery power on the direction of scanning front side (downstream that liquid 1 flows through).Specifically; Substrate P to+when directions X moves, relatively the AR1 of view field be set at+the recovery power of the 2nd recovery part 29 (the 2nd liquids recovery parts 27) on the X side be arranged to than by be set at-the recovery power of the 1st recovery part 28 (the 1st liquids recovery portion 26) on the X side is big.Thus, can prevent that fluid 1 can carry out the liquids recovery action on the substrate P smoothly when flow out the outside.
And then its formation is to adopt the liquids recovery action of the 1st, the 2nd liquids recovery parts 26,27 simultaneously in the above-described embodiment, but also can be the structure of carrying out respectively.For example its structure is; Substrate P to-when directions X moves; Only by the relative AR1 of view field be set at+the 2nd recovery part 29 (the 2nd liquids recovery portion 27) on the X side carries out the liquids recovery action, stops the liquids recovery action of being undertaken by the 1st recovery part 28 (the 1st liquids recovery portion 26).In this case, because liquid 1 is mainly in+X side flow, so only also can withdrawal liquid 1 through the recovery action of the 2nd liquids recovery portion 27.
In addition, in above-mentioned each embodiment, the recovery part of configuration liquids recovery mechanism 20 surrounds the whole of the AR1 of view field, but its structure also can be only on the both sides, direction of scanning of the AR1 of view field.
In addition, in above-mentioned each embodiment, the recovery part of continuous formation liquids recovery mechanism 20 as surrounding the AR1 of view field, and its formation as shown in Figure 8 also can be, intermittently disposes a plurality of recovery part 22D.Same its structure also can be, also is a plurality of supply part 13D of interrupted configuration, 14D for liquid feed mechanism 10.In this case, because with reclaiming action continuously as surrounding the such recovery mouth that disposes of the AR1 of view field, so even liquid 1 spreads to a certain direction, also withdrawal liquid 1 well.
In addition; In situation of the recovery part that is provided with a plurality of liquids recovery mechanism 20 etc.; Liquids recovery mechanism 20 is through making the liquids recovery power (the liquids recovery amount of time per unit) of the relative AR1 of view field on position spaced on the direction of scanning, and than on the position different with it, specifically the liquids recovery power on position spaced on the non-direction of scanning is also big; Can when scan exposure, reclaim the liquid 1 on the substrate P smoothly.
In addition; Through to connecting a plurality of liquids recovery portion respectively via recovery tube separately with vacuum pump etc. with what cut off partition space 24 that parts 23 cut apart; The recovery action of these a plurality of liquids recovery portions of independent control can make recovery power different according to the liquids recovery position.And then; Go up the liquids recovery portion that do not connect separately separately at partition space 24; And connect 1 liquids recovery portion and a plurality of partition space 24 separately with a plurality of recovery tubes; These recovery tubes separately on valve is set, through the adjustment valve aperture, can correspondingly make recovery power different with the liquids recovery position.And then, through changing above-mentioned a plurality of recovery tube length separately, also can make the recovery power on each partition space 24 different through the pressure loss.
And then in above-mentioned each embodiment, the supply part of liquid feed mechanism 10 is that roughly circular shape is seen on the plane, and as shown in Figure 9, also can be rectilinear form.At this, plane shown in Figure 9 sees that the supply part 13,14 of linearity is set at respectively on the both sides, direction of scanning of the AR1 of view field.Equally, the recovery part 22 of liquids recovery mechanism 20 also is not limited to circular, and as shown in Figure 9 can be rectangular shape.
Shown in Figure 10 (a), also can on the internal flow path 13H (14H) of the supply part 13 (14) of liquid feed mechanism 10, porous plastid 40 be set.Perhaps shown in Figure 10 (b), also can be provided with and cut off the slot-shaped stream of parts 41 formation.Through like this, can rectification offer the liquid 1 on the substrate P from supply part 13 (14), can be suppressed at the unusual generation that produces turbulent flow or liquid vibration on the substrate P.
In above-mentioned each embodiment, explained that collecting part 30 (collection surface 31) is that elliptical shape is seen on the plane, but also can be circular or rectangular shape.On the other hand, because the place that liquid 1 flows out easily is the both sides, direction of scanning of the AR1 of view field, so as stated,, can catch the liquid 1 that will flow out well through being arranged to elliptical shape to collecting part 30.In addition; Its formation is in the above-described embodiment; Collecting part 30 (collection surface 31) is an elliptical shape; The outside of the liquids recovery position of recovery part 22 all on as surround setting the recovery part 22, for example can be arranged to only be arranged on the both sides, direction of scanning of the AR1 of view field, be not arranged on the relative AR1 of view field on position spaced on the non-direction of scanning.Because the position that liquid 1 is not easy to flow out is in the both sides, direction of scanning, so even only on the both sides, direction of scanning of the AR1 of view field, collecting part 30 is set, also can catch the liquid 1 that will flow out well.In addition, the angle of inclination that also can be arranged to collection surface 31 is according to its position difference.For example, in collection surface 31, also can make near the angle of inclination the both sides, direction of scanning of the AR1 of view field bigger than other part.In addition, collection surface 31 needs not be the plane, for example can be the shape on a plurality of planes of combination.
Figure 11 is the figure of another embodiment of the collection surface 31 of exhibiting collection parts 30.Shown in figure 11, collection surface 31 can be a curve form.Specifically, shown in figure 11, collection surface 31 can be that section is seen for example 2 dimension curve shape or circular shapes.At this, collection surface 31 it is desirable to the curved surface to substrate P one side expansion.Even such shape also can be caught liquid 1 well.
Perhaps, shown in figure 12, can implement surface area to collection surface 31 and enlarge processing, specifically implement asperities and handle.The surface area of handling collection surface 31 through asperities enlarges, and can further catch liquid 1 well.And then asperities is handled need be on whole of collection surface 31, and its formation can be in collection surface 31, for example only handles on the zone of the part of direction of scanning, implementing asperities.
Shown in figure 13, also can use a plurality of fan-shaped parts 32 to constitute collecting part 30.In Figure 13, fan-shaped part 32 is that general triangular is seen in the side, and laterally and upwards square neck is oblique along with the relative AR1 of view field on the limit (bottom) relative with substrate P.Then, these a plurality of fan-shaped parts 32 are on the lateral surface of recovery part 22, and it is radial that its length direction is mounted to towards the outside.At this, separate between a plurality of fan-shaped parts 32, between each fan-shaped part 32, form space segment 33.Liquid 1 with recovery part 22 can not thoroughly reclaim is caught the space segment 33 between the fan-shaped part 32 through abutment surface tension force, prevents that liquid 1 from flowing to the outside of substrate P.
And then a plurality of fan-shaped parts 32 can be uniformly-spaced to be provided with, also can be with the unequal interval setting.The interval of the fan-shaped part 32 that for example, also can the position along the direction of scanning be set is set for than is set at along the interval of the fan-shaped part 32 of the position setting of non-direction of scanning little.In addition, separately length of a plurality of fan-shaped parts 32 (size of radiation direction) can be identical, and being set at also can be longer than the locational fan-shaped part 32 that is set in addition along the length of the fan-shaped part 32 of the position of direction of scanning.In addition, in collecting part 30, also can constitute the zone of a part, constitute remaining zone with collection surface with fan-shaped part.And then its formation also can be on the collection surface 31 that waits explanation with reference to Fig. 4, fan-shaped part 32 to be installed.And then it is desirable to, for the surface of fan-shaped part 32, also implement the lyophily processing of the compatibility of raising and liquid 1.
In above-mentioned each embodiment,, also can make this collection surface 31 have lyophily and distribute when collection surface 31 (perhaps fan-shaped part 32) being implemented under the situation of lyophily processing.In other words, can make the liquid contact angle for a plurality of zones on the surface-treated face through the enforcement surface treatment is different separately values.The lyophily relative inner zone in the part zone outside for example, also the AR1 of view field makes relatively in collection surface 31 reduces.And then its formation also can be, do not need the whole of lyophily processing collection surface 31, and for example a lyophily processing is along the zone of the part of direction of scanning.
And then, in the above-described embodiment, explained collection surface 31 is implemented the lyophily processing, but hydrophilicity-imparting treatment also can be implemented in the surface of the stream that in the liquids recovery portion 20 of liquid feed mechanism 10, liquid 1 is flow through.Particularly implement the lyophily processing, can carry out liquids recovery smoothly through recovery part 22 to liquids recovery mechanism 20.Perhaps also can implement the lyophily processing to the fore-end of the projection optical system PL of the lens barrel PK that comprises liquid 1 contact.And then when under film forming situation on the optical element 2, because be configured on the light path of exposing light beam EL, so the material that has a permeability with relative exposing light beam EL forms, its film thickness also is configured to see through the degree of exposing light beam EL.
In addition, being used for the surface-treated film is monofilm, the film that also can be made up of multilayer.In addition, it forms material if metal, metallic compound and organism etc. can be brought into play the material of desirable performance, then also can use material arbitrarily.
In addition, on the surface of substrate P, also can as one man implement surface treatment with the compatibility of liquid 1.And then as stated, the liquid compatibility of collection surface 31 it is desirable to also higher than the liquid compatibility on substrate P surface.
Below, another embodiment of liquid feed mechanism 10 of the present invention and liquids recovery mechanism 20 is described with reference to Figure 14.
In Figure 14, liquid feed mechanism 10 comprises: the 1st liquid feeding parts 11 and the 2nd liquid feeding parts 12; The AR1 of view field is set at the 1st supply part 13 on direction of scanning one side (X side) relatively; Be set at the 2nd supply part 14 on the opposite side (+X side); The 1st supply pipe 41 that connects the 1st liquid supply unit 11 and the 1st supply part 13; The 2nd supply pipe 42 that connects the 2nd liquid feeding parts 12 and the 2nd supply part 14.1st, the 2nd supply part 13,14 possesses internal flow path 13H, 14H respectively and is formed on supply port 13A, the 14A on its end portion with the same with reference to the embodiment of Fig. 2 and Fig. 3 explanation, is formed the plane and sees roughly circular shape.
The 1st supply pipe 41 that connects the 1st supply unit 11 and the 1st supply part 13 has straight sections 43, slit pipe portion 44.One end parts of straight sections 43 is connected with the 1st liquid supply unit 11, and the other end part of straight sections 43 is connected with an end of slit pipe portion 44.In addition, the other end of slit pipe portion 44 is connected with the upper part of the internal flow path 13H of the 1st supply part 13.One end parts of slit pipe portion 44 is formed with straight sections 43 roughly onesize, and the other end is formed with the upper part size of the 1st supply pipe parts 13 roughly the same.Then; Slit pipe portion 44 enlarges gradually in the horizontal direction to other end part from an end parts and forms the plane and see the general triangular shape, is formed on slot-shaped internal flow path 44H in the slit portion 44 and forms in the horizontal direction to the other end branch from an end parts and enlarge gradually.
The 2nd supply pipe 42 that connects the 2nd liquid supply unit 12 and the 2nd liquid supply unit 14 has straight sections 45; Slit pipe portion 46.One end parts of straight sections 45 is connected with the 2nd liquid supply unit 12, and the other end of straight sections 45 is connected with an end parts of slit pipe 46.In addition, the other end of slit pipe portion 46 is connected with the upper part of the internal flow path 14H of the 2nd supply part 14.It is roughly the same that one end parts of slit pipe portion 46 and straight sections 45 form size, and it is identical that the upper part of other end part and the 2nd supply part 14 forms approximate size.Then; Slit pipe portion 46 forms the plane that on horizontal slit, enlarges that kind gradually from an end parts to the other end branch and sees the general triangular shape, and the slot-shaped internal flow path 46H that is formed in the slit pipe portion 46 is formed from an end parts to the expansion gradually in the horizontal direction of other end part.
Liquids recovery mechanism 20 comprises: be formed on the recovery part 22 that ring-type is seen on the plane; A plurality of liquids recovery parts 61～64; The many recovery tubes 71～74 separately that connect recovery part 22 and liquids recovery portion 61～64.In this embodiment, liquids recovery portion is with 4 formations of the 1st～the 4th liquids recovery portion 61～64, and recovery tube is with 4 formations of the 1st～the 4th recovery tube 71～74 as corresponding with it.Recovery part 22 is with the same with reference to the embodiment of Fig. 2 and Fig. 3 explanation, comprise ring-type internal flow path 22H, be formed on the recovery mouth 22A on its end portion.And then, on the internal flow path 22H of embodiment shown in Figure 14, be not provided with and cut off parts (23).The recovery part 22 of liquids recovery mechanism 20 is configured on the outside of the 1st, the 2nd supply part 13,14 of liquid feed mechanism 10.
The 1st recovery tube 71 that in a plurality of liquids recovery parts, connects the 1st liquids recovery portion 61 and recovery part 22 has straight sections 75, slit pipe portion 76.One end parts of straight sections 75 is connected with the 1st liquids recovery portion 61, and the other end of straight sections 75 is connected with the other end of slit duct member 76.In addition, the other end of slit pipe portion 76 is connected with the upper part of the internal flow path 22H of recovery part 22.At this, an end parts of slit pipe portion 76 is formed with straight sections 75 sizes roughly the same, and on the other hand, the other end of slit pipe portion 76 is formed roughly 1/4 the size of the upper part of circular recovery part 22.Then; The general triangular shape is seen as being formed the plane to other end part enlarging gradually in the horizontal direction from an end parts by slit pipe portion 76, is formed on slot-shaped internal flow path 76H in the slit pipe portion 76 and is formed from an end parts and enlarges gradually to other end part.
Equally; The 2nd recovery tube 72 that connects the 2nd liquids recovery parts 62 and recovery part 22 has straight sections 77, slit pipe portion 78; One end parts of slit pipe portion 78 is formed with straight sections 77 roughly onesize; On the other hand, the other end of slit pipe portion 78 is formed roughly 1/4 the size of the upper part of circular recovery part 22.Then, slit pipe portion 78 is formed the plane and sees the general triangular shape, and the internal flow path 78H that is formed on the slit tubulose in the slit pipe portion 78 is formed to go up in the horizontal direction gradually to the other end from an end parts and enlarges.In addition, the 3rd recovery tube 73 that connects the recovery part 22 of the 3rd liquids recovery portion 63 has straight sections 79, slit pipe portion 80, and the 4th recovery tube 74 that connects the 4th liquid recovery tube portion 64 and recovery part 22 has straight sections 81 and slit pipe portion 82.Then, the other end of slit pipe portion 80,82 is formed roughly 1/4 the size of the upper part of circular recovery part 22 respectively.Then; The general triangular shape is seen on the plane that is formed separately of slit pipe portion 80,82, and the slot-shaped internal flow path 80H, being formed separately from an end parts of 82H that are formed on the slit pipe 80,82 enlarge on horizontal slit to other end part gradually.
The parts of liquid communication in the parts that constitute liquid feed mechanism 10 and liquids recovery mechanism 20; Specifically supply pipe 41,42 and recovery tube 71～74 are as stated; Can form with synthetic resin such as teflon, for example also can use the metal of stainless steel and aluminium etc. to form.In this embodiment, the parts of liquid communication are metallic.Particularly be arranged to aluminium to the parts that in liquid feed mechanism 10 and liquids recovery mechanism 20, constitute liquid flow path, because the contact angle of aluminium and liquid (water) is little, so circulating liquid smoothly.In addition, though not shown in Figure 14, on around the recovery part of liquids recovery mechanism 20 with the same collecting part 30 that is provided with of embodiment of front.
Below, the action of liquid feed mechanism 10 and liquids recovery mechanism 20 is described.Soak zone (AR2) in order to form liquid, the 1st, the 2nd liquid supply unit 11,12 of control device CONT driving liquid feed mechanism 10 separately.The liquid of seeing off separately from the 1st, the 2nd liquid supply unit 11,12 1 offers on the substrate P via the 1st, the 2nd supply part 13,14 after the circulation separately that makes the 1st, the 2nd supply pipe 41,42.At this; The liquid of seeing off from the 1st liquid feeding parts 11 1 is after straight sections 43 circulations of the 1st supply pipe 41; Through (transverse direction) the upward diffusion in the horizontal direction of circulation on slit pipe 44; On the other end of slit pipe portion 44, after the size of the roughly Y direction of the internal flow path 13H that expands the 1st supply part 13 to (supply port 13A), offer on the substrate P via the internal flow path 13H of the 1st supply part 13.Thus, liquid 1 Y direction as each position of the supply port 13A of the roughly circular shape of length direction on roughly uniformly the liquid quantity delivered offer on the substrate P.Equally; The liquid of seeing off from the 2nd liquid supply unit 12 1 is also after the straight sections that flows through the 2nd supply pipe 42 45; After (transverse direction) gone up expansion in the horizontal direction via slit pipe 46; Because offer the 2nd supply part 14, thus on each position of supply port 14A with roughly uniformly the liquid quantity delivered offer on the substrate P.
Promptly; In embodiment with reference to Fig. 2 and Fig. 3 explanation; Because supply pipe 11A all constitutes with straight tube; So from the supply pipe 11A of this straight tube to as the 1st supply part 13 of length direction liquid being provided directly Y direction; Then because the difference of this flow path area, thus the middle body of the length direction of the supply port 13A of the 1st supply part 13, promptly the liquid quantity delivered on the positive upper/lower positions at supply pipe 11A with the length direction end of supply port 13A, promptly and supply pipe 11A position spaced on the liquid quantity delivered between generation poor, liquid quantity delivered uneven phenomenon on each position of supply port 13A appears.Specifically; The length direction middle body of supply port 13A (supply pipe 11 just under the position) in the liquid quantity delivered more than the liquid quantity delivered in the length direction end (with supply pipe 11A position spaced) at supply port 13A; Generation can not evenly provide liquid, liquid to soak the uneven possibility of regional AR2.But; The 1st supply part 13 (supply port 13A) that is set to length direction in Y direction is gone up when by the 1st liquid supply unit 11 liquid 1 being provided; The stream size and the size of the 1st supply part 13 of at least a portion of supply pipe 41 are correspondingly set; Shown in this embodiment; Through being arranged to the part of supply pipe 41 have in the horizontal direction the slit pipe portion 44 of the internal flow path 44H of the horn shape that enlarges gradually, can with uniform liquid quantity delivered roughly liquid 1 be provided on substrate P Y direction in as each position of the supply port 13A of the 1st supply part 13 of length direction towards the 1st supply part 13.Equally, the liquid of seeing off from the 2nd liquid supply unit 12 1 also offers on the substrate P via the 2nd supply pipe 42 and the 2nd supply part 14 equably.
In addition, the 1st～the 4th liquids recovery portion 61～64 that control device CONT drives liquids recovery mechanism 20 reclaims the liquid 1 on the substrate P via recovery part 22 and the 1st～the 4th recovery tube 71～74 separately separately.Passing through separately of the 1st～the 4th liquids recovery parts 61～64 via liquid 1 recovery on the 1st～the 4th recovery tube 71～74 attraction substrate P.Then, the liquid on the substrate P 1 in each position of the recovery mouth 22A of circular recovery part 22 with roughly uniformly yield (recovery power) reclaim.
Promptly; With above-mentioned the same, if directly connect the recovery tube and the recovery part 22 of straight tube, then because its flow path area is different; Produce difference in the liquids recovery amount (recovery power) in each position of reclaiming mouthful 22A, produce liquids recovery amount uneven situation on each position of reclaiming mouthful 22A.For example, recovery tube just under the position in the liquids recovery amount than many in addition locational liquid quantity delivered, withdrawal liquid produces liquid and soaks the uneven possibility of regional AR2 equably.But; Shown in this embodiment; Through be arranged to the part of recovery tube to have towards recovery part 22 enlarge gradually in the horizontal direction the slit pipe portion 76,78,80,82 of internal flow path of horn shape, on each position of the recovery mouth 22A of circular recovery part 22 can with roughly uniformly the liquids recovery amount reclaim the liquid on the substrate P.
Like this, on supply port 13A, 14A each position separately, when can evenly liquid being provided,, soak regional AR2 so can form uniform liquid because can on each position of reclaiming mouthful 22A, evenly reclaim.
In embodiment with reference to Figure 14 explanation; The internal flow path 44H (46H) of slit pipe portion 44 (46) is empty shape; Shown in figure 15; On the internal flow path 44H (46H) of the slit pipe portion 44 (46) of the part of the supply pipe 41 (42) that constitutes liquid feed mechanism 10, a plurality of fan-shaped parts 85 can be set along the circulating direction (one end parts of pipe portion is to other end part from the slit) of liquid 1.Thus, can be at rectification liquid 1 after on substrate P, provide by supply part 13 (14).And then, also can extend to this fan-shaped part 85 the internal flow path 13H (14H) of supply part 13 (14).In addition, the internal flow path 76H of the slit pipe portion 76,78,80,82 of the recovery tube that constitutes liquid feed mechanism 20,78H, 80H, 82H separately on fan-shaped part 85 is set.
And then under the situation about for example moving in the substrate P high-velocity scanning etc., even consider in embodiment shown in Figure 14, can not thoroughly reclaim the liquid 1 on the substrate P, the liquid 1 on the substrate P flows out to the situation in the outside of recovery part 22.In this case, the plane that can the position along the direction of scanning (X-direction) of substrate P be set see the general triangular shape slit pipe portion 44,46 below, replace collecting part 30 to use as collection surface.
And then in this embodiment, its formation is to connect many recovery tubes 71～74 for 1 recovery part 22, and its constitute also can be as corresponding with many recovery tubes 71～74 such a plurality of recovery parts (recovery mouth) near the substrate P setting.
Below, another embodiment of liquid feed mechanism 10 of the present invention and liquids recovery mechanism 20 is described with reference to Figure 16～Figure 19.
Figure 16 shows the liquid feed mechanism (10) of this embodiment and the oblique view of liquids recovery mechanism (20).In Figure 16, liquid feed mechanism (10) comprising: 1st, the 2nd liquid supply unit 11,12; The the 1st, the 2nd supply pipe 41,42 that is connected separately with the 1st, the 2nd liquid supply unit 11,12.Liquids recovery mechanism (20) comprising: the 1st～the 4th liquids recovery portion 61～64; The the 1st～the 4th recovery tube 71～74 that is connected separately with the 1st～the 4th liquids recovery portion 61～64.Then, an end and the 1st separately of the 1st, the 4th supply pipe 41,42, the 2nd liquid supply unit 11,12 are connected, and the other end is connected with the supply stream that forms the later narration of parts 90 formation with stream.An end and the 1st separately of the 1st～the 4th recovery tube 71～74～the 4th liquids recovery parts 61～64 are connected, and the other end is connected with the recovery stream that forms the later narration of parts 90 formation with stream.
Stream forms parts 90 and comprises: the 1st parts 91; Be configured in the 2nd parts 92 on the top of the 1st parts 91; Be configured in the 3rd parts 93 on the top of the 2nd parts 92.Stream forms parts 90 and is configured to surround projection optical system PL; Constitute the respectively plate-shaped member of same naturally size rectangle that this stream forms the 1st～the 3rd parts 91～93 of parts 90, have bore portion 91A～93A that the part of can entreating therein goes up configuration projection optical system PL.Bore portion 91A～93A is formed and is interconnected.In addition, the 1st, the 2nd supply pipe 41,42 is connected with the 3rd parts 93 topmost in the 1st～the 3rd parts, and the 1st～the 4th recovery tube 71～74 is connected with the 2nd parts 92 in stage casing.
Figure 17 is illustrated in the oblique view that is configured in the 1st parts 91 on the hypomere in the 1st～the 3rd parts.The 1st parts 91 comprise: be formed on projection optical system PL-the X side on, form the 1st 94A of supply hole portion of the supply port that liquid 1 is provided on substrate 1; Be formed on projection optical system PL+the X side on, form the 2nd 95A of supply hole portion of the supply port that liquid is provided on substrate 1.The plane separately of the 1st 94A of supply hole portion and the 2nd 95A of supply hole portion see be formed roughly circular-arc.And then the 1st parts 91 comprise: be formed on projection optical system PL-the X side on, form to reclaim the 1st 96A of recovery holes portion of the recovery mouth of liquid on the substrate P; Be formed projection optical system PL-on the Y side, form the 2nd 97A of recovery holes portion of the recovery mouth that reclaims the liquid on the substrate P; Be formed on projection optical system PL+the X side on, form to reclaim the 3rd 98A of recovery holes portion of the recovery mouth of the liquid on the substrate P; Be formed on projection optical system PL+the Y side on, form to reclaim the 4th 99A of recovery holes portion of the recovery mouth of the liquid on the substrate P.Roughly circular shape is seen on the plane that is formed separately of the 1st～the 4th 96A～99A of recovery holes portion, around projection optical system PL, is configured to roughly uniformly-spaced.In addition, the relative projection optical system PL that compares with the 94A of supply hole portion, 95A separately of the 96A～99A of recovery holes portion is set at the outside.
Figure 18 is illustrated in the oblique view that is configured in the 2nd parts 92 on the stage casing in the 1st～the 3rd parts, and Figure 18 (a) is the oblique view from looking sideways, and Figure 18 (b) is the oblique view of looking sideways from down.The 2nd parts 92 comprise: be formed on projection optical system PL-the X side on, the 3rd 94B of supply hole portion that is connected with the 1st supply hole 94A of the 1st parts 91; Be formed on projection optical system PL+the X side on, the 4th 95B of supply hole portion that is connected with the 2nd supply hole 95A of the 1st parts 91.3rd, the 4th supply hole 94B, 95B shape and size separately is corresponding with the 1st, the 2nd 94A of supply hole portion, 95A.
And then the 2nd parts 92 comprise: below it, be formed on projection optical system PL-the X side on, the 1st 96B of recovery trench portion that is connected with the 1st 96A of recovery holes portion of the 1st parts 91; Be formed on projection optical system PL-the Y side on, the 2nd 97B of recovery trench portion that is connected with the 2nd recovery holes 97A of the 1st parts 91; Be formed on projection optical system PL+the X side on, the 3rd 98B of recovery trench portion that is connected with the 3rd 98A of recovery holes portion of the 1st parts 91; Be formed on projection optical system PL+the Y side on, the 4th 99B of recovery trench portion that is connected with the 4th 99A of recovery holes portion of the 1st parts 91.Each of the 1st～the 4th 96B～99B of recovery trench portion is formed the plane with the shape of the 1st～the 4th 96A～99A of recovery holes portion and big or small corresponding that kind freely and sees roughly circular shape, around projection optical system PL, roughly uniformly-spaced is provided with.In addition, the 1st recovery tube 71 is connected via the horn shape ditch 96T of portion with the 2nd 96B of recovery trench portion.The horn shape ditch 96T of portion is formed from the connecting portion of relative the 1st recovery tube 71 and enlarges gradually in the horizontal direction to the 1st 96B of recovery trench portion.Equally, the 2nd recovery tube 72 is connected via the horn shape ditch 97T of portion with the 2nd 97B of recovery trench portion, and the 3rd recovery tube 73 is connected via the horn shape ditch 98T of portion with the 3rd 98B of recovery trench portion, and the 4th recovery tube 74 is connected via the horn shape ditch 99T of portion with the 4th 99B of recovery trench portion.
Figure 19 is illustrated in the oblique view that is configured in the 3rd parts 93 on the epimere in the 1st～the 3rd parts, and Figure 19 (a) is the oblique view from looking sideways, and Figure 19 (b) is the oblique view of looking sideways from down.The 3rd parts 93 comprise: below it, be formed on projection optical system PL-the X side on, what be connected with the 3rd 94B of supply hole portion of the 2nd parts 92 the 1st supplies with the ditch 94C of portion; Be formed on projection optical system PL+the X side on, what be connected with the 4th supply hole 95B of the 2nd parts 92 the 2nd supplies with the ditch 95C of portion.1st, the 2nd supply with the ditch 94C of portion, 95C shape and size separately and see roughly circular shape as with the 3rd, the 4th 94B of supply hole portion, 95B (and then the 1st, the 2nd supply hole 94A, 95A) are corresponding, being formed the plane.In addition, the 1st supply pipe 41 and the 1st supply ditch 94C of portion are connected via the horn shape ditch 94T of portion.The horn shape ditch 94T of portion is formed from supplying with the ditch 94C of portion with the 1st supply pipe 41 relative connecting portions to the 1st and enlarges gradually in the horizontal direction.Equally, the 2nd supply pipe 42 and the 2nd supply ditch 95C of portion are connected via the 95T of cingulum sulcus portion.
The the 1st～the 3rd parts 91～93 for example form with stainless steel, titanium, aluminium or the metal that comprises their alloy etc., and the hole portion and the ditch portion of each parts 91～93 for example form with electrodischarge machining.Through electrodischarge machining each parts 91～93 is being processed,, formed stream and form parts 90 through with bonding these each parts 91～93 such as bonding agent, thermo-compressed methods.Bonding through each parts 91～93 of lamination, the horn shape ditch 94T of portion, the 1st supplies with the connection separately (connection) of the ditch 94C of portion, the 3rd 94B of supply hole portion and the 1st 94A of supply hole portion, forms the supply stream that is connected (connection) with the 1st supply pipe 41 thus.Equally, supply with the ditch 95C of portion, the 4th 95B of supply hole portion and the 2nd 95A of supply hole portion separately, form the supply stream that is connected (connection) with the 2nd supply pipe 41 through connecting (connection) horn shape ditch 95T of portion, the 2nd.Then, the liquid of seeing off separately from the 1st, the 2nd liquid supply unit 11,12 1 offers on the substrate P via the 1st, the 2nd supply pipe 41,42 and above-mentioned supply stream.That is,, form liquid and supply with stream through plate-shaped laminated parts 91～93.
In addition, through connecting (connection) horn shape ditch 96T of portion, the 1st 96B of recovery trench portion and the 1st 96A of recovery holes portion separately, form the recovery stream that is connected (connection) with the 1st recovery tube 71.Equally; Through connecting the horn shape ditch 97T of portion, the 2nd 97B of recovery trench portion and the 2nd 97A of recovery holes portion separately; Form the recovery stream that is connected (connection) with the 2nd recovery tube 72; Through connecting (connection) horn shape ditch 98T of portion, the 3rd 98B of recovery trench portion and the 3rd 98A of recovery holes portion separately; Form the recovery stream that is connected (connection) with the 3rd recovery tube 73,, form the recovery stream that is connected (connection) with the 4th recovery tube 74 through connecting (connection) horn shape ditch 99T of portion, the 4th 99B of recovery trench portion and the 4th 99A of recovery holes portion separately.Then, being recovered separately of the liquid on the substrate P via above-mentioned recovery stream and the 1st～the 4th recovery tube 71～74.
At this moment; Because the 1st, the 2nd supply pipe 41,42 separately on connect the horn shape ditch 94T of portion, 95T; So the same with embodiment with reference to Figure 14 explanation, be set to can evenly to carry out liquid on each position of supply port of length direction in Y direction and supply with.Equally, because also connect horn shape ditch portion, so can use uniform recovery power withdrawal liquid going up separately of recovery tube 71～74.
Then, form parts 90, for example can form and swallow the vibration that takes place when air attracts liquid when parts 90 are absorbed in liquids recovery with stream through each the self-forming stream that is used as the 1st of plate-shaped member～the 3rd parts 91～93.In addition because for many plate-shaped members 91～93 separately through implementing the part that is processed to form stream of electrodischarge machining etc., through making up the stream that their form liquid, supply with stream and reclaim stream separately so can form easily.
And then; In a plurality of parts 91～93 that form stream formation parts 90; The face of relative XY plane inclination is set on around the 1st～the 4th 96A～99A of recovery holes portion below the 1st parts 91 on being configured in hypomere; Handling through lyophily should the surface, can be used as seizure and can not use the collection surface of the liquid that liquids recovery mechanism thoroughly reclaims to use.In addition, form the parts 91～93rd that stream forms parts 90, square plate-shaped member, but also can use circular plate-shaped member, can be arranged in elliptoid plate-shaped member long on the directions X.
In addition, above-mentioned stream forms parts 90 portion's formation within it and supplies with stream and the both sides that reclaim stream, also can only be arranged on any side the inside of stream formation parts 90.In addition, the stream that forms of a plurality of parts of lamination form parts can be divided into supply with stream with and the recovery stream with and provide respectively.
Below, further another embodiment of the present invention is described.As stated; It is desirable to separately of liquids recovery mechanism 20 that comprises the liquid feed mechanism 10 of supply part 13,14 and comprise recovery part 22 is with projection optical system PL and support the support member supports beyond the support component of this projection optical system PL.Below, the supporting construction of liquid feed mechanism 10 and support liq recovering mechanism 20 is described with reference to Figure 20.
Figure 20 is a skeleton diagram of showing the support structure of liquid feed mechanism 10 and liquids recovery mechanism 20.Among Figure 20, exposure device EX comprises: the lens barrel platform of support projection optical system PL (the 1st support component) 100; Support the main frame (the 2nd support component) 102 of lens barrel platform 100, mask microscope carrier MST and baseplate carrier PST.And then in Figure 20, Z microscope carrier and XY microscope carrier illustrate with one.Main frame 102 is arranged to approximate horizontal through foot section 108 on the ground of ultra-clean chamber etc.On main frame 102, form outstanding to the inside 102A of upper lateral section portion and the 102B of lower lateral section portion.
Lamp optical system IL supports with the support frame 120 on the top that is fixed on main frame 102.In the upper lateral section part 102A of main frame 102, support mask platform 124 via vibration proof device 122.Formation makes the peristome that the pattern image of mask M is passed through on the middle body of mask microscope carrier MST and mask platform 124.A plurality of gas bearing as non-contact bearing (air bearing) 126 are set on below mask microscope carrier MST.Mask microscope carrier MST supports with top (guide surface) noncontact of air bearing 126 relative mask platforms 124, can 2 dimensions move and small rotation on θ Z direction in the XY plane with mask microscope carrier drive unit.
On the periphery of the lens barrel PK that keeps projection optical system PL, ring flange 104 is set, projection optical system PL is supported on the lens barrel platform 100 via this ring flange 104.Configuration comprises the antihunting device 106 of mattress etc. between the 102B of hypomere portion of lens barrel platform 100 and main frame 102, and the lens barrel platform 100 of support projection optical system PL is supported on the lower lateral section part 102B of main frame 102 through antihunting device 106.Be not delivered on the lens barrel platform 100 of support projection optical system PL with the vibration of this antihunting device 106 as main frame 102, on vibratility, be isolated from each other lens barrel platform 100 and main frame 102.
Gas bearing (air bearing) 130 as a plurality of non-contact bearings is set on below baseplate carrier PST.In addition, on main frame 102, through comprising the antihunting device 110 supporting platform pedestals 112 of mattress etc.Baseplate carrier PST supports with top (guide surface) noncontact of air bearing 130 relative microscope carrier pedestals 112, can in the XY plane, 2 dimensions move and minute movement on θ Z direction with the baseplate carrier drive unit.And then baseplate carrier PST can also move on Z direction, θ directions X and θ Y direction.Be not delivered to the vibration of this antihunting device 110 as main frame 102 the microscope carrier seat 112 of noncontact supporting substrate microscope carrier PST, microscope carrier pedestal 112 is isolated from each other on vibratility with main frame 102 quilts.
On the baseplate carrier PST+moving lens 55 is set on the assigned position of X side, lens barrel PK+be provided with reference to mirror (fixed mirror) 114 on the assigned position of X side.In addition, on the relative position laser interferometer 56 is being set with moving lens 55 and with reference to mirror 114.Laser interferometer 56 is because be installed on the lens barrel platform 100, so laser interferometer 56 is isolated from each other on vibratility with liquid feed mechanism 10 and liquids recovery mechanism 20.Laser interferometer 56 shines reference beams (with reference to light) when long light beam (mensuration light) is surveyed in 55 irradiations of lens barrel mirror on reference to mirror 114.On the light accepting part of laser interferometer 56, receive light from moving lens 55 and with reference to mirror 114 reflected light separately with reference beams based on the long light beam of irradiated survey; Laser interferometer 56 is interfered these light; Measurement is the variable quantity of optical path length of the long light beam of survey of benchmark with the optical path length of reference beams; And then measure being the positional information of the moving lens 55 of benchmark, the i.e. positional information of baseplate carrier PST with reference to mirror 114.Equally, though not simultaneously, on baseplate carrier PST and lens barrel PK+the Y side also is provided with moving lens and with reference to mirror, on the position relative with them, laser interferometer is set.
In addition; In the focal position that is used to measure substrate P on the lens barrel platform 100 (Z position) and the self-focusing detection system that tilts and the calibration system of the calibration marker on the substrate P etc.; Also supported by not shown measuring system, these measuring systems also are to be isolated from each other on vibratility with main frame 102, liquid feed mechanism 10, liquids recovery mechanism 20.
Liquid feed mechanism 10 and liquids recovery mechanism 20 are supported by the 102B of hypomere portion of main frame 102.Formation in this embodiment is: the recovery part 22, recovery tube 21A etc. that constitute the 1st, the 2nd supply part 13,14, supply pipe 11A, the 12A of liquid feed mechanism 10 and constitute liquids recovery mechanism 20 are with support component 140 supports, and this support component 140 is connected with the 102B of hypomere portion of main frame 102.And then, in Figure 20, simplicity of illustration such as supply part 13,14, recovery part 22, supply pipe 11A, 12A and recovery tube 21A.
Like this; Through with the main frame 102 support liq feed mechanisms 10 and the liquid feed mechanism 20 that on vibratility, are isolated from each other with the lens barrel platform 100 of support projection optical system PL, liquid feed mechanism 10 and liquids recovery mechanism 20 are isolated from each other on vibratility with projection optical system PL quilt.Thereby when liquid was supplied with, the vibration that perhaps produces during liquids recovery can not be delivered to the measuring system of projection optical system PL, laser interferometer 56 and self-focusing detection and calibration system etc. via lens barrel platform 100.Thereby, can prevent because the unusual situation of pattern image deterioration takes place in the projection optical system vibration, in addition, because can high precision carry out the position control of baseplate carrier (substrate P), so can project to the pattern image high precision on the substrate.In addition; Through with the main frame 102 support liq feed mechanisms 10 and the liquid feed mechanism 20 that on vibratility, are isolated from each other with the microscope carrier pedestal 112 of supporting substrate microscope carrier PST, liquid feed mechanism 10 and liquids recovery mechanism 20 are isolated from each other on vibratility with microscope carrier pedestal 112 quilts.Thereby when liquid was supplied with, the vibration that perhaps when liquids recovery, produces can not be delivered to microscope carrier pedestal 112, can prevent to produce the position that reduces baseplate carrier PST and confirm precision, perhaps mobile accuracy unusual.
And then, in this embodiment, support liq feed mechanism 10 and liquids recovery mechanism 20 integratedly on main frame 102, but also can liquid feed mechanism 10 be installed separately on main frame 102 with liquids recovery mechanism 20.And then main frame 102 and another support component are configured in the ground of ultra-clean chamber etc., also can support liq feed mechanism and liquids recovery mechanism on this support component.
As stated, the liquid in this embodiment 1 uses pure water.When can obtaining in a large number easily, have does not have dysgenic advantage to the photoresist on the substrate P and optical element (lens) etc. to pure water in semiconductor fabrication factory etc.In addition, pure water is not having the dysgenic while to environment, because the amount of impurity is extremely low, so the effect on the surface of the optical element on the front end face that can also expect to clean the surface of substrate P and be set at projection optical system PL.Then; The refractive index n of the pure water (water) of the exposing light beam EL about relative wavelength 193nm we can say roughly about 1.44; Work as under the situation of using ArF PRK (wavelength 193nm) as the light source of exposing light beam EL; On substrate P, turned to 1/n, promptly about 134nm and obtain high resolution by the short wavelength.And then; Compare in depth of focus and the air because expand as n approximately doubly, promptly be about 1.44 times, so as long as when guaranteeing under the situation about in air, using under the situation that equal depth of focus gets final product; Can further increase the numerical aperture of projection optical system PL, this point also can improve resolution.
And then, ought use as stated under the situation of immersion method, the numerical aperture NA of projection optical system is 0.9～1.3.Under the big like this situation of the numerical aperture NA of projection optical system, in the random polarization that in the past uses as exposing light beam because of polarized light effect imaging performance worsens, so hope to use polarized illumination.In this case; Carry out the consistent rectilinearly polarized light illumination of length direction with the line pattern of the line of mask (master reticle) and pitch pattern; From the pattern of mask (master reticle), can penetrate the diffraction light of many S polarized light components (along the direction of polarized light composition of the length direction of line pattern).And be full of projection optical system PL and be coated on the situation between the lip-deep resist of substrate P with liquid; And be full of projection optical system PL and situation about being coated between the lip-deep resist of substrate P is compared with air (gas); Because the lip-deep transmitance of resist at the diffraction light of the S polarized light component that helps improving contrast is high; Even, also can obtain high imaging performance so surpass under 1.0 the situation at the numerical aperture NA of projection optical system.In addition, if combination oblique incidence illumination (particularly dipole illumination) consistent with the length direction of phase shifting mask or line pattern etc. aptly then has further effect.And then; For the oblique incidence illumination consistent with the length direction of line pattern; For example be disclosed in the spy and open on the flat 6-188169 communique, in by this world application, specify or scope that the state decree selected is allowed in, quote this openly as the part of the record of this paper.
In this embodiment, on the front end of projection optical system PL,, can carry out the optical characteristics of projection optical system PL, for example the adjustment of aberration (spherical aberration, coma aberration etc.) with this projection as optical element 2 lens mounting.And then, also can be the optical sheet of the above-mentioned optical characteristics of adjustment as optical element 2.On the other hand, also can be arranged to the planopaallel plate more cheap to the optical element 2 that contacts with liquid 1 than lens.Through being arranged to planopaallel plate to optical element 2; Even the inhomogeneity material (for example silica-based organic substance) of illumination and illumination profile that reduces the transmitance of projection optical system PL, the exposing light beam EL on the substrate P in when the transportation of exposure device EX, assembling, adjustment etc. is on attached to this planopaallel plate; Also can only before liquid 1 is being provided, change this planopaallel plate, compare with the situation that the optical element that contacts with liquid 1 is set to lens and have the low advantage of its replacement cost.Promptly; Because because the particle that splashes that from resist, takes place because of the irradiation of exposing light beam EL, perhaps adhering to of the impurity in the liquid 1 waits the surface that causes the optical element that contact with liquid 1 dirty, so need regularly replace this optical element; And through being arranged to this optical element cheap planopaallel plate; Compare the cost of changing parts with lens and reduce, and can shorten and change the needed time, can suppress the rising of maintenance cost (operating cost) and the reduction of turnout.
And then, under the situation big, can not change this optical element because of the optical element of the front end of the projection optical system PL of the mobile generation of liquid 1 and the pressure between the substrate P, this optical element is by fixing can not being moved by this pressure firmly.
And then the liquid 1 of this embodiment is water, and also can be the liquid beyond the water.For example the light source at exposing light beam EL is F 2Under the situation of laser, this F 2Laser is because permeate water not, so can be to see through F as liquid 1 2The fluorine element base flow body of for example crossing fluorinated polyether (PFPE) or fluorine element base oil etc. of laser beam.In this case, with part that the liquid 1 that with collection surface 31 is the master contacts on, for example, form film through material and carry out the lyophily processing with the little molecular configuration of the polarity that comprises fluorine element.In addition, as liquid 1, can also use relative exposing light beam EL to have permeability in addition, refractive index is high as far as possible, for projection optical system PL be coated on the stable material of the lip-deep photoresist of substrate P (for example cedar oil).The polarity that also is surface treatment and employed liquid 1 is in this case correspondingly carried out.
And then; The formation of above-mentioned projection optical system PL (design) is; Liquid be full of this image planes side with liquid 1 (pure water) soaks under the state, and its imaging performance is best, becomes such structure and (design) also can be set; The optical element (near the optical element of substrate P) of the part through changing projection optical system PL does not exist the non-liquid of liquid to soak state and soaks under the state with the liquid that another liquid is full of this image planes side in this image planes side to obtain desirable imaging performance.Through such formation projection optical system PL, for example under the situation that needs big depth of focus DOF, soak and use exposure device EX state under at liquid, soak use exposure device EX under the state at non-liquid requiring to change a part of optical element under large-duty situation.In this case, for the imaging performance after the replacing of measuring a part of optical element, hope configuration space image-position sensor or corrugated aberration determination sensor on baseplate carrier PST.In addition, can use the corrugated aberration to measure the mask of usefulness, also can as under each state, obtaining desirable imaging performance, promote a part of optical element, perhaps carry out the inching of the wavelength of exposing light beam EL according to the mensuration result of this imaging performance.And then; For above-mentioned aerial image sensor in detail; For example open in 2002-14005 number (corresponding United States Patent (USP) discloses 20020041377) the spy open, in addition for corrugated aberration determination sensor in detail, for example open in No. 02/63664 communique of International Publication; Specify in the border application home or scope that the decree of selecteed country allows in, quote the part of these open records as this paper.
In addition, the replacing of the optical element of a part it is desirable under the state that projection optical system PL is installed on the exposure device EX, carry out, and also can under the state of pulling down projection optical system PL from exposure device EX, carry out.
And then; Substrate P as above-mentioned each embodiment; Be not only applicable to the semiconductor wafer of semiconductor devices manufacturing usefulness; And be applicable to the glass substrate that display devices uses, the ceramic wafers that thin-film head is used, the mask that perhaps in exposure device, uses or the master of master reticle (synthetic quartz, silicon wafer) etc.
As exposure device EX except the scanning exposure apparatus (scanning stepping exposure device) of the step-by-step movement scan mode that can be suitable for the pattern that makes mask M and the synchronous motion scan exposed mask of substrate P M; Can also be useful in and make under the static state of mask M and substrate P the pattern of exposed mask M in the lump, make the projection aligner (stepping exposure device) of the stepping repetitive mode that the stepping of substrate P order moves.In addition, the present invention can also be applicable to the exposure device of the interrupted mode of stepping of a local at least overlapping transferase 12 pattern on substrate P.
In addition, the present invention can also be applicable to the exposure device of two microscope carrier types.The structure of the exposure device of two microscope carrier types and exposure actions are for example opened flat 10-163099 number and spy the spy and are opened flat 10-214783 number (corresponding United States Patent (USP) 6341007; 6400441,6549269 and 6590634), 2000-505958 number (corresponding United States Patent (USP) 5 of special table; 969; 441) open or in the United States Patent (USP) 6208407, specify in the application of border home or scope that the decree of selecteed country is allowed in, quote these open parts as this paper record.
Kind as exposure device EX; Be not limited to the exposure device of the semiconductor element manufacturing usefulness of exposure semiconductor element pattern on substrate P; Also can adaptable across make the liquid crystal display cells manufacturing with or the exposure device of display exposure device for making and thin-film head, imaging apparatus (CCD) or master reticle or mask etc. etc. in.
Under the situation that in baseplate carrier PST and mask microscope carrier MST, is suitable for linear electric machine, also can use the air come-up type of the air bearing of having sampled and use Lorentz force or one of the magnetic levitation type of reactance power.In addition, each microscope carrier PST, MST can be the types that moves along guide rail, also can be the no rail types that guide rail is not set.The example that in microscope carrier, has used linear electric machine is at United States Patent (USP) 5,623, and 853 and 5; 528; Open in 118, specify in the scope that perhaps decree of selecteed country is allowed in the application of border home respectively, quote the part of the record content of these files as the record of this paper.
As the driving mechanism of each microscope carrier PST, MST, can use in the magnet assemblies that has disposed magnet on the bidimensional and on two dimension, to have disposed the armature assembly of coil relative, the planar motor of each microscope carrier PST of electricity consumption magnetically-actuated, MST.In this case, if one of magnet assemblies and armature assembly be connected microscope carrier PST, MST is last, be arranged on the opposing party of magnet assemblies and armature assembly on the mobile side of microscope carrier PST, MST to get final product.
Reacting force by the mobile generation of baseplate carrier PST can use frame parts mechanically to be transmitted to the earth, so that it is not delivered on the projection optical system PL.The disposal route of its reacting force is for example at United States Patent (USP) 5; 528; Open in detail in 118 (spy opens flat 8-166475 communique), specify in the scope that perhaps decree of selecteed country is allowed in the application of border home, quote the part of the content of document record as this paper record.
Reacting force by the mobile generation of mask microscope carrier MST uses frame parts mechanically to be delivered to the earth, so that it is not delivered to projection optical system PL.The disposal route of this reacting force for example is disclosed in United States Patent (USP) the 5th in detail; 874; Among 820 (spies open flat 8-330224 communique), in the scope that the decree designated or country selected is allowed in the application of border home, the part of the open record as this paper of quoting the document.
As stated, the exposure device EX of the application's embodiment is included in the various subsystem manufacturings of each inscape of enumerating in the scope of the application's patent request through assembling as the mechanical precision that keeps regulation, electric precision, optical precision.In order to ensure these precision; Front and back in this assembling; Various optical systems are used to realize the adjustment of optical precision, various mechanical systems are used to realize the adjustment of mechanicalness precision, various electrical systems are used to realize the adjustment of electric precision.The operation of the assembling from various subsystems to exposure device comprises the distribution connection of the mutual mechanical connection of various subsystems, electric circuit, the pipe arrangement connection of pneumatic circuit etc.From various subsystems before the operation of the assembling of exposure device, each subsystem assembling procedure is separately arranged certainly.If the assembling procedure to the exposure device of various subsystems finishes, then comprehensively adjust, guarantee as the whole various precision of exposure device.And then the manufacturing of exposure device is hoped in the clean room that temperature and cleanliness are managed, to carry out.
The microdevice of semiconductor devices etc. is via following steps manufacturing shown in figure 21: carry out the function of microdevice and the step 201 of performance design; Manufacturing is based on the step 202 of the mask (master reticle) of this design procedure; Manufacturing is as the step 203 of the substrate of the basic material of device; With the exposure device EX of above-mentioned embodiment the exposure-processed step 204 of the pattern exposure of mask on substrate; Device number of assembling steps (comprising: cutting action, bonding process, packaging process) 205; Inspection step 206 etc.
If employing the present invention; Then between projection optical system and substrate, forming liquid soaks when carrying out exposure-processed under the regional state; Can stably form liquid soak the zone in reclaim this liquid well; Because can prevent that liquid is to periphery outflow etc., so can carry out exposure-processed accurately.Thereby exposure device of the present invention is extremely effective between the exposure period of the high image resolution of the short wavelength light source that has used ArF PRK etc.

Claims (16)

1. exposure device, through projecting to exposure base on the substrate to the picture of predetermined pattern across liquid, this exposure device comprises:
Project to the projection optical system on the substrate to the picture of above-mentioned pattern;
The liquid feed mechanism of liquid for soaking the zone, formation liquid on a part of substrate of the view field that comprises projection optical system is provided on substrate;
In the liquids recovery mechanism that carries out the liquids recovery on the substrate on a plurality of positions simultaneously,
The aforesaid liquid recovering mechanism comes withdrawal liquid according to the liquids recovery position with different recovery power.
2. the described exposure device of claim 1; Each shooting area on the aforesaid substrate moves on one side to the direction of scanning of regulation on one side and is made public; The aforesaid liquid recovering mechanism makes the liquids recovery power on the assigned position that separates with above-mentioned view field on the above-mentioned direction of scanning, and is also bigger than the locational liquids recovery power different with the afore mentioned rules position.
3. the described exposure device of claim 1 further comprises the outside that is configured in the liquids recovery position that above-mentioned relatively view field undertakies by the aforesaid liquid recovering mechanism and is formed with the collecting part of the liquid collection surface of the specified length of catching the liquid that can not thoroughly reclaim with above-mentioned liquids recovery mechanism.
4. the described exposure device of claim 1, the aforesaid liquid feed mechanism carries out the supply of liquid between liquids recovery position of being undertaken by the aforesaid liquid recovering mechanism and above-mentioned view field.
5. the described exposure device of claim 1, aforesaid liquid feed mechanism provide the high liquid of compatibility to the compatibility comparison aforesaid substrate surface of the liquid contact surface of the front end of above-mentioned projection optical system.
6. the described exposure device of claim 5, aforesaid liquid is a water, the liquid contact surface of the front end of above-mentioned projection optical system has been implemented hydrophilicity-imparting treatment, on the aforesaid substrate surface, is coated with the photosensitive material of water proofing property.
7. the described exposure device of claim 1, aforesaid liquid recovering mechanism have continuously or form the recovery mouth that surrounds above-mentioned view field discontinuously.
8. the described exposure device of claim 1 also comprises being configured to the lyophily lower surface that surrounds above-mentioned view field and keep aforesaid liquid.
9. the described exposure device of claim 8, above-mentioned lyophily lower surface with respect to the horizontal plane tilts.
10. the described exposure device of claim 8, above-mentioned lyophily lower surface is for the lyophily of the aforesaid liquid surface greater than aforesaid substrate.
11. the described exposure device of claim 10, the surface of aforesaid substrate is a water proofing property for aforesaid liquid.
12. the described exposure device of claim 1, in the recovery of aforesaid liquid, the aforesaid liquid feed mechanism is supplied with aforesaid liquid on aforesaid substrate.
13. the described exposure device of claim 12, aforesaid liquid feed mechanism change the quantity delivered of aforesaid liquid according to the action that will carry out.
14. the described exposure device of claim 13; While each shooting area that moves on the aforesaid substrate scan exposure aforesaid substrate, the aforesaid liquid feed mechanism is made the quantity delivered of liquid during the stepping between 2 shooting areas on the aforesaid substrate is moved and between the exposure period of each shooting area, differ from one another by operation.
15. the described exposure device of claim 1, the aforesaid liquid feed mechanism has supply port, and the aforesaid liquid recovering mechanism has and reclaims mouthful, and the distance on surface that distance and the above-mentioned recovery mouth that above-mentioned supply port leaves the surface of aforesaid substrate leaves aforesaid substrate is different.
16. a device making method uses each the described exposure device among the claim 1-15.
CN2008101609543A 2003-02-26 2004-02-26 Exposure apparatus and method for producing device Expired - Fee Related CN101354540B (en)

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