CN101319310B - Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture - Google Patents
Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture Download PDFInfo
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- CN101319310B CN101319310B CN200810022195.4A CN200810022195A CN101319310B CN 101319310 B CN101319310 B CN 101319310B CN 200810022195 A CN200810022195 A CN 200810022195A CN 101319310 B CN101319310 B CN 101319310B
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Abstract
The invention discloses a plasma chemical vapor deposition vacuum apparatus for the scale manufacture of photovoltaic modules, comprising a vacuum cavity body (10) and an electrode box (20). The vacuum cavity body (10) is a separable vacuum cavity body which comprises a main part (11) positioned in the middle section of the vacuum cavity body and separable parts (12 and 13) respectively positioned at two ends of the vacuum cavity body. The main part (11) and the separable parts (12, 13) at two ends of the vacuum cavity body can encloses an airtight vacuum cavity body and can be separated from each other for loading and unloading the deposition products, the electrode box (20) is arranged inside the main part (11) of the vacuum cavity body and keeps relative static to the main part (11) of the vacuum cavity body. By moving a part of the vacuum cavity body, the invention is free from the motion of the electrode box, thereby avoiding severe damages caused by frequent contact in loading and unloading of the electrode, and the reduction in the qualification rate of product caused by the unstable radio frequency glow due to the damage of the electrode. Besides, the vacuum apparatus has simple structure and lowers the manufacture cost.
Description
Technical field
The present invention relates to photovoltaic module and manufacture field, especially relate to a kind of plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture.
Background technology
In prior art, for the plasma chemical vapor deposition vacuum apparatus of photovoltaic module scale manufacturing, comprise the major partss such as vacuum moulding machine chamber and electrode box.A depositing electrode box comprises a plurality of radio-frequency electrodes, each electrode can deposit 4 solar cells, the electrode box that preheating is completed is put in the middle of a vacuum moulding machine chamber, completes the deposition of amorphous silicon film solar battery in vacuum chamber, after having deposited, the taking-up of electrode box is carried out cooling.
The existing shortcoming of prior art is: before deposition, need, by being equipped with wait the electrode box that deposits glass after other device is preheated, to push deposition chambers at every turn, then the electrode of electrode box is installed; And after deposition, need again the electrode that has deposited the electrode box of amorphous silicon film solar battery to unload, and electrode box is pulled out to vacuum chamber, cooling at other supplementary unit.Electrode contact so frequently loads and unloads, and the contact of electrode is produced and bad impact, and the contact of electrode is bad will cause the unstable of radio frequency aura again, thereby causes the qualification rate in production process not high.Meanwhile, existing system has also increased extra primary heater unit and refrigerating unit, has increased the process of the central streamline of production line.
Summary of the invention
The object of the invention is: disclose a kind of plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture, it can improve the qualification rate of product, and system architecture is simple, can reduce the cost of manufacturing.
The technical scheme of the inventive method is: a kind of plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture, it is characterized in that: it includes vacuum cavity, electrode box, described vacuum cavity is detachable vacuum cavity, and it comprises relatively-stationary main part and separable portion; Described electrode box is installed in vacuum cavity main part, and all keeps relative with vacuum cavity main part static before deposition, in deposition process, after deposition.
Below such scheme is further explained:
The preferred structure of described vacuum cavity is to comprise: a separable portion that is positioned at the main part at position, stage casing and lays respectively at two-end part, the separable portion at described main part and two ends can airtight formation vacuum cavity, also can when needs loading, unloading deposited product, separate.
The main part of described vacuum cavity is provided with radio frequency and introduces electrode.
Described electrode box is provided with radio frequency and introduces the electrode contact that electrode pair should be connected, and before deposition, in deposition process, after deposition, radio frequency is introduced electrode and all kept in touch with electrode contact.
Described electrode box top is provided with inlet mouth, and inlet mouth communicates with electrode box inner chamber by the gas box of two band sieve shape pores successively, and the distribution area of the sieve shape pore of second gas box enough covers whole electrode box top.
The present invention compared with prior art has following advantages:
1. plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture of the present invention, by a part for Mobile vacuum cavity, avoids the motion of electrode box, keeps in process of production electrode box static.Avoided like this existing apparatus all to need electrode box to push, release and cause electrode frequently load and unload contact and be badly damaged in each deposition process; Avoided because electrode damage makes radio frequency aura unstable, caused the qualification rate of product to reduce.Therefore, the present invention can improve the qualification rate of production greatly.
2. the present invention is incorporated to preheating, cooling system and depositing system in a system device, has reduced the required number of devices of production line, makes the more succinct of production line change.
3. the present invention also can be preferably designed to same air-bleed system Gei Liangge sediment chamber and bleed, with same set of radio-frequency power supply and gas circuit supply system Wei Liangtao sediment chamber, jointly use, can reduce greatly the cost of equipment, thus the substantial every watt of manufacturing cost that has reduced amorphous silicon film solar battery.
Accompanying drawing explanation
Below in conjunction with drawings and Examples, the invention will be further described:
Fig. 1 is the structural representation of vacuum cavity of the present invention when airtight;
Schematic diagram when Fig. 2 is vacuum cavity separation of the present invention;
Fig. 3 is the schematic cross-section of vacuum cavity of the present invention;
Fig. 4 is the schematic cross-section of electrode box of the present invention.
Wherein: 10 vacuum cavities; The main part of 11 vacuum cavities; The separable portion of 12 vacuum cavities; The separable portion of 13 vacuum cavities; 18 radio frequencies are introduced electrode; 20 electrode boxes; 21 electrode contacts; 22 battery lead plates; 23 glass to be deposited; 24 inlet mouths; 25 gas boxes one; 26 pores; 27 gas boxes two; 28 pores.
Embodiment
Embodiment:
As shown in Figure 1 and Figure 2, a kind of plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture, it includes vacuum cavity 10, electrode box 20.
With reference to figure 2, vacuum cavity 10 is detachable vacuum cavity, and it comprises a separable portion 12,13 that is positioned at the relatively-stationary main part 11 at position, stage casing and lays respectively at two-end part.The separable portion 12,13 at main part 11 and two ends can be when need of work airtight formation vacuum cavity, also can when needs loading, unloading deposited product, separate.
With reference to figure 1, Fig. 2, electrode box 20 is installed in vacuum cavity 10, and all keeps relative static with the main part 11 of vacuum cavity 10 before deposition, in deposition process, after deposition.
As shown in Figure 3, the main part 11 of vacuum cavity 10 is provided with radio frequency and introduces electrode 18.As shown in Figure 4, electrode box 20 is provided with the electrode contact 21 of introducing the corresponding connection of electrode 18 with radio frequency.Before deposition, in deposition process, after deposition, it is static that electrode box keeps, so radio frequency is introduced electrode 18 and all kept static contact with electrode contact 21.Avoided so the frequent handling of electrode contact and caused wearing and tearing, avoided therefore making radio frequency aura unstable.
In the production process of prior art, after having deposited, all need electrode box to pull out at every turn, and before deposition, electrode box is pushed in.The present invention by a part for Mobile vacuum cavity, avoids the motion of electrode box, for keeping radio frequency to introduce the static condition of having brought that contacts of electrode 18 and electrode contact 21 in whole production process.
As shown in Figure 4, electrode box 20 tops are provided with inlet mouth 24, inlet mouth 24 sieves the gas box 1 of shape pore 26, the gas box 2 27 of band sieve shape pore 28 communicates with electrode box 20 inner chambers by band successively, and the distribution area of the sieve shape pore 28 of gas box 2 27 enough covers whole electrode box 20 tops.The air flow line of air inlet can represent with reference to the arrow in figure 4.
In the middle of whole working process, it is static keeping electrode box 20; Before deposition, first in the middle of electrode box 20, load glass 23 to be deposited; After dress, the main part of vacuum cavity 10 11 and separable portion 12,13 are combined, form a vacuum cavity; Then, start to vacuumize deposition; After deposition, the separable portion of vacuum chamber 10 12,13 parts are pulled out toward both sides, can guarantee that like this electrode box 20 keeps static, avoid radio frequency to introduce electrode 18 and frequently contact with electrode contact 21 and wear and tear.
It should be pointed out that for the present invention through absolutely proving, also can there is the embodiment of multiple conversion and remodeling, be not limited to the specific embodiment of above-mentioned embodiment.Above-described embodiment is as just explanation of the present invention, rather than limitation of the present invention.In a word, protection scope of the present invention should comprise those apparent conversion or alternative and remodeling to those skilled in the art.
Claims (3)
1. a plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture, is characterized in that: it includes vacuum cavity (10), electrode box (20); Described vacuum cavity (10) is detachable vacuum cavity, and it comprises relatively-stationary main part (11) and separable portion; Described electrode box (20) is installed in vacuum cavity main part (11), and all keeps relative static with vacuum cavity main part (11) before deposition, in deposition process, after deposition;
The main part (11) of described vacuum cavity (10) is provided with radio frequency and introduces electrode (18);
Described electrode box (20) is provided with the electrode contact (21) of introducing the corresponding connection of electrode (18) with radio frequency, and before deposition, in deposition process, after deposition, radio frequency is introduced electrode (18) and is all kept in touch with electrode contact (21);
Described electrode box top is provided with inlet mouth (24), and inlet mouth (24) sieves shape pore gas box by band communicates with electrode box (20) inner chamber.
2. a plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture, is characterized in that: it includes vacuum cavity (10), electrode box (20); Described vacuum cavity (10) is detachable vacuum cavity, and it comprises relatively-stationary main part (11) and separable portion; Described electrode box (20) is installed in vacuum cavity main part (11), and all keeps relative static with vacuum cavity main part (11) before deposition, in deposition process, after deposition;
The main part (11) of described vacuum cavity (10) is provided with radio frequency and introduces electrode (18);
Described electrode box (20) is provided with the electrode contact (21) of introducing the corresponding connection of electrode (18) with radio frequency, and before deposition, in deposition process, after deposition, radio frequency is introduced electrode (18) and is all kept in touch with electrode contact (21);
Described electrode box top is provided with inlet mouth (24), inlet mouth (24) sieves the gas box one (25) of shape pore (26), the gas box two (27) of band sieve shape pore (28) communicates with electrode box (20) inner chamber by band successively, and the distribution area of the sieve shape pore (28) of gas box two (27) enough covers whole electrode box (20) top.
3. plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture according to claim 1 and 2, it is characterized in that: described vacuum cavity (10) comprises a separable portion (12,13) that is positioned at the main part (11) at position, stage casing and lays respectively at two-end part, the separable portion at described main part (11) and two ends (12,13) can airtight formation vacuum cavity, also can when needs loading, unloading deposited product, separate.
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| Application Number | Priority Date | Filing Date | Title |
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| CN200810022195.4A CN101319310B (en) | 2008-07-02 | 2008-07-02 | Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture |
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| CN200810022195.4A CN101319310B (en) | 2008-07-02 | 2008-07-02 | Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture |
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| CN101319310A CN101319310A (en) | 2008-12-10 |
| CN101319310B true CN101319310B (en) | 2014-03-12 |
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| CN200810022195.4A Expired - Fee Related CN101319310B (en) | 2008-07-02 | 2008-07-02 | Plasma chemical vapor deposition vacuum apparatus for photovoltaic assembly scale manufacture |
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| CN102185217B (en) * | 2011-03-04 | 2013-02-06 | 深圳市创益科技发展有限公司 | Connecting member and method for radio-frequency power supply in silicon-based film battery deposition clamp |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1489644A (en) * | 2001-02-07 | 2004-04-14 | ��ķ�ƶ��ɷ�����˾ | Susceptorless reactor for growing epitaxial layers by chemical vapor deposition |
| CN101161858A (en) * | 2006-10-13 | 2008-04-16 | 西得乐公司 | Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
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Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1489644A (en) * | 2001-02-07 | 2004-04-14 | ��ķ�ƶ��ɷ�����˾ | Susceptorless reactor for growing epitaxial layers by chemical vapor deposition |
| CN101161858A (en) * | 2006-10-13 | 2008-04-16 | 西得乐公司 | Installation for depositing, by means of microwave plasma, an internal barrier coating in thermoplastic containers |
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| JP特开平8-85872A 1996.04.02 |
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Owner name: SUZHOU SPRUCE PHOTOVOLTAIC TECHNOLOGY, INC. Free format text: FORMER OWNER: XI JIANPING Effective date: 20120416 |
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Effective date of registration: 20120416 Address after: 215163 Jiangsu city of Suzhou province high tech Zone Kunlun Tongan Road No. 189, No. 2 building Applicant after: Suzhou Spruce Photovoltaic Energy Technologies, Inc. Address before: Suzhou City, Jiangsu province 215163 Suzhou high tech Zone East Zhu Zhen Xu Qiao Bei Si, Suzhou blue Applicant before: Xi Jianping |
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