CN101265022A - 激光修复系统 - Google Patents

激光修复系统 Download PDF

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Publication number
CN101265022A
CN101265022A CNA2008100951425A CN200810095142A CN101265022A CN 101265022 A CN101265022 A CN 101265022A CN A2008100951425 A CNA2008100951425 A CN A2008100951425A CN 200810095142 A CN200810095142 A CN 200810095142A CN 101265022 A CN101265022 A CN 101265022A
Authority
CN
China
Prior art keywords
laser
slit
stop member
limit
laser stop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2008100951425A
Other languages
English (en)
Chinese (zh)
Inventor
孙东一
金德星
赵圣行
宋源喜
郑昌赫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Electronics Co Ltd
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of CN101265022A publication Critical patent/CN101265022A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/066—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms by using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Nonlinear Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Laser Beam Processing (AREA)
  • Liquid Crystal (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
CNA2008100951425A 2007-02-22 2008-02-22 激光修复系统 Pending CN101265022A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR1020070017861A KR20080078165A (ko) 2007-02-22 2007-02-22 레이저 리페어 시스템
KR17861/07 2007-02-22

Publications (1)

Publication Number Publication Date
CN101265022A true CN101265022A (zh) 2008-09-17

Family

ID=39741340

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2008100951425A Pending CN101265022A (zh) 2007-02-22 2008-02-22 激光修复系统

Country Status (5)

Country Link
US (1) US20080218833A1 (enExample)
JP (1) JP2008200749A (enExample)
KR (1) KR20080078165A (enExample)
CN (1) CN101265022A (enExample)
TW (1) TW200844620A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104493366A (zh) * 2014-12-16 2015-04-08 昆山国显光电有限公司 激光修复系统
CN111922515A (zh) * 2020-09-01 2020-11-13 苏州科韵激光科技有限公司 一种激光修复装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5853331B2 (ja) * 2011-03-11 2016-02-09 株式会社ブイ・テクノロジー レーザ照射装置及びそれを使用した液晶表示パネルの輝点修正方法
KR101999397B1 (ko) * 2018-12-26 2019-09-27 주식회사 에이치비테크놀러지 파장 분기를 위한 개폐형 미러를 포함하는 레이저 리페어 장치

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6090528A (en) * 1999-10-27 2000-07-18 Gordon; Michael S. Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge
DE10244850A1 (de) * 2002-09-24 2004-04-01 Carl Zeiss Jena Gmbh Einstellbares Pinhole

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104493366A (zh) * 2014-12-16 2015-04-08 昆山国显光电有限公司 激光修复系统
CN111922515A (zh) * 2020-09-01 2020-11-13 苏州科韵激光科技有限公司 一种激光修复装置

Also Published As

Publication number Publication date
JP2008200749A (ja) 2008-09-04
TW200844620A (en) 2008-11-16
KR20080078165A (ko) 2008-08-27
US20080218833A1 (en) 2008-09-11

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Legal Events

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C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20080917