CN101231463A - Method for making optical element base on ultraviolet stamping multiphase and continue relief structure - Google Patents
Method for making optical element base on ultraviolet stamping multiphase and continue relief structure Download PDFInfo
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- CN101231463A CN101231463A CNA2008100639842A CN200810063984A CN101231463A CN 101231463 A CN101231463 A CN 101231463A CN A2008100639842 A CNA2008100639842 A CN A2008100639842A CN 200810063984 A CN200810063984 A CN 200810063984A CN 101231463 A CN101231463 A CN 101231463A
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Abstract
The invention provides a method for fabricating optical components with multi-phase and continuous embossed structures based on the ultraviolet-imprint lithography, which relates to the technical field of optical components. The method for fabricating micro-optical components with multi-level and continuous embossed structures comprises the following three steps of (1) fabricating an imprint die with embossed structures by micro-machining technique; (2) imprinting the embossed structures from the imprint die onto polymers on a substrate by using nanoimprint lithography, wherein the nanoimprint lithography is ultraviolet-imprint lithography; and (2) transferring the fine structure patterns to the hard substrate by dry etching technique by using the polymers as masks. The method can process micro-optics elements from single-component non-polymer hard optical material with multi-phase or continuous embossed structures on the surface, and has higher processing capacity than prior art.
Description
Technical field
The invention belongs to the micro optical element method for making, relate to a kind of method that the ultraviolet stamping fabrication techniques has the micro optical element of leggy and continuous relief structure feature of using.
Background technology
The Microstructure Optics element can greatly improve the imaging characteristic of optical system, reduces system bulk, reduces system weight, makes the performance of optical system reach a new height.
The job operation of traditional Microstructure Optics element mainly contains (repeatedly) optics alignment (patent No.: US5218471-A; US36352-E, " Method of making multilevel diffractive opticalelement-generating two binary amplitude masks; exposing photoresist layer onoptical element substrate through mask and etching it and repeating process "), the direct writing technology and the gray scale mask (patent No.: US2006263698-A1, " Grayscale photo mask makingmethod for opto-electronics industry; involves moving laser beam over locations onlayer, where locations have gray scale level to provide preset gray scale pattern onlocations to produce mask ") etc. several method.This several method ubiquity processing technology complexity, working (machining) efficiency are low, speed waits shortcoming slowly, and wherein, repeatedly there is unavoidable alignment error in optics alignment process complexity, and the diffraction efficiency of Microstructure Optics element is produced very big influence; It is extremely low directly to write working (machining) efficiency, can't be applied to the batch machining manufacturing; The gray scale mask processing technology is costly, complex process, and the phenomenon of existence exposure distortion.
The moulding replication technology (patent No.: US6881358-B1 based on thermoplastic, " Mold apparatusfor producing molded optical elements; e.g.diffractive lenses; includes first mold unitfor defining mold cavities and flow passageways; second mold unit having integratedmold surface containing patterns; and mold pins ") make that the Microstructure Optics element can realize surface fine structure once duplicate moulding, but use this method and can only process micro optical element based on polymeric optical material, can't processed glass, hard optical elements such as silicon dioxide, there is the material selection narrow range, range of application is little, shortcomings such as function limitation, this method also is difficult to avoid the distortion and the mismachining tolerance that cause because of expanding with heat and contract with cold simultaneously.
Ultraviolet nanometer impression art (UV Nanoimprint Lithography-UV NIL) is a kind of of nanometer embossing, in the researchist by Texas, USA university Austin branch school Materials Research Laboratories in 1999 (patent No. US266663, " Step and flash imprint lithography ") proposed.This technology is a kind of imprint lithography techniques of utilizing the ultraviolet light polymerization high molecular polymer under normal temperature, atmospheric pressure environment.This method is compared with existing hot press printing technology before, difference is, need not heating in advance during impression, the pressure of impression is also less, avoided the thermal expansion and the mechanically deform of pressing mold in the thermal imprint process, also reduce wearing and tearing, therefore improved the degree of accuracy of polymer pattern and the repeatability of multi-impression.This method is come the cure polymer layer by UV-irradiation, and the used time is very short, can significantly enhance productivity.
Disclose at present several application ultraviolet nanometer stamping techniques and made the method for micro optical element, as Markus Rossi, Hartmut Rudmann, Susanne Westenh fer, Martin Salt, Rainer Pelzer.Optical module fabrication using nanoimprint technology.Proc.of SPIE Vol.6110,61100L, (2006) with Niyaz Khusnatdinov.Gary Doyle.Mike Miller.Nick Stacey.MikeWatts.Dwayne L.LaBrake.Fabrication of Nano and Micro Optical Elements by Stepand Flash Imprint Lithography.Proc.of SPIE Vol.6110,61100K, (2006) etc., main by selecting for use the good polymeric material of optical property as surface film, directly on thin polymer film, impress through once impressing or repeatedly repeating, realize the processing of continuous relief Fresnel lens microtexture and microlens array structure, the subject matter of these class methods is, micro optical element is by two kinds of different material be combined intos, two kinds of material coefficient of thermal expansion coefficients do not match and cause membraneous material to come off with the temperature wide variation easily, and, the kind of polymer thin-film material is also very limited, can not satisfy optical material requirement in particular cases, thereby the application scenario is subjected to great restriction.
The present ultraviolet nanometer impression making micro optical element infrared as quartz, glass, silicon, germanium etc. or the hard optical material that visible spectrum is interior of using still is not reported.
Summary of the invention
The objective of the invention is to design a kind of leggy or continuous relief structure micro-optical element method for processing based on the ultraviolet stamping technology, by using single or ultraviolet stamping repeatedly, and, realize the high precision of micro optical element, preparation low-costly and in high volume in conjunction with dry etch process.
Technical solution of the present invention is: a kind of method of making based on the leggy and the continuous relief structure micro-optical element of ultraviolet stamping technology specifically may further comprise the steps: 1. use the Micrometer-Nanometer Processing Technology preparation and be used to process leggy or the required microtexture pressing mold of continuous relief structure micro-optical element; 2. the applying nano stamping technique is impressed into the embossment structure on the pressing mold on the on-chip polymkeric substance; It is characterized in that, the employed nanometer embossing of this method is the ultraviolet stamping technology, and this method is further comprising the steps of, 3. with the polymer architecture mask, realize of the transmission of microtexture figure by dry etching technology, use this method and realize that homogenous material and surface have the processing of the non-polymer hard optical material micro optical element of leggy or continuous relief structure to the hard substrate.
Described leggy or continuous relief structure micro-optical element method for processing based on the ultraviolet stamping technology, it is characterized in that, die material is the hard and the soft die material of transmissive ultraviolet light, as glass, quartz, polymethylmethacrylate (PMMA), dimethyl silicone polymer (PDMS).
Described leggy or continuous relief structure micro-optical element method for processing based on the ultraviolet stamping technology is characterized in that, Micrometer-Nanometer Processing Technology comprises cover lithography, laser direct-writing technology, direct electronic beam writing technology and soft making ide injection moulding reproduction technology.
Described leggy or continuous relief structure micro-optical element method for processing based on the ultraviolet stamping technology is characterized in that the micro optical element material comprises glass, quartz (SiO
2), silicon (Si), germanium (Ge), sapphire (Al
2O
3), gallium arsenide (GaAs), magnesium fluoride (MgF
2), lithium fluoride (LiF), barium fluoride (BaF
2), kalzit (CaCO
3), zinc sulphide (ZnS).
Innovative works of the present invention is:
The present invention proposes a kind of method for making of leggy and the continuous relief structure optical element based on ultraviolet stamping.The basic thought of this method is based on the intrinsic photochemical properties of uv curable polymers self, use the hard or the soft pressing mold that have micro relief profile to carry out mechanical presses on uncured polymer surface with flowability, this photochemistry of process ultraviolet light polymerization is with the high-precision polymer surfaces that copies to of the micro relief profile of stamper surface again, finish the transfer of microtexture figure, this method can make process complexity significantly reduce, using this method replaces the optical exposure of traditional Micrometer-Nanometer Processing Technology or directly writes processing step, realize microtexture duplicating to the target surface resist, can reduce the sky high cost that traditional diamond-making technique becomes dose exposure technology, improve the consistance of batch machining, using ultra-violet curing also can avoid in the curing process because of the caused thermal deformation of temperature variation on a large scale, machining precision is improved, in conjunction with the dry etch process step, finally realize the transfer processing and fabricating of microtexture figure simultaneously to the hard optical material surface.
Based on above-mentioned innovative point, the present invention compares micro-optical device processing technology in the past, mainly has following superiority
1, the present invention can the microtexture of machining feature size below 10nm, can satisfy the processing request of object lens of large relative aperture, high-diffraction efficiency and short wavelength's device, can realize once-forming to the step embossment structure and the continuous relief structure of complexity.
2, than the gray scale mask processing technology, the present invention has avoided gray scale exposure technology process, do not need the high change dose exposure mask of manufacturing cost, can also solve simultaneously the phenomenons such as exposure distortion in the gray scale exposure process, have good machining precision and technology realization property, reduce process complexity simultaneously.
3, than traditional multilayer mask cover lithography, the present invention has avoided the alignment error that repeatedly alignment brought, the main error source of the processing technology of having pruned, improved the level of processing of high-diffraction efficiency micro optical element, replace repeatedly photoetching with once impressing simultaneously, greatly improved working (machining) efficiency.
4, than the laser direct-writing process technology, the present invention is having great raising aspect process velocity and the efficient, has solved the shortcoming of the slow maximum of process velocity, has advantages such as processing technology is simple, processing result high conformity simultaneously.
5, than hot press printing technology, the problem on deformation that the present invention has avoided high temperature and operation with high pressure to bring has reduced the complicacy of operating, and has improved the repeatability of impression degree of accuracy, production efficiency and multi-impression, has also improved working (machining) efficiency simultaneously.
6, the present invention to the material of Microstructure Optics device without limits can be with the multidigit on the press mold mutually or continuous relief structure, is delivered to accurately such as in the hard optical materials such as quartzy, monocrystalline silicon and sapphire by corresponding dry etch process.The polymeric material that is adopted in other micro-optic duplication process, this type of material has advantages such as high strength, high rigidity, high radiation preventing damage threshold, high chemical stability, wide transmitted spectrum scope.
7, the present invention has that technology is simple, speed is fast, good reproducibility, low, the productive rate advantages of higher of cost, can realize simultaneously producing in batches.
Description of drawings
Fig. 1 obtains the technology of pressing mold and uses the schematic flow sheet that the injection moulding reproduction technology is made soft making ide for using direct writing technology.
(a) on-chip resist is carried out the scan-type pointwise and become dose exposure;
(b) develop the back at its surperficial embossment structure that forms step;
(c) use anisotropic rie and obtain pressing mold.
(d) use soft making ide injection moulding reproduction technology and make soft making ide.
Fig. 2 is for making the process flow diagram of the binary optical lenses with many steps embossment structure.
(a) stamper architecture synoptic diagram;
(b) use this pressing mold and implement ultraviolet stamping;
(c) the binary optical lenses micro relief profile synoptic diagram behind the dry etching.
Fig. 3 is the binary optical lenses structural representation with continuous relief structure.
Fig. 4 is for making the binary optical lenses process flow diagram with continuous relief structure.
(a) stamper architecture synoptic diagram;
(b) use this pressing mold and implement ultraviolet stamping;
(c) the binary optical lenses microstructure synoptic diagram behind the dry etching.
Fig. 5 is for making the synoptic diagram of the microlens array with continuous relief structure.
(a) quartzy micro relief profile motherboard synoptic diagram;
(b) use the injection moulding reproduction technology and make PDMS making ide synoptic diagram;
(c) use the PDMS pressing mold and implement ultraviolet stamping;
(d) be the array structure thereof synoptic diagram behind the dry etching.
Embodiment
Making has the binary optical lenses of many steps embossment structure, and element material and die material are glass, and the required polymkeric substance of ultraviolet stamping is ultra-violet curing glue OG154, and concrete technological process is as follows:
1,, use the laser direct-writing fabrication techniques to have surface relief pressing mold with the object construction complementation, as Fig. 2 (a) according to as shown in Figure 1 technological process.
2, use ultraviolet stamping the structure on the pressing mold is oppositely copied on the on-chip OG154, as Fig. 2 (b).
3, be mask with the OG154 pattern, application response ion etching technology obtains many steps embossment structure, as Fig. 2 (c) on quartz substrate.
Embodiment 2:
Make the binary optical lenses that has continuous relief structure as shown in Figure 3, element material is a monocrystalline silicon, and the material of pressing mold is quartzy, and polymkeric substance is selected ultraviolet organic photo solvent PAK01 for use.Concrete technological process is as follows:
1,, use direct electronic beam writing technology to make the continuous relief pressing mold that has with the object construction complementation, as Fig. 4 (a) according to as shown in Figure 1 technological process.
2, use ultraviolet stamping the embossment structure on the pressing mold is oppositely copied on the on-chip PAK01, as Fig. 4 (b).
3, be mask with the PAK01 pattern, use dry etching technology, on quartz substrate, obtain continuous relief structure, as Fig. 4 (c).
Embodiment 3:
Make the microlens array that has continuous relief structure as shown in Figure 5, element material is a sapphire, and die material is dimethyl silicone polymer (PDMS), and polymkeric substance is selected ultraviolet organic photo solvent PAK01 for use, and concrete technological process is as follows:
1, according to as shown in Figure 1 technological process, use direct electronic beam writing technology to be the material continuous relief structure identical, as Fig. 5 (a) with object construction with quartz.
2, the continuous micro relief profile made from step 1 is a mould, uses the method that injection moulding is duplicated, and makes the soft making ide of PDMS, as Fig. 5 (b).
3, the application ultraviolet stamping is impressed into the micro relief profile on PDMS making ide surface on the substrate surface polymer P AK01, as Fig. 5 (c).
4, use dry etching technology, with the micro relief profile figure transfer of polymeric layer to substrate surface, as Fig. 5 (d).
Claims (4)
1. a method of making based on the leggy and the continuous relief structure micro-optical element of ultraviolet stamping technology specifically may further comprise the steps: 1. use the Micrometer-Nanometer Processing Technology preparation and be used to process leggy or the required microtexture pressing mold of continuous relief structure micro-optical element; 2. the applying nano stamping technique is impressed into the embossment structure on the pressing mold on the on-chip polymkeric substance; It is characterized in that, the employed nanometer embossing of this method is the ultraviolet stamping technology, and this method is further comprising the steps of, 3. with the polymer architecture mask, realize of the transmission of microtexture figure by dry etching technology, use this method and realize that homogenous material and surface have the processing of the non-polymer hard optical material micro optical element of leggy or continuous relief structure to the hard substrate.
2. method of making according to claim 1 based on the leggy and the continuous relief structure micro-optical element of ultraviolet stamping technology, it is characterized in that the ultraviolet stamping die material is the hard and the soft die material of transmissive ultraviolet light, comprises quartz, glass, dimethyl silicone polymer (PDMS) and polymethyl methacrylate (PMMA).
3. method of making based on the leggy and the continuous relief structure micro-optical element of ultraviolet stamping technology according to claim 1 is characterized in that Micrometer-Nanometer Processing Technology comprises cover lithography, laser direct-writing technology, direct electronic beam writing technology and soft making ide injection moulding reproduction technology.
4. method of making based on the leggy and the continuous relief structure micro-optical element of ultraviolet stamping technology according to claim 1 is characterized in that the micro optical element material comprises glass, quartz (SiO
2), silicon (Si), germanium (Ge), sapphire (Al
2O
3), gallium arsenide (GaAs), magnesium fluoride (MgF
2), lithium fluoride (LiF), barium fluoride (BaF
2), kalzit (CaCO
3), zinc sulphide (ZnS).
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|---|---|---|---|
| CNA2008100639842A CN101231463A (en) | 2008-02-04 | 2008-02-04 | Method for making optical element base on ultraviolet stamping multiphase and continue relief structure |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104708800A (en) * | 2013-12-11 | 2015-06-17 | 中国科学院深圳先进技术研究院 | Soft imprinting method for manufacturing micro-nano structure in cycloalkene polymer micro-fluidic chip |
| CN105397300A (en) * | 2014-08-22 | 2016-03-16 | 中兴通讯股份有限公司 | Optical waveguide reflector machining method and system and optical waveguide |
| CN114188815A (en) * | 2021-12-09 | 2022-03-15 | 北京工业大学 | Lens-free focusing device and method of coherent array laser |
-
2008
- 2008-02-04 CN CNA2008100639842A patent/CN101231463A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104708800A (en) * | 2013-12-11 | 2015-06-17 | 中国科学院深圳先进技术研究院 | Soft imprinting method for manufacturing micro-nano structure in cycloalkene polymer micro-fluidic chip |
| CN105397300A (en) * | 2014-08-22 | 2016-03-16 | 中兴通讯股份有限公司 | Optical waveguide reflector machining method and system and optical waveguide |
| CN114188815A (en) * | 2021-12-09 | 2022-03-15 | 北京工业大学 | Lens-free focusing device and method of coherent array laser |
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